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Search for "CVD" in Full Text gives 211 result(s) in Beilstein Journal of Nanotechnology. Showing first 200.

Bi-layer sandwich film for antibacterial catheters

  • Gerhard Franz,
  • Florian Schamberger,
  • Hamideh Heidari Zare,
  • Sara Felicitas Bröskamp and
  • Dieter Jocham

Beilstein J. Nanotechnol. 2017, 8, 1982–2001, doi:10.3762/bjnano.8.199

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  • , irrespective of whether the catheter is utilized as urethral balloon catheter or as ureteral stent. Due to the high aspect ratio of the catheters (20 to 30 cm in length at with a small lumen of maximal 1 or 3 mm), the only technique to achieve a double-sided coating is chemical vapor deposition (CVD). A
  • coating, because it forms the very stable complex [Ag(NH3)2]+, which dissolves a possible precipitate of AgCl [19]. 3. Among the various deposition techniques, chemical vapor deposition (CVD) is known for its outstanding conformal coatings, in particular on three-dimensional substrates. Because the
  • in the uriniferous system is different from oral ingestion or intravenous injections. 5. Among the thousands of possible organic materials, just a few remain fulfilling the requirements of biocompatibility and of the FDA regulations. For the CVD deposition we chose poly(p-xylylene) N, PPX-N or
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Published 22 Sep 2017

Process-specific mechanisms of vertically oriented graphene growth in plasmas

  • Subrata Ghosh,
  • Shyamal R. Polaki,
  • Niranjan Kumar,
  • Sankarakumar Amirthapandian,
  • Mohamed Kamruddin and
  • Kostya (Ken) Ostrikov

Beilstein J. Nanotechnol. 2017, 8, 1658–1670, doi:10.3762/bjnano.8.166

Graphical Abstract
  • morphology from planar to vertical networks by altering the growth temperature while maintaining the same sp3 content. According to the above results, the growth mechanism of VGNs, shows as schematic in Figure 4, can be explained as follows: The ECR-CVD creates highly energetic plasma species (e.g., CxHy, C2
  • resistance of 0.98 kΩ/sq is observed for the VGNs grown at 800 °C. The lowest sheet resistance of 0.6 kΩ/sq is obtained for the film grown at a distance of 10 cm from the plasma source, which is lower than that of CVD-grown planar graphene with eight layers (0.77 kΩ/sq) [64]. Grain boundary and edge defects
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Published 10 Aug 2017

Parylene C as a versatile dielectric material for organic field-effect transistors

  • Tomasz Marszalek,
  • Maciej Gazicki-Lipman and
  • Jacek Ulanski

Beilstein J. Nanotechnol. 2017, 8, 1532–1545, doi:10.3762/bjnano.8.155

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  • under the commercial name of parylenes, is unique in many ways. It is a synthetic path for polymer formation, at the same time it belongs to the category of chemical vapor deposition (CVD) and, as such, it yields products in a form of conformal solid films depositing at any surface exposed. As a CVD
  • C by CVD method does not disturb the semiconductor surface, and second, the charge-trapping effect caused by oxygen and water is much less pronounced when Parylene C is working as a protecting layer of the semiconductor film. An example of this advantage is given in the abovementioned work with C60
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Published 28 Jul 2017

Adsorption and electronic properties of pentacene on thin dielectric decoupling layers

  • Sebastian Koslowski,
  • Daniel Rosenblatt,
  • Alexander Kabakchiev,
  • Klaus Kuhnke,
  • Klaus Kern and
  • Uta Schlickum

Beilstein J. Nanotechnol. 2017, 8, 1388–1395, doi:10.3762/bjnano.8.140

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  • at 1073 K for 5 min. A h-BN layer was grown by chemical vapor deposition (CVD) by heating the Rh(111) sample to 1073 K and exposing it to 110 L of borazine ((HBNH)3) gas. h-BN grows in a self-terminating growth process [22] on the (111) surface of the crystal. The KCl layers on various metal surfaces
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Published 06 Jul 2017

Micro- and nano-surface structures based on vapor-deposited polymers

  • Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

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  • technologies for vapor-based coatings largely depend on adaptation from these lithographical approaches (Figure 1). A DNA array was fabricated in a photolithographical liftoff process on a vapor-deposited (chemical vapor deposition, CVD) poly-p-xylylene surface, and the resulting array surface showed excellent
  • for the pattern formation of polyethylene glycol (PEG)-like polymer derivatives to guide fibroblast attachment [21]. A photodefinable polymer of poly(4-benzoyl-p-xylylene-co-p-xylylene) was synthesized by CVD, and a combined soft lithographical and UV light process was performed to create the
  • surfaces. For example, surface patterns were created on a CVD-deposited pentafluorophenol ester-functionalized poly-p-xylylene coating by μCP with the use of a PDMS elastomeric stamp, and line patterns of functional biotin molecules were formed with stability up to seven days at room temperature. In the
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Published 04 Jul 2017

Oxidative chemical vapor deposition of polyaniline thin films

  • Yuriy Y. Smolin,
  • Masoud Soroush and
  • Kenneth K. S. Lau

Beilstein J. Nanotechnol. 2017, 8, 1266–1276, doi:10.3762/bjnano.8.128

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  • advantageous route for depositing conducting polymer thin films without the need of a solvent or a conductive substrate, which naturally makes the process amenable in a wide range of applications [17][21]. Other methods such as plasma-enhanced CVD (PECVD) have previously been used to make conformal and uniform
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Published 16 Jun 2017

Preparation of thick silica coatings on carbon fibers with fine-structured silica nanotubes induced by a self-assembly process

  • Benjamin Baumgärtner,
  • Hendrik Möller,
  • Thomas Neumann and
  • Dirk Volkmer

Beilstein J. Nanotechnol. 2017, 8, 1145–1155, doi:10.3762/bjnano.8.116

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  • study is the deposition of nanostructured silica onto the surface of carbon fibers. Among other techniques of covering the carbon fiber surface with a silicon dioxide layer (or other ceramic coatings), the most common ones are chemical vapor deposition (CVD) [4], liquid phase impregnation [5] and sol
  • –gel techniques [6]. Even though the CVD method leads typically to a uniform and dense surface coating, low deposition rates can make this process time-consuming and expensive. The sol–gel method is advantageous owing to the low processing temperature, inexpensive and commercially available precursors
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Published 26 May 2017

Growth, structure and stability of sputter-deposited MoS2 thin films

  • Reinhard Kaindl,
  • Bernhard C. Bayer,
  • Roland Resel,
  • Thomas Müller,
  • Viera Skakalova,
  • Gerlinde Habler,
  • Rainer Abart,
  • Alexey S. Cherevan,
  • Dominik Eder,
  • Maxime Blatter,
  • Fabian Fischer,
  • Jannik C. Meyer,
  • Dmitry K. Polyushkin and
  • Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

Graphical Abstract
  • [11], tremendous progress on MoS2 growth by chemical vapour deposition (CVD) type synthesis has recently been made [20][22][23][24][25][26]. An alternative fabrication route with industrial scalability and potentially offering MoS2 deposition on a variety of substrates is physical vapour deposition
  • conduction behaviour could be related to both chemical composition and structure and will be discussed in the following. First, Mo/S stoichiometry variations in the MoS2 film could contribute to unexpected variations in electrical transport. For instance, for transistor devices based on CVD MoS2 monolayers
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Published 22 May 2017

The integration of graphene into microelectronic devices

  • Guenther Ruhl,
  • Sebastian Wittmann,
  • Matthias Koenig and
  • Daniel Neumaier

Beilstein J. Nanotechnol. 2017, 8, 1056–1064, doi:10.3762/bjnano.8.107

Graphical Abstract
  • , epitaxy on silicon carbide or chemical vapor deposition (CVD) on catalytic metals [5]. Besides meeting the requirements of film quality and cost, the scalability to 200 or 300 mm wafer sizes is crucial for being suitable for industrial production. Currently, the highest-quality graphene synthesis method
  • that fulfills these constraints is graphene CVD on copper substrates [4][6]. However, for building electronic devices graphene typically has to be placed on an insulating substrate. Hence the graphene films have to be transferred from their growth substrate to the device substrate. In the past several
  • methods have been proposed [7], which can be grouped into the following categories. 1.1 Ex situ transfer The CVD growth substrate can either be a copper foil, which is most commonly used, or a Cu film deposited by physical vapor deposition (PVD) on a silicon wafer substrate with a diffusion barrier
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Published 15 May 2017

Study of the correlation between sensing performance and surface morphology of inkjet-printed aqueous graphene-based chemiresistors for NO2 detection

  • F. Villani,
  • C. Schiattarella,
  • T. Polichetti,
  • R. Di Capua,
  • F. Loffredo,
  • B. Alfano,
  • M. L. Miglietta,
  • E. Massera,
  • L. Verdoliva and
  • G. Di Francia

Beilstein J. Nanotechnol. 2017, 8, 1023–1031, doi:10.3762/bjnano.8.103

Graphical Abstract
  • printing a LPE graphene suspension dispersed in a water/isopropanol (H2O/IPA) mixture as sensing ink onto paper substrates. Analogous paper-based graphene sensors, relying on different fabrication processes, such as CVD (chemical vapour deposition) grown transferred graphene [13] or inkjet-printed GO
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Published 09 May 2017

CVD transfer-free graphene for sensing applications

  • Chiara Schiattarella,
  • Sten Vollebregt,
  • Tiziana Polichetti,
  • Brigida Alfano,
  • Ettore Massera,
  • Maria Lucia Miglietta,
  • Girolamo Di Francia and
  • Pasqualina Maria Sarro

Beilstein J. Nanotechnol. 2017, 8, 1015–1022, doi:10.3762/bjnano.8.102

Graphical Abstract
  • surface area. A study on graphene that was synthetized by means of a novel transfer-free fabrication approach and is employed as sensing material is herein presented. Multilayer graphene was deposited by chemical vapour deposition (CVD) mediated by CMOS-compatible Mo. The utilized technique takes
  • number of publications dedicated to graphene-based sensors [2]. The gas sensor devices presented in literature are mostly based on pristine graphene, graphene oxide (GO) and reduced graphene oxide (rGO). Many approaches for the fabrication of such materials, including CVD, mechanical, chemical and
  • of conductometric devices in which multilayer graphene films have been directly synthesized on insulating SiO2 substrates by means of a transfer-free CVD method mediated by Mo. The pre-patterning of the Mo layer allows the graphene to be shaped in the desired form by means of standard lithography
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Published 08 May 2017

Needs and challenges for assessing the environmental impacts of engineered nanomaterials (ENMs)

  • Michelle Romero-Franco,
  • Hilary A. Godwin,
  • Muhammad Bilal and
  • Yoram Cohen

Beilstein J. Nanotechnol. 2017, 8, 989–1014, doi:10.3762/bjnano.8.101

Graphical Abstract
  • assessment of carbon nanotubes (CNTs) reported by Eckelman et al. [38]. This latter study compared the environmental impacts (in freshwater) of chemical releases resulting from the manufacture (e.g., arc ablation, chemical vapor deposition (CVD), and high-pressure carbon monoxide (HiPco)) for a hypothetical
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Published 05 May 2017

Vapor-phase-synthesized fluoroacrylate polymer thin films: thermal stability and structural properties

  • Paul Christian and
  • Anna Maria Coclite

Beilstein J. Nanotechnol. 2017, 8, 933–942, doi:10.3762/bjnano.8.95

Graphical Abstract
  • deposition techniques (e.g., plasma-enhanced CVD). Therefore, depending on the application and on the desired polymer properties, one can choose to work in conditions that drive crystallinity and hydrophobicity or thermally stable surface properties instead. Molecular structure of the monomers PFDA and EGDMA
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Published 26 Apr 2017

High photocatalytic activity of Fe2O3/TiO2 nanocomposites prepared by photodeposition for degradation of 2,4-dichlorophenoxyacetic acid

  • Shu Chin Lee,
  • Hendrik O. Lintang and
  • Leny Yuliati

Beilstein J. Nanotechnol. 2017, 8, 915–926, doi:10.3762/bjnano.8.93

Graphical Abstract
  • ], plasma enhanced-chemical vapor deposition (PE-CVD) and radio frequency (RF) sputtering approach [12], and plasma enhanced-chemical vapor deposition and atomic layer deposition (ALD) followed by thermal treatment [13]. Among these preparation methods, impregnation is a commonly used approach for the
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Published 24 Apr 2017

Investigation of growth dynamics of carbon nanotubes

  • Marianna V. Kharlamova

Beilstein J. Nanotechnol. 2017, 8, 826–856, doi:10.3762/bjnano.8.85

Graphical Abstract
  • developing the methods of their efficient synthesis. During last years, significant progress was made in this field. The arc-discharge, laser ablation and chemical vapor deposition (CVD) methods were optimized for the synthesis of SWCNTs in a high yield [5][6]. Synthesis parameters can be varied in a broad
  • summarized. Finally, the growth properties of inner tubes inside SWCNTs filled with fullerene and organometallic molecules are considered. Synthesis of carbon nanotubes The SWCNTs can be synthesized by the arc-discharge, laser ablation and chemical vapour deposition (CVD) techniques. A detailed overview of
  • described in detail in [18]. Growth mechanism of carbon nanotubes Although the synthesis of nanotubes with controlled properties can be performed in the CVD process, the growth mechanism of nanotubes is not completely understood and is still debated. Nanotube growth in the CVD process Vapor-liquid-solid and
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Published 11 Apr 2017

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

  • Brett B. Lewis,
  • Robert Winkler,
  • Xiahan Sang,
  • Pushpa R. Pudasaini,
  • Michael G. Stanford,
  • Harald Plank,
  • Raymond R. Unocic,
  • Jason D. Fowlkes and
  • Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

Graphical Abstract
  • sufficient to initiate carbon removal without inducing significant thermal drift and/or laser chemical vapor deposition (CVD). Laser pulses are delivered to the sample with an optical working distance of 9 mm using a multi-mode 100 µm diameter fiber optic cable housed within a stainless steel shaft with
  • situation at elevated temperatures. MeCpPt(IV)Me3 was originally developed for use as a thermal chemical vapor deposition (CVD) precursor [75]; the thermal decomposition temperature on the order of 120 °C in the presence of H2 results in pure Pt films. Thus, with LAEBID we leverage the pulsed thermal energy
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Published 07 Apr 2017

Vapor deposition routes to conformal polymer thin films

  • Priya Moni,
  • Ahmed Al-Obeidi and
  • Karen K. Gleason

Beilstein J. Nanotechnol. 2017, 8, 723–735, doi:10.3762/bjnano.8.76

Graphical Abstract
  • , USA 10.3762/bjnano.8.76 Abstract Vapor phase syntheses, including parylene chemical vapor deposition (CVD) and initiated CVD, enable the deposition of conformal polymer thin films to benefit a diverse array of applications. This short review for nanotechnologists, including those new to vapor
  • coats the substrate geometry (Figure 1c) [1]. Several chemical vapor deposition (CVD) techniques result in highly conformal polymer films. For instance, emerging techniques such as molecular layer deposition (MLD) and oxidative CVD (oCVD) form conformal metalucone and step-growth polymer films [10][11
  • -studied, conformal polymer CVD techniques: parylene CVD and initiated CVD (iCVD), with both deriving from free radical polymerization mechanisms. The four parts of this review will address reaction mechanisms of the aforementioned techniques, necessary deposition conditions for conformal film growth
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Published 28 Mar 2017

Synthesis of graphene–transition metal oxide hybrid nanoparticles and their application in various fields

  • Arpita Jana,
  • Elke Scheer and
  • Sebastian Polarz

Beilstein J. Nanotechnol. 2017, 8, 688–714, doi:10.3762/bjnano.8.74

Graphical Abstract
  • graphene from graphite by micromechanical cleavage [1]. Later, graphene was prepared in bulk from graphite utilising various approaches, including micromechanical exfoliation of pyrolytic graphite [31][32][33] (the scotch tape method), epitaxial growth [34], chemical vapour deposition (CVD) [35][36], and
  • (Figure 1). Bottom-up growth of graphene includes micromechanical exfoliation of bulk graphite. The processes included in the bottom-up synthesis of graphene are CVD [39][40], arc discharge [41], and epitaxial growth [42]. Using CVD, graphene and few-layer graphene have been grown on catalytic metal
  • surfaces from carbon containing gasses. In terms of production, the CVD method is used for the production of graphene with a large area with low defect concentration, but in small quantities. Reina et al. have prepared 1- to 12-layer graphene having continuous films with up to ≈20 µm in lateral size by
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Published 24 Mar 2017

Ion beam profiling from the interaction with a freestanding 2D layer

  • Ivan Shorubalko,
  • Kyoungjun Choi,
  • Michael Stiefel and
  • Hyung Gyu Park

Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73

Graphical Abstract
  • vapor deposition (CVD) according to a previously developed method [19]. This method is optimized for maximal grain connectivity resulting in uniform graphene films. Then, graphene was transferred to silicon/silicon-nitride frames with openings of a few micrometers in diameter. A PMMA-based graphene
  • Graphene was grown using CVD on an Alfa Aesar 46986 Cu foil. Before the growth the foil is cleaned by Ar ion beam milling for 10 min at 250 mA and 600 V. Then, it is reduction-annealed in a H2/Ar gas flow (5 sccm/5 sccm) at 1000 °C for 60 min. The growth of graphene is initiated by introducing a CH4 gas
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Published 23 Mar 2017

Gas sensing properties of MWCNT layers electrochemically decorated with Au and Pd nanoparticles

  • Elena Dilonardo,
  • Michele Penza,
  • Marco Alvisi,
  • Riccardo Rossi,
  • Gennaro Cassano,
  • Cinzia Di Franco,
  • Francesco Palmisano,
  • Luisa Torsi and
  • Nicola Cioffi

Beilstein J. Nanotechnol. 2017, 8, 592–603, doi:10.3762/bjnano.8.64

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  • MWCNTs, for gas sensing applications. Experimental Preparation of metal-decorated MWCNT-based chemiresistors MWCNT networked films were grown by chemical vapor deposition (CVD) directly onto the surface of an alumina substrate that was previously coated with a cobalt (Co) sputtered catalytic layer (≈6 nm
  • decoration, in both cases. Oxygen is commonly present in MWCNTs synthesized by the CVD process and is mainly derived from the oxygen adsorbed on the surface, as well as from carbon oxidation events. In both hybrid systems, the atomic percentage of oxygen further increased at the MWCNT surface after metal
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Published 10 Mar 2017

Graphene functionalised by laser-ablated V2O5 for a highly sensitive NH3 sensor

  • Margus Kodu,
  • Artjom Berholts,
  • Tauno Kahro,
  • Mati Kook,
  • Peeter Ritslaid,
  • Helina Seemen,
  • Tea Avarmaa,
  • Harry Alles and
  • Raivo Jaaniso

Beilstein J. Nanotechnol. 2017, 8, 571–578, doi:10.3762/bjnano.8.61

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  • material. The response of graphene-based sensors can be radically improved by introducing defects in graphene using, for example, metal or metal oxide nanoparticles. We have functionalised CVD grown, single-layer graphene by applying pulsed laser deposition (PLD) of V2O5 which resulted in a thin V2O5 layer
  • monolayer per laser pulse are the advantages worth mentioning. The method of PLD has recently been applied to improve the nitrogen dioxide (NO2) sensing properties of chemical vapour deposition (CVD) grown, single-layer graphene in our previous work, using ZrO2 and Ag for functionalisation [14]. In the
  • present work, we demonstrate functionalisation of single-layer CVD graphene with a few layers of laser deposited V2O5. The amount and chemical state of vanadium oxide on graphene was characterized by X-ray photoelectron spectroscopy and X-ray fluorescence. The impact of the PLD process on graphene defect
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Published 07 Mar 2017

Liquid permeation and chemical stability of anodic alumina membranes

  • Dmitrii I. Petukhov,
  • Dmitrii A. Buldakov,
  • Alexey A. Tishkin,
  • Alexey V. Lukashin and
  • Andrei A. Eliseev

Beilstein J. Nanotechnol. 2017, 8, 561–570, doi:10.3762/bjnano.8.60

Graphical Abstract
  • channels blocking. This process intensifies in basic pH due to the high positive charge of the anodic alumina surface. An approach for improving anodic aluminum oxide stability towards dissolution in water by carbon CVD coating of the membrane walls is suggested. Keywords: anodic alumina; carbon-modified
  • , thermally treated membranes have also illustrated water permeation loss during the operation and after membrane drying between the cycles. To provide an additional protection, carbon CVD (by the pyrolysis of hydrocarbons) was also adopted in the same thermal treatment regime to provide a continuous 10 nm
  • error limits; however, slightly better stability of carbon-coated membranes was noticed. Therefore, both the thermal treatment procedure and the CVD coating of the membrane with an amorphous carbon results in the stabilization of AAO membranes towards dissolution in water. This therefore allows for
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Published 06 Mar 2017

Advances in the fabrication of graphene transistors on flexible substrates

  • Gabriele Fisichella,
  • Stella Lo Verso,
  • Silvestra Di Marco,
  • Vincenzo Vinciguerra,
  • Emanuela Schilirò,
  • Salvatore Di Franco,
  • Raffaella Lo Nigro,
  • Fabrizio Roccaforte,
  • Amaia Zurutuza,
  • Alba Centeno,
  • Sebastiano Ravesi and
  • Filippo Giannazzo

Beilstein J. Nanotechnol. 2017, 8, 467–474, doi:10.3762/bjnano.8.50

Graphical Abstract
  • transferred to the target substrate. In this sense, the use of graphene grown by chemical vapor deposition (CVD) on various metals (Ni [7], Cu [13]) and using various precursors [14] represents the most suitable choice. Among the various device architectures, Gr-FET-based sensors can represent a great
  • deposition conditions must be optimized in order to ensure the expected layer-by-layer ALD mechanism of the insulating film, instead of a massive CVD growth mechanism, which in turn can result in a degradation of the overall structural and electrical quality of the insulator. This aspect is particularly
  • between the precursor exposure in order to prevent the precursor mixing and a consequent CVD growth mechanism. The developed low temperature (LT) and prolonged cycle process was analyzed on a silicon (100) reference wafer and compared to a standard temperature (ST) PE-ALD growth process. The morphology
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Published 20 Feb 2017

The longstanding challenge of the nanocrystallization of 1,3,5-trinitroperhydro-1,3,5-triazine (RDX)

  • Florent Pessina and
  • Denis Spitzer

Beilstein J. Nanotechnol. 2017, 8, 452–466, doi:10.3762/bjnano.8.49

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  • rate of a continuous hydrothermal process from 1–10 tons/year to 100 tons/year for inorganic nanomaterials [123]. Tsuzuki et al. [124] statistically studied which methods for inorganic nanosynthesis are mostly employed in industry: vapor (39% mainly chemical vapor deposition (CVD)) and liquid (45
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Published 17 Feb 2017

Study of the surface properties of ZnO nanocolumns used for thin-film solar cells

  • Neda Neykova,
  • Jiri Stuchlik,
  • Karel Hruska,
  • Ales Poruba,
  • Zdenek Remes and
  • Ognen Pop-Georgievski

Beilstein J. Nanotechnol. 2017, 8, 446–451, doi:10.3762/bjnano.8.48

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  • surface properties of ZnO NCs and the binding state of present elements were investigated before and after different plasma treatments, typically used in plasma-enhanced CVD solar cell deposition processes, by X-ray photoelectron spectroscopy (XPS). Photothermal deflection spectroscopy (PDS) was used to
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Published 16 Feb 2017
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