Formation mechanisms of boron oxide films fabricated by large-area electron beam-induced deposition of trimethyl borate

• Aiden A. Martin and
• Philip J. Depond

Beilstein J. Nanotechnol. 2018, 9, 1282–1287, doi:10.3762/bjnano.9.120

• absorbers, and high-temperature and chemically resistant ceramics. In this article, the first investigation into the deposition of boron-based material via electron beam-induced deposition (EBID) is reported. Thin films were deposited using a novel, large-area EBID system that is shown to deposit material

• process and the potential for EBID as a scalable fabrication technique that could have a transformative effect on the athermal deposition of materials. Keywords: boron oxide; diffusion and growth; electron beam-induced deposition; surface reactions; trimethyl borate; Introduction Applications for boron

• demonstrated for a wide range of materials is electron beam-induced deposition (EBID) [6]. It avoids instabilities related to thermal- and mass-transport by overcoming the activation barrier for material deposition via electron-induced dissociation of surface-adsorbed precursor molecules into atomic or

Surface characterization of nanoparticles using near-field light scattering

• Eunsoo Yoo,
• Yizhong Liu,
• Chukwuazam A. Nwasike,
• Sebastian R. Freeman,
• Brian C. DiPaolo,
• Bernardo Cordovez and
• Amber L. Doiron

Beilstein J. Nanotechnol. 2018, 9, 1228–1238, doi:10.3762/bjnano.9.114

• were not obtainable because of the continuous degradation of the polymer coating under the electron beam exposure. The energy dispersive X-ray spectroscopy (EDS) spectrum of the uncoated SPIOs (Figure 3C) showed peaks corresponding to iron (Fe) and oxygen (O), as expected, while the TEM grid and Si (Li

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• fluorine free copper precursor, Cu(tbaoac)2 with the chemical sum formula CuC16O6H26 is introduced for focused electron beam induced deposition (FEBID). FEBID with 15 keV and 7 nA results in deposits with an atomic composition of Cu:O:C of approximately 1:1:2. Transmission electron microscopy proved that

• measured from deposited pads was used to simulate the optical response of tip arrays fabricated out of the same precursor and showed good agreement with measurements. This paves the way for future plasmonic applications with copper-FEBID. Keywords: copper; Cu(tbaoac)2; focused electron beam induced

• deposition; nanostructures; optical properties; Introduction The focused electron beam in a scanning electron microscope can be used to deposit material. This process is often observed as an unwanted side effect in electron microscopy. Residual chamber gases, adsorbed on the substrate surface, are

Field-controlled ultrafast magnetization dynamics in two-dimensional nanoscale ferromagnetic antidot arrays

• Anulekha De,
• Sucheta Mondal,
• Sourav Sahoo,
• Saswati Barman,
• Yoshichika Otani,
• Rajib Kumar Mitra and
• Anjan Barman

Beilstein J. Nanotechnol. 2018, 9, 1123–1134, doi:10.3762/bjnano.9.104

• previously. Results and Discussion 25 × 25 μm2 arrays of two-dimensional Py antidot arrays with triangular holes arranged in hexagonal lattice symmetry have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling [20]. Figure 1a,b shows the scanning electron

• -dimensional arrays of Py antidots with triangular holes arranged in a hexagonal lattice have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling. The 20 nm-thick Py film was deposited on a commercially available self-oxidized Si(100) substrate and a 60-nm

• irradiation of laser light. A PMMA/MMA bilayer resist was used for electron-beam lithography to prepare the resist pattern on the Py thin film followed by argon ion milling at a base pressure of 1 × 10−4 Torr with a beam current of 60 mA for 6 min for etching out the Py film from everywhere except the

Room-temperature single-photon emitters in titanium dioxide optical defects

• Kelvin Chung,
• Yu H. Leung,
• Chap H. To,
• Aleksandra B. Djurišić and
• Snjezana Tomljenovic-Hanic

Beilstein J. Nanotechnol. 2018, 9, 1085–1094, doi:10.3762/bjnano.9.100

• characterisation measurements of fluorescence microscopy, correlation measurements, PL spectra and photodynamics are presented. Experimental Electron-beam deposition of TiO2 thin films The films were fabricated via e-beam deposition in high vacuum with the substrate temperature set to 200 °C during deposition

Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition

• Federico Venturi,
• Gian Carlo Gazzadi,
• Amir H. Tavabi,
• Alberto Rota,
• Rafal E. Dunin-Borkowski and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2018, 9, 1040–1049, doi:10.3762/bjnano.9.97

• nanowires (NWs) and square nanorings, which were deposited by focused electron beam induced deposition (FEBID) of a Co carbonyl precursor, are studied using off-axis electron holography (EH), Lorentz transmission electron microscopy (L-TEM) and magnetic force microscopy (MFM). EH shows that NWs deposited

• at remanence using L-TEM and MFM. Our results confirm the suitability of FEBID for nanofabrication of magnetic structures and demonstrate the versatility of TEM techniques for the study and manipulation of magnetic domain walls in nanostructures. Keywords: focused electron beam induced deposition

• focused electron beam induced deposition (FEBID) of Co carbonyl (Co2(CO)8). This is a direct-write technique performed in a scanning electron microscope (SEM) equipped with a gas injector system (GIS) [9]. It exploits secondary electron emission resulting from interaction of the primary electron beam with

Comparative study of sculptured metallic thin films deposited by oblique angle deposition at different temperatures

• Susann Liedtke,
• Christoph Grüner,
• Jürgen W. Gerlach and
• Bernd Rauschenbach

Beilstein J. Nanotechnol. 2018, 9, 954–962, doi:10.3762/bjnano.9.89

• Susann Liedtke Christoph Gruner Jurgen W. Gerlach Bernd Rauschenbach Leibniz Institute of Surface Engineering (IOM), Permoserstraße 15, D-04318 Leipzig, Germany 10.3762/bjnano.9.89 Abstract Metals with a wide range of melting points are deposited by electron beam evaporation under oblique

• significantly by lowering the substrate temperature. Experimental The metals Al, Ni, Ti, Co, Cr, Mo and Ta were evaporated by an electron beam. These metals were selected in order to cover a wide range of melting points (Tmelt (Al) = 933 K to Tmelt (Ta) = 3269 K). The pressure in the vacuum chamber was constant

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• , Nicolaus Copernicus University in Toruń, Gagarina 7, 87-100 Toruń, Poland 10.3762/bjnano.9.78 Abstract Carboxylates constitute an extremely promising class of precursor compounds for the electron beam induced deposition of silver. In this work both silver 2,2-dimethylbutyrate and silver

• pentafluoropropionate were investigated with respect to their dwell-time-dependent deposition behavior and growth characteristics. While silver 2,2-dimethylbutyrate showed a strong depletion in the center of the impinging electron beam profile hindering any vertical growth, silver pentafluoropropionate indicated a

• towards the direct electron beam writing of three-dimensional plasmonic device parts from the gas phase. Keywords: carboxylate; electron beam induced deposition; silver; three-dimensional nanostructures; vertical growth rate; Introduction Focused electron beam induced deposition (FEBID) is a resistless

Dynamics and fragmentation mechanism of (C₅H₄CH₃)Pt(CH₃)₃ on SiO₂ surfaces

• Kaliappan Muthukumar,
• Harald O. Jeschke and
• Roser Valentí

Beilstein J. Nanotechnol. 2018, 9, 711–720, doi:10.3762/bjnano.9.66

• molecular dynamics simulations. Fully and partially hydroxylated surfaces represent substrates before and after electron beam treatment and this study examines the role of electron beam pretreatment on the substrates in the initial stages of precursor dissociation and formation of Pt deposits. Our

• the initial orientation of the molecule and the distribution of surface active sites. Based on the observations from the simulations and available experiments, we discuss possible dissociation channels of the precursor. Keywords: deposition; dissociation; electron beam induced deposition (EBID

• ); focused electron beam induced deposition (FEBID); precursor; trimethyl(methylcyclopentadienyl)platinum(IV) ((CH3-C5H4)Pt(CH3)3); Introduction Nanoscale device applications require a growth of regular or specially patterned transition metal nanodeposits. Electron beam induced deposition (EBID), is a size

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• with 500 eV electrons, and its performance in focused electron beam induced deposition (FEBID) at room temperature under HV conditions. The performance of this precursor in FEBID is poor, resulting in maximum metal content of 26 atom % under optimized conditions. Furthermore, the Ru/Fe ratio in the

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

• complex geometries [1][2]. Focused electron beam induced deposition (FEBID) is a powerful technique relying on the decomposition of transiently adsorbed precursors under low vacuum conditions [3]. Different strategies have been used to identify suitable precursors for this process, which relies on

Single-step process to improve the mechanical properties of carbon nanotube yarn

• Maria Cecilia Evora,
• Xinyi Lu,
• Nitilaksha Hiremath,
• Nam-Goo Kang,
• Kunlun Hong,
• Roberto Uribe,
• Gajanan Bhat and
• Jimmy Mays

Beilstein J. Nanotechnol. 2018, 9, 545–554, doi:10.3762/bjnano.9.52

• Department, University of Georgia, Athens, GA 30602, USA 10.3762/bjnano.9.52 Abstract Carbon nanotube (CNT) yarns exhibit low tensile strength compared to conventional high-performance carbon fibers due to the facile sliding of CNTs past one another. Electron beam (e-beam) irradiation was employed for in a

• ± 68.4 MPa) by more than 75% and the modulus (21.5 ± 0.6 GPa) by more than 144% as compared to untreated CNT yarn (strength 251 ± 26.5 MPa and modulus 8.8 ± 1.2 GPa). Keywords: carbon nanotube yarns; crosslinking; electron beam; grafting; Introduction Due to their exceptional mechanical, thermal, and

• ][22], chemical treatment followed by irradiation [23] and radiation processes only [24][25][26]. Radiation processes (electron beam and gamma irradiation), with the aim of modifying carbon-based materials, have been used for modification of materials and still are the subject of investigations [27][28

Engineering of oriented carbon nanotubes in composite materials

• Razieh Beigmoradi,
• Abdolreza Samimi and
• Davod Mohebbi-Kalhori

Beilstein J. Nanotechnol. 2018, 9, 415–435, doi:10.3762/bjnano.9.41

• white because, unlike light, the electron beam does not carry color information. However, in modern in systems with image analysis software, a pseudo-color image can be obtained by adding artificial colors to the grayscale image. The second limitation is that, unlike light, electrons cannot easily move

Blister formation during graphite surface oxidation by Hummers’ method

• Olga V. Sinitsyna,
• Georgy B. Meshkov,
• Anastasija V. Grigorieva,
• Alexander A. Antonov,
• Inna G. Grigorieva and
• Igor V. Yaminsky

Beilstein J. Nanotechnol. 2018, 9, 407–414, doi:10.3762/bjnano.9.40

• . The samples were tilted relative to the electron beam by 45°, which enhances the contrast between the crystallites [25]. A Renishaw InVia Raman spectrometer was used. The spectra were recorded using a 514.4 nm laser with a power of 14 mW. a) Raman spectra of the highly annealed pyrolythic graphite

• (HAPG) before and after the treatment. G and 2D peaks are shown with higher resolution in b) and c), respectively. SEM image of the highly annealed pyrolythic graphite (HAPG) surface after cleavage. The sample is tilted by 45° relative to the electron beam to visualize the mosaic structure. AFM images

Electron interaction with copper(II) carboxylate compounds

• Michal Lacko,
• Peter Papp,
• Iwona B. Szymańska,
• Edward Szłyk and
• Štefan Matejčík

Beilstein J. Nanotechnol. 2018, 9, 384–398, doi:10.3762/bjnano.9.38

• latter, reactive chemical species (radicals) and electrons lead to activation of molecules and this process can be controlled well on large scales. One of the most innovative techniques, known as EBID or FEBID (Focused Electron Beam Induced Deposition) [2][3], uses a high energy electron beam that can be

• there is still demand for new precursors with other satisfactory parameters like vapor pressure, toxicity, thermal stability, and stability over time. Electrons present on the surface are combination of high energy electrons from the primary electron beam and secondary electrons emitted from the surface

• contaminated by some free acid was excluded. Appearance energies have been measured for several fragments (Figure 3). The values presented in Table 1 are estimated with uncertainty ±0.5 eV, which results from the resolution of the electron beam that varied from 100 meV up to 500 meV. The largest value was

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• ] top-down NEM switch fabrication approaches. Similarly to copper, the fabrication of a platinum cantilever NEM switching element involved an additional thermal annealing step at 300 °C to reduce the stress gradient in the beam. The usability of platinum for electron-beam lithography-based fabrication

• . Several CNT-based relays and switches have been fabricated using the bottom-up arrangement of CNTs, including dielectrophoresis [33], controlled growth of CNTs [34][37], dispersion coating [12][35][36], nanomanipulation [15][32] techniques and electron beam lithography/metal sputtering for the fabrication

• chemical vapour deposition (CVD)-synthesized or mechanically exfoliated graphene flakes to the desired position on the substrate, and photo- and electron-beam lithography and metal sputtering techniques for fabrication of the electrical contacts. A SiO2 sacrificial layer may be used for the release of

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• Physics and Applied Computer Science, Al. Mickiewicza 30, 30-059 Kraków, Poland 10.3762/bjnano.9.24 Abstract Focused electron beam induced deposition (FEBID) is a flexible direct-write method to obtain defined structures with a high lateral resolution. In order to use this technique in application fields

• , silver crystal growth presents a strong dependency on electron dose and precursor refreshment. Keywords: focused electron beam induced deposition; low volatility precursor; silver; Introduction The fabrication of defined patterns in the nanometer regime demands techniques with high lateral resolution

• and preferably as few processing steps as possible. Therefore, a maskless direct-write method would be favorable in comparison to common resist-based lithography techniques, which require multiple steps and are reaching their lateral resolution limits. Focused electron beam induced deposition (FEBID

Bombyx mori silk/titania/gold hybrid materials for photocatalytic water splitting: combining renewable raw materials with clean fuels

• Stefanie Krüger,
• Michael Schwarze,
• Otto Baumann,
• Christina Günter,
• Michael Bruns,
• Christian Kübel,
• Dorothée Vinga Szabó,
• Rafael Meinusch,
• Verónica de Zea Bermudez and
• Andreas Taubert

Beilstein J. Nanotechnol. 2018, 9, 187–204, doi:10.3762/bjnano.9.21

• spectra were primarily obtained by spot analysis with the electron beam directly placed on one of the dark spherical features; the corresponding spectra show intense Au signals, which confirm HRTEM. Corresponding data for TPS_Au2.5 are displayed in Figure S4, Supporting Information File 1. The AuNP shown

Atomic layer deposition and properties of ZrO₂/Fe₂O₃ thin films

• Kristjan Kalam,
• Helina Seemen,
• Peeter Ritslaid,
• Mihkel Rähn,
• Aile Tamm,
• Kaupo Kukli,
• Aarne Kasikov,
• Joosep Link,
• Raivo Stern,
• Salvador Dueñas,
• Helena Castán and
• Héctor García

Beilstein J. Nanotechnol. 2018, 9, 119–128, doi:10.3762/bjnano.9.14

• properties were characterized [5]. Upon annealing at 500 °C, the metastable cubic phase of ZrO2 was stabilized and ferromagnetic hysteresis of the nanocomposite film was confirmed. Saturation magnetization was measured to be ≈173 emu/g [5]. Undoped ZrO2, prepared by pulsed electron beam deposition [6] or

• deposited on TiN substrates were supplied with platinum electrodes, with an area of 0.204 mm2, that were electron-beam-evaporated on top of the films. In addition, for investigating deposition uniformity in terms of conformal growth, stacked three-dimensional structures of silicon substrates with an aspect

• monoclinic ZrO2 (PDF Card 37-1484). It is also worth noting that magnetization even in ZrO2 that is not doped with ferromagnetic metals has been investigated and theoretically predicted [43]. In another study on electron beam evaporated undoped ZrO2 films, ferromagnetic-like magnetization hysteresis was

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• storage, ferroelectric tunnel junction memristors, metal interconnects for high performance integrated circuits in microelectronics and nano-optics applications, especially in the areas of plasmonics and metamaterials. Focused-electron-beam-induced deposition (FEBID) is a maskless direct-write tool

• removing the carbon matrix and drastically reducing the electrical resistance of the deposit. Keywords: copper; gold; cobalt; focused-electron-beam-induced deposition; noble metal; non-noble metals; post-growth annealing; Introduction Focused-electron-beam-induced deposition (FEBID) constitutes a well

• deposition mechanism consists of the delivery of gas molecules into a scanning electron microscope (SEM) chamber by a gas injection system (GIS), and the subsequent reversible physiosorption of these molecules on the substrate surface. Part of the energy, from both the primary electron beam and the secondary

Electron-driven and thermal chemistry during water-assisted purification of platinum nanomaterials generated by electron beam induced deposition

• Ziyan Warneke,
• Markus Rohdenburg,
• Jonas Warneke,
• Janina Kopyra and
• Petra Swiderek

Beilstein J. Nanotechnol. 2018, 9, 77–90, doi:10.3762/bjnano.9.10

• Division, Richland, WA, USA Siedlce University, Faculty of Sciences, 4 Maja 54, 08-110 Siedlce, Poland 10.3762/bjnano.9.10 Abstract Focused electron beam induced deposition (FEBID) is a versatile tool for the direct-write fabrication of nanostructures on surfaces. However, FEBID nanostructures are usually

• insights into the chemistry that occurs during purification of FEBID nanostructures with implications also for the stability of the carbonaceous matrix of nanogranular FEBID materials under humid conditions. Keywords: carbon contamination; electron induced reactions; focused electron beam induced

• deposition; nanostructure purification; platinum precursor; Introduction Focused electron beam induced deposition (FEBID) produces solid nanomaterials with size down to the sub-10 nm regime by decomposing precursor molecules adsorbed on a surface under a tightly focused high-energy electron beam [1

Growth model and structure evolution of Ag layers deposited on Ge films

• Arkadiusz Ciesielski,
• Lukasz Skowronski,
• Ewa Górecka,
• Jakub Kierdaszuk and
• Tomasz Szoplik

Beilstein J. Nanotechnol. 2018, 9, 66–76, doi:10.3762/bjnano.9.9

• spite of scattering loss reduction, the measured imaginary part of permittivity of a 7 nm Al-doped Ag film is three-fold higher than that of a 30 nm pure Ag in the 400–1700 nm spectral range [17]. On the other hand, if silver films are thermally or electron beam (e-beam) evaporated under optimum

Response under low-energy electron irradiation of a thin film of a potential copper precursor for focused electron beam induced deposition (FEBID)

• Leo Sala,
• Iwona B. Szymańska,
• Céline Dablemont,
• Anne Lafosse and
• Lionel Amiaud

Beilstein J. Nanotechnol. 2018, 9, 57–65, doi:10.3762/bjnano.9.8

• 10.3762/bjnano.9.8 Abstract Background: Focused electron beam induced deposition (FEBID) allows for the deposition of free standing material within nanometre sizes. The improvement of the technique needs a combination of new precursors and optimized irradiation strategies to achieve a controlled

• should be not only in the gas phase, but also it needs to be deposited on the surface where the electron beam is focused. The main motivation of the present study is to get insights on the response of this precursor under FEBID conditions, i.e., under electron irradiation in vacuum. We separate here the

• precursor in the irradiation area. Secondly, irradiation is done in the beginning of the experiment in the electron-limited regime when the precursor quantity exposed to electron beam is not limited by adsorption and diffusion. This regime is known to give the best results in terms of spatial resolution [1

Transition from silicene monolayer to thin Si films on Ag(111): comparison between experimental data and Monte Carlo simulation

• Alberto Curcella,
• Romain Bernard,
• Yves Borensztein,
• Silvia Pandolfi and
• Geoffroy Prévot

Beilstein J. Nanotechnol. 2018, 9, 48–56, doi:10.3762/bjnano.9.7

• ). The Si normalized intensity converges to = 0.60 ± 0.04 (Figure 1e), thus corresponding to the value for a clean Si surface. Note that this value slightly differs from the one measured in [34], probably due to the different geometry used (the incidence of the electron beam with the sample normal is 30

The rational design of a Au(I) precursor for focused electron beam induced deposition

• Ali Marashdeh,
• Thiadrik Tiesma,
• Niels J. C. van Velzen,
• Sjoerd Harder,
• Remco W. A. Havenith,
• Jeff T. M. De Hosson and
• Willem F. van Dorp

Beilstein J. Nanotechnol. 2017, 8, 2753–2765, doi:10.3762/bjnano.8.274

• , University of Ghent, B-9000 Ghent, Belgium Uniresearch B.V., 2628 XG Delft, Netherlands 10.3762/bjnano.8.274 Abstract Au(I) complexes are studied as precursors for focused electron beam induced processing (FEBIP). FEBIP is an advanced direct-write technique for nanometer-scale chemical synthesis. The

• interactions, making it volatile. It is stable enough to act as a volatile source for Au deposition, being stabilized by 6.5 kcal/mol. Finally, MeAuCO is likely to dissociate in a single step to pure Au. Keywords: crystallography; focused electron beam induced processing; gold chemistry; precursor design

• ; Introduction Electron microscopes, typically used for imaging and analysis, can be turned into a platform for nanoscale chemical synthesis using electron beam induced chemistry. The electron beam can act as a pen or an eraser on any solid sample, using a technique called focused electron beam induced

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• while imaging self-assembled alkanethiols on Au surfaces [5]. In earlier studies, changing the operating voltage (i.e., the voltage of the primary electron beam) during SEM image acquisition was shown to reverse the contrast for images taken from the same sample. For PDMS, which is not conducting, the

• vapor in the sample chamber to avoid charging of the insulating PDMS surfaces by the electron beam. Functional DNA patterns on supported Au monolayers As-received DNA (Integrated DNA Technologies, Coralville, IA, USA) was diluted in nuclease-free water (QIAGEN, Valencia, CA, USA) to make 100 µM stock