Growth, structure and stability of sputter-deposited MoS₂ thin films

• Reinhard Kaindl,
• Bernhard C. Bayer,
• Roland Resel,
• Thomas Müller,
• Viera Skakalova,
• Gerlinde Habler,
• Rainer Abart,
• Alexey S. Cherevan,
• Dominik Eder,
• Maxime Blatter,
• Fabian Fischer,
• Jannik C. Meyer,
• Dmitry K. Polyushkin and
• Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

• films by magnetron sputtering. MoS2 films with thicknesses from ≈10 to ≈1000 nm were deposited on SiO2/Si and reticulated vitreous carbon (RVC) substrates. Samples deposited at room temperature (RT) and at 400 °C were compared. The deposited MoS2 was characterized by macro- and microscopic X-ray

Graphene functionalised by laser-ablated V₂O₅ for a highly sensitive NH₃ sensor

• Margus Kodu,
• Artjom Berholts,
• Tauno Kahro,
• Mati Kook,
• Peeter Ritslaid,
• Helina Seemen,
• Tea Avarmaa,
• Harry Alles and
• Raivo Jaaniso

Beilstein J. Nanotechnol. 2017, 8, 571–578, doi:10.3762/bjnano.8.61

• foil was dissolved in ammonium persulfate solution overnight. The floating PMMA/graphene film was rinsed with deionized water and transferred onto the Si/SiO2 substrate (see Figure 6) equipped with Pt electrodes (60 nm thick) that were deposited through a shadow mask by magnetron sputtering. The gap

Anodization-based process for the fabrication of all niobium nitride Josephson junction structures

• Massimiliano Lucci,
• Ivano Ottaviani,
• Matteo Cirillo,
• Fabio De Matteis,
• Roberto Francini,
• Vittorio Merlo and
• Ivan Davoli

Beilstein J. Nanotechnol. 2017, 8, 539–546, doi:10.3762/bjnano.8.58

• Industriale, Università di Roma “Tor Vergata”, Via del Politecnico, 00133 Roma, Italy 10.3762/bjnano.8.58 Abstract We studied the growth and oxidation of niobium nitride (NbN) films that we used to fabricate superconductive tunnel junctions. The thin films were deposited by dc reactive magnetron sputtering

Thin SnO_x films for surface plasmon resonance enhanced ellipsometric gas sensing (SPREE)

• Daniel Fischer,
• Andreas Hertwig,
• Uwe Beck,
• Volkmar Lohse,
• Detlef Negendank,
• Martin Kormunda and
• Norbert Esser

Beilstein J. Nanotechnol. 2017, 8, 522–529, doi:10.3762/bjnano.8.56

• the problems of cross sensitivity of the MOS concept. Results: Undoped tin oxide (SnOx) and iron doped tin oxide (Fe:SnOx) thin add-on films were prepared by magnetron sputtering on the top of the actual surface plasmon resonance (SPR) sensing gold layer. The films were tested for their sensitivity to

• of 7 mm (Edmund Optics). The prisms were coated on the hypotenuse face with a 45 nm gold layer by using the electron beam evaporation technique (CS 730 ECS, von Ardenne Anlagentechnik GmbH). The additional undoped SnOx add-on layer was then added by using radio frequency (RF) magnetron sputtering (CS

• 730 ECS, von Ardenne Anlagentechnik GmbH) with 13.56 MHz frequency and 200 W power. Here, a commercially available pure SnO2 target (99.9%) obtained from FHR GmbH was used. The target has a diameter of 200 mm and a thickness of 6 mm. For the Fe-doped samples, a home-built RF magnetron sputtering

Study of the surface properties of ZnO nanocolumns used for thin-film solar cells

• Neda Neykova,
• Jiri Stuchlik,
• Karel Hruska,
• Ales Poruba,
• Zdenek Remes and
• Ognen Pop-Georgievski

Beilstein J. Nanotechnol. 2017, 8, 446–451, doi:10.3762/bjnano.8.48

• were prepared before by DC reactive magnetron sputtering. The optical absorption of the pristine ZnO layers as well as that of the substrates bearing the dense ZnO NCs was investigated by photothermal deflection spectroscopy (PDS) [16][17]. Furthermore, we investigated the changes in the PDS spectrum

• nanocrystalline Si. Experimental The growth of densely packed ZnO nanocolumns was performed on fused silica (Suprasil®) substrates that were covered with an undoped thin seed layer of ZnO by DC reactive magnetron sputtering. The parameters of magnetron sputtering were as follows: processing temperature of 400 °C

Template-controlled piezoactivity of ZnO thin films grown via a bioinspired approach

• Nina J. Blumenstein,
• Fabian Streb,
• Stefan Walheim,
• Thomas Schimmel,
• Zaklina Burghard and
• Joachim Bill

Beilstein J. Nanotechnol. 2017, 8, 296–303, doi:10.3762/bjnano.8.32

• high mechanical deformation [13]. Growth of such oriented films was achieved via technically sophisticated methods under harsh reaction conditions [14][15][16][17]. For example radio-frequency magnetron sputtering [14][17], pulsed laser deposition [16] or sol–gel methods followed by annealing [15] were

• the films due to their (002) texture. This also reflects in the value obtained for deff of 3.2 pm V−1 (d33 = 6.4 pm V−1). This value is in the range or higher than the one of other oriented, ZnO thin films prepared by RF magnetron sputtering (2–13 pm V−1) [14] or sol–gel process (5 pm V−1) [15]. Since

• pm V−1 to 6.4 pm V−1. This leads to responses comparable to ZnO structures till now only obtained by RF magnetron sputtering [14] or after high temperature treatment (e.g., at 500 °C) [15]. Experimental Template preparation Boron-doped Si (100) wafers were cleaned first in Milli-Q water and then in

Optical and photocatalytic properties of TiO₂ nanoplumes

• Viviana Scuderi,
• Massimo Zimbone,
• Maria Miritello,
• Giuseppe Nicotra,
• Giuliana Impellizzeri and
• Vittorio Privitera

Beilstein J. Nanotechnol. 2017, 8, 190–195, doi:10.3762/bjnano.8.20

• sputtered on quartz substrates by ultra-high vacuum magnetron sputtering from a Ti target of 99.99% purity. The Ti samples (1 cm × 1 cm in size) were put into 3 mL H2O2 (30%) solution at 60 °C for different etching times. Afterwards, the samples were rinsed with deionized water and dried in air. SEM

Fundamental properties of high-quality carbon nanofoam: from low to high density

• Natalie Frese,
• Shelby Taylor Mitchell,
• Christof Neumann,
• Amanda Bowers,
• Armin Gölzhäuser and
• Klaus Sattler

Beilstein J. Nanotechnol. 2016, 7, 2065–2073, doi:10.3762/bjnano.7.197

• for carbon films prepared by magnetron sputtering [53]. A correlation between the 1180 cm−1 peak and the sp3 content in these films was found [53]. At approximately this wavenumber, we see a small feature in the spectrum of Figure 2b. This indicates that a small diamond-like contribution is present in

Ferromagnetic behaviour of ZnO: the role of grain boundaries

• Boris B. Straumal,
• Svetlana G. Protasova,
• Andrei A. Mazilkin,
• Eberhard Goering,
• Gisela Schütz,
• Petr B. Straumal and
• Brigitte Baretzky

Beilstein J. Nanotechnol. 2016, 7, 1936–1947, doi:10.3762/bjnano.7.185

• deposition (PLD), or magnetron sputtering [5][6][7][8][9]. However, the first disappointments also appeared immediately. Namely, single crystals, ceramics sintered from coarse-grained powders and single-crystalline films deposited by molecular beam epitaxy (MBE) were never ferromagnetic. Other synthesis

Nanostructured germanium deposited on heated substrates with enhanced photoelectric properties

• Ionel Stavarache,
• Valentin Adrian Maraloiu,
• Petronela Prepelita and
• Gheorghe Iordache

Beilstein J. Nanotechnol. 2016, 7, 1492–1500, doi:10.3762/bjnano.7.142

• ], implantation [26], RF magnetron sputtering [27]. However, for most of these approaches, thermal treatments were necessary after the deposition process in order to obtain high-quality nanostructures based on crystalline Ge [28]. The most important parameter to be finely tuned is the substrate temperature during

• of Ge-nps embedded in SiO2 thin film are summarized. The influence of the temperature on the photodetector test structure, fabricated on substrates at 300, 400 and 500 °C is also described. In Figure 1, the diffractograms recorded of thin films deposited by RF magnetron sputtering on substrates at

• thin films during deposition at temperatures lower than those necessary for nanostructuring Ge-nps by thermal annealing after deposition. To optimize the substrate temperature, Al/n-Si/Ge:SiO2/ITO photodetector test structures have been fabricated by magnetron sputtering at low temperatures of 300, 400

A composite structure based on reduced graphene oxide and metal oxide nanomaterials for chemical sensors

• Vardan Galstyan,
• Elisabetta Comini,
• Iskandar Kholmanov,
• Andrea Ponzoni,
• Veronica Sberveglieri,
• Nicola Poli,
• Guido Faglia and
• Giorgio Sberveglieri

Beilstein J. Nanotechnol. 2016, 7, 1421–1427, doi:10.3762/bjnano.7.133

• ZnO nanostructures is similar to that described in our previous work [24]. Thin films of metallic Zn with a thickness of 600 nm were deposited on 2 mm square alumina substrates by means of radio frequency (RF) magnetron sputtering. Thin deposited films of Zn were anodized in 2 M oxalic acid dihydrate

Dealloying of gold–copper alloy nanowires: From hillocks to ring-shaped nanopores

• Adrien Chauvin,
• Cyril Delacôte,
• Mohammed Boujtita,
• Benoit Angleraud,
• Junjun Ding,
• Chang-Hwan Choi,
• Pierre-Yves Tessier and
• Abdel-Aziz El Mel

Beilstein J. Nanotechnol. 2016, 7, 1361–1367, doi:10.3762/bjnano.7.127

• them into residues (Figure 1a(3)). The existence of photoresist residues is related to the non-homogenous etching of the polymers forming the photoresist. In the last stage, the metal is deposited by magnetron sputtering over the prepared substrate to form an array of nanowires containing hillocks

• photoresist using oxygen plasma leaving behind residues of photoresist and (4) deposition of metal over the patterned substrate by magnetron sputtering allowing to grow nanowires with a nodular morphology. SEM micrograph showing the typical morphology of metal nanowires: (b) as grown and (c) after

Fast diffusion of silver in TiO₂ nanotube arrays

• Wanggang Zhang,
• Yiming Liu,
• Diaoyu Zhou,
• Hui Wang,
• Wei Liang and
• Fuqian Yang

Beilstein J. Nanotechnol. 2016, 7, 1129–1140, doi:10.3762/bjnano.7.105

• Education, Taiyuan Shanxi 030024, China Department of Chemical and Materials Engineering, University of Kentucky, Lexington, KY 40506, USA 10.3762/bjnano.7.105 Abstract Using magnetron sputtering and heat treatment, Ag@TiO2 nanotubes are prepared. The effects of heat-treatment temperature and heating time

• the outmost surface of TiO2 nanotubes. Probably there are hardly any Ag nanocrystals formed inside the TiO2 nanotubes through the migration of Ag. Keywords: activation energy; fast diffusion; magnetron sputtering; silver; TiO2 nanotube; Introduction Titanium dioxide (TiO2) has gained great attention

• aqueous solutions. In addition, the technique of magnetron sputtering has been used to deposit Ag nanostructures on the surface of TiO2 nanotube arrays. It is worth mentioning that Enachi et al. [25] heat-treated the TiO2 nanotube arrays after the deposition of Ag film of 50 nm on the top surface of TiO2

Customized MFM probes with high lateral resolution

• Óscar Iglesias-Freire,
• Miriam Jaafar,
• Eider Berganza and
• Agustina Asenjo

Beilstein J. Nanotechnol. 2016, 7, 1068–1074, doi:10.3762/bjnano.7.100

• thin film with no buffer layer, using a custom-built AC magnetron sputtering system with a substrate holder designed on purpose to favour the growth of the magnetic layer on one side of the pyramidal tip. The deposition parameters are carefully chosen to yield highly flat surfaces with small grain size

Thickness dependence of the triplet spin-valve effect in superconductor–ferromagnet–ferromagnet heterostructures

• Daniel Lenk,
• Vladimir I. Zdravkov,
• Jan-Michael Kehrle,
• Günter Obermeier,
• Aladin Ullrich,
• Roman Morari,
• Hans-Albrecht Krug von Nidda,
• Claus Müller,
• Mikhail Yu. Kupriyanov,
• Anatolie S. Sidorenko,
• Siegfried Horn,
• Rafael G. Deminov,
• Lenar R. Tagirov and
• Reinhard Tidecks

Beilstein J. Nanotechnol. 2016, 7, 957–969, doi:10.3762/bjnano.7.88

• sample series investigated in this work was prepared by magnetron sputtering at room temperature on a commercial silicon substrate with a {111} surface. While for the sputtering of the niobium layers, the target was moved over the substrate to obtain a smooth layer of nearly constant thickness, the

• Cu41Ni59 layer was deposited on the substrate positioned off-axis below the sputtering target to utilize the natural sputtering gradient of magnetron sputtering to obtain a wedge of varying thickness. Subsequently, the Co layer was deposited on the substrate without moving the target. Finally, the CoOx

In situ observation of deformation processes in nanocrystalline face-centered cubic metals

• Aaron Kobler,
• Christian Brandl,
• Horst Hahn and
• Christian Kübel

Beilstein J. Nanotechnol. 2016, 7, 572–580, doi:10.3762/bjnano.7.50

• by radio frequency (RF) magnetron sputtering using 2" diameter planar targets with 99.95% purity. TEM grids (holycarbon R2/1 + 2 nm C, Quantifoil) were used as a substrate. The nominal thickness between the holes is 22 nm. Pd was sputtered in 5 cycles of 50.38 s at 60 W constant sputtering power

Determination of the compositions of the DIGM zone in nanocrystalline Ag/Au and Ag/Pd thin films by secondary neutral mass spectrometry

• Gábor Y. Molnár,
• Shenouda S. Shenouda,
• Gábor L. Katona,
• Gábor A. Langer and
• Dezső L. Beke

Beilstein J. Nanotechnol. 2016, 7, 474–483, doi:10.3762/bjnano.7.41

• )/substrate, as well as Pd(30 nm)/Ag(30 nm)/substrate thin film systems were produced by magnetron sputtering onto single crystalline Si substrates with native SiO2 layers at room temperature. The base pressure in the sputtering chamber was below 2 × 10−5 Pa. During the deposition, the Ar (99.999%) pressure

Chemical bath deposition of textured and compact zinc oxide thin films on vinyl-terminated polystyrene brushes

• Nina J. Blumenstein,
• Caroline G. Hofmeister,
• Peter Lindemann,
• Cheng Huang,
• Johannes Baier,
• Andreas Leineweber,
• Stefan Walheim,
• Christof Wöll,
• Thomas Schimmel and
• Joachim Bill

Beilstein J. Nanotechnol. 2016, 7, 102–110, doi:10.3762/bjnano.7.12

• emitting diodes, as surface acoustic wave generators or for field effect transistors [1][2][3][4][5][6][7][8]. Up to now, the fabrication of nanosized devices requires complex techniques like magnetron sputtering or pulsed laser deposition. Therefore, it is of high interest to develop easy-to-handle

Plasma fluorination of vertically aligned carbon nanotubes: functionalization and thermal stability

• Claudia Struzzi,
• Mattia Scardamaglia,
• Axel Hemberg,
• Luca Petaccia,
• Jean-François Colomer,
• Rony Snyders and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2015, 6, 2263–2271, doi:10.3762/bjnano.6.232

• performed using plasma treatment in a magnetron sputtering chamber with fluorine diluted in an argon atmosphere with an Ar/F2 ratio of 95:5. The effect of heavily diluted fluorine in the precursor gas mixture is investigated by evaluating the modifications in the nanotube structure and the electronic

• a fine selection of grafted species and tuning of electronic properties. Experimental vCNTs were produced by catalytic chemical vapor deposition (CCVD) at atmospheric pressure. The catalysts were prepared by magnetron sputtering; first, a 30 nm Al2O3 buffer layer was deposited on Si wafers with

• additional flow of hydrogen (120 sccm) was introduced. After 5 min, Ar was replaced by ethylene (C2H4) flow (50 sccm) for 20 min. After the growth, the oven atmosphere was again filled with Ar. Fluorination was performed by exposing the vCNTs samples to fluorine chemical species generated in a magnetron

Effect of SiN_x diffusion barrier thickness on the structural properties and photocatalytic activity of TiO₂ films obtained by sol–gel dip coating and reactive magnetron sputtering

• Mohamed Nawfal Ghazzal,
• Eric Aubry,
• Nouari Chaoui and
• Didier Robert

Beilstein J. Nanotechnol. 2015, 6, 2039–2045, doi:10.3762/bjnano.6.207

• much thicker SiNx diffusion barrier [6]. This suggests that the crystallite size of the TiO2 films obtained by magnetron sputtering does not depend on the thickness of the SiNx. Furthermore, no difference has been observed between the crystallite size of the MS-TiO2 films grown on SLG or on SiNx/SLG

• from the reactive magnetron sputtering process show a preferential (004) orientation plane. Regardless of the process used to synthesize the TiO2 films, the intercalating SiNx diffusion barrier between the photocatalyst and the soda lime glass showed a beneficial effect on the photocatalytic efficiency

Magnetic properties of iron cluster/chromium matrix nanocomposites

• Arne Fischer,
• Robert Kruk,
• Di Wang and
• Horst Hahn

Beilstein J. Nanotechnol. 2015, 6, 1158–1163, doi:10.3762/bjnano.6.117

• newly developed UHV cluster ion beam deposition apparatus, which is described elsewhere [2]. Fe clusters are produced in a Haberland-type magnetron sputtering/gas aggregation cluster source. Extracted anions are accelerated by electrostatic lenses and mass-separated in a 90° sector magnet. The mass

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• authors acknowledge the support of the Russian Ministry of Education and Science under the state task 559 and Far Eastern Federal University. A.S. thanks Dr Maksim Stebliy for the magnetron sputtering of the magnetic film over PMMA patterns.

Characterization of nanostructured ZnO thin films deposited through vacuum evaporation

• Jose Alberto Alvarado,
• Arturo Maldonado,
• Héctor Juarez,
• Mauricio Pacio and
• Rene Perez

Beilstein J. Nanotechnol. 2015, 6, 971–975, doi:10.3762/bjnano.6.100

• ], and RF magnetron sputtering [10]. However, the vacuum evaporation technique is used to deposit worm-form nanostructured thin films. This technique is different from those reported in the literature such as thermal evaporation assisted by inert gases [11], or e-beam evaporation [12]. So this technique

Nanostructuring of GeTiO amorphous films by pulsed laser irradiation

• Valentin S. Teodorescu,
• Cornel Ghica,
• Adrian V. Maraloiu,
• Mihai Vlaicu,
• Andrei Kuncser,
• Magdalena L. Ciurea,
• Ionel Stavarache,
• Ana M. Lepadatu,
• Nicu D. Scarisoreanu,
• Andreea Andrei,
• Valentin Ion and
• Maria Dinescu

Beilstein J. Nanotechnol. 2015, 6, 893–900, doi:10.3762/bjnano.6.92

• obtained by RF magnetron sputtering with 50:50 initial atomic ratio of Ge:TiO2. Laser irradiation was performed by using the fourth harmonic (266 nm) of a Nd:YAG laser. The laser-induced nanostructuring results in two effects, the first one is the appearance of a wave-like topography at the film surface

• GeTiO matrix. Experimental Amorphous GeTiO films with a thickness of 330 nm were deposited by RF magnetron sputtering on Si(100) wafer substrates using Ge:TiO2 with 50:50 atomic ratio. Details on the film deposition are found in [23]. These GeTiO amorphous films were irradiated with laser fluences from

• results from the RF magnetron sputtering films preparation. This shows that about 1/3 of the Ge content is lost from the surface layer affected by the laser radiation, and 2/3 of it can be segregated in amorphous Ge nanoparticles. Discussion The nanostructure formed at the GeTiO film surface by pulsed

Manipulation of magnetic vortex parameters in disk-on-disk nanostructures with various geometry

• Maxim E. Stebliy,
• Alexander G. Kolesnikov,
• Alexey V. Ognev,
• Alexander S. Samardak and
• Ludmila A. Chebotkevich

Beilstein J. Nanotechnol. 2015, 6, 697–703, doi:10.3762/bjnano.6.70

• diameters of 600 and 200 nm, respectively, were separated by a 3 nm thick Cu interlayer. The nanostructures were fabricated on naturally oxidized Si(111) substrates by means of electron-beam lithography, magnetron sputtering and standard lift-off process. Geometry and surface roughness were checked with