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Search for "gas injection system" in Full Text gives 33 result(s) in Beilstein Journal of Nanotechnology.
Tunable magnetism on the lateral mesoscale by post-processing of Co/Pt heterostructures
Beilstein J. Nanotechnol. 2015, 6, 1082–1090, doi:10.3762/bjnano.6.109
- electron microscope (SEM: FEI, Nova NanoLab 600). The SEM was equipped with a multi-channel gas injection system for FEBID. As substrates we used epi-polished c-cut (0001) Al2O3 with Cr/Au contacts of 3/50 nm thickness prepared by photolithography in conjunction with lift-off. The samples are one Co-FEBID
- pressure of 1.5 × 10−5 mbar through a home-made gas injection system. The samples were subjected to 12 cycles of oxygen flux switched on for 5 min interrupted by 5-minute turn-offs. The resistivity of the as-deposited Pt-based layers was 0.4 Ω·cm, decreased to about 90 mΩ·cm as the temperature rose to 150
Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition
Beilstein J. Nanotechnol. 2015, 6, 907–918, doi:10.3762/bjnano.6.94
- purification study in O2 was performed in a standard high-vacuum SEM and the O2 was injected with a localized gas injection system. In the previous study we examined the purification rate as a function of deposit thickness, localized oxygen pressure and oxygen temperature. The results suggested that the rate
- . (an Oxford Instruments Company) for assistance with the OmniGIS gas injection system. HP acknowledges the support from Prof. Ferdinand Hofer and the Austrian Cooperative Research (ACR) and the Graz University of Technology in Austria.
Fundamental edge broadening effects during focused electron beam induced nanosynthesis
Beilstein J. Nanotechnol. 2015, 6, 462–471, doi:10.3762/bjnano.6.47
- via a dedicated gas injection system where it adsorbs at the surface, undergoes random diffusion and desorbs again after a system-dependent residence time [1][3][4][7][8][9][10][11][12][13][14][15][16][17][18][19]. A major problem of FEBID, however, is the large amount of carbon impurities that often
- practical output of this study. Experimental FEBID was performed with a FEI Nova200™ dual beam microscope (DBM) equipped with a FEI gas-injection-system (GIS) for Pt deposition, arranged at an angle of 52° and a vertical distance of 120 µm to the substrate with an exact alignment of the GIS main axis with
Probing the electronic transport on the reconstructed Au/Ge(001) surface
Beilstein J. Nanotechnol. 2014, 5, 1463–1471, doi:10.3762/bjnano.5.159
- a gas injection system by the electron beam and the FIB beam was used to cut out the lamella. The high resolution (HR) TEM and high angle annular dark field (HAADF) scanning TEM images together with energy dispersive X-ray spectroscopy (EDX) analysis of the sample were obtained by the FEI Tecnai
In situ growth optimization in focused electron-beam induced deposition
Beilstein J. Nanotechnol. 2013, 4, 919–926, doi:10.3762/bjnano.4.103
- -beam SEM/FIB microscope (FEI, Nova Nanolab 600) equipped with a Schottky electron emitter. The precursor gases are introduced into the high-vacuum chamber via a gas injection system through a thin capillary (diameter = 0.5 mm) in close proximity to the focus of the electron beam. As a substrate
Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM
Beilstein J. Nanotechnol. 2013, 4, 77–86, doi:10.3762/bjnano.4.9
- throughout the experiments. The DualBeam system is equipped with a standard gas injection system (GIS) with (CH3)3Pt(CpCH3) as organometallic precursor gas. The reservoir temperature was approximately 43 °C. The electron beam used for deposition can be accelerated between 3 kV and 30 kV with a beam current
Focused electron beam induced deposition: A perspective
Beilstein J. Nanotechnol. 2012, 3, 597–619, doi:10.3762/bjnano.3.70
- review of the fundamentals FEBID in a nutshell: The FEBID process is based on the electron-induced dissociation of a molecular precursor previously adsorbed on a substrate surface and constantly replenished by a gas-supply system. In most instances the gas-supply or gas-injection system consists of a
Spontaneous dissociation of Co2(CO)8 and autocatalytic growth of Co on SiO2: A combined experimental and theoretical investigation
Beilstein J. Nanotechnol. 2012, 3, 546–555, doi:10.3762/bjnano.3.63
- injection system for 30 min, causing a pressure increase to 3 × 10−5 mbar, which dropped within ten minutes to about 6 × 10−6 mbar. The gas injection system employs a stainless-steel precursor capsule with a fine-dosage valve. The precursor temperature was set by the ambient conditions to 27 °C. From the
- known precursor temperature and associated vapor pressure, as well as the geometry of our gas injection system we can roughly estimate the maximum molecular flux at the substrate surface to be 1.4 × 1017 cm−2 s−1 following [34]. In the second series of experiments the untreated silica surface was
- discharge for 75 min after the scanning electron microscope (SEM) chamber had been evacuated to its base pressure of about 5 × 10−6 mbar. After the plasma treatment the chamber was again evacuated to base pressure and Co-precursor flux was admitted to the chamber by opening the valve of a home-made gas
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