Dumbbell gold nanoparticle dimer antennas with advanced optical properties

• Janning F. Herrmann and
• Christiane Höppener

Beilstein J. Nanotechnol. 2018, 9, 2188–2197, doi:10.3762/bjnano.9.205

• approaches, which rely on, e.g., electron-beam lithography, ion milling and other techniques, are widely used, often tailoring gap structures explores common limitations in regard to their obtainable resolution and non-invasiveness. In contrast, common bottom-up approaches often rely on the specific

Localized photodeposition of catalysts using nanophotonic resonances in silicon photocathodes

• Evgenia Kontoleta,
• Sven H. C. Askes,
• Lai-Hung Lai and
• Erik C. Garnett

Beilstein J. Nanotechnol. 2018, 9, 2097–2105, doi:10.3762/bjnano.9.198

• promising for the design of lithography-free and efficient hierarchical nanostructures for the generation of solar fuels. Keywords: catalysts; nanomaterials; nanophotonics; photodeposition; solar fuels; Introduction The relentless rise of CO2 levels in the atmosphere as well as the growth of the world

• excitation wavelength. The extensive literature on such nanophotonic tuning makes this an exciting approach for lithography-free nanoscale control over catalyst positioning [34][35][36][37][38]. We have chosen vertical silicon nanowires as a model nanophotonic system because of their ease of fabrication

• with higher catalytic activity, leading to preferential deposition, or traps that capture carriers preventing deposition. Conclusion We show that the optical modes of silicon nanostructures can be used for lithography-free patterning of catalytic nanoparticles. Tuning of the photo-electrochemical

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• -resolution imaging and lithography at short wavelengths. Their fabrication requires nano-machining capabilities with exceptional precision and strict tolerances such as those enabled by modern lithography methods. In particular, ion beam lithography (IBL) is a noteworthy method thanks to its robust direct

• that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics. Keywords: extreme ultraviolet (EUV

• ) radiation; focused ion beam (FIB); Fresnel zone plate; ion beam lithography (IBL); nanopatterning; soft X-rays; Introduction Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

• Emre Gürdal,
• Simon Dickreuter,
• Fatima Noureddine,
• Pascal Bieschke,
• Dieter P. Kern and
• Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

• lithography; optical antenna; self-assembly; SERS; Introduction Over the last decades self-assembled layers of gold nanoparticles have taken an important role in emerging nanotechnologies. Noble metal nanoparticles show localized surface plasmon polariton resonances (LSPRs) in the visible and infrared

• enhanced Raman spectroscopy (SERS) [10]. Ordered arrays of such particles can be fabricated by different methods. Electron-beam lithography for example is a top-down method which provides good control, but is time consuming and costly. In contrast, the self-assembly of block-copolymers is a bottom-up

• method, which enables the parallel processing of large areas. A cost-effective photochemical method is block copolymer micelle lithography (BCML), which can be used to create templates on the surfaces of substrates [10][11][12]. To use the templates for further patterning of the substrate with nanodots

Electromigrated electrical optical antennas for transducing electrons and photons at the nanoscale

• Arindam Dasgupta,
• Mickaël Buret,
• Nicolas Cazier,
• Marie-Maxime Mennemanteuil,
• Reinaldo Chacon,
• Kamal Hammani,
• Jean-Claude Weeber,
• Juan Arocas,
• Laurent Markey,
• Gérard Colas des Francs,
• Alexander Uskov,
• Igor Smetanin and
• Alexandre Bouhelier

Beilstein J. Nanotechnol. 2018, 9, 1964–1976, doi:10.3762/bjnano.9.187

• connected optical antenna is a Au constriction formed between two fan-out electrodes laying on a glass cover slip. We use electron-beam lithography and standard physical vapor deposition to produce gold constrictions and the proximity electrodes. The thickness of the Au layer is typically 50 nm, and we use

• is obtained in a second step of fabrication by ultraviolet (UV) photolithography. An image of a typical sample, constituted of 24 constrictions and their associated macroscopic electrodes, is illustrated in Figure 1b. The red and blue regions are realized by electron-beam lithography and UV

• lithography, respectively. Each electrode is connected to a common ground (centered square) and can be individually addressed by a set of peripheral electrodes. To create a tunnel junction that will eventually form the active feedgap of an optical antenna, we perform an operator-controlled electromigration of

The inhibition effect of water on the purification of natural gas with nanoporous graphene membranes

• Krzysztof Nieszporek,
• Tomasz Pańczyk and
• Jolanta Nieszporek

Beilstein J. Nanotechnol. 2018, 9, 1906–1916, doi:10.3762/bjnano.9.182

• lithography [4] and surface-assisted aryl–aryl coupling reactions [5]. Girit et al. [6] observed experimentally the movement of individual atoms at the edge of a graphene hole. Coal, crude oil and natural gas are the very useful energy sources. Natural gas is commonly assumed to be an environmentally friendly

Synthesis of hafnium nanoparticles and hafnium nanoparticle films by gas condensation and energetic deposition

• Irini Michelakaki,
• Nikos Boukos,
• Dimitrios A. Dragatogiannis,
• Spyros Stathopoulos,
• Costas A. Charitidis and
• Dimitris Tsoukalas

Beilstein J. Nanotechnol. 2018, 9, 1868–1880, doi:10.3762/bjnano.9.179

• mechanical properties can be formed, without any additional treatment. It is shown that these films can be patterned on the substrate in sub-micrometer dimensions using conventional lithography while their porosity can be well controlled. The fabrication and experimental characterization of hafnium

• try to construct other geometries and we did not test this method at other substrate bias values. But these results demonstrate that the method of energetic NPs deposition on patterned surfaces via lithography seems to have the technical potential to construct mechanically stable 3D patterns composed

• , it was shown that NTFs can be patterned on the substrate in sub-micrometer dimensions using conventional lithography. We demonstrated the energetic deposition with Hf nanoparticles, but the technique can be applied to any charged metallic nanoparticles according to the required application. We

Tunable fractional Fourier transform implementation of electronic wave functions in atomically thin materials

• Daniela Dragoman

Beilstein J. Nanotechnol. 2018, 9, 1828–1833, doi:10.3762/bjnano.9.174

• geometries have been fabricated on flexible substrates for the purpose of acting as brain–computer interfaces [21], while single nanoscale nonplanar electrodes with complex topographies have been obtained using advanced stencil lithography [22]. Because γ > 0, the configuration illustrated in Figure 1a

Magnetic properties of Fe₃O₄ antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

• Juan L. Palma,
• Alejandro Pereira,
• Raquel Álvaro,
• José Miguel García-Martín and
• Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

• [23] and colloidal [24] lithography, porous anodic alumina [25][26], block copolymer templates [27], nanochannel glass [28] and focused ion beam (FIB) patterning [29][30]. Recently, we have proposed the fabrication of disordered antidot arrays through the thermal reduction of thin films synthesized by

Josephson effect in junctions of conventional and topological superconductors

• Alex Zazunov,
• Albert Iks,
• Miguel Alvarado,
• Alfredo Levy Yeyati and
• Reinhold Egger

Beilstein J. Nanotechnol. 2018, 9, 1659–1676, doi:10.3762/bjnano.9.158

• ][5][6][7][8][9][10][11][12], and they may also be designed in two-dimensional layouts by means of gate lithography techniques. Over the last few years, several experiments employing such platforms have provided mounting evidence for MBSs, e.g., from zero-bias conductance peaks in N–TS junctions

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• , Campus Ecotekne, Via Monteroni, Lecce, Italy National Institute of Gastroenterology “S. De Bellis” Research Hospital, via Turi 27, 70013, Castellana Grotte (Bari), Italy Institute for Microelectronics and Microsystems, IMM-CNR, Lecce, Italy 10.3762/bjnano.9.150 Abstract Colloidal lithography is an

• different sizes and materials. Keywords: colloidal lithography; electrostatic interactions; large-area nanostructure patterning; localized surface plasmon resonance; spherical nanoparticles; Introduction In recent years, ordered nanostructured arrays have attracted great interest because of their

• ; this is why a proper fabrication tool, able to guarantee good flexibility, is required to meet research goals. Typically, the fabrication of nanostructured systems involves techniques such as electron beam and focused ion beam lithography in order to realize arrays of nanoscale features with precise

Evaluation of replicas manufactured in a 3D-printed nanoimprint unit

• Manuel Caño-García,
• Morten A. Geday,
• Manuel Gil-Valverde,
• Xabier Quintana and
• José M. Otón

Beilstein J. Nanotechnol. 2018, 9, 1573–1581, doi:10.3762/bjnano.9.149

• Manuel Cano-Garcia Morten A. Geday Manuel Gil-Valverde Xabier Quintana Jose M. Oton CEMDATIC, ETSI Telecomunicación, Universidad Politécnica de Madrid, Av. Complutense 30, 28040-Madrid, Spain 10.3762/bjnano.9.149 Abstract Nanoimprint lithography has become a useful tool to prepare elements

• of a solvent were found to be superior for most nanoimprint applications. A large dispersion of the samples was found. Keywords: nanoimprint; oriented gradient; photoresist; polymer; replica; Introduction Although the basic principles behind nanoimprint lithography (NIL) have been known for many

Optical near-field mapping of plasmonic nanostructures prepared by nanosphere lithography

• Gitanjali Kolhatkar,
• Alexandre Merlen,
• Jiawei Zhang,
• Chahinez Dab,
• Gregory Q. Wallace,
• François Lagugné-Labarthet and
• Andreas Ruediger

Beilstein J. Nanotechnol. 2018, 9, 1536–1543, doi:10.3762/bjnano.9.144

• Department and Centre for Materials and Biomaterials, 1151 Richmond Street, London, ON, N6A5B7, Canada 10.3762/bjnano.9.144 Abstract We introduce a simple, fast, efficient and non-destructive method to study the optical near-field properties of plasmonic nanotriangles prepared by nanosphere lithography

• : apertureless scanning near-field optical microscopy; diffuse signal; nanosphere lithography; photomultiplier tube; plasmonic nanostructures; Introduction SNOM (scanning near-field optical microscopy) is an imaging technique based on an optical near-field probe for high spatial resolution [1][2]. A version of

• contribution, we use the Fourier transformation of the diffuse signal and filtering. This method is applied to plasmonic gold nanotriangles [19] inscribed on a glass substrate, that were prepared by nanosphere lithography [20][21][22]. Those nanostructures, that most commonly consist of arrays of metallic

Cathodoluminescence as a probe of the optical properties of resonant apertures in a metallic film

• Kalpana Singh,
• Evgeniy Panchenko,
• Babak Nasr,
• Amelia Liu,
• Lukas Wesemann,
• Timothy J. Davis and
• Ann Roberts

Beilstein J. Nanotechnol. 2018, 9, 1491–1500, doi:10.3762/bjnano.9.140

• lithography, the authors [58] of were able to efficiently investigate a range of hole separations, but were restricted to weakly resonant circular apertures and pairs of holes. Here we investigate the resonances of small groups of apertures in gold films on a glass substrate. Specifically, we study ensembles

Nanoporous silicon nitride-based membranes of controlled pore size, shape and areal density: Fabrication as well as electrophoretic and molecular filtering characterization

• Axel Seidenstücker,
• Stefan Beirle,
• Fabian Enderle,
• Paul Ziemann,
• Othmar Marti and
• Alfred Plettl

Beilstein J. Nanotechnol. 2018, 9, 1390–1398, doi:10.3762/bjnano.9.131

• separation of fluorescent-labeled protein molecules [47]. Although the preparation may be addressed as demanding, the whole processing is factory compatible and stable, enabled by consequent application of parallel processes of unconventional lithography techniques. Inspired by recent reports [48][49][50][51

Heterostuctures of 4-(chloromethyl)phenyltrichlorosilane and 5,10,15,20-tetra(4-pyridyl)-21H,23H-porphine prepared on Si(111) using particle lithography: Nanoscale characterization of the main steps of nanopatterning

• Phillip C. Chambers and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2018, 9, 1211–1219, doi:10.3762/bjnano.9.112

• porphyrins and organosilanes. A protocol was developed with particle lithography using steps of immersion in organosilane solutions to selectively passivate the surface of Si(111) with octadecyltrichlorosilane (OTS). A methyl-terminated matrix was chosen to direct the growth of CMPS nanostructures to fill

• matrix of OTS showed minimal areas of nonspecific adsorption. The AFM studies provide insight into the mechanism of the self-polymerization of CMPS as a platform for constructing porphyrin heterostructures. Keywords: atomic force microscopy (AFM); nanostructures; particle lithography; porphyrin; self

• triple-decker sandwich complex of phthalocyanine compounds prepared on graphite was studied using STM by Lei et al. [17]. A method of photocatalytic lithography was reported for making porphyrin surface structures that were applied for preparing protein arrays [18][19]. The assembly of porphyrins at

Field-controlled ultrafast magnetization dynamics in two-dimensional nanoscale ferromagnetic antidot arrays

• Anulekha De,
• Sucheta Mondal,
• Sourav Sahoo,
• Saswati Barman,
• Yoshichika Otani,
• Rajib Kumar Mitra and
• Anjan Barman

Beilstein J. Nanotechnol. 2018, 9, 1123–1134, doi:10.3762/bjnano.9.104

• previously. Results and Discussion 25 × 25 μm2 arrays of two-dimensional Py antidot arrays with triangular holes arranged in hexagonal lattice symmetry have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling [20]. Figure 1a,b shows the scanning electron

• -dimensional arrays of Py antidots with triangular holes arranged in a hexagonal lattice have been fabricated by a combination of electron-beam lithography, electron-beam evaporation and ion milling. The 20 nm-thick Py film was deposited on a commercially available self-oxidized Si(100) substrate and a 60-nm

• irradiation of laser light. A PMMA/MMA bilayer resist was used for electron-beam lithography to prepare the resist pattern on the Py thin film followed by argon ion milling at a base pressure of 1 × 10−4 Torr with a beam current of 60 mA for 6 min for etching out the Py film from everywhere except the

Tuning adhesion forces between functionalized gold colloidal nanoparticles and silicon AFM tips: role of ligands and capillary forces

• Sven Oras,
• Sergei Vlassov,
• Marta Berholts,
• Rünno Lõhmus and
• Karine Mougin

Beilstein J. Nanotechnol. 2018, 9, 660–670, doi:10.3762/bjnano.9.61

• substrate material for MEMS and NEMS is silicon. It can be tailored into complex shapes by fine lithography methods. The adhesion between Au and Si or SiO2 is known to be rather poor [18][19][20]. Böhme et al. [21] demonstrated that the oxygen layer forming on the silicon substrates affects the adhesion

Electron interactions with the heteronuclear carbonyl precursor H₂FeRu₃(CO)₁₃ and comparison with HFeCo₃(CO)₁₂: from fundamental gas phase and surface science studies to focused electron beam induced deposition

• Ragesh Kumar T P,
• Paul Weirich,
• Lukas Hrachowina,
• Marc Hanefeld,
• Ragnar Bjornsson,
• Helgi Rafn Hrodmarsson,
• Sven Barth,
• D. Howard Fairbrother,
• Michael Huth and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

• ; focused electron beam induced deposition; heteronuclear FEBID precursors; surface science; Introduction Direct-write technologies using electron beams for nanostructure deposition can surpass the limitations of standard lithography techniques, such as the growth of three-dimensional nanostructures with

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• biological species recognition with minimum nonspecific attachment. Herein, a straightforward approach utilizing chemical lift-off lithography to create a diluted self-assembled monolayer matrix for anchoring diverse biological probes is introduced. The strategy encompasses convenient operation, well-tunable

• lift-off lithography; patterning; self-assembled monolayer; Introduction Patterning on the micro- to nanoscale plays a key role in modern scientific and engineering research fields. Particularly, the creation of bioactive surfaces with well-defined geometries has drawn lots of attention due to its

• fact that optical lithography allows for large-area fabrication provides an accessible route to bioactive substrate manufacturing but is limited by light diffraction when very fine control is required. On the other hand, scanning beam-based lithographic techniques allow for highly controllable fine

Review: Electrostatically actuated nanobeam-based nanoelectromechanical switches – materials solutions and operational conditions

• Liga Jasulaneca,
• Jelena Kosmaca,
• Raimonds Meija,
• Jana Andzane and
• Donats Erts

Beilstein J. Nanotechnol. 2018, 9, 271–300, doi:10.3762/bjnano.9.29

• nanomanipulation approaches. The top-down approach involves lithography, etching and coating technologies to fabricate device structures from bulk materials or thin films [7][19][23][39][47][48][49][50]. The combined approach of fabricating NEM switches requires subsequent transfer and alignment of synthesized

• ] top-down NEM switch fabrication approaches. Similarly to copper, the fabrication of a platinum cantilever NEM switching element involved an additional thermal annealing step at 300 °C to reduce the stress gradient in the beam. The usability of platinum for electron-beam lithography-based fabrication

• . Several CNT-based relays and switches have been fabricated using the bottom-up arrangement of CNTs, including dielectrophoresis [33], controlled growth of CNTs [34][37], dispersion coating [12][35][36], nanomanipulation [15][32] techniques and electron beam lithography/metal sputtering for the fabrication

Gas-assisted silver deposition with a focused electron beam

• Luisa Berger,
• Katarzyna Madajska,
• Iwona B. Szymanska,
• Katja Höflich,
• Mikhail N. Polyakov,
• Jakub Jurczyk,
• Carlos Guerra-Nuñez and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

• and preferably as few processing steps as possible. Therefore, a maskless direct-write method would be favorable in comparison to common resist-based lithography techniques, which require multiple steps and are reaching their lateral resolution limits. Focused electron beam induced deposition (FEBID

Al₂O₃/TiO₂ inverse opals from electrosprayed self-assembled templates

• Arnau Coll,
• Sandra Bermejo,
• David Hernández and
• Luís Castañer

Beilstein J. Nanotechnol. 2018, 9, 216–223, doi:10.3762/bjnano.9.23

• top-down approaches based on lithography or holography), the present state of the current techniques [8][9][10][11][12][13] either leads to various randomly oriented domains [14] or to limited defect-free areas, and furthermore, they are typically very slow fabrication processes. In addition, a review

Combined scanning probe electronic and thermal characterization of an indium arsenide nanowire

• Tino Wagner,
• Fabian Menges,
• Heike Riel,
• Bernd Gotsmann and
• Andreas Stemmer

Beilstein J. Nanotechnol. 2018, 9, 129–136, doi:10.3762/bjnano.9.15

• = 2 mΩ·cm) silicon wafers coated with a 100 nm thick thermal oxide. Electrical contact pads and alignment marks for e-beam alignment and localization of the NWs where defined and fabricated using an ultraviolet lithography process. The InAs NWs were transferred from a growth substrate onto the pre

• -patterned wafer on which they where localized and contacted by e-beam lithography. The InAs NWs studied were grown in a metal-organic vapor deposition (MOCVD) system by vapor–liquid–solid (VLS) growth using a gold particle as catalyst and using trimethylindium (TMIn) and tert-butylarsine (TBA) as precursors

Comparative study of post-growth annealing of Cu(hfac)₂, Co₂(CO)₈ and Me₂Au(acac) metal precursors deposited by FEBID

• Marcos V. Puydinger dos Santos,
• Aleksandra Szkudlarek,
• Artur Rydosz,
• Carlos Guerra-Nuñez,
• Fanny Béron,
• Kleber R. Pirota,
• Stanislav Moshkalev,
• José Alexandre Diniz and
• Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

• thick CuxFyCzOz and 50 nm thick AuxCyOz depositions. Each defined a rectangular pattern of 20 × 5 μm2 onto predefined 100 nm thick Au electrodes. These electrodes were obtained by standard UV lithography on phosphorus-doped Si wafers (8 mΩ·cm) with a 200 nm thick SiO2 layer for electrodes isolation. The