Polarization-dependent strong coupling between silver nanorods and photochromic molecules

• Gwénaëlle Lamri,
• Alessandro Veltri,
• Jean Aubard,
• Pierre-Michel Adam,
• Nordin Felidj and
• Anne-Laure Baudrion

Beilstein J. Nanotechnol. 2018, 9, 2657–2664, doi:10.3762/bjnano.9.247

• plasmonic resonances and the excited state of photochromic molecules, as well as the existence of a strong coupling regime when the plasmonic resonance matches the wavelength of the molecular transition. Theoretical calculations confirm our experimental findings. Experimental We used standard electron-beam

Nanoantenna structures for the detection of phonons in nanocrystals

• Alexander G. Milekhin,
• Sergei A. Kuznetsov,
• Ilya A. Milekhin,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Alexander V. Latyshev,
• Volodymyr M. Dzhagan and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2018, 9, 2646–2656, doi:10.3762/bjnano.9.246

• , differing in nanoantenna length and lateral periodicity, were fabricated on bare Si(001) substrates and substrates covered with SiO2 layers of different (5–100 nm) thicknesses by direct electron beam writing (Raith-150, Germany) as described earlier [23][31]. For H-shaped nanoantennas, additional Au

Au–Si plasmonic platforms: synthesis, structure and FDTD simulations

• Anna Gapska,
• Marcin Łapiński,
• Paweł Syty,
• Wojciech Sadowski,
• Józef E. Sienkiewicz and
• Barbara Kościelska

Beilstein J. Nanotechnol. 2018, 9, 2599–2608, doi:10.3762/bjnano.9.241

• homogeneous distributions of nanostructures, but are far more complex and expensive, such as electron beam lithography. One promising technique that could be used to fabrication of plasmonic platforms is the method based on the directional solidification of eutectics. In this process, two or more phases can

Pattern generation for direct-write three-dimensional nanoscale structures via focused electron beam induced deposition

• Lukas Keller and
• Michael Huth

Beilstein J. Nanotechnol. 2018, 9, 2581–2598, doi:10.3762/bjnano.9.240

• Lukas Keller Michael Huth Institute of Physics, Goethe University, Max-von-Laue-Str. 1, 60438 Frankfurt am Main, Germany 10.3762/bjnano.9.240 Abstract Fabrication of three-dimensional (3D) nanoarchitectures by focused electron beam induced deposition (FEBID) has matured to a level that highly

• different precursors are presented that validate the effectiveness of the implementation. Keywords: focused electron beam induced deposition; nanofabrication; three-dimensional nanostructures; 1 Introduction New physical effects and functionalities can arise when the third dimension can be accessed at the

• uses a layer-by-layer based technique [4]. The design of the desired 3D structure is partitioned into horizontal slices parallel to the substrate surface. For each slice a full set of structure-definition steps, typically combining physical vapor deposition and UV or electron beam lithography, are

Friction reduction through biologically inspired scale-like laser surface textures

• Johannes Schneider,
• Vergil Djamiykov and
• Christian Greiner

Beilstein J. Nanotechnol. 2018, 9, 2561–2572, doi:10.3762/bjnano.9.238

• microscopy of the laser surface textured samples was performed with a FEI Helios 650 (Hillsborough, USA) scanning electron/focused ion beam microscope used in electron beam mode only. Tribological characterization The tribological pin-on-disc tests for the experiments against different counter body materials

High-throughput micro-nanostructuring by microdroplet inkjet printing

• Hendrikje R. Neumann and
• Christine Selhuber-Unkel

Beilstein J. Nanotechnol. 2018, 9, 2372–2380, doi:10.3762/bjnano.9.222

• ]. Using electron-beam lithography, it is possible to generate such patterns with very high spatial precision [5]. Focused electron beam induced deposition (FEBID) even serves as a method to deposit 3D nanostructures without the need of masks [6]. A further and very successful method to write gold

• steps that are only achievable with clean-room methods. For example, so-called “micro-nanostructures” have been fabricated by combining BCML with electron-beam lithography and photolithography [20][21]. A different approach was proposed based on topography-induced micro-nanostructuring, but this method

• BCML micro-nanostructuring strategies is the time for the patterning itself – it is much shorter and less complicated than other approaches that employ additional steps such as electron-beam lithography or photolithography [20][21]. A further result of the plasma treatment could be a rough surface

Directional light beams by design from electrically driven elliptical slit antennas

• Shuiyan Cao,
• Eric Le Moal,
• Quanbo Jiang,
• Aurélien Drezet,
• Serge Huant,
• Jean-Paul Hugonin,
• Gérald Dujardin and
• Elizabeth Boer-Duchemin

Beilstein J. Nanotechnol. 2018, 9, 2361–2371, doi:10.3762/bjnano.9.221

• corrals etched in a single crystal of gold. In order to produce the oblique beam of light, the high-energy (30 keV) electron beam is focussed onto one of the two focal points of the structure [42]. The emission direction is determined by the eccentricity of the corral and could, in principle, be tailored

Magnetism and magnetoresistance of single Ni–Cu alloy nanowires

• Andreea Costas,
• Camelia Florica,
• Elena Matei,
• Maria Eugenia Toimil-Molares,
• Ionel Stavarache,
• Andrei Kuncser,
• Victor Kuncser and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2018, 9, 2345–2355, doi:10.3762/bjnano.9.219

• membranes. Photolithography was employed for obtaining interdigitated metallic electrode systems of Ti/Au onto SiO2/Si substrates and subsequent electron beam lithography was used for contacting single nanowires in order to investigate their galvano-magnetic properties. The results of the magnetoresistance

• electrochemical replication, using as templates chemically etched polycarbonate membranes irradiated with swift heavy ions. Individual Ni–Cu alloy nanowires of different compositions have been contacted on interdigitated metallic electrodes by using electron beam lithography (EBL) and magnetoresistive

Block copolymers for designing nanostructured porous coatings

• Roberto Nisticò

Beilstein J. Nanotechnol. 2018, 9, 2332–2344, doi:10.3762/bjnano.9.218

• plasma oxidization [53], electron beam curing, as well as laser and/or selective decomposition (as reported in Table 1). Hozumi and co-workers [74] investigated the removal of poly(methyl methacrylate) (PMMA) domains in a PS-b-PMMA copolymer film by using 172 nm vacuum-ultraviolet (VUV) light. In this

• , where the titanium assembly is driven by the microphase separation of the PS-b-PEO layer underneath [99]. When the titanium coating procedure is performed by electron beam evaporation onto a previously self-assembled PS-b-PEO substrate, Ti preferentially deposits and diffuses inside the PS matrix, thus

Metal–dielectric hybrid nanoantennas for efficient frequency conversion at the anapole mode

• Valerio F. Gili,
• Lavinia Ghirardini,
• Davide Rocco,
• Giuseppe Marino,
• Ivan Favero,
• Iännis Roland,
• Giovanni Pellegrini,
• Lamberto Duò,
• Marco Finazzi,
• Luca Carletti,
• Andrea Locatelli,
• Aristide Lemaître,
• Dragomir Neshev,
• Costantino De Angelis,
• Giuseppe Leo and
• Michele Celebrano

Beilstein J. Nanotechnol. 2018, 9, 2306–2314, doi:10.3762/bjnano.9.215

• SiOx are deposited on the surface via plasma-enhanced chemical vapor deposition (PECVD) to later improve the adhesion of the negative-tone HSQ resist on the III–V layer. A first positive-tone lithography step with PMMA resist is performed to realize the alignment structures, followed by electron beam

• electron beam evaporation and lift-off, defines the gold nanorings. Optical setup The nonlinear optical microscope employed in our experiment is depicted in Figure 7. The radiation from a 150 fs-laser centered at 1554 nm is sent to the sample through a high-NA (0.85) air objective, after setting the linear

Two-dimensional photonic crystals increasing vertical light emission from Si nanocrystal-rich thin layers

• Lukáš Ondič,
• Marian Varga,
• Ivan Pelant,
• Alexander Kromka,
• Karel Hruška and
• Robert G. Elliman

Beilstein J. Nanotechnol. 2018, 9, 2287–2296, doi:10.3762/bjnano.9.213

• theoretically [12] and experimentally [13], that by optimizing the dimensions of the PhC, very high absorption efficiencies can be achieved. The main issue limiting the practical use of 2D PhCs is a relatively complicated and expensive fabrication process. Typically, electron beam lithography in combination

• ” by electron beam lithography (“e-LiNE system”, Raith GmbH, Germany) into a polymer mask forming a 2D periodic patterns of holes. A 60 nm thick gold layer was subsequently evaporated and part of the gold was removed by lift-off of the PMMA to define a mask for etching. Afterwards, the samples were

Optimization of the optical coupling in nanowire-based integrated photonic platforms by FDTD simulation

• Nan Guan,
• Andrey Babichev,
• Martin Foldyna,
• Dmitry Denisov,
• François H. Julien and
• Maria Tchernycheva

Beilstein J. Nanotechnol. 2018, 9, 2248–2254, doi:10.3762/bjnano.9.209

• from 1.25 to 1.75 µm. We note that the control of the waveguide width with a precision of ≈20 nm is within reach of electron beam lithography processing techniques. The FDTD simulations for the waveguide widths around 1.5 µm were performed as shown in Figure 3b. A coupling efficiency above 59% is

Dumbbell gold nanoparticle dimer antennas with advanced optical properties

• Janning F. Herrmann and
• Christiane Höppener

Beilstein J. Nanotechnol. 2018, 9, 2188–2197, doi:10.3762/bjnano.9.205

• approaches, which rely on, e.g., electron-beam lithography, ion milling and other techniques, are widely used, often tailoring gap structures explores common limitations in regard to their obtainable resolution and non-invasiveness. In contrast, common bottom-up approaches often rely on the specific

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• , FZPs can achieve diffraction-limited focusing and imaging performance. The fabrication requirements of nanofocusing FZPs are stringent [1]. Usually, state-of-the-art electron beam lithography instrumentation is chosen to comply with these strict requirements [11][12][13][14]. Recently, a few

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• enhanced Raman spectroscopy (SERS) [10]. Ordered arrays of such particles can be fabricated by different methods. Electron-beam lithography for example is a top-down method which provides good control, but is time consuming and costly. In contrast, the self-assembly of block-copolymers is a bottom-up

Electromigrated electrical optical antennas for transducing electrons and photons at the nanoscale

• Arindam Dasgupta,
• Mickaël Buret,
• Nicolas Cazier,
• Marie-Maxime Mennemanteuil,
• Reinaldo Chacon,
• Kamal Hammani,
• Jean-Claude Weeber,
• Juan Arocas,
• Laurent Markey,
• Gérard Colas des Francs,
• Alexander Uskov,
• Igor Smetanin and
• Alexandre Bouhelier

Beilstein J. Nanotechnol. 2018, 9, 1964–1976, doi:10.3762/bjnano.9.187

• connected optical antenna is a Au constriction formed between two fan-out electrodes laying on a glass cover slip. We use electron-beam lithography and standard physical vapor deposition to produce gold constrictions and the proximity electrodes. The thickness of the Au layer is typically 50 nm, and we use

• is obtained in a second step of fabrication by ultraviolet (UV) photolithography. An image of a typical sample, constituted of 24 constrictions and their associated macroscopic electrodes, is illustrated in Figure 1b. The red and blue regions are realized by electron-beam lithography and UV

• connected tunneling optical antennas is fabricated by electron-beam lithography, Au evaporation and lift-off process. The structures consist of either a gold nanowire of 1.1 μm length and 130 nm width or a constriction as discussed above. For both types, the structures are connected to a set of electrodes

The inhibition effect of water on the purification of natural gas with nanoporous graphene membranes

• Krzysztof Nieszporek,
• Tomasz Pańczyk and
• Jolanta Nieszporek

Beilstein J. Nanotechnol. 2018, 9, 1906–1916, doi:10.3762/bjnano.9.182

• engineers. While considering production techniques, the application of focused electron beam irradiation in transmission electron microscopy makes it possible to determine graphene membranes with well-defined pore diameter [3]. Similar possibilities are also created by modified helium ion microscopy for

Direct AFM-based nanoscale mapping and tomography of open-circuit voltages for photovoltaics

• Katherine Atamanuk,
• Justin Luria and
• Bryan D. Huey

Beilstein J. Nanotechnol. 2018, 9, 1802–1808, doi:10.3762/bjnano.9.171

• to move to the underlying n-type CdS layer [6]. Equivalent conclusions have been inferred from complementary techniques such as simple conductive AFM [27], surface-potential mapping [28], and electron beam induced currents [29], though the fully three-dimensional, directly acquired data of ISC* and

Friction force microscopy of tribochemistry and interfacial ageing for the SiO_x/Si/Au system

• Christiane Petzold,
• Marcus Koch and
• Roland Bennewitz

Beilstein J. Nanotechnol. 2018, 9, 1647–1658, doi:10.3762/bjnano.9.157

• thickness that allowed for TEM analysis. The FIB lamella was produced by first depositing a layer of platinum, starting with an electron beam at 2 kV and subsequently using the Ga ion beam at 30 kV until the platinum layer had reached a thickness of about 2.5 µm. The lamella was cut with the Ga ion beam at

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• ; this is why a proper fabrication tool, able to guarantee good flexibility, is required to meet research goals. Typically, the fabrication of nanostructured systems involves techniques such as electron beam and focused ion beam lithography in order to realize arrays of nanoscale features with precise

Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography

• Gitanjali Kolhatkar,
• Alexandre Merlen,
• Jiawei Zhang,
• Chahinez Dab,
• Gregory Q. Wallace,
• François Lagugné-Labarthet and
• Andreas Ruediger

Beilstein J. Nanotechnol. 2018, 9, 1536–1543, doi:10.3762/bjnano.9.144

• coverslip and distributed homogeneously. After the sample dried, 3 nm of Ti followed by 30 nm of Au were deposited using electron beam evaporation. The sample was then sonicated in ethanol for 1 min to remove the polystyrene particles. A pattern of gold plasmonic nanotriangles (side length ≈350 nm

Cathodoluminescence as a probe of the optical properties of resonant apertures in a metallic film

• Kalpana Singh,
• Evgeniy Panchenko,
• Babak Nasr,
• Amelia Liu,
• Lukas Wesemann,
• Timothy J. Davis and
• Ann Roberts

Beilstein J. Nanotechnol. 2018, 9, 1491–1500, doi:10.3762/bjnano.9.140

• space and time [38], and hence, an electron beam can induce a time-varying polarization in an adjacent material leading to optical excitation. Optical resonances can be probed by studying either the loss in the energy of the electrons (through electron energy loss spectroscopy, EELS) [38][39] or the

• nominally 100 nm thickness is deposited using electron beam evaporation (Intvac Nanochrome I) onto a high quality borosilicate glass slide with 5 nm of chromium as an adhesive layer. The rate of deposition of the gold was set to 0.3 Å/s. High quality azimuthal arrangements of three slot apertures with

• stage to position the sample at the focus of the mirror [59]. A hole of 600 μm diameter is located in the mirror just above the focal point through which the electron beam passes and is then incident on the sample. A CL signal is emitted as the electron beam of 30 keV interacts with the specimen located

Tailoring polarization and magnetization of absorbing terahertz metamaterials using a cut-wire sandwich structure

• Hadi Teguh Yudistira,
• Shuo Liu,
• Tie Jun Cui and
• Han Zhang

Beilstein J. Nanotechnol. 2018, 9, 1437–1447, doi:10.3762/bjnano.9.136

• on a silicon wafer and then baked on a hot plate at 80 °C, 120 °C, 180 °C and 250 °C for 5, 5, 5 and 20 min, respectively. Then, standard photolithography was performed [34][35], and another Ti/Au layer (30/100 nm) was deposited onto the PI substrate by electron beam evaporation. A standard lift-off

Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• membrane. Experimental details are summarized in Table S1 in Supporting Information File 1. First, in Figure 1a an approximately 55 nm thick sacrificial layer of silicon oxide is deposited on top of the SiN membrane by electron beam physical vapor deposition (EBPVD). After that, Au NPs (typical diameter ca

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• -induced chemistry of volatile precursor molecules is central to a novel class of gas-assisted nanolithographic techniques, subsumed as focused electron beam induced processing (FEBIP) [1][2]. FEBIP has emerged with the availability of extremely narrow focused electron beams in electron microscopy. These

• beams can be used to induce, on a very small area, chemical reactions of adsorbed precursor molecules that either lead to etching of the underlying surface or deposition of material. The latter additive variant of FEBIP is focused electron beam induced deposition (FEBID), a powerful direct-write

• surface and are decomposed under the tightly focused electron beam to yield a solid deposit. The precursor consists of elements that are desired in the deposit and of ligands which provide the molecules with sufficient volatility to be handled via a gas injection system. Ideally, the precursor molecule