High-throughput micro-nanostructuring by microdroplet inkjet printing

• Hendrikje R. Neumann and
• Christine Selhuber-Unkel

Beilstein J. Nanotechnol. 2018, 9, 2372–2380, doi:10.3762/bjnano.9.222

• surfaces and the generated patterns were found to depend on the material type and surface topography. Based on the presented strategy, we were able to achieve patterning times of a few seconds and produce quasi-hexagonal micro-nanopatterns of gold nanoparticles on smooth surfaces. Hence, this method is a

• : biofunctional surfaces; inkjet printing; microstructures; nanolithography; nanoparticles; Introduction Many applications require well-organized micro- and nanoscale patterning of metallic nanoparticles. Examples include high-performance optics [1], multimodal waveguides [2], biosensors [3] and biomaterials [4

• clean-room equipment. In contrast to such methods, inkjet printing has recently become a powerful and affordable tool for the quick, easy-to-handle and user-defined surface patterning in various orders of magnitude and with a broad spectrum of different inks, including conductive gels, dispersions, but

Two-dimensional photonic crystals increasing vertical light emission from Si nanocrystal-rich thin layers

• Lukáš Ondič,
• Marian Varga,
• Ivan Pelant,
• Alexander Kromka,
• Karel Hruška and
• Robert G. Elliman

Beilstein J. Nanotechnol. 2018, 9, 2287–2296, doi:10.3762/bjnano.9.213

• defined direction through Bragg diffraction. Optical modes that instead of being guided in the layer can radiate into air, are referred to as leaky modes [8][9]. It was shown that by using 2D periodic patterning of group-III-nitride-based LEDs [10], similar light-extraction efficiencies as those of

Localized photodeposition of catalysts using nanophotonic resonances in silicon photocathodes

• Evgenia Kontoleta,
• Sven H. C. Askes,
• Lai-Hung Lai and
• Erik C. Garnett

Beilstein J. Nanotechnol. 2018, 9, 2097–2105, doi:10.3762/bjnano.9.198

• with higher catalytic activity, leading to preferential deposition, or traps that capture carriers preventing deposition. Conclusion We show that the optical modes of silicon nanostructures can be used for lithography-free patterning of catalytic nanoparticles. Tuning of the photo-electrochemical

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• (SEM), focused ion beam (FIB) dual-beam instrument, installed with a lithography attachment (Please see the Experimental section for details). Several exposure, milling or patterning strategies can be adopted in an IBL process. A few such processing procedures relevant to present work are illustrated

• )3CH3C5H4Pt, as the metal-organic precursor gas. Structure of the FZP The patterning and ion beam parameters tabulated in Table 1 resulted in a linear dosage of 0.8 pC/µm, and the successful fabrication of the FZP with 50 µm diameter, 110 nm nominal thickness and 30 nm Δr in just 8 min and 23 s. The dosage is

• given in linear terms because of the single pixel circular elements used for patterning. The overall FZP exhibited a high quality as shown in Figure 2. The FZP (internally designated as M-IV), is shown side by side with the reference aperture for diffraction efficiency (DE) measurements in Figure 2a

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• method, which enables the parallel processing of large areas. A cost-effective photochemical method is block copolymer micelle lithography (BCML), which can be used to create templates on the surfaces of substrates [10][11][12]. To use the templates for further patterning of the substrate with nanodots

Defect formation in multiwalled carbon nanotubes under low-energy He and Ne ion irradiation

• Santhana Eswara,
• Jean-Nicolas Audinot,
• Brahime El Adib,
• Maël Guennou,
• Tom Wirtz and
• Patrick Philipp

Beilstein J. Nanotechnol. 2018, 9, 1951–1963, doi:10.3762/bjnano.9.186

• total irradiation fluences of the MWCNT samples ranged from 1014 to 1018 ions/cm2. Beam position and primary ion fluence were controlled by the Fibics Nanopatterning and Visualisation Engine (NPVE) (http://www.fibics.com/). The FIBICS nano-patterning software allows for high-performance milling and ion

Synthesis of hafnium nanoparticles and hafnium nanoparticle films by gas condensation and energetic deposition

• Irini Michelakaki,
• Nikos Boukos,
• Dimitrios A. Dragatogiannis,
• Spyros Stathopoulos,
• Costas A. Charitidis and
• Dimitris Tsoukalas

Beilstein J. Nanotechnol. 2018, 9, 1868–1880, doi:10.3762/bjnano.9.179

• alternative method to tune the porosity of the NTFs. 3D NTF patterning Cluster beam deposition combined with patterning for fabricating 3D objects has been successfully performed by other groups with techniques such as supersonic cluster beam deposition combined with stencil masks [65][66]. In our case we

• , several scenarios, such as derformation, fragmentation and implantation of the NPs, are possible [40][43]. In this study we observed partial and complete deformation of the NPs. 3D NTF patterning In order to fabricate 3D NTF patterns, a spin-coated PMMA film on a Si substrate was initially patterned via e

Preparation of micro/nanopatterned gelatins crosslinked with genipin for biocompatible dental implants

• Reika Makita,
• Tsukasa Akasaka,
• Seiichi Tamagawa,
• Yasuhiro Yoshida,
• Saori Miyata,
• Hirofumi Miyaji and
• Tsutomu Sugaya

Beilstein J. Nanotechnol. 2018, 9, 1735–1754, doi:10.3762/bjnano.9.165

• surfaces using genipin crosslinking, with the aim of understanding the use of patterning in surface modification of dental implants. Results: Grooves, holes, and pillars, with widths or diameters of 2 µm, 1 µm, or 500 nm were fabricated using a combination of molding and genipin crosslinking of gelatin

• showed that the number of surface-attached cells increased with increasing patterning of the gelatin surface. Unlike the cell attachment assay, the results of a cell proliferation assay showed that Saos-2 cells prefer grooves with diameters of approximately 2 µm and 1 µm and pillars with diameters of 1

• . Thus, gelatin surfaces patterned using genipin crosslinking are now an available option for biocompatible material patterning. Keywords: cell attachment; cell proliferation; dental implants; gelatin; genipin; nanopatterning; Introduction Topography on the micro- and nanoscale is an important property

Magnetic properties of Fe₃O₄ antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

• Juan L. Palma,
• Alejandro Pereira,
• Raquel Álvaro,
• José Miguel García-Martín and
• Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

• [23] and colloidal [24] lithography, porous anodic alumina [25][26], block copolymer templates [27], nanochannel glass [28] and focused ion beam (FIB) patterning [29][30]. Recently, we have proposed the fabrication of disordered antidot arrays through the thermal reduction of thin films synthesized by

• , one of the samples was measured every 15°. Results and Discussion Figure 2a shows the SEM image of a representative Fe2O3 antidot array patterned on the film with 27 nm thickness. After patterning the antidot array has the shape of a circle of 30 μm diameter, which is surrounded by a circular trench

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• innovative fabrication technique employing spherical, nanoscale crystals as a lithographic mask for the low cost realization of nanoscale patterning. The features of the resulting nanostructures are related to the particle size, deposition conditions and interactions involved. In this work, we studied the

• control the number of particles on the surface and the interparticle distance, namely changing the salt concentration and absorption time in the particle solution. These approaches enabled the realization of large area (≈cm2) patterning of nanoscale holes (nanoholes) and nanoscale disks (nanodisks) of

• different sizes and materials. Keywords: colloidal lithography; electrostatic interactions; large-area nanostructure patterning; localized surface plasmon resonance; spherical nanoparticles; Introduction In recent years, ordered nanostructured arrays have attracted great interest because of their

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• patterning possibilities of varying point distances and dwell times, three-dimensional shapes with high lateral resolution can be fabricated [4][5][6]. There is ongoing research for new precursors to improve the quality of the deposits and expand the choice of materials [2][7]. To deposit metallic structures

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

• Phillip C. Chambers and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112

• ]. Multiporphyrin assemblies have been proposed for molecular photonic devices due to the versatile physical properties [24]. Particle lithography is a patterning method that uses a surface mask of colloidal spheres to direct the deposition of molecules or other nanomaterials on surfaces. Particle lithography

Towards the third dimension in direct electron beam writing of silver

• Katja Höflich,
• Jakub Mateusz Jurczyk,
• Katarzyna Madajska,
• Maximilian Götz,
• Luisa Berger,
• Carlos Guerra-Nuñez,
• Caspar Haverkamp,
• Iwona Szymanska and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

• finally resulted in a gas flux of around 30 × 1015 molecules per second and cm2 roughly doubling the typical gas flux of AgO2Me2Bu [9]. Due to the low vapor pressure of the compounds, the growth pressure equaled the base pressure being typically around 3 × 10−5 hPa. A Xenos Patterning engine was used to

• define the patterning parameters. Square patterns of 10 × 10 µm2 with a pitch of 3 nm and 100 repeats were written using a spiral beam path and 500 pA beam current. Spot arrays with 5 µm distance between the respective spots were exposed with increasing dwell times from row to row and 100,000 repeats

• of 500 pA with varying dwell times were carried out. The dwell time was increased from 100 ns as the minimum value that could be realized with the patterning engine up to 5 µs to cover the typical time scale for precursor depletion. At the end of each line, the beam dwells for approximately 5 ms to

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• lift-off lithography; patterning; self-assembled monolayer; Introduction Patterning on the micro- to nanoscale plays a key role in modern scientific and engineering research fields. Particularly, the creation of bioactive surfaces with well-defined geometries has drawn lots of attention due to its

• sizes created by CLL. The scale bars are 50 μm. A representative photo (A) and fluorescence images (B–D) of the large-area bioactive surface fabricated by CLL. (A) Photo images showing a wafer-scale patterning achieved by CLL. (B–D) Fluorescence images obtained from different sampling spots indicated in

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• beam lithography patterning and etching of the SiC layer deposited over the Si/SiO2 substrate and following release of SiC nanostructures by removing the SiO2 sacrificial layer. The as-fabricated 400–500 nm thick poly-SiC beam-based 3T switches showed stable operation during more than 106 cycles at

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• have a measured full width at half maximum varying from 180 to 400 nm, according to the beam parameters (Table S1, Supporting Information File 1). The electron beam was controlled by a Xenos patterning engine which controls the shape, step size, dwell time and number of passes of the deposit. The line

• pC/µm, respectively. The spot deposition was achieved by stationary spot exposure for 10 min, while lineXENOS was written with the patterning software of our system. For both structures a central area is visually well distinguishable from the surrounding halo, as shown in detail in Figure 1c. The

Study of the vertically aligned in-plane switching liquid crystal mode in microscale periodic electric fields

• Artur R. Geivandov,
• Mikhail I. Barnik,
• Irina V. Kasyanova and
• Serguei P. Palto

Beilstein J. Nanotechnol. 2018, 9, 11–19, doi:10.3762/bjnano.9.2

• speeding up the VA-IPS mode. Recent advances in photolithography allow for the use of sub-micrometer spatial resolution in electrode patterning. The decrease of the electrode size down to the micrometer and sub-micrometer scale opens up new possibilities for the application of the VA-IPS LC mode. When the

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• supported Au–thiolate layers. The patterning of these layers laterally encodes their functionality, as demonstrated by a fluorescence-based approach that relies on dye-labeled complementary DNA hybridization. Supported thin Au films can be patterned via features on PDMS stamps (controlled contact), using

• patterned Au substrates prior to lift-off (e.g., selective wet etching), or by patterning alkanethiols on Au substrates to be reactive in selected regions but not others (controlled reactivity). In all cases, the regions containing Au–alkanethiolate layers have a sub-nanometer apparent height, which was

• found to be consistent with molecular dynamics simulations that predicted the removal of no more than 1.5 Au atoms per thiol, thus presenting a monolayer-like structure. Keywords: chemical patterning; hybrid material; monolayer; soft lithography; two-dimensional material; Introduction Chemical lift

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• materials. Moreover, bearing in mind that this deposition technique allows for extremely precise patterning of 2D and 3D structures on the nano- and microscale, these findings may facilitate a widespread usage of FEBID in a range of applications. Oxygen-plasma cleaning of FEBID Au nanostructures As was

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• electron beam irradiation, with non-volatile product species being incorporated into the growing deposit. The size and shape of the nanostructure are controlled by manipulation of the electron beam (focusing ability and patterning capabilities), which allows an almost unlimited array of three-dimensional

• pA in a serpentine patterning sequence. A point pitch of 26 nm and a dwell time of 250 µs were used to ensure a flat-top deposit shape [49]. Nine different deposition heights, ranging from 14 to 73 nm were achieved by a variation of loops (1–9 loops), resulting in a variation of the total exposure

• MeCpPtMe3 contain platinum atoms embedded in a carbonaceous matrix [7][44], which we will refer to hereafter as a PtCx structure. To produce PtCx FEBID deposits with well-defined shapes suitable for AFM analysis, a focused electron beam in combination with patterning was used to create a range of different

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• inorganic oxide film by ALD and demonstrated its usefulness in soft lithography patterning of polymer films. DNA nanotubes and origami triangles with Al2O3 films of ca. 2 nm, ca. 5 nm or ca. 20 nm thickness have been tested as the master templates to imprint their nanoscale features to PLLA films. As the

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

• Alexandra M. Patron,
• Timothy S. Hooker,
• Daniel F. Santavicca,
• Corey P. Causey and
• Thomas J. Mullen

Beilstein J. Nanotechnol. 2017, 8, 2339–2344, doi:10.3762/bjnano.8.233

• -ruler process is a notable example of this hybrid approach as it couples conventional patterning methods with molecular self-assembly [14]. The molecular-ruler process can be employed to form nanogaps between registered metal surface features that have been generated using conventional lithographic

Tailoring the nanoscale morphology of HKUST-1 thin films via codeposition and seeded growth

• Landon J. Brower,
• Lauren K. Gentry,
• Amanda L. Napier and
• Mary E. Anderson

Beilstein J. Nanotechnol. 2017, 8, 2307–2314, doi:10.3762/bjnano.8.230

• formation [25][26]. Processing conditions have been optimized for some specific MOF systems to utilize conventional lithography for patterning of the film [8][27][28]. While these methods offer means to control the spatial location of the MOF for integration, they typically do not present processing

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

• Laura Evangelio,
• Federico Gramazio,
• Matteo Lorenzoni,
• Michaela Gorgoi,
• Francisco Miguel Espinosa,
• Ricardo García,
• Francesc Pérez-Murano and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

• complementary alternative to traditional patterning methods providing sub-10 nm resolution, low-cost processing and high throughput [1][2][3]. Moreover, it is one of the most promising techniques for the development of the next generation of nanoelectronic devices and circuits, as it is compatible with current

Application of visible-light photosensitization to form alkyl-radical-derived thin films on gold

• Rashanique D. Quarels,
• Xianglin Zhai,
• Neepa Kuruppu,
• Jenny K. Hedlund,
• Ashley A. Ellsworth,
• Amy V. Walker,
• Jayne C. Garno and
• Justin R. Ragains

Beilstein J. Nanotechnol. 2017, 8, 1863–1877, doi:10.3762/bjnano.8.187

• conditions (i.e., with benzyl nicotinamide). We also combined thin film deposition with particle lithography [10][17][45][46][47][48][49]. This approach to surface patterning uses photomasks consisting of silicon dioxide mesospheres (d = 500 nm) on surfaces to protect small, discrete regions of the surface