Metal oxide nanostructures: preparation, characterization and functional applications as chemical sensors

• Dario Zappa,
• Angela Bertuna,
• Elisabetta Comini,
• Navpreet Kaur,
• Nicola Poli,
• Veronica Sberveglieri and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2017, 8, 1205–1217, doi:10.3762/bjnano.8.122

• ). Characterization techniques A field-emission scanning electron microscope (FE-SEM) LEO 1525 was used to investigate the morphology of samples. The electron beam was set at 3–5 keV energy and the samples were attached to metallic stub via carbon glue, to reduce charging effect due to the interaction of electron

• beam with the specimens. Raman spectra were measured using a HORIBA monochromator iHR320, with a grating of 1800 grooves·mm−1 and coupled to a Peltier-cooled Synapse CCD (HORIBA). A helium–cadmium (He–Cd) blue laser (442 nm) was focused on the samples by a fiber-coupled confocal optical microscope

Growth, structure and stability of sputter-deposited MoS₂ thin films

• Reinhard Kaindl,
• Bernhard C. Bayer,
• Roland Resel,
• Thomas Müller,
• Viera Skakalova,
• Gerlinde Habler,
• Rainer Abart,
• Alexey S. Cherevan,
• Dominik Eder,
• Maxime Blatter,
• Fabian Fischer,
• Jannik C. Meyer,
• Dmitry K. Polyushkin and
• Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

• , electron beam and light scattering, scanning and spectroscopic methods as well as electrical device characterization. We find that room-temperature-deposited MoS2 films are amorphous, of smooth surface morphology and easily degraded upon moderate laser-induced annealing in ambient conditions. In contrast

• ) preparation and transmission electron microscopy (TEM) Secondary electron images were collected using an Everhart–Thornley-detector mounted on a FEI Quanta 3D FEG applying electron beam settings of 15 kV accelerating voltage. In the same system cross-sectional electron transparent foils of the MoS2 films on

Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting

• Sun-Kyu Lee,
• Sori Hwang,
• Yoon-Kee Kim and
• Yong-Jun Oh

Beilstein J. Nanotechnol. 2017, 8, 1049–1055, doi:10.3762/bjnano.8.106

• , high-resolution lithography techniques – such as electron beam lithography (EBL) or laser interference lithography (LIL) – with a conventional multistep etching process on a silicon wafer are still required to fabricate templates with nanostructured surface topographies that determine the features of

Near-field surface plasmon field enhancement induced by rippled surfaces

• Mario D’Acunto,
• Francesco Fuso,
• Ruggero Micheletto,
• Makoto Naruse,
• Francesco Tantussi and
• Maria Allegrini

Beilstein J. Nanotechnol. 2017, 8, 956–967, doi:10.3762/bjnano.8.97

• -down lithographic techniques such as electron beam lithography and nanosphere lithography [22][23][24]. In this paper, we simulate the conditions of SPP field enhancement and the formation of dark and hot, or bright spots, for a wide variety of patterned surfaces. The patterned surfaces are numerically

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• , grain structure/morphology, and electrical resistivity of 3D platinum nanowires synthesized via electron beam induced deposition with and without an in situ pulsed laser assist process which photothermally couples to the growing Pt–C deposits. Notably, we demonstrate: 1) higher platinum concentration

• : additive manufacturing; beam induced processing; 3D printing; direct-write; electron beam induced deposition; microscopy; nanofabrication; pulsed laser; purification; rapid prototyping; Introduction The first fully incorporated 3D transistor logic was reported in 2012 [1]. Further 3D device concepts and

• of success. Recently, electron beam induced deposition (EBID) was extended to 3D nanoscale mesh geometries [11]. Deposition occurs during EBID as the nanoscale focused electron beam dissociates adsorbed precursor molecules. A condensed byproduct accumulates by prolonged electron exposure with the

Vapor deposition routes to conformal polymer thin films

• Priya Moni,
• Ahmed Al-Obeidi and
• Karen K. Gleason

Beilstein J. Nanotechnol. 2017, 8, 723–735, doi:10.3762/bjnano.8.76

• cross section of the wire can reveal the conformal coating [26]. Imaging a series of cross sections can inform conformality along the length of the wire. Not all complex substrates are amenable to forming physical cross sections. In this case, ion or electron beam ablation can expose the substrate so

Computing the T-matrix of a scattering object with multiple plane wave illuminations

• Martin Fruhnert,
• Ivan Fernandez-Corbaton,
• Vassilios Yannopapas and
• Carsten Rockstuhl

Beilstein J. Nanotechnol. 2017, 8, 614–626, doi:10.3762/bjnano.8.66

• metallic disks, usually separated by a dielectric spacer layer. This particle is preferably fabricated by top-down procedures, such as electron beam lithography [5][45]. The investigated object has a disk radius of 60 nm, a disk height of 30 nm and a gap thickness of 10 nm. The metal disks consist of gold

Thin SnO_x films for surface plasmon resonance enhanced ellipsometric gas sensing (SPREE)

• Daniel Fischer,
• Andreas Hertwig,
• Uwe Beck,
• Volkmar Lohse,
• Detlef Negendank,
• Martin Kormunda and
• Norbert Esser

Beilstein J. Nanotechnol. 2017, 8, 522–529, doi:10.3762/bjnano.8.56

• , several different coating methods were developed which include chemical vapor deposition [11], sol–gel [12], spray pyrolysis [13], sputtering [14][15][16] and electron beam evaporation [17]. In our approach, we aim to develop a new sensing concept which combines the adsorption concept of MOS sensors with

• of 7 mm (Edmund Optics). The prisms were coated on the hypotenuse face with a 45 nm gold layer by using the electron beam evaporation technique (CS 730 ECS, von Ardenne Anlagentechnik GmbH). The additional undoped SnOx add-on layer was then added by using radio frequency (RF) magnetron sputtering (CS

Formation and shape-control of hierarchical cobalt nanostructures using quaternary ammonium salts in aqueous media

• Ruchi Deshmukh,
• Anurag Mehra and
• Rochish Thaokar

Beilstein J. Nanotechnol. 2017, 8, 494–505, doi:10.3762/bjnano.8.53

• ). The impression of needles is evoked by mass-thickness contrast, such that, the nanoplates standing upright on their edge appear brighter than the nanoplates lying perpendicular to the electron beam. Therefore, it is emphasized that a careful interpretation of electron micrographs is essential to avoid

• area electron diffraction pattern (SAED), obtained with a 30 nm electron beam diameter (Figure 6b), confirms the hcp phase of cobalt. The SAED pattern acquired by an electron beam of 5 nm diameter provides a clear spot pattern highlighting the crystalline nature and various planes of a nanoplate

• obtained by an electron beam of 30 nm diameter shows various planes of hcp cobalt; (c,d) high resolution image of a single nanoplate, the edge is normal to the direction of the electron beam, and the obtained SAED pattern at a spot focused with electron beam with 5 nm diameter; (e) XRD spectrum of fully

Fabrication of black-gold coatings by glancing angle deposition with sputtering

• Alan Vitrey,
• Rafael Alvarez,
• Alberto Palmero,
• María Ujué González and
• José Miguel García-Martín

Beilstein J. Nanotechnol. 2017, 8, 434–439, doi:10.3762/bjnano.8.46

• the nanostructures fabricated with evaporation methods (such as thermal evaporation or electron-beam evaporation) exhibit very well defined shapes and impressive homogeneity due to their almost punctual material sources, they cannot be scaled-up to mass production. Consequently, from an industrial

Role of oxygen in wetting of copper nanoparticles on silicon surfaces at elevated temperature

• Tapas Ghosh and
• Biswarup Satpati

Beilstein J. Nanotechnol. 2017, 8, 425–433, doi:10.3762/bjnano.8.45

•  4d. We have extended our study by measuring the elemental line profile using STEM-HAADF-EDX, as presented in Figure 5. Two elemental line profiles for Cu, O and Si have been acquired for the as-deposited sample (Figure 5a). These profiles show a higher Cu intensity when the electron beam (along the

• line) passes through the particle and significantly less intensity when it does not pass through any particle. The elemental line profile for the same sample annealed in an oxygen environment at 500 °C for 1 minute shows high copper intensity as the electron beam passes through the film (Figure 5b). We

Phosphorus-doped silicon nanorod anodes for high power lithium-ion batteries

• Chao Yan,
• Qianru Liu,
• Jianzhi Gao,
• Zhibo Yang and
• Deyan He

Beilstein J. Nanotechnol. 2017, 8, 222–228, doi:10.3762/bjnano.8.24

• conditions described in the experimental section. Before the measurement, coplanar aluminium electrodes with a length of 1 cm and a spacing of 0.5 mm were deposited on the Si film by electron-beam evaporation combined with a mask. Then, after an annealing treatment, the conductivity of the film was measured

Flexible photonic crystal membranes with nanoparticle high refractive index layers

• Torben Karrock,
• Moritz Paulsen and
• Martina Gerken

Beilstein J. Nanotechnol. 2017, 8, 203–209, doi:10.3762/bjnano.8.22

• crystal membrane to be created. It is allowed to flow in the indentations by gravity. On top a nanostructured photo resist stamp is pressed. This secondary stamp was replicated in Amonil (AMO GmbH, Aachen, Germany) from an electron-beam written glass master with a linear grating period of 400 nm and a

Laser irradiation in water for the novel, scalable synthesis of black TiO_x photocatalyst for environmental remediation

• Massimo Zimbone,
• Giuseppe Cacciato,
• Mohamed Boutinguiza,
• Vittorio Privitera and
• Maria Grazia Grimaldi

Beilstein J. Nanotechnol. 2017, 8, 196–202, doi:10.3762/bjnano.8.21

• , leading to the black-TiOx/Ti/PtNp multilayer structure depicted in Figure 1c. Methods SEM images were acquired by using a field emission SEM (Gemini Zeiss SUPRATM25) at a working distance of 5–6 mm, using an electron beam of 5 keV and SE detector. The UV–vis spectrum was collected using a Perkin-Elmer

Tunable plasmons in regular planar arrays of graphene nanoribbons with armchair and zigzag-shaped edges

• Cristian Vacacela Gomez,
• Michele Pisarra,
• Mario Gravina and
• Antonello Sindona

Beilstein J. Nanotechnol. 2017, 8, 172–182, doi:10.3762/bjnano.8.18

• access to the unperturbed density–density response function, of the non-interacting valence electrons, to a probe particle of energy ω and momentum q. The latter is provided by the Alder–Wiser formula [40][41]: Indeed, plasmons in solid-state materials are typically triggered by electron-beam radiation

Surface-enhanced Raman scattering of self-assembled thiol monolayers and supported lipid membranes on thin anodic porous alumina

• Marco Salerno,
• Amirreza Shayganpour,
• Barbara Salis and
• Silvia Dante

Beilstein J. Nanotechnol. 2017, 8, 74–81, doi:10.3762/bjnano.8.8

• ≈500 nm thick Al layer was first coated on a silicon wafer by an electron-beam evaporation system PVD75 (Kurt J. Lesker Ltd., UK) working at a base pressure of 10−6 Torr with a deposition rate of 0.5–1 Å/s. tAPA was fabricated in a single-step (≈15 min) anodization performed at 110 V in 0.4 M

• nitrogen and dehydrating on a hotplate set at 100 °C for 15 min, the tAPA was overcoated by the same electron-beam evaporation system with a ≈25 nm thick Au layer to make it SERS-active. More details on similar fabrication procedure can be found in references [12][13]. The characteristic size of tAPA pores

Sub-nanosecond light-pulse generation with waveguide-coupled carbon nanotube transducers

• Felix Pyatkov,
• Svetlana Khasminskaya,
• Vadim Kovalyuk,
• Frank Hennrich,
• Manfred M. Kappes,
• Gregory N. Goltsman,
• Wolfram H. P. Pernice and
• Ralph Krupke

Beilstein J. Nanotechnol. 2017, 8, 38–44, doi:10.3762/bjnano.8.5

• electron beam lithography on top of Si3N4/SiO2/Si substrate. Au/Cr contacts were produced by physical vapor deposition, and 600 nm wide, half-etched Si3N4-waveguides were formed with reactive ion etching. A typical sample contains tens of contact pairs and CNTs that were placed in between using

Obtaining and doping of InAs-QD/GaAs(001) nanostructures by ion beam sputtering

• Sergei N. Chebotarev,
• Alexander S. Pashchenko,
• Leonid S. Lunin,
• Elena N. Zhivotova,
• Georgy A. Erimeev and
• Marina L. Lunina

Beilstein J. Nanotechnol. 2017, 8, 12–20, doi:10.3762/bjnano.8.2

• epitaxy [8] and vapour phase epitaxy [9] are commonly used and well-understood techniques for obtaining such nanostructures. Besides the mentioned methods, classic growth methods such as liquid phase epitaxy [10], laser beam sputtering [11], electron beam sputtering [12] and ion beam sputtering [13] are

Annealing-induced recovery of indents in thin Au(Fe) bilayer films

• Anna Kosinova,
• Ruth Schwaiger,
• Leonid Klinger and
• Eugen Rabkin

Beilstein J. Nanotechnol. 2016, 7, 2088–2099, doi:10.3762/bjnano.7.199

• results of the present study, the following conclusions can be drawn: Thin polycrystalline Au(Fe) films on basal-plane oriented sapphire substrates were produced by electron beam deposition. The films exhibited a strong [111] texture and all grain boundaries were either of the near-Σ3<111> tilt, or of the

• underlayer) were deposited on c-plane sapphire (α-Al2O3) substrates at room temperature using electron beam deposition. The deposition took place in a VST e-beam evaporator with a base pressure of 5 × 10−7 Torr (6.7 × 10−7 mbar). Deposition rates were 0.2–0.3 Å·s−1 for Fe and 0.7 Å·s−1 for Au. After the

Solvent-mediated conductance increase of dodecanethiol-stabilized gold nanoparticle monolayers

• Patrick A. Reissner,
• Jean-Nicolas Tisserant,
• Antoni Sánchez-Ferrer,
• Raffaele Mezzenga and
• Andreas Stemmer

Beilstein J. Nanotechnol. 2016, 7, 2057–2064, doi:10.3762/bjnano.7.196

• samples were rinsed with THF or EtOH and dried under nitrogen flow [3]. Contact deposition Electric contacts were applied by shadow mask evaporation. We aligned a 400 mesh TEM grid with the printed lines on the substrate and deposited 3 nm titanium and 65 nm gold by electron-beam evaporation at a pressure

Effect of Anderson localization on light emission from gold nanoparticle aggregates

• Mohamed H. Abdellatif,
• Marco Salerno,
• Gaser N. Abdelrasoul,
• Ioannis Liakos,
• Alice Scarpellini,
• Sergio Marras and
• Alberto Diaspro

Beilstein J. Nanotechnol. 2016, 7, 2013–2022, doi:10.3762/bjnano.7.192

• localization is due to the increase of the radiative process in the localized field. These results suggest that by fabricating special surface patterns using electron beam lithography or by self-assembly, the localization of light can be engineered. The possibility to generate Anderson localization by control

Morphology of SiO₂ films as a key factor in alignment of liquid crystals with negative dielectric anisotropy

• Volodymyr Tkachenko,
• Antigone Marino,
• Eva Otón,
• Noureddine Bennis and
• Josè Manuel Otón

Beilstein J. Nanotechnol. 2016, 7, 1743–1748, doi:10.3762/bjnano.7.167

• measured parameters as a function of the deposition angle. Some of the results are compared with the experimental data and simulations from literature. Experimental SiO2 films and LC cells SiO2 thin films were deposited by electron-beam evaporation on indium tin oxide (ITO) coated glass substrates

Thickness-modulated tungsten–carbon superconducting nanostructures grown by focused ion beam induced deposition for vortex pinning up to high magnetic fields

• Ismael García Serrano,
• Javier Sesé,
• Isabel Guillamón,
• Hermann Suderow,
• Sebastián Vieira,
• Manuel Ricardo Ibarra and
• José María De Teresa

Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162

• ][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44][45]. In order to design vortex-pinning landscapes, electron beam lithography is commonly used to fabricate arrays of holes [33][40] or arrays of magnetic dots/lines [30][34][36][39][41], whereas selective ion implantation [29][38][41

• , whereas for the samples with higher pitches (120 and 140 nm), the corrugation is greater than 50%. The W–C samples were further characterized by means of scanning transmission electron microscopy (STEM) in a 300 kV F30-Tecnai apparatus by FEI. In the STEM experiments performed, the electron beam was

Nanoanalytics for materials science

• Thilo Glatzel and
• Tom Wirtz

Beilstein J. Nanotechnol. 2016, 7, 1674–1675, doi:10.3762/bjnano.7.159

• included in both the device structures and detection techniques. A typical setup includes a probe (such as tip, ion beam or electron beam), the condition of the sample and the interaction between them, which all need to be extensively investigated by simulations and modeling in order to obtain an in-depth

Sb₂S₃ grown by ultrasonic spray pyrolysis and its application in a hybrid solar cell

• Erki Kärber,
• Atanas Katerski,
• Ilona Oja Acik,
• Arvo Mere,
• Valdek Mikli and
• Malle Krunks

Beilstein J. Nanotechnol. 2016, 7, 1662–1673, doi:10.3762/bjnano.7.158

• accelerating voltage of 10 kV. The same SEM system was used for visualization of the morphology of the layers and of the cross-section of the solar cells at an electron beam accelerating voltage of 4 kV. Current–voltage scans of the solar cells were used to obtain the principal characteristics of the solar