Growth model and structure evolution of Ag layers deposited on Ge films

• Arkadiusz Ciesielski,
• Lukasz Skowronski,
• Ewa Górecka,
• Jakub Kierdaszuk and
• Tomasz Szoplik

Beilstein J. Nanotechnol. 2018, 9, 66–76, doi:10.3762/bjnano.9.9

• stable Ag-based layers of thickness less than 15 nm on fused silica substrates is magnetron cosputtering of silver and aluminum. Surface root-mean-square (RMS) roughness of 15 nm Al-doped Ag films with an Al atomic concentration of 4% have been recently reported to be equal to 0.4 nm [16]. However, in

Ta₂N₃ nanocrystals grown in Al₂O₃ thin layers

• Krešimir Salamon,
• Maja Buljan,
• Iva Šarić,
• Mladen Petravić and
• Sigrid Bernstorff

Beilstein J. Nanotechnol. 2017, 8, 2162–2170, doi:10.3762/bjnano.8.215

• magnetron deposition at room temperature and characterized using grazing incidence small-angle X-ray scattering (GISAXS), X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GIXRD), secondary ion mass spectrometry (SIMS) and X-ray photoelectron spectroscopy (XPS). We found amorphous tantalum

• isolated nitride NPs within thin dielectric layers. An emphasis is placed here on the control of size and spatial arrangement of NPs, which should then ensure the desired optical properties. This is achieved by using reactive magnetron sputtering and the deposition procedure we already used for the self

• by using the reactive magnetron sputtering deposition technique under conditions that implied a high nitrogen fraction in sputtering gas mixture and post-deposition annealing [23]. We found that the Ta2N3 phase has metallic properties, which makes it a possible candidate for the LSPR applications

Advances and challenges in the field of plasma polymer nanoparticles

• Andrei Choukourov,
• Pavel Pleskunov,
• Daniil Nikitin,
• Valerii Titov,
• Artem Shelemin,
• Mykhailo Vaidulych,
• Anna Kuzminova,
• Pavel Solař,
• Jan Hanuš,
• Jaroslav Kousal,
• Ondřej Kylián,
• Danka Slavínská and
• Hynek Biederman

Beilstein J. Nanotechnol. 2017, 8, 2002–2014, doi:10.3762/bjnano.8.200

• plasma polymerization of volatile monomers or via radio frequency (RF) magnetron sputtering of conventional polymers. The formation of hydrocarbon, fluorocarbon, silicon- and nitrogen-containing plasma polymer nanoparticles as well as core@shell nanoparticles based on plasma polymers is discussed with a

• the production of metal NPs by vacuum thermal evaporation with subsequent condensation of atomic metal vapours on a cool buffer gas and later thermal evaporation was replaced by magnetron sputtering [41]. At least one work investigated the formation of polymeric NPs by thermal evaporation of poly(N

• -vinyl-2-pyrrolidone) in a GAS [42]. At present, a typical GAS consists of a tubular vacuum chamber equipped with a DC or RF electrode (or magnetron) which is used to ignite a plasma and which serves as a source of material to be “vaporized” (Figure 1). In the case of the production of plasma polymer NPs

Growth and characterization of textured well-faceted ZnO on planar Si(100), planar Si(111), and textured Si(100) substrates for solar cell applications

• Chin-Yi Tsai,
• Jyong-Di Lai,
• Shih-Wei Feng,
• Chien-Jung Huang,
• Chien-Hsun Chen,
• Fann-Wei Yang,
• Hsiang-Chen Wang and
• Li-Wei Tu

Beilstein J. Nanotechnol. 2017, 8, 1939–1945, doi:10.3762/bjnano.8.194

• (101) plane in the hexagonal lattice [12]. Furthermore, hexagonal and pyramidal ZnO composed of the (101) and (001) planes has been synthesized in ionic liquids or obtained on Si(111) substrates by RF magnetron sputtering [13][14]. Nevertheless, the growth of well-faceted pyramidal-like ZnO on silicon

Fluorination of vertically aligned carbon nanotubes: from CF₄ plasma chemistry to surface functionalization

• Claudia Struzzi,
• Mattia Scardamaglia,
• Jean-François Colomer,
• Alberto Verdini,
• Luca Floreano,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2017, 8, 1723–1733, doi:10.3762/bjnano.8.173

• vapor deposition (CCVD) at atmospheric pressure. The catalysts are prepared by magnetron sputtering: a 30 nm Al2O3 buffer layer is deposited on Si wafers with native SiO2 and a 6 nm Fe layer is then deposited to form nanoparticles which catalyse the vCNT growth. Then, the substrate is placed inside the

Metal oxide nanostructures: preparation, characterization and functional applications as chemical sensors

• Dario Zappa,
• Angela Bertuna,
• Elisabetta Comini,
• Navpreet Kaur,
• Nicola Poli,
• Veronica Sberveglieri and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2017, 8, 1205–1217, doi:10.3762/bjnano.8.122

• –condensation are the evaporation temperature of the source material and the condensation temperature at which materials start to condensate and grow as 1D nanostructure. An ultrathin layer of gold particles were deposited on alumina substrates with RF magnetron sputtering at 70 W, Ar flow 7 sccm for 5 sec

• ) nanowires directly on the final transducer, starting from a metallic tungsten layer deposited by magnetron sputtering [54]. Metallic tungsten was deposited by RF magnetron sputtering (100 W, 5 × 10−3 mbar, argon plasma, room temperature) via a shadow-mask technique, in order to obtain a 180 nm thin layer on

• by Fang et al. [56], but worked on a thin layer of niobium deposited on alumina substrates by magnetron sputtering. For this reason, we carried out several experiments to obtain the optimal conditions (set out below) for the growth of nanostructures. RF magnetron sputtering was used to deposit a

Growth, structure and stability of sputter-deposited MoS₂ thin films

• Reinhard Kaindl,
• Bernhard C. Bayer,
• Roland Resel,
• Thomas Müller,
• Viera Skakalova,
• Gerlinde Habler,
• Rainer Abart,
• Alexey S. Cherevan,
• Dominik Eder,
• Maxime Blatter,
• Fabian Fischer,
• Jannik C. Meyer,
• Dmitry K. Polyushkin and
• Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

• films by magnetron sputtering. MoS2 films with thicknesses from ≈10 to ≈1000 nm were deposited on SiO2/Si and reticulated vitreous carbon (RVC) substrates. Samples deposited at room temperature (RT) and at 400 °C were compared. The deposited MoS2 was characterized by macro- and microscopic X-ray

• measurements suggest directions for future work on our PVD MoS2 films. Keywords: electrode; hydrogen evolution reaction (HER); magnetron sputter deposition; MoS2; reticulated vitreous carbon (RVC) foam; SiO2/Si substrate; Introduction Molybdenum disulphide (MoS2) is a layered chemical compound comprised of

• (PVD) [27][28], which includes techniques such as magnetron sputter deposition, pulsed laser ablation or evaporation [3][29][30]. In this regard, PVD offers a wide processing window in terms of attainable deposition temperatures and substrates, constituent element fluxes and kinetic energies of the

Graphene functionalised by laser-ablated V₂O₅ for a highly sensitive NH₃ sensor

• Margus Kodu,
• Artjom Berholts,
• Tauno Kahro,
• Mati Kook,
• Peeter Ritslaid,
• Helina Seemen,
• Tea Avarmaa,
• Harry Alles and
• Raivo Jaaniso

Beilstein J. Nanotechnol. 2017, 8, 571–578, doi:10.3762/bjnano.8.61

• foil was dissolved in ammonium persulfate solution overnight. The floating PMMA/graphene film was rinsed with deionized water and transferred onto the Si/SiO2 substrate (see Figure 6) equipped with Pt electrodes (60 nm thick) that were deposited through a shadow mask by magnetron sputtering. The gap

Anodization-based process for the fabrication of all niobium nitride Josephson junction structures

• Massimiliano Lucci,
• Ivano Ottaviani,
• Matteo Cirillo,
• Fabio De Matteis,
• Roberto Francini,
• Vittorio Merlo and
• Ivan Davoli

Beilstein J. Nanotechnol. 2017, 8, 539–546, doi:10.3762/bjnano.8.58

• Industriale, Università di Roma “Tor Vergata”, Via del Politecnico, 00133 Roma, Italy 10.3762/bjnano.8.58 Abstract We studied the growth and oxidation of niobium nitride (NbN) films that we used to fabricate superconductive tunnel junctions. The thin films were deposited by dc reactive magnetron sputtering

• bath at 4.2 K. Equipment The sputtering system used in our experiment is a commercial Leybold sputtering system equipped with two 4 inch dc and rf magnetron sources and one etching source. A flux meter controls the inlet for N2 and Ar. Finally, a rotatable disk plate holds several substrates in the

Thin SnO_x films for surface plasmon resonance enhanced ellipsometric gas sensing (SPREE)

• Daniel Fischer,
• Andreas Hertwig,
• Uwe Beck,
• Volkmar Lohse,
• Detlef Negendank,
• Martin Kormunda and
• Norbert Esser

Beilstein J. Nanotechnol. 2017, 8, 522–529, doi:10.3762/bjnano.8.56

• the problems of cross sensitivity of the MOS concept. Results: Undoped tin oxide (SnOx) and iron doped tin oxide (Fe:SnOx) thin add-on films were prepared by magnetron sputtering on the top of the actual surface plasmon resonance (SPR) sensing gold layer. The films were tested for their sensitivity to

• of 7 mm (Edmund Optics). The prisms were coated on the hypotenuse face with a 45 nm gold layer by using the electron beam evaporation technique (CS 730 ECS, von Ardenne Anlagentechnik GmbH). The additional undoped SnOx add-on layer was then added by using radio frequency (RF) magnetron sputtering (CS

• 730 ECS, von Ardenne Anlagentechnik GmbH) with 13.56 MHz frequency and 200 W power. Here, a commercially available pure SnO2 target (99.9%) obtained from FHR GmbH was used. The target has a diameter of 200 mm and a thickness of 6 mm. For the Fe-doped samples, a home-built RF magnetron sputtering

Study of the surface properties of ZnO nanocolumns used for thin-film solar cells

• Neda Neykova,
• Jiri Stuchlik,
• Karel Hruska,
• Ales Poruba,
• Zdenek Remes and
• Ognen Pop-Georgievski

Beilstein J. Nanotechnol. 2017, 8, 446–451, doi:10.3762/bjnano.8.48

• were prepared before by DC reactive magnetron sputtering. The optical absorption of the pristine ZnO layers as well as that of the substrates bearing the dense ZnO NCs was investigated by photothermal deflection spectroscopy (PDS) [16][17]. Furthermore, we investigated the changes in the PDS spectrum

• nanocrystalline Si. Experimental The growth of densely packed ZnO nanocolumns was performed on fused silica (Suprasil®) substrates that were covered with an undoped thin seed layer of ZnO by DC reactive magnetron sputtering. The parameters of magnetron sputtering were as follows: processing temperature of 400 °C

Fabrication of black-gold coatings by glancing angle deposition with sputtering

• Alan Vitrey,
• Rafael Alvarez,
• Alberto Palmero,
• María Ujué González and
• José Miguel García-Martín

Beilstein J. Nanotechnol. 2017, 8, 434–439, doi:10.3762/bjnano.8.46

• fabrication of the nanostructured coatings has been carried out at room temperature in an UHV chamber (base pressure in the range of 10−9 mbar) using a magnetron source from AJA with a gold target (3.8 cm diameter). Argon was the sputter gas and the pressure during the deposition was 1.5 × 10−3 mbar, which

Template-controlled piezoactivity of ZnO thin films grown via a bioinspired approach

• Nina J. Blumenstein,
• Fabian Streb,
• Stefan Walheim,
• Thomas Schimmel,
• Zaklina Burghard and
• Joachim Bill

Beilstein J. Nanotechnol. 2017, 8, 296–303, doi:10.3762/bjnano.8.32

• high mechanical deformation [13]. Growth of such oriented films was achieved via technically sophisticated methods under harsh reaction conditions [14][15][16][17]. For example radio-frequency magnetron sputtering [14][17], pulsed laser deposition [16] or sol–gel methods followed by annealing [15] were

• . Thus, in order to obtain reliable data, we chose the intermediate thickness range on the order of 300 nm. For RF-magnetron-sputtered ZnO films it was reported, that thicker films in the range of 1 µm show an increasing piezo-activity [45]. This trend may arise from a lower density of grain boundaries

• the films due to their (002) texture. This also reflects in the value obtained for deff of 3.2 pm V−1 (d33 = 6.4 pm V−1). This value is in the range or higher than the one of other oriented, ZnO thin films prepared by RF magnetron sputtering (2–13 pm V−1) [14] or sol–gel process (5 pm V−1) [15]. Since

Optical and photocatalytic properties of TiO₂ nanoplumes

• Viviana Scuderi,
• Massimo Zimbone,
• Maria Miritello,
• Giuseppe Nicotra,
• Giuliana Impellizzeri and
• Vittorio Privitera

Beilstein J. Nanotechnol. 2017, 8, 190–195, doi:10.3762/bjnano.8.20

• sputtered on quartz substrates by ultra-high vacuum magnetron sputtering from a Ti target of 99.99% purity. The Ti samples (1 cm × 1 cm in size) were put into 3 mL H2O2 (30%) solution at 60 °C for different etching times. Afterwards, the samples were rinsed with deionized water and dried in air. SEM

Fundamental properties of high-quality carbon nanofoam: from low to high density

• Natalie Frese,
• Shelby Taylor Mitchell,
• Christof Neumann,
• Amanda Bowers,
• Armin Gölzhäuser and
• Klaus Sattler

Beilstein J. Nanotechnol. 2016, 7, 2065–2073, doi:10.3762/bjnano.7.197

• for carbon films prepared by magnetron sputtering [53]. A correlation between the 1180 cm−1 peak and the sp3 content in these films was found [53]. At approximately this wavenumber, we see a small feature in the spectrum of Figure 2b. This indicates that a small diamond-like contribution is present in

Ferromagnetic behaviour of ZnO: the role of grain boundaries

• Boris B. Straumal,
• Svetlana G. Protasova,
• Andrei A. Mazilkin,
• Eberhard Goering,
• Gisela Schütz,
• Petr B. Straumal and
• Brigitte Baretzky

Beilstein J. Nanotechnol. 2016, 7, 1936–1947, doi:10.3762/bjnano.7.185

• deposition (PLD), or magnetron sputtering [5][6][7][8][9]. However, the first disappointments also appeared immediately. Namely, single crystals, ceramics sintered from coarse-grained powders and single-crystalline films deposited by molecular beam epitaxy (MBE) were never ferromagnetic. Other synthesis

Nanostructured germanium deposited on heated substrates with enhanced photoelectric properties

• Ionel Stavarache,
• Valentin Adrian Maraloiu,
• Petronela Prepelita and
• Gheorghe Iordache

Beilstein J. Nanotechnol. 2016, 7, 1492–1500, doi:10.3762/bjnano.7.142

• ], implantation [26], RF magnetron sputtering [27]. However, for most of these approaches, thermal treatments were necessary after the deposition process in order to obtain high-quality nanostructures based on crystalline Ge [28]. The most important parameter to be finely tuned is the substrate temperature during

• of Ge-nps embedded in SiO2 thin film are summarized. The influence of the temperature on the photodetector test structure, fabricated on substrates at 300, 400 and 500 °C is also described. In Figure 1, the diffractograms recorded of thin films deposited by RF magnetron sputtering on substrates at

• thin films during deposition at temperatures lower than those necessary for nanostructuring Ge-nps by thermal annealing after deposition. To optimize the substrate temperature, Al/n-Si/Ge:SiO2/ITO photodetector test structures have been fabricated by magnetron sputtering at low temperatures of 300, 400

A composite structure based on reduced graphene oxide and metal oxide nanomaterials for chemical sensors

• Vardan Galstyan,
• Elisabetta Comini,
• Iskandar Kholmanov,
• Andrea Ponzoni,
• Veronica Sberveglieri,
• Nicola Poli,
• Guido Faglia and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2016, 7, 1421–1427, doi:10.3762/bjnano.7.133

• ZnO nanostructures is similar to that described in our previous work [24]. Thin films of metallic Zn with a thickness of 600 nm were deposited on 2 mm square alumina substrates by means of radio frequency (RF) magnetron sputtering. Thin deposited films of Zn were anodized in 2 M oxalic acid dihydrate

Dealloying of gold–copper alloy nanowires: From hillocks to ring-shaped nanopores

• Adrien Chauvin,
• Cyril Delacôte,
• Mohammed Boujtita,
• Benoit Angleraud,
• Junjun Ding,
• Chang-Hwan Choi,
• Pierre-Yves Tessier and
• Abdel-Aziz El Mel

Beilstein J. Nanotechnol. 2016, 7, 1361–1367, doi:10.3762/bjnano.7.127

• nodular growth triggered by the presence of surface defects created intentionally on the substrate as well as the high tilt angle between the magnetron source axis and the normal to the substrate, metal nanowires containing hillocks emerging out of the surface can be created. The approach is demonstrated

• them into residues (Figure 1a(3)). The existence of photoresist residues is related to the non-homogenous etching of the polymers forming the photoresist. In the last stage, the metal is deposited by magnetron sputtering over the prepared substrate to form an array of nanowires containing hillocks

• by a shadowing effect. This shadowing effect is enhanced by the fact that the angle between the magnetron source axis and the normal to the substrate was 30°. During the early stage of deposition (Figure 4(2)), the metal grows non-uniformly on the photoresist residues. The film is thick at the top

Fast diffusion of silver in TiO₂ nanotube arrays

• Wanggang Zhang,
• Yiming Liu,
• Diaoyu Zhou,
• Hui Wang,
• Wei Liang and
• Fuqian Yang

Beilstein J. Nanotechnol. 2016, 7, 1129–1140, doi:10.3762/bjnano.7.105

• Education, Taiyuan Shanxi 030024, China Department of Chemical and Materials Engineering, University of Kentucky, Lexington, KY 40506, USA 10.3762/bjnano.7.105 Abstract Using magnetron sputtering and heat treatment, Ag@TiO2 nanotubes are prepared. The effects of heat-treatment temperature and heating time

• the outmost surface of TiO2 nanotubes. Probably there are hardly any Ag nanocrystals formed inside the TiO2 nanotubes through the migration of Ag. Keywords: activation energy; fast diffusion; magnetron sputtering; silver; TiO2 nanotube; Introduction Titanium dioxide (TiO2) has gained great attention

• aqueous solutions. In addition, the technique of magnetron sputtering has been used to deposit Ag nanostructures on the surface of TiO2 nanotube arrays. It is worth mentioning that Enachi et al. [25] heat-treated the TiO2 nanotube arrays after the deposition of Ag film of 50 nm on the top surface of TiO2

Customized MFM probes with high lateral resolution

• Óscar Iglesias-Freire,
• Miriam Jaafar,
• Eider Berganza and
• Agustina Asenjo

Beilstein J. Nanotechnol. 2016, 7, 1068–1074, doi:10.3762/bjnano.7.100

• thin film with no buffer layer, using a custom-built AC magnetron sputtering system with a substrate holder designed on purpose to favour the growth of the magnetic layer on one side of the pyramidal tip. The deposition parameters are carefully chosen to yield highly flat surfaces with small grain size

A terahertz-vibration to terahertz-radiation converter based on gold nanoobjects: a feasibility study

• Kamil Moldosanov and
• Andrei Postnikov

Beilstein J. Nanotechnol. 2016, 7, 983–989, doi:10.3762/bjnano.7.90

• practical source of microwave radiation, a magnetron of a domestic microwave oven is suggested, that operates at ν = 2.45 GHz. In this case, hν ≈ 1.01·10−2 meV 17.4 meV, so that the approximation holds and the approximation in Equation 1 is valid. A substrate with multiple GNBs is placed into the oven

• chamber, where the GNBs are exposed to both direct irradiation from the magnetron and to that reflected from the chamber walls. Effectively, the microwave photons could be absorbed anyway inside the GNBs, where consequently the THz photons will be emitted. The resulting THz radiation is channeled out of

• : magnetron (ν = 2.45 GHz), 3: substrate with densely deposited GNBs or GNRs, 4: THz band resonance filter (ν0 = 4.2 THz), 5: lens, 6: object to be studied. Acknowledgements We thank Dr. Muñoz and Dr. Kresch for useful discussions of their measurements of the phonon spectrum in gold.

Thickness dependence of the triplet spin-valve effect in superconductor–ferromagnet–ferromagnet heterostructures

• Daniel Lenk,
• Vladimir I. Zdravkov,
• Jan-Michael Kehrle,
• Günter Obermeier,
• Aladin Ullrich,
• Roman Morari,
• Hans-Albrecht Krug von Nidda,
• Claus Müller,
• Mikhail Yu. Kupriyanov,
• Anatolie S. Sidorenko,
• Siegfried Horn,
• Rafael G. Deminov,
• Lenar R. Tagirov and
• Reinhard Tidecks

Beilstein J. Nanotechnol. 2016, 7, 957–969, doi:10.3762/bjnano.7.88

• sample series investigated in this work was prepared by magnetron sputtering at room temperature on a commercial silicon substrate with a {111} surface. While for the sputtering of the niobium layers, the target was moved over the substrate to obtain a smooth layer of nearly constant thickness, the

• Cu41Ni59 layer was deposited on the substrate positioned off-axis below the sputtering target to utilize the natural sputtering gradient of magnetron sputtering to obtain a wedge of varying thickness. Subsequently, the Co layer was deposited on the substrate without moving the target. Finally, the CoOx

In situ observation of deformation processes in nanocrystalline face-centered cubic metals

• Aaron Kobler,
• Christian Brandl,
• Horst Hahn and
• Christian Kübel

Beilstein J. Nanotechnol. 2016, 7, 572–580, doi:10.3762/bjnano.7.50

• be separated from real local crystallographic changes [38]. In situ ACOM-STEM is applied to magnetron-sputtered NC thin film samples exhibiting a predominately columnar grain structure. In the following, we concentrate on results from an annealed NC Pd (ncPda) thin film with ≈50 nm thickness

• by radio frequency (RF) magnetron sputtering using 2" diameter planar targets with 99.95% purity. TEM grids (holycarbon R2/1 + 2 nm C, Quantifoil) were used as a substrate. The nominal thickness between the holes is 22 nm. Pd was sputtered in 5 cycles of 50.38 s at 60 W constant sputtering power

Determination of the compositions of the DIGM zone in nanocrystalline Ag/Au and Ag/Pd thin films by secondary neutral mass spectrometry

• Gábor Y. Molnár,
• Shenouda S. Shenouda,
• Gábor L. Katona,
• Gábor A. Langer and
• Dezső L. Beke

Beilstein J. Nanotechnol. 2016, 7, 474–483, doi:10.3762/bjnano.7.41

• )/substrate, as well as Pd(30 nm)/Ag(30 nm)/substrate thin film systems were produced by magnetron sputtering onto single crystalline Si substrates with native SiO2 layers at room temperature. The base pressure in the sputtering chamber was below 2 × 10−5 Pa. During the deposition, the Ar (99.999%) pressure