Nanoglasses: a new kind of noncrystalline materials

• Herbert Gleiter

Beilstein J. Nanotechnol. 2013, 4, 517–533, doi:10.3762/bjnano.4.61

• significance of nanometer-sized patterning of the surface of nanoglasses agrees with the results of recent studies [62][63][64] indicating that the spatial patterning of biochemical cues controls several cellular processes such as spreading, adhesion, migration and proliferation. In fact, these studies

• be so because integrin clustering and adhesion-induced arginine-glycine-aspatic acid (RGD) ligands depend on the local order of the ligand arrangement on the substrate if the average ligand spacing is above 70 nm. Adhesion is “turned off“ by RGD patterning above 70 nm and “turned on” below this

Structural and thermoelectric properties of TMGa₃ (TM = Fe, Co) thin films

• Sebastian Schnurr,
• Ulf Wiedwald,
• Paul Ziemann,
• Valeriy Y. Verchenko and
• Andrei V. Shevelkov

Beilstein J. Nanotechnol. 2013, 4, 461–466, doi:10.3762/bjnano.4.54

• of typically 1 nm/min as indicated by a quartz crystal monitor at a background pressure of 10−8 mbar with a cooling shield filled with liquid N2. For the lateral patterning of the films evaporation was performed through masks in contact with the substrates (c-cut sapphire or glass) held at ambient

Digging gold: keV He⁺ ion interaction with Au

• Vasilisa Veligura,
• Gregor Hlawacek,
• Robin P. Berkelaar,
• Raoul van Gastel,
• Harold J. W. Zandvliet and
• Bene Poelsema

Beilstein J. Nanotechnol. 2013, 4, 453–460, doi:10.3762/bjnano.4.53

• crystals; helium ion microscopy; ion beam/solid interactions; vacancies in crystals; Introduction The helium ion microscope allows the projection of a He+ beam of several tens of kiloelectronvolts with a diameter of 0.4 nm [1] onto a sample. This makes HIM an attractive tool for surface patterning and

Porous polymer coatings as substrates for the formation of high-fidelity micropatterns by quill-like pens

• Michael Hirtz,
• Marcus Lyon,
• Wenqian Feng,
• Andrea E. Holmes,
• Harald Fuchs and
• Pavel A. Levkin

Beilstein J. Nanotechnol. 2013, 4, 377–384, doi:10.3762/bjnano.4.44

• polymer in the wetted state [4]. Such porous HEMA substrates were used for creating superhydrophilic–superhydrophobic micropatterned surfaces for cell-patterning [6] and cell-screening applications [7][8]. Here, we present an approach for the formation of high-fidelity microarrays of three-dimensional 20

• Discussion Pattern generation The microarrays were fabricated by spotting the dye solution with quill-like microchannel cantilevers, called surface patterning tools (SPTs) [9], attached to a dip-pen nanolithography (DPN) platform (NLP 2000, NanoInk, USA) for precise control in x- y- and z-direction (Figure 1

• reservoir. Bright field and fluorescent microscopy images demonstrate huge differences in the patterning outcome for the different substrates. Plain paper (Figure 4a and Figure 4e) does not consistently take up phloxine B from the SPT, presumably in part because of a large surface roughness (that might have

Guided immobilisation of single gold nanoparticles by chemical electron beam lithography

• Patrick A. Schaal and
• Ulrich Simon

Beilstein J. Nanotechnol. 2013, 4, 336–344, doi:10.3762/bjnano.4.39

• processing steps, including formation, patterning and development of resist films, metal evaporation/sputtering and lift-off, whereby feature sizes rarely go beyond the 10 nm threshold [1]. Depending on the chosen substrate, e.g., SiO2, additional metal layers such as Ti are needed as adhesive layers. In

Grain boundaries and coincidence site lattices in the corneal nanonipple structure of the Mourning Cloak butterfly

• Ken C. Lee and
• Uwe Erb

Beilstein J. Nanotechnol. 2013, 4, 292–299, doi:10.3762/bjnano.4.32

• effect, which provides some protection from predators. In recent years many artificial moth-eye-type surfaces have been developed as antireflection, antiglare surfaces by various methods such as photoresist patterning, porous aluminium oxide templating or direct reproduction, e.g., [7][8][9]. With

Functionalization of vertically aligned carbon nanotubes

• Eloise Van Hooijdonk,
• Carla Bittencourt,
• Rony Snyders and
• Jean-François Colomer

Beilstein J. Nanotechnol. 2013, 4, 129–152, doi:10.3762/bjnano.4.14

• functionalization, and also dry gas-phase functionalization. Before presenting these methods, we briefly discuss different ways to synthesize vertically aligned carbon nanotubes and the existing approaches to obtain patterning of vertically aligned carbon nanotubes. A part of this review is also dedicated to a

• key achievement was the engineering of vertically oriented CNT-arrays by using CVD of ethylene, size-controlled Fe catalytic particles, and nanotube positioning by substrate patterning. The mechanism of the alignment of the CNTs was proposed to be due to the van der Waals forces where the outer wall

• techniques and the main achievements in this field. For further reading, detailed literature can be found in [54]. 2 Patterning of VA-CNT arrays For optimal engineering in applications such as field emitters or sensors, the location of the VA-CNTs and the design of their growth area are of primary importance

Low-dose patterning of platinum nanoclusters on carbon nanotubes by focused-electron-beam-induced deposition as studied by TEM

• Xiaoxing Ke,
• Carla Bittencourt,
• Sara Bals and
• Gustaaf Van Tendeloo

Beilstein J. Nanotechnol. 2013, 4, 77–86, doi:10.3762/bjnano.4.9

• nanotubes; FEBID; nanocluster; platinum; patterning; radiation-induced nanostructures; TEM; Introduction Hybrid nanostructures consisting of carbon nanotubes (CNTs) decorated with metal nanoclusters enable access to various electrical and catalytic properties. Therefore, they are considered as building

• the formation of a novel stripe-patterning of nanoclusters on the surface of the CNTs, which may open up new prospects of nanostructuring for applications in nanodevices dependent on the distribution of metal clusters. High-resolution transmission electron microscopy (HRTEM) and high-angle annular

• ). Demonstrating the ability of FEBID to deposit nanoclusters on both sides of the CNTs, we believe that the application of FEBID as a direct patterning approach can be extended to various electron-transparent structures, such as nanowires, thin films and graphene. Furthermore, taking into account that

Controlled deposition and combing of DNA across lithographically defined patterns on silicon

• Zeinab Esmail Nazari and
• Leonid Gurevich

Beilstein J. Nanotechnol. 2013, 4, 72–76, doi:10.3762/bjnano.4.8

• introduced that involved a combination of molecular combing with other techniques such as lithographic patterning [7]. For instance, Guan et al. used a combination of molecular combing with contact printing and soft lithography. With this method, it was possible to generate complex patterns of DNA on the

Sub-10 nm colloidal lithography for circuit-integrated spin-photo-electronic devices

• Adrian Iovan,
• Marco Fischer,
• Roberto Lo Conte and
• Vladislav Korenivski

Beilstein J. Nanotechnol. 2012, 3, 884–892, doi:10.3762/bjnano.3.98

• Adrian Iovan Marco Fischer Roberto Lo Conte Vladislav Korenivski Nanostructure Physics, Royal Institute of Technology, 10691 Stockholm, Sweden 10.3762/bjnano.3.98 Abstract Patterning of materials at sub-10 nm dimensions is at the forefront of nanotechnology and employs techniques of various

• complexity, efficiency, areal scale, and cost. Colloid-based patterning is known to be capable of producing individual sub-10 nm objects. However, ordered, large-area nano-arrays, fully integrated into photonic or electronic devices have remained a challenging task. In this work, we extend the practice of

• [4] and DNA [5][6], and for producing artificial crystals in photonics [7][8] and gigahertz oscillators in spin-electronics [9][10][11][12][13][14]. Scaling of colloidal patterning down to 10 nm and below, dimensions comparable or smaller than the main relaxation lengths in the relevant materials

Pinch-off mechanism in double-lateral-gate junctionless transistors fabricated by scanning probe microscope based lithography

• Farhad Larki,
• Arash Dehzangi,
• Alam Abedini,
• Ahmad Makarimi Abdullah,
• Elias Saion,
• Sabar D. Hutagalung,
• Mohd N. Hamidon and
• Jumiah Hassan

Beilstein J. Nanotechnol. 2012, 3, 817–823, doi:10.3762/bjnano.3.91

• at constant voltage of 9 V is shown in Figure 1c. The optimized oxidation parameters correspond to a voltage of 9 V on the tip, with a speed of 1 µm/s, with the RH in the range of 65–67%. After patterning of the oxide mask, the first step of wet chemical etching was carried out with a solution of 30

Controlled positioning of nanoparticles on a micrometer scale

• Fabian Enderle,
• Oliver Dubbers,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2012, 3, 773–777, doi:10.3762/bjnano.3.86

• them as masks for subsequent etching procedures to transfer the NP pattern into their supporting substrate. In this respect, the notion of a nanoparticle should include as well colloids and micelles since their use for patterning is more widely spread [7][8][9][10][11][12]. Of course, in addition to

• system fixed within the sample surface. When restricting the patterning to a 100 μm × 100 μm area, no mechanical movement of the sample holder is necessary, rather all programmed positions are approached by steering the electron beam. During the writing process, however, one observes a time-dependent

Ordered arrays of nanoporous gold nanoparticles

• Dong Wang,
• Ran Ji,
• Arne Albrecht and
• Peter Schaaf

Beilstein J. Nanotechnol. 2012, 3, 651–657, doi:10.3762/bjnano.3.74

• on the Si wafer, and then an array of holes was defined by SCIL. SCIL was developed as a new nanoimprint lithography technique that combines the advantages of both UV nanoimprint lithography techniques, with a rigid stamp for best resolution and with a soft stamp for large-area patterning [23]. The

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

• Cheng Huang,
• Markus Moosmann,
• Jiehong Jin,
• Tobias Heiler,
• Stefan Walheim and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 620–628, doi:10.3762/bjnano.3.71

• time featuring regions of bare SiOx. The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled

• [8]. Patterning of self-assembled monolayers on the nanometer scale is easily performed by sequential lithographic techniques that are well-established in the literature. Electron beam lithography allows the desorption or destruction of molecules of a SAM layer, line by line [9][10]. Advanced

• -force-microscopy-based lithographic techniques allow the structuring and patterning of surfaces with a lateral resolution down to the nanometer scale [24][25][26][27][28][29][30]. The advantage of techniques such as electron beam lithography or SFM-based lithography is their high lateral resolution and

Nano-structuring, surface and bulk modification with a focused helium ion beam

• Daniel Fox,
• Yanhui Chen,
• Colm C. Faulkner and
• Hongzhou Zhang

Beilstein J. Nanotechnol. 2012, 3, 579–585, doi:10.3762/bjnano.3.67

• silicon lamella leaving the subsurface structure intact for further analysis. Surface roughness and contaminants were both reduced by the irradiation process. Fabrication is also realized with a high level of patterning acuity. Implantation of helium beneath the surface of the sample is visualized in

• crystal structure. The resolution of the FIB is limited by the energy spread of the gallium ions generated from the liquid metal ion source (LMIS). The sputter yield is also too large for acute patterning control over very short lateral distances. The recently developed Carl Zeiss Orion Plus helium ion

• with a 5 keV gallium ion beam final polish in order to reduce FIB induced artifacts which would obscure our analysis of the patterning and subsurface modification effects of the HIM modification. Sample 3 is shown after FIB lift-out in the SEM image in Figure 4a. Figure 4b is an illustration of the

The oriented and patterned growth of fluorescent metal–organic frameworks onto functionalized surfaces

• Jinliang Zhuang,
• Jasmin Friedel and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 570–578, doi:10.3762/bjnano.3.66

• groups, such as carboxylate and pyridyl groups, capable of coordinating to the constituents of the MOF. It could be demonstrated that this directed coordination also orients the nanocrystals deposited at the surface. Using two different patterning methods, i.e., microcontact printing and electron-beam

• -substituted alkanethiol solution can be significantly enhanced by electron irradiation, a new patterning technique was developed by Zharnikov et al. [50][51][52][53][54]. Thus, our second strategy to fabricate a patterned SAM was the combination of this irradiation-promoted exchange reaction (IPER) with

• the SAM constituents are not distributed evenly over the surface, but are instead patterned, they also direct the location of SURMOF deposition. Two different methods have been employed for the patterning, namely microcontact printing and electron-beam lithography. We demonstrated that both methods

Directed deposition of silicon nanowires using neopentasilane as precursor and gold as catalyst

• Britta Kämpken,
• Verena Wulf,
• Norbert Auner,
• Marcel Winhold,
• Michael Huth,
• Daniel Rhinow and
• Andreas Terfort

Beilstein J. Nanotechnol. 2012, 3, 535–545, doi:10.3762/bjnano.3.62

• deposited as a thin film and thermally annealed, but can also be patterned by using UV irradiation, providing access to laterally structured layers of silicon nanowires. Keywords: chemical vapor deposition; gold; nanoparticle; patterning; radiation-induced nanostructures; vapor-liquid-solid mechanism

• around 150 nm. Additionally, smaller-scaled NWs growing in a buckled way could be observed on the substrate (Figure 11, right). The polymeric nature of “liquid bright gold” offers opportunities for patterning and hence controlling the growth areas of the NWs. One well-established method for the patterned

• spin-coated films of “liquid bright gold” at 650 °C, dense layers of nanoparticles can be easily formed, which serve as efficient catalysts for Si NW production. An interesting extension of this approach is that these films can be cross-linked by UV irradiation, permitting their lateral patterning

Colloidal lithography for fabricating patterned polymer-brush microstructures

• Tao Chen,
• Debby P. Chang,
• Rainer Jordan and
• Stefan Zauscher

Beilstein J. Nanotechnol. 2012, 3, 397–403, doi:10.3762/bjnano.3.46

• : atom-transfer radical polymerization; colloidal lithography; patterning; self-assembled microsphere monolayer; Introduction It is well known that monodisperse colloidal microspheres easily self-assemble into hexagonally close-packed arrays on surfaces as a result of capillary forces arising from the

• separation of biological molecules [14][15][16]. They can be grown by surface-initiated polymerization from surface-confined initiator templates, as fabricated by various lithographic approaches. Although a range of strategies for polymer brush patterning, including photolithography [17], electron-beam

• lithography [18], electron-beam chemical lithography [19], microcontact printing (µCP) [20], scanning-probe lithography [21] and capillary-force lithography [22], have been exploited over the years, there is still considerable interest in the exploitation of new, simple patterning strategies that do not

Combining nanoscale manipulation with macroscale relocation of single quantum dots

• Francesca Paola Quacquarelli,
• Richard A. J. Woolley,
• Martin Humphry,
• Jasbiner Chauhan,
• Philip J. Moriarty and
• Ashley Cadby

Beilstein J. Nanotechnol. 2012, 3, 324–328, doi:10.3762/bjnano.3.36

• patterning procedure allows us to (re-)locate a given, previously positioned, QD in any optical system. To manipulate and characterise a single quantum dot we required the ability to repeatedly address an area of only a few square nanometres on a 10 × 10 mm2 substrate. In order to realise this relocation

Variations in the structure and reactivity of thioester functionalized self-assembled monolayers and their use for controlled surface modification

• Inbal Aped,
• Yacov Mazuz and
• Chaim N. Sukenik

Beilstein J. Nanotechnol. 2012, 3, 213–220, doi:10.3762/bjnano.3.24

• reported. A striking example of in situ SAM transformations is based on the initial deposition of thioacetate-bearing monolayers and their in situ conversion to sulfonic acid surfaces [15]. This transformation provides the basis for surface patterning of the monolayer and for its use as a patterned

Parallel- and serial-contact electrochemical metallization of monolayer nanopatterns: A versatile synthetic tool en route to bottom-up assembly of electric nanocircuits

• Jonathan Berson,
• Assaf Zeira,
• Rivka Maoz and
• Jacob Sagiv

Beilstein J. Nanotechnol. 2012, 3, 134–143, doi:10.3762/bjnano.3.14

• –solution interface by ion migration to the electrode rather than by electron transfer to hydrated ions in solution. Keywords: AFM (SFM); bipolar electrochemistry; electrochemical metal deposition; monolayer patterning; nanolithography; self-assembled organosilane monolayers; Introduction The quest for a

• ][20][21][22][23][24][25][26][27][28]. To this end, a monolayer-patterning methodology, referred to as constructive lithography (CL), has been advanced, which allows nondestructive local electrooxidation of the top –CH3 groups of a self-assembled OTS/Si monolayer (highly ordered monolayer assembled on

• one-step parallel printing of OTSeo features extending over much larger surface areas, typically beyond the micrometer (constructive microlithography, CML) [16][22]. Recently, we demonstrated a two-step CL patterning and pattern metallization process, referred to as contact electrochemical patterning

Self-assembly of octadecyltrichlorosilane: Surface structures formed using different protocols of particle lithography

• ChaMarra K. Saner,
• Kathie L. Lusker,
• Zorabel M. LeJeune,
• Wilson K. Serem and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2012, 3, 114–122, doi:10.3762/bjnano.3.12

• nanomaterials. The surface density of nanostructures can be designed by selecting the diameter of mesospheres, for high-throughput patterning on the order of 109 nanostructures per square centimeter. Different approaches with particle lithography have been successful for producing periodic, 2D arrays of

• helpful for new applications and developments in the patterning of biomolecules or nanoparticles for optical measurements and biosensor surfaces. The morphology of SAMs or nanostructures of OTS reflects a balance of the interactions that occur between the silane precursor and the silanol groups

• outcome of patterning with particle lithography. Polystyrene latex has been described as a “hairy” particle, with strands of polystyrene extending across the exterior surface areas of the beads. The strands provide surface sites for interaction with OTS to produce a cross-linked arrangement within the

Electron-beam patterned self-assembled monolayers as templates for Cu electrodeposition and lift-off

• Zhe She,
• Andrea DiFalco,
• Georg Hähner and
• Manfred Buck

Beilstein J. Nanotechnol. 2012, 3, 101–113, doi:10.3762/bjnano.3.11

• patterned SAM layer does not deteriorate during the lift-off process it may serve as a master that can be straightforwardly reused [15]. This is of particular advantage for small-scaled structures in which patterning becomes increasingly time-consuming and expensive. The feasibility of this SAM based

• hexadecane thiol (CH3(CH2)15SH, MC16) as a blocking thiol [15]. The present paper is an investigation of a scheme for creating surface features with smaller dimensions by using e-beam patterning of a single-component SAM of ω-(4'-methylbiphenyl-4-yl)thiol (CH3–C6H4–C6H4–SH, MBP0). While selective deposition

• rate becomes very small. These two points together are very important as they are the key to high-resolution patterning. A double-pulse-polarisation scheme is applied in which an initial nucleation phase at an overpotential that is significantly larger than ηcrit is followed by further growth at lower

Substrate-mediated effects in photothermal patterning of alkanethiol self-assembled monolayers with microfocused continuous-wave lasers

• Anja Schröter,
• Mark Kalus and
• Nils Hartmann

Beilstein J. Nanotechnol. 2012, 3, 65–74, doi:10.3762/bjnano.3.8

• locally heat the substrate surface and initiate desorption or decomposition of the coating. Because of the strongly temperature-dependent desorption kinetics, the overall process is highly nonlinear in the applied laser power. For this reason, subwavelength patterning is feasible employing ordinary

• continuous-wave lasers. The lateral resolution, generally, depends on both the type of the organic monolayer and the nature of the substrate. In previous studies we reported on photothermal patterning of distinct types of SAMs on Si supports. In this contribution, a systematic study on the impact of the

• patterning technique. Because of the strongly temperature-dependent thermal conductivity of Si, surface-temperature profiles on Au/Si substrates are very narrow ensuring a particularly high lateral resolution. At a 1/e spot diameter of 2 µm, fabrication of subwavelength structures with diameters of 300–400

Direct-write polymer nanolithography in ultra-high vacuum

• Woo-Kyung Lee,
• Minchul Yang,
• Arnaldo R. Laracuente,
• William P. King,
• Lloyd J. Whitman and
• Paul E. Sheehan

Beilstein J. Nanotechnol. 2012, 3, 52–56, doi:10.3762/bjnano.3.6

• decrease as the inverse square root of the scan speed. The widths of the deposited structures decrease monotonically with the scan speed but do not show a clear power law relationship. When patterning under ambient conditions, dimensional control may be achieved by varying the tip temperature; however, the