Role of titanium and organic precursors in molecular layer deposition of “titanicone” hybrid materials

• Arbresha Muriqi and
• Michael Nolan

Beilstein J. Nanotechnol. 2022, 13, 1240–1255, doi:10.3762/bjnano.13.103

• (MLD) allows the deposition of these hybrid films using sequential, self-limiting reactions, similar to atomic layer deposition (ALD). In this paper, we use first principles density functional theory (DFT) to investigate the growth mechanism of titanium-containing hybrid organic–inorganic MLD films

• initial MLD reactions in titanicone film growth using three different surface models: anatase TiO2, rutile TiO2 and Al2O3. Calculated energetics show that while TiCl4 is reactive towards the anatase and rutile TiO2 surfaces, it is not reactive towards the Al2O3 surface. Ti(DMA)4 is reactive towards all

• growth could be achieved. Keywords: density functional theory (DFT) studies; double reactions; surface chemistry; titanicone; Introduction Molecular layer deposition (MLD), a thin film deposition technique, has attracted significant attention in recent years as a suitable approach for the deposition of

Design of surface nanostructures for chirality sensing based on quartz crystal microbalance

• Yinglin Ma,
• Xiangyun Xiao and
• Qingmin Ji

Beilstein J. Nanotechnol. 2022, 13, 1201–1219, doi:10.3762/bjnano.13.100

• deposition (MLD) using diethylzinc (DEZn) as the inorganic precursor and Cys enantiomer as the chiral organic precursor [122]. The Zn/Cys nanostructures showed a size of 15 nm and could tightly aggregate into a homogeneous and continuous film on the QCM surface. The QCM adsorption results indicated that ʟ

• -alanine was 307.97% more enantioselective than ᴅ-alanine. Similar enantioselectivity could also be achieved by Al/ʟ-Cys MLD films [123]. The methodology is also versatile and promising for the deposition of chiral thin films over any substrates or membranes of interest, which may promote the exploration

On the transformation of “zincone”-like into porous ZnO thin films from sub-saturated plasma enhanced atomic layer deposition

• Alberto Perrotta,
• Julian Pilz,
• Stefan Pachmajer,
• Antonella Milella and
• Anna Maria Coclite

Beilstein J. Nanotechnol. 2019, 10, 746–759, doi:10.3762/bjnano.10.74

• crystal growth occurred, giving insights in the manufacturing of nanoporous ZnO from Zn-based hybrid materials. Keywords: calcination; PE-ALD; porosity; thin films; ZnO; Introduction Atomic layer deposition (ALD) and molecular layer deposition (MLD) are sequential self-limiting vapor-phase deposition

• substrates and devices. By combining the metalorganic precursors adopted in ALD with the organic ligands used in MLD, hybrid organic–inorganic materials can be synthesized [2][3][4]. These materials possess properties in between their pure organic and inorganic counterparts, yet differing from the pristine

• element, oxygen, and an organic backbone, and are referred to as metal alkoxides or ‘metalcones’, e.g., alucones, zincones, and titanicones [2][4]. From the metal alkoxide produced with MLD, porous metal oxide thin films can be achieved through water etching or thermal treatments in the presence of oxygen

Biocompatible organic–inorganic hybrid materials based on nucleobases and titanium developed by molecular layer deposition

• Leva Momtazi,
• Henrik H. Sønsteby and
• Ola Nilsen

Beilstein J. Nanotechnol. 2019, 10, 399–411, doi:10.3762/bjnano.10.39

• combining titanium tetra-isopropoxide (TTIP) and the nucleobases thymine, uracil or adenine using the molecular layer deposition (MLD) approach. Such materials have potential as bioactive coatings, and the bioactivity of these films is described in our recent work [Momtazi, L.; Dartt, D. A.; Nilsen, O

• refraction. Keywords: ALD; bioactive materials; hybrid materials; MLD; nucleobases; Introduction There is an ever-increasing interest in organometallic compounds in the field of medicinal chemistry. Organometallic complexes are now being developed as anticancer agents, radiopharmaceuticals for diagnosis

• response [9]. Thus, the tailoring of the surface of materials used in tissue engineering is important for designing bioactive and biocompatible materials. Our choice is the atomic layer deposition/molecular layer deposition (ALD/MLD) technique by which organic–inorganic materials are developed through the

Phosphorus monolayer doping (MLD) of silicon on insulator (SOI) substrates

• Noel Kennedy,
• Ray Duffy,
• Luke Eaton,
• Dan O’Connell,
• Scott Monaghan,
• Shane Garvey,
• James Connolly,
• Chris Hatem,
• Justin D. Holmes and
• Brenda Long

Beilstein J. Nanotechnol. 2018, 9, 2106–2113, doi:10.3762/bjnano.9.199

• MLD on SOI, which allows for the impact of reduced substrate dimensions to be probed. The doping was done through functionalization of the substrates with chemically bound allyldiphenylphosphine dopant molecules. Following functionalization, the samples were capped and annealed to enable the diffusion

• of dopant atoms into the substrate and their activation. Electrical and material characterisation was carried out to determine the impact of MLD on surface quality and activation results produced by the process. MLD has proven to be highly applicable to SOI substrates producing doping levels in

• future device scaling that a means of damage-free, conformal doping is established, and this is where monolayer doping (MLD) appears to have potential to succeed. MLD was pioneered by Javey and co-workers [5] in 2008 and has subsequently been used to dope multiple substrate types such as silicon [5][6][7

Vapor deposition routes to conformal polymer thin films

• Priya Moni,
• Ahmed Al-Obeidi and
• Karen K. Gleason

Beilstein J. Nanotechnol. 2017, 8, 723–735, doi:10.3762/bjnano.8.76

• coats the substrate geometry (Figure 1c) [1]. Several chemical vapor deposition (CVD) techniques result in highly conformal polymer films. For instance, emerging techniques such as molecular layer deposition (MLD) and oxidative CVD (oCVD) form conformal metalucone and step-growth polymer films [10][11

• ]. However, no systematic studies of conformality have been devoted solely to these techniques thus far. Practitioners of MLD can look at existing models for its inorganic analogue, atomic layer deposition (ALD), as a starting point for studying conformal MLD films [12]. This review will focus on two, well

• in Figure 9c [43]. These coated nanotube forests were later shown to be beneficial to flexographic printing by Hart et al. [47]. Brown et al. showed that MLD could create 10 nm, conformal aluminum alkoxide derivative films on CNT sheets, as seen in Figure 9d, to create a composite material with 4

Organic and inorganic–organic thin film structures by molecular layer deposition: A review

• Pia Sundberg and
• Maarit Karppinen

Beilstein J. Nanotechnol. 2014, 5, 1104–1136, doi:10.3762/bjnano.5.123

• inorganic thin films, i.e., atomic layer deposition (ALD), is currently experiencing a strongly growing interest. Like ALD in case of the inorganics, the emerging molecular layer deposition (MLD) technique for organic constituents can be employed to fabricate high-quality thin films and coatings with

• thickness and composition control on the molecular scale, even on complex three-dimensional structures. Moreover, by combining the two techniques, ALD and MLD, fundamentally new types of inorganic–organic hybrid materials can be produced. In this review article, we first describe the basic concepts

• regarding the MLD and ALD/MLD processes, followed by a comprehensive review of the various precursors and precursor pairs so far employed in these processes. Finally, we discuss the first proof-of-concept experiments in which the newly developed MLD and ALD/MLD processes are exploited to fabricate novel