Electromigrated electrical optical antennas for transducing electrons and photons at the nanoscale

• Arindam Dasgupta,
• Mickaël Buret,
• Nicolas Cazier,
• Marie-Maxime Mennemanteuil,
• Reinaldo Chacon,
• Kamal Hammani,
• Jean-Claude Weeber,
• Juan Arocas,
• Laurent Markey,
• Gérard Colas des Francs,
• Alexander Uskov,
• Igor Smetanin and
• Alexandre Bouhelier

Beilstein J. Nanotechnol. 2018, 9, 1964–1976, doi:10.3762/bjnano.9.187

• connected optical antenna is a Au constriction formed between two fan-out electrodes laying on a glass cover slip. We use electron-beam lithography and standard physical vapor deposition to produce gold constrictions and the proximity electrodes. The thickness of the Au layer is typically 50 nm, and we use

• is obtained in a second step of fabrication by ultraviolet (UV) photolithography. An image of a typical sample, constituted of 24 constrictions and their associated macroscopic electrodes, is illustrated in Figure 1b. The red and blue regions are realized by electron-beam lithography and UV

• connected tunneling optical antennas is fabricated by electron-beam lithography, Au evaporation and lift-off process. The structures consist of either a gold nanowire of 1.1 μm length and 130 nm width or a constriction as discussed above. For both types, the structures are connected to a set of electrodes

The inhibition effect of water on the purification of natural gas with nanoporous graphene membranes

• Krzysztof Nieszporek,
• Tomasz Pańczyk and
• Jolanta Nieszporek

Beilstein J. Nanotechnol. 2018, 9, 1906–1916, doi:10.3762/bjnano.9.182

• engineers. While considering production techniques, the application of focused electron beam irradiation in transmission electron microscopy makes it possible to determine graphene membranes with well-defined pore diameter [3]. Similar possibilities are also created by modified helium ion microscopy for

Direct AFM-based nanoscale mapping and tomography of open-circuit voltages for photovoltaics

• Katherine Atamanuk,
• Justin Luria and
• Bryan D. Huey

Beilstein J. Nanotechnol. 2018, 9, 1802–1808, doi:10.3762/bjnano.9.171

• to move to the underlying n-type CdS layer [6]. Equivalent conclusions have been inferred from complementary techniques such as simple conductive AFM [27], surface-potential mapping [28], and electron beam induced currents [29], though the fully three-dimensional, directly acquired data of ISC* and

Friction force microscopy of tribochemistry and interfacial ageing for the SiO_x/Si/Au system

• Christiane Petzold,
• Marcus Koch and
• Roland Bennewitz

Beilstein J. Nanotechnol. 2018, 9, 1647–1658, doi:10.3762/bjnano.9.157

• thickness that allowed for TEM analysis. The FIB lamella was produced by first depositing a layer of platinum, starting with an electron beam at 2 kV and subsequently using the Ga ion beam at 30 kV until the platinum layer had reached a thickness of about 2.5 µm. The lamella was cut with the Ga ion beam at

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• ; this is why a proper fabrication tool, able to guarantee good flexibility, is required to meet research goals. Typically, the fabrication of nanostructured systems involves techniques such as electron beam and focused ion beam lithography in order to realize arrays of nanoscale features with precise

Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography

• Gitanjali Kolhatkar,
• Alexandre Merlen,
• Jiawei Zhang,
• Chahinez Dab,
• Gregory Q. Wallace,
• François Lagugné-Labarthet and
• Andreas Ruediger

Beilstein J. Nanotechnol. 2018, 9, 1536–1543, doi:10.3762/bjnano.9.144

• coverslip and distributed homogeneously. After the sample dried, 3 nm of Ti followed by 30 nm of Au were deposited using electron beam evaporation. The sample was then sonicated in ethanol for 1 min to remove the polystyrene particles. A pattern of gold plasmonic nanotriangles (side length ≈350 nm

Cathodoluminescence as a probe of the optical properties of resonant apertures in a metallic film

• Kalpana Singh,
• Evgeniy Panchenko,
• Babak Nasr,
• Amelia Liu,
• Lukas Wesemann,
• Timothy J. Davis and
• Ann Roberts

Beilstein J. Nanotechnol. 2018, 9, 1491–1500, doi:10.3762/bjnano.9.140

• space and time [38], and hence, an electron beam can induce a time-varying polarization in an adjacent material leading to optical excitation. Optical resonances can be probed by studying either the loss in the energy of the electrons (through electron energy loss spectroscopy, EELS) [38][39] or the

• nominally 100 nm thickness is deposited using electron beam evaporation (Intvac Nanochrome I) onto a high quality borosilicate glass slide with 5 nm of chromium as an adhesive layer. The rate of deposition of the gold was set to 0.3 Å/s. High quality azimuthal arrangements of three slot apertures with

• stage to position the sample at the focus of the mirror [59]. A hole of 600 μm diameter is located in the mirror just above the focal point through which the electron beam passes and is then incident on the sample. A CL signal is emitted as the electron beam of 30 keV interacts with the specimen located

Tailoring polarization and magnetization of absorbing terahertz metamaterials using a cut-wire sandwich structure

• Hadi Teguh Yudistira,
• Shuo Liu,
• Tie Jun Cui and
• Han Zhang

Beilstein J. Nanotechnol. 2018, 9, 1437–1447, doi:10.3762/bjnano.9.136

• on a silicon wafer and then baked on a hot plate at 80 °C, 120 °C, 180 °C and 250 °C for 5, 5, 5 and 20 min, respectively. Then, standard photolithography was performed [34][35], and another Ti/Au layer (30/100 nm) was deposited onto the PI substrate by electron beam evaporation. A standard lift-off

Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• membrane. Experimental details are summarized in Table S1 in Supporting Information File 1. First, in Figure 1a an approximately 55 nm thick sacrificial layer of silicon oxide is deposited on top of the SiN membrane by electron beam physical vapor deposition (EBPVD). After that, Au NPs (typical diameter ca

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• -induced chemistry of volatile precursor molecules is central to a novel class of gas-assisted nanolithographic techniques, subsumed as focused electron beam induced processing (FEBIP) [1][2]. FEBIP has emerged with the availability of extremely narrow focused electron beams in electron microscopy. These

• beams can be used to induce, on a very small area, chemical reactions of adsorbed precursor molecules that either lead to etching of the underlying surface or deposition of material. The latter additive variant of FEBIP is focused electron beam induced deposition (FEBID), a powerful direct-write

• surface and are decomposed under the tightly focused electron beam to yield a solid deposit. The precursor consists of elements that are desired in the deposit and of ligands which provide the molecules with sufficient volatility to be handled via a gas injection system. Ideally, the precursor molecule

Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• absorbers, and high-temperature and chemically resistant ceramics. In this article, the first investigation into the deposition of boron-based material via electron beam-induced deposition (EBID) is reported. Thin films were deposited using a novel, large-area EBID system that is shown to deposit material

• process and the potential for EBID as a scalable fabrication technique that could have a transformative effect on the athermal deposition of materials. Keywords: boron oxide; diffusion and growth; electron beam-induced deposition; surface reactions; trimethyl borate; Introduction Applications for boron

• demonstrated for a wide range of materials is electron beam-induced deposition (EBID) [6]. It avoids instabilities related to thermal- and mass-transport by overcoming the activation barrier for material deposition via electron-induced dissociation of surface-adsorbed precursor molecules into atomic or

Surface characterization of nanoparticles using near-field light scattering

• Eunsoo Yoo,
• Yizhong Liu,
• Chukwuazam A. Nwasike,
• Sebastian R. Freeman,
• Brian C. DiPaolo,
• Bernardo Cordovez and
• Amber L. Doiron

Beilstein J. Nanotechnol. 2018, 9, 1228–1238, doi:10.3762/bjnano.9.114

• were not obtainable because of the continuous degradation of the polymer coating under the electron beam exposure. The energy dispersive X-ray spectroscopy (EDS) spectrum of the uncoated SPIOs (Figure 3C) showed peaks corresponding to iron (Fe) and oxygen (O), as expected, while the TEM grid and Si (Li

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that

• measured from deposited pads was used to simulate the optical response of tip arrays fabricated out of the same precursor and showed good agreement with measurements. This paves the way for future plasmonic applications with copper-FEBID. Keywords: copper; Cu(tbaoac)2; focused electron beam induced

• deposition; nanostructures; optical properties; Introduction The focused electron beam in a scanning electron microscope can be used to deposit material. This process is often observed as an unwanted side effect in electron microscopy. Residual chamber gases, adsorbed on the substrate surface, are

Field-controlled ultrafast magnetization dynamics in two-dimensional nanoscale ferromagnetic antidot arrays

• Anulekha De,
• Sucheta Mondal,
• Sourav Sahoo,
• Saswati Barman,
• Yoshichika Otani,
• Rajib Kumar Mitra and
• Anjan Barman

Beilstein J. Nanotechnol. 2018, 9, 1123–1134, doi:10.3762/bjnano.9.104

• previously. Results and Discussion 25 × 25 μm2 arrays of two-dimensional Py antidot arrays with triangular holes arranged in hexagonal lattice symmetry have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling [20]. Figure 1a,b shows the scanning electron

• -dimensional arrays of Py antidots with triangular holes arranged in a hexagonal lattice have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling. The 20 nm-thick Py film was deposited on a commercially available self-oxidized Si(100) substrate and a 60-nm

• irradiation of laser light. A PMMA/MMA bilayer resist was used for electron-beam lithography to prepare the resist pattern on the Py thin film followed by argon ion milling at a base pressure of 1 × 10−4 Torr with a beam current of 60 mA for 6 min for etching out the Py film from everywhere except the

Room-temperature single-photon emitters in titanium dioxide optical defects

• Kelvin Chung,
• Yu H. Leung,
• Chap H. To,
• Aleksandra B. Djurišić and
• Snjezana Tomljenovic-Hanic

Beilstein J. Nanotechnol. 2018, 9, 1085–1094, doi:10.3762/bjnano.9.100

• characterisation measurements of fluorescence microscopy, correlation measurements, PL spectra and photodynamics are presented. Experimental Electron-beam deposition of TiO2 thin films The films were fabricated via e-beam deposition in high vacuum with the substrate temperature set to 200 °C during deposition

Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition

• Federico Venturi,
• Gian Carlo Gazzadi,
• Amir H. Tavabi,
• Alberto Rota,
• Rafal E. Dunin-Borkowski and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2018, 9, 1040–1049, doi:10.3762/bjnano.9.97

• nanowires (NWs) and square nanorings, which were deposited by focused electron beam induced deposition (FEBID) of a Co carbonyl precursor, are studied using off-axis electron holography (EH), Lorentz transmission electron microscopy (L-TEM) and magnetic force microscopy (MFM). EH shows that NWs deposited

• at remanence using L-TEM and MFM. Our results confirm the suitability of FEBID for nanofabrication of magnetic structures and demonstrate the versatility of TEM techniques for the study and manipulation of magnetic domain walls in nanostructures. Keywords: focused electron beam induced deposition

• focused electron beam induced deposition (FEBID) of Co carbonyl (Co2(CO)8). This is a direct-write technique performed in a scanning electron microscope (SEM) equipped with a gas injector system (GIS) [9]. It exploits secondary electron emission resulting from interaction of the primary electron beam with

Comparative study of sculptured metallic thin films deposited by oblique angle deposition at different temperatures

• Susann Liedtke,
• Christoph Grüner,
• Jürgen W. Gerlach and
• Bernd Rauschenbach

Beilstein J. Nanotechnol. 2018, 9, 954–962, doi:10.3762/bjnano.9.89

• Susann Liedtke Christoph Gruner Jurgen W. Gerlach Bernd Rauschenbach Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, D-04318 Leipzig, Germany 10.3762/bjnano.9.89 Abstract Metals with a wide range of melting points are deposited by electron beam evaporation under oblique

• significantly by lowering the substrate temperature. Experimental The metals Al, Ni, Ti, Co, Cr, Mo and Ta were evaporated by an electron beam. These metals were selected in order to cover a wide range of melting points (Tmelt (Al) = 933 K to Tmelt (Ta) = 3269 K). The pressure in the vacuum chamber was constant

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• , Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland 10.3762/bjnano.9.78 Abstract Carboxylates constitute an extremely promising class of precursor compounds for the electron beam induced deposition of silver. In this work both silver 2,2-dimethylbutyrate and silver

• pentafluoropropionate were investigated with respect to their dwell-time-dependent deposition behavior and growth characteristics. While silver 2,2-dimethylbutyrate showed a strong depletion in the center of the impinging electron beam profile hindering any vertical growth, silver pentafluoropropionate indicated a

• towards the direct electron beam writing of three-dimensional plasmonic device parts from the gas phase. Keywords: carboxylate; electron beam induced deposition; silver; three-dimensional nanostructures; vertical growth rate; Introduction Focused electron beam induced deposition (FEBID) is a resistless

Dynamics and fragmentation mechanism of (C₅H₄CH₃)Pt(CH₃)₃ on SiO₂ surfaces

• Kaliappan Muthukumar,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2018, 9, 711–720, doi:10.3762/bjnano.9.66

• molecular dynamics simulations. Fully and partially hydroxylated surfaces represent substrates before and after electron beam treatment and this study examines the role of electron beam pretreatment on the substrates in the initial stages of precursor dissociation and formation of Pt deposits. Our

• the initial orientation of the molecule and the distribution of surface active sites. Based on the observations from the simulations and available experiments, we discuss possible dissociation channels of the precursor. Keywords: deposition; dissociation; electron beam induced deposition (EBID

• ); focused electron beam induced deposition (FEBID); precursor; trimethyl(methylcyclopentadienyl)platinum(IV) ((CH3-C5H4)Pt(CH3)3); Introduction Nanoscale device applications require a growth of regular or specially patterned transition metal nanodeposits. Electron beam induced deposition (EBID), is a size

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• with 500 eV electrons, and its performance in focused electron beam induced deposition (FEBID) at room temperature under HV conditions. The performance of this precursor in FEBID is poor, resulting in maximum metal content of 26 atom % under optimized conditions. Furthermore, the Ru/Fe ratio in the

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

• complex geometries [1][2]. Focused electron beam induced deposition (FEBID) is a powerful technique relying on the decomposition of transiently adsorbed precursors under low vacuum conditions [3]. Different strategies have been used to identify suitable precursors for this process, which relies on

Single-step process to improve the mechanical properties of carbon nanotube yarn

• Maria Cecilia Evora,
• Xinyi Lu,
• Nitilaksha Hiremath,
• Nam-Goo Kang,
• Kunlun Hong,
• Roberto Uribe,
• Gajanan Bhat and
• Jimmy Mays

Beilstein J. Nanotechnol. 2018, 9, 545–554, doi:10.3762/bjnano.9.52

• Department, University of Georgia, Athens, GA 30602, USA 10.3762/bjnano.9.52 Abstract Carbon nanotube (CNT) yarns exhibit low tensile strength compared to conventional high-performance carbon fibers due to the facile sliding of CNTs past one another. Electron beam (e-beam) irradiation was employed for in a

• ± 68.4 MPa) by more than 75% and the modulus (21.5 ± 0.6 GPa) by more than 144% as compared to untreated CNT yarn (strength 251 ± 26.5 MPa and modulus 8.8 ± 1.2 GPa). Keywords: carbon nanotube yarns; crosslinking; electron beam; grafting; Introduction Due to their exceptional mechanical, thermal, and

• ][22], chemical treatment followed by irradiation [23] and radiation processes only [24][25][26]. Radiation processes (electron beam and gamma irradiation), with the aim of modifying carbon-based materials, have been used for modification of materials and still are the subject of investigations [27][28

Engineering of oriented carbon nanotubes in composite materials

• Razieh Beigmoradi,
• Abdolreza Samimi and
• Davod Mohebbi-Kalhori

Beilstein J. Nanotechnol. 2018, 9, 415–435, doi:10.3762/bjnano.9.41

• white because, unlike light, the electron beam does not carry color information. However, in modern in systems with image analysis software, a pseudo-color image can be obtained by adding artificial colors to the grayscale image. The second limitation is that, unlike light, electrons cannot easily move

Blister formation during graphite surface oxidation by Hummers’ method

• Olga V. Sinitsyna,
• Georgy B. Meshkov,
• Anastasija V. Grigorieva,
• Alexander A. Antonov,
• Inna G. Grigorieva and
• Igor V. Yaminsky

Beilstein J. Nanotechnol. 2018, 9, 407–414, doi:10.3762/bjnano.9.40

• . The samples were tilted relative to the electron beam by 45°, which enhances the contrast between the crystallites [25]. A Renishaw InVia Raman spectrometer was used. The spectra were recorded using a 514.4 nm laser with a power of 14 mW. a) Raman spectra of the highly annealed pyrolythic graphite

• (HAPG) before and after the treatment. G and 2D peaks are shown with higher resolution in b) and c), respectively. SEM image of the highly annealed pyrolythic graphite (HAPG) surface after cleavage. The sample is tilted by 45° relative to the electron beam to visualize the mosaic structure. AFM images

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• latter, reactive chemical species (radicals) and electrons lead to activation of molecules and this process can be controlled well on large scales. One of the most innovative techniques, known as EBID or FEBID (Focused Electron Beam Induced Deposition) [2][3], uses a high energy electron beam that can be

• there is still demand for new precursors with other satisfactory parameters like vapor pressure, toxicity, thermal stability, and stability over time. Electrons present on the surface are combination of high energy electrons from the primary electron beam and secondary electrons emitted from the surface

• contaminated by some free acid was excluded. Appearance energies have been measured for several fragments (Figure 3). The values presented in Table 1 are estimated with uncertainty ±0.5 eV, which results from the resolution of the electron beam that varied from 100 meV up to 500 meV. The largest value was

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• ] top-down NEM switch fabrication approaches. Similarly to copper, the fabrication of a platinum cantilever NEM switching element involved an additional thermal annealing step at 300 °C to reduce the stress gradient in the beam. The usability of platinum for electron-beam lithography-based fabrication

• . Several CNT-based relays and switches have been fabricated using the bottom-up arrangement of CNTs, including dielectrophoresis [33], controlled growth of CNTs [34][37], dispersion coating [12][35][36], nanomanipulation [15][32] techniques and electron beam lithography/metal sputtering for the fabrication

• chemical vapour deposition (CVD)-synthesized or mechanically exfoliated graphene flakes to the desired position on the substrate, and photo- and electron-beam lithography and metal sputtering techniques for fabrication of the electrical contacts. A SiO2 sacrificial layer may be used for the release of