Electroburning of few-layer graphene flakes, epitaxial graphene, and turbostratic graphene discs in air and under vacuum

• Andrea Candini,
• Nils Richter,
• Domenica Convertino,
• Camilla Coletti,
• Franck Balestro,
• Wolfgang Wernsdorfer,
• Mathias Kläui and
• Marco Affronte

Beilstein J. Nanotechnol. 2015, 6, 711–719, doi:10.3762/bjnano.6.72

• formation than working in air. Conversely, for graphene on SiC the EB process is not successful under vacuum. Finally, the EB is possible with turbostratic graphene discs only after the creation of a constriction in the sample using lithographic patterning. Keywords: graphene; graphene based electrodes

• are deposited on the same substrate as the exfoliated graphene. Here, we found that the EB process leads to a breaking of the graphene devices only after the patterning of a constriction. This hardness with respect to exfoliated graphene suggests that the different morphology of the edges also plays a

• role to initiate the burning. Indeed, the presence of nonsaturated carbon bonds makes the edges the most reactive part of the device. Edges cleaved during the exfoliation (exfoliated graphene), edges created during the oxygen plasma (graphene on SiC and turbostratic discs after the patterning), and

Fundamental edge broadening effects during focused electron beam induced nanosynthesis

• Roland Schmied,
• Jason D. Fowlkes,
• Robert Winkler,
• Phillip D. Rack and
• Harald Plank

Beilstein J. Nanotechnol. 2015, 6, 462–471, doi:10.3762/bjnano.6.47

• –3)·10−6 mbar. Prior to patterning, the GIS was opened for about 2 min to establish stable precursor conditions at the surface at a chamber pressure of (1–2)·10−5 mbar. All structures have been fabricated by using stream-files that were generated through a patterning algorithm custom-written in C

• varying the number of patterning loops. Beam currents, DTs and PoPs were based on previous studies, suggesting a widely balanced working regime without strong excess of electrons or molecules [10][44][45][47]. Preliminary experiments were performed without precursor gas by using the same patterns at the

• . The dotted vertical line gives the last patterning point at the edge (intended patterning edge) revealing the final slope to be symmetrically distributed at half maximum. Previous studies by Arnold et al. [44] revealed that the achievable width of single lines is determined by BSE/SE-II contributions

Electrical properties of single CdTe nanowires

• Elena Matei,
• Camelia Florica,
• Andreea Costas,
• María Eugenia Toimil-Molares and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2015, 6, 444–450, doi:10.3762/bjnano.6.45

• nanowire suspension was placed on Si/SiO2 substrates on which interdigitated Ti/Au electrodes were patterned by photolithography (Figure 4). FIBIM is a direct patterning method employed for the design of metallic nanostructures. The method is based on the interaction of an ion beam with the surface

Boosting the local anodic oxidation of silicon through carbon nanofiber atomic force microscopy probes

• Gemma Rius,
• Matteo Lorenzoni,
• Soichiro Matsui,
• Masaki Tanemura and
• Francesc Perez-Murano

Beilstein J. Nanotechnol. 2015, 6, 215–222, doi:10.3762/bjnano.6.20

• nanofabrication methods based on scanning probe microscopy have been developed during the last decades. Local anodic oxidation (LAO) is one of such methods: Upon application of an electric field between tip and surface under ambient conditions, oxide patterning with nanometer-scale resolution can be performed

• and chemical properties, intrinsic very high aspect ratios and tiny tip radii, CNTs looked very promising for LAO-AFM application. Indeed, both single and multi-walled CNTs showed remarkable patterning capabilities [16]. However, this approach has been nearly abandoned, due to the high cost and poor

• current experiments we focus on the definition of line patterns. Prior to patterning, the AFM control feedback is disabled and the required voltage is applied. However, in order to keep a constant tip–surface distance, previously the surface inclination with respect to the X–Y piezo-scanning plane is

Bright photoluminescence from ordered arrays of SiGe nanowires grown on Si(111)

• D. J. Lockwood,
• N. L. Rowell,
• A. Benkouider,
• A. Ronda,
• L. Favre and
• I. Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2498–2504, doi:10.3762/bjnano.5.259

• in the substrate by focused ion beam patterning for the preferential nucleation and growth of these well-organized NWs. The NWs thus produced have a diameter of 200 nm, a length of 200 nm, and a Ge concentration x = 0.15. Their photoluminescence (PL) spectra were measured at low temperatures (from 6

• patterning; (c) galvanic selective deposition of Au; (d) induced phase transition in AuSi catalysts; and (e) selective growth of SiGe NWs. With this method we have produced Si1−xGex NWs with diameters in the range 50–200 nm, although the size can potentially be tuned between 30 and 300 nm, and with Ge

• concentration x in the range 0 ≤ x ≤ 0.15. Prior to the substrate patterning (Figure 1a), the Si(111) substrates, which were either 5 cm diameter wafers or wafer sections of dimensions 2 × 2 cm2 and 1 × 1 cm2, were first systematically cleaned by a modified Shiraki ex situ process and then capped with an ultra

Mammalian cell growth on gold nanoparticle-decorated substrates is influenced by the nanoparticle coating

• Christina Rosman,
• Sebastien Pierrat,
• Marco Tarantola,
• David Schneider,
• Eva Sunnick,
• Andreas Janshoff and
• Carsten Sönnichsen

Beilstein J. Nanotechnol. 2014, 5, 2479–2488, doi:10.3762/bjnano.5.257

• filamentous residue remains (Figure 1D). However, this residue emerges in control samples without nanoparticle patterning as well (Supporting Information File 1, Figure S1) and corresponds to retracting filopodia [25]. Therefore, no specific anchoring of the membrane to the nanoparticles seems to be necessary

• internalization. Hence, applications involving nanoparticle patterning of implants should also consider any stabilizing agents with respect to cellular interaction. Conclusion Gold nanoparticles scatter and absorb light strongly, which makes them amenable to biomedical applications. However, unintended impact on

Si/Ge intermixing during Ge Stranski–Krastanov growth

• Alain Portavoce,
• Khalid Hoummada,
• Antoine Ronda,
• Dominique Mangelinck and
• Isabelle Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246

• dot assembly [1][2][3][4][5][6][7]. The focus of these investigations was devoted to understanding the shape of the islands and density variations versus stress (or strain) or substrate surface modifications (e.g., patterning, Si(Ge) buffer or surfactant variations) [6][7][8][9][10][11], using

Electrical contacts to individual SWCNTs: A review

• Wei Liu,
• Christofer Hierold and
• Miroslav Haluska

Beilstein J. Nanotechnol. 2014, 5, 2202–2215, doi:10.3762/bjnano.5.229

• processes which could be used as a scale-up process for patterning metal–nanotube contacts. For instance, Vazquez-Mena et al. [72] developed a stencil lithography process to fabricate metallic nanowires at the wafer level. Nanoslits with a width down to 70 nm were defined on a wafer level membrane made of

Biopolymer colloids for controlling and templating inorganic synthesis

• Laura C. Preiss,
• Katharina Landfester and
• Rafael Muñoz-Espí

Beilstein J. Nanotechnol. 2014, 5, 2129–2138, doi:10.3762/bjnano.5.222

• nanoparticles [7]. In a different approach, biopolymers can also be applied to modify surfaces and induce the deposition of nanoparticles. For instance, Nochomovitz et al. [8] described the deposition and patterning of gold colloidal nanoparticles and carbon nanotubes on surfaces previously modified with

Properties of plasmonic arrays produced by pulsed-laser nanostructuring of thin Au films

• Katarzyna Grochowska,
• Katarzyna Siuzdak,
• Peter A. Atanasov,
• Carla Bittencourt,
• Anna Dikovska,
• Nikolay N. Nedyalkov and
• Gerard Śliwiński

Beilstein J. Nanotechnol. 2014, 5, 2102–2112, doi:10.3762/bjnano.5.219

• the plasmon resonance peak resulting from repeated film deposition and laser annealing observed for the first time is reported. Results and Discussion Nanoparticle structures The photothermally stimulated patterning path from a thin metal film to a nanostructured array of particles is initiated by

• to the synthesis problem of sensor materials based on the SPR effect. This has been confirmed by using the patterning effect induced by a single laser pulse at 532 nm and intensities up to 1000 mJ/cm2 in a thin Au film deposited onto an ITO substrate [12]. The Au nanoclusters (20–40 nm) produced in

Patterning a hydrogen-bonded molecular monolayer with a hand-controlled scanning probe microscope

• Matthew F. B. Green,
• Taner Esat,
• Christian Wagner,
• Philipp Leinen,
• Alexander Grötsch,
• F. Stefan Tautz and
• Ruslan Temirov

Beilstein J. Nanotechnol. 2014, 5, 1926–1932, doi:10.3762/bjnano.5.203

High speed e-beam lithography for gold nanoarray fabrication and use in nanotechnology

• Jorge Trasobares,
• François Vaurette,
• Marc François,
• Hans Romijn,
• Jean-Louis Codron,
• Dominique Vuillaume,
• Didier Théron and
• Nicolas Clément

Beilstein J. Nanotechnol. 2014, 5, 1918–1925, doi:10.3762/bjnano.5.202

• actual limitation of the proposed high-speed writing technique is the resist exposure time. Recently, direct patterning of high density sub-15 nm gold dot array using ultrahigh contrast electron beam lithography process on positive tone resist has been demonstrated [21]. Combination of high contrast

The influence of molecular mobility on the properties of networks of gold nanoparticles and organic ligands

• Edwin J. Devid,
• Paulo N. Martinho,
• M. Venkata Kamalakar,
• Úna Prendergast,
• Christian Kübel,
• Tibebe Lemma,
• Jean-François Dayen,
• Tia. E. Keyes,
• Bernard Doudin,
• Mario Ruben and
• Sense Jan van der Molen

Beilstein J. Nanotechnol. 2014, 5, 1664–1674, doi:10.3762/bjnano.5.177

• patterning Ti(3 nm)/Au(47 nm)-electrodes of 20 μm width, separated by a gap of around 100 nm (about 10 nanoparticles), are created on Si/SiO2 substrates. We transfer the nanoparticle array onto these electrodes via a PDMS stamp. Samples containing 2D single-layer Au-NP–S-BPP arrays typically exhibited very

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• . Patterning by oxygen plasma led to a chemically functional SAM nanopattern of limited resolution of the order of 200 nm. Only the combined UV near-field photochemical and ozone-induced chemical process led to functional nanopatterns of a chemically reactive SAM which could be used for the selective

Review of nanostructured devices for thermoelectric applications

• Giovanni Pennelli

Beilstein J. Nanotechnol. 2014, 5, 1268–1284, doi:10.3762/bjnano.5.141

• obtained by using metal masks with suitable patterning. However, if the generation of holes through the reducing reaction (Equation 13) is faster than the silicon oxidation/etching reaction, holes generated at the silicon–metal interface can diffuse toward confining, metal-free, regions [127]. Thus

Topology assisted self-organization of colloidal nanoparticles: application to 2D large-scale nanomastering

• Hind Kadiri,
• Serguei Kostcheev,
• Daniel Turover,
• Rafael Salas-Montiel,
• Komla Nomenyo,
• Anisha Gokarna and
• Gilles Lerondel

Beilstein J. Nanotechnol. 2014, 5, 1203–1209, doi:10.3762/bjnano.5.132

• analysis were used to characterize the morphology of the ordered surfaces. Finally, the production of silicon molds is demonstrated by using the beads as a template for dry etching. Keywords: assisted self-organization; dislocations; patterning; polystyrene beads; single crystal; Introduction The

• development of nanoscience and nanotechnology has led to a continuous miniaturization of microelectronic components. 193 nm optical-mask lithography is the driving force behind this evolution [1]. Techniques such as double patterning lithography [2], extreme UV (EUV) or electron beam have been developed or

• patterns. By using patterned silicon substrates, we were able to minimize the presence of these dislocations resulting in the formation of single crystal structures of PS beads on the entire pre-patterned area, which is scalable depending on the technique used for pre-patterning. Results and Discussion

Nanoforging – Innovation in three-dimensional processing and shaping of nanoscaled structures

• Andreas Landefeld and
• Joachim Rösler

Beilstein J. Nanotechnol. 2014, 5, 1066–1070, doi:10.3762/bjnano.5.118

• submicron- and nanoscale do not seem to be feasible. For electromechanical and optical application numerous patterning techniques were developed. Only a few are applicable for patterning metals. An example is imprinting. This techniques uses a macroscopic stamp with structures in the micro- and nano-range

• . By pressing it into a substrate the structure of the stamp is replicated as imprint. Polymers [5], but also metallic glasses [6], are used as substrate material for this surface patterning process. It is less applicable for three-dimensional forming of individual objects than for structuring of large

• and plain surfaces. Another example is electrodeposition [7]. This technique enables three dimensional patterning in the nano-range by deposition of metals electrochemically. Like imprinting, electrodeposition is less suitable for direct and individual shaping of freestanding structures. Recently

DNA origami deposition on native and passivated molybdenum disulfide substrates

• Xiaoning Zhang,
• Masudur Rahman,
• David Neff and
• Michael L. Norton

Beilstein J. Nanotechnol. 2014, 5, 501–506, doi:10.3762/bjnano.5.58

• proteins [5][6], and act as templates for the organization of carbon nanotubes [6][7][8][9]. This bottom-up process offers a tremendous advantage over photolithography, because is enables the patterning of surfaces with feature sizes less than 20 nm [10]. However, some materials may interfere with the base

• pairing responsible for origami structure formation and maintenance and are therefore unsuitable substrates for DNA origami deposition and patterning. For example, the folded structures are lost when they are deposited onto a graphene surface, because of π–π stacking between the single-stranded DNA and

• atomically smooth to enable optimal patterning and imaging through atomic force microscopy (AFM) because the origami structures are very thin and conformal. A final substrate property that needs to be considered for maximal utility is that the material should possess conductive or semiconductive electronic

Effect of contaminations and surface preparation on the work function of single layer MoS₂

• Oliver Ochedowski,
• Kolyo Marinov,
• Nils Scheuschner,
• Artur Poloczek,
• Benedict Kleine Bussmann,
• Janina Maultzsch and
• Marika Schleberger

Beilstein J. Nanotechnol. 2014, 5, 291–297, doi:10.3762/bjnano.5.32

• can be observed on the MoS2 flake. We attribute these features, marked in Figure 3a with green circles, to contaminations due to the patterning process. The height of these contaminations varies between 1 nm and 20 nm. These contaminations have a noticeable effect on the work function of SLM, as ΦSLM

Nanoscale patterning of a self-assembled monolayer by modification of the molecule–substrate bond

• Cai Shen and
• Manfred Buck

Beilstein J. Nanotechnol. 2014, 5, 258–267, doi:10.3762/bjnano.5.28

• self-assembled monolayer (SAM) and a Au(111)/mica substrate by underpotential deposition (UPD) is studied as a means of high resolution patterning. A SAM of 2-(4'-methylbiphenyl-4-yl)ethanethiol (BP2) prepared in a structural phase that renders the Au substrate completely passive against Cu-UPD, is

• patterned by modification with the tip of a scanning tunneling microscope. The tip-induced defects act as nucleation sites for Cu-UPD. The lateral diffusion of the metal at the SAM–substrate interface and, thus, the pattern dimensions are controlled by the deposition time. Patterning down to the sub-20 nm

• bilayer of metal, which is intercalated at the SAM–substrate interface [20][21][22][23][24]. The interest in this process arises from the alteration in the strength of the S–substrate bond. Following the order Au < Ag < Cu [25] patterning is enabled by a localised UPD of Cu or Ag on Au and the subsequent

Fabrication of carbon nanomembranes by helium ion beam lithography

• Xianghui Zhang,
• Henning Vieker,
• André Beyer and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2014, 5, 188–194, doi:10.3762/bjnano.5.20

• formed is still missing. Further modification and patterning of SAMs have been achieved by using ion irradiation (e.g. Ar+, Ga+, Si+, etc.), which leads to the desorption and the fragmentation of molecules [14][15]. High energy helium ions passing through polymer films modify the macroscopic properties

Surface assembly and nanofabrication of 1,1,1-tris(mercaptomethyl)heptadecane on Au(111) studied with time-lapse atomic force microscopy

• Tian Tian,
• Burapol Singhana,
• Lauren E. Englade-Franklin,
• Xianglin Zhai,
• T. Randall Lee and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2014, 5, 26–35, doi:10.3762/bjnano.5.3

• junction, and tailgroups of tunable chemical composition [3][4][5][6]. The nature of the headgroup, junctions, hydrocarbon backbone, and tailgroups of SAMs enable designs of complex architectures for applications and surface patterning [7][8][9]. The stability of organosulfur-based adsorbates on noble

• metal surfaces is a consideration for applications of SAMs, which impacts the reliability and durability of the related products [10][11][12][13][14][15][16][17]. To realize the full potential of patterning surfaces for manufacturing processes, challenges need to be addressed for designing robust

In situ growth optimization in focused electron-beam induced deposition

• Paul M. Weirich,
• Marcel Winhold,
• Christian H. Schwalb and
• Michael Huth

Beilstein J. Nanotechnol. 2013, 4, 919–926, doi:10.3762/bjnano.4.103

• microscope (TEM). During the last decade FEBID has developed from a highly specialized nanofabrication method with a limited selection of application fields to one of the most flexible approaches for functional nanostructure fabrication with true 3D patterning capabilities. By now FEBID-based nanostructures

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

• Tatjana Ladnorg,
• Alexander Welle,
• Stefan Heißler,
• Christof Wöll and
• Hartmut Gliemann

Beilstein J. Nanotechnol. 2013, 4, 638–648, doi:10.3762/bjnano.4.71

• SAMs by using the AFM as nanografting tool. ToF-SIMS analyses were carried out to demonstrate the successful SAM patterning by nanografting, while FT-IR microscopy and AFM were used to verify the SURMOF growth on the patterned substrate. Results and Discussion The in-situ nanografting process includes

• interesting for biological application, would require a technique, which allows the patterning of the substrate with different SAMs. Although usual structuring methods, such as micro contact printing or e-beam lithography, can be used for SAM patterning as well, those techniques reach a limit when patterns

Mapping of plasmonic resonances in nanotriangles

• Simon Dickreuter,
• Julia Gleixner,
• Andreas Kolloch,
• Johannes Boneberg,
• Elke Scheer and
• Paul Leiderer

Beilstein J. Nanotechnol. 2013, 4, 588–602, doi:10.3762/bjnano.4.66

• than the FDTD results. Minimum structure size As mentioned in the introduction, plasmon-mediated ablation is an interesting method for optical patterning of surfaces far below the diffraction limit as well as for imaging optical near fields. The ablation hole shown as an example in the profile of

• around 10 nm. Yet nanopatterning by near-field ablation with femtosecond pulses and the related formation of a nanoscale plasma appears as a novel route for certain applications in biology and medicine, where a chemical patterning of a substrate on scales well below optical wavelengths is of interest