Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• well-defined configurations for building integrated systems for micro- and nanoelectronics. In this regard, classical methods like optical lithography (OL) [13] and electron beam lithography (EBL) [14], but also focused ion beam (FIB) processing [15], have been successfully applied to fabricate

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

• Alexandra M. Patron,
• Timothy S. Hooker,
• Daniel F. Santavicca,
• Corey P. Causey and
• Thomas J. Mullen

Beilstein J. Nanotechnol. 2017, 8, 2339–2344, doi:10.3762/bjnano.8.233

• techniques such as photolithography or electron-beam lithography (Figure 1) [14][15][16][17][18][19][20][21][22][23][24]. In short, a metal structure that has been patterned on a non-metal substrate (e.g., Si) using conventional lithography is subsequently covered by a metal-ligated multilayer through the

Fabrication of gold-coated PDMS surfaces with arrayed triangular micro/nanopyramids for use as SERS substrates

• Jingran Zhang,
• Yongda Yan,
• Peng Miao and
• Jianxiong Cai

Beilstein J. Nanotechnol. 2017, 8, 2271–2282, doi:10.3762/bjnano.8.227

• ], such as electron-beam lithography (EBL) [11][12], soft interference lithography (SIL) [13][14], and nanosphere lithography (NSL) [15][16]. To improve the reproducibility and production quantity of SERS substrates, researchers have focused on replicating molded micro/nanostructures as SERS substrates

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

• Laura Evangelio,
• Federico Gramazio,
• Matteo Lorenzoni,
• Michaela Gorgoi,
• Francisco Miguel Espinosa,
• Ricardo García,
• Francesc Pérez-Murano and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

• silicon wafer, left in the Figure) and the block copolymer domains. The first DSA (two steps) process uses electron beam lithography (EBL) [12] on a poly(methyl methacrylate) (PMMA) resist with a subsequent substrate functionalization with oxygen plasma of the uncovered areas (top of Figure 1). The two

A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls

• Carlos Angulo Barrios and
• Víctor Canalejas-Tejero

Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124

• fabrication sequence of an array of closed nanocages (hollow nanopillars) made of thin-walled Al. First, an array of SU-8 negative resist nanopillars are created by electron-beam lithography (EBL) on an Al-coated Si substrate (Figure 1a). The SU-8 nanopillars exhibit a smooth surface with rounded top edges

• (Microchem Corp.) was spun at 3000 rpm on a 100 nm thick Al film, which was previously deposited on a Si substrate, and soft-baked at 110 °C for 1 min on a hot plate. Next, a 600 nm period square lattice of circular solid nanodots was written in the resist film by electron beam lithography (EBL) at 50 kV and

• array of hollow, closed, Al nanocages. a) SU-8 resist nanopillar array (period = 600 nm) fabricated by electron-beam lithography on an Al-coated Si substrate. b) Structure shown in (a) after the deposition of a thin Al film (thickness on horizontal surface = 40 nm) by metal evaporation. c) Structure

Assembly of metallic nanoparticle arrays on glass via nanoimprinting and thin-film dewetting

• Sun-Kyu Lee,
• Sori Hwang,
• Yoon-Kee Kim and
• Yong-Jun Oh

Beilstein J. Nanotechnol. 2017, 8, 1049–1055, doi:10.3762/bjnano.8.106

• , high-resolution lithography techniques – such as electron beam lithography (EBL) or laser interference lithography (LIL) – with a conventional multistep etching process on a silicon wafer are still required to fabricate templates with nanostructured surface topographies that determine the features of

Near-field surface plasmon field enhancement induced by rippled surfaces

• Mario D’Acunto,
• Francesco Fuso,
• Ruggero Micheletto,
• Makoto Naruse,
• Francesco Tantussi and
• Maria Allegrini

Beilstein J. Nanotechnol. 2017, 8, 956–967, doi:10.3762/bjnano.8.97

• -down lithographic techniques such as electron beam lithography and nanosphere lithography [22][23][24]. In this paper, we simulate the conditions of SPP field enhancement and the formation of dark and hot, or bright spots, for a wide variety of patterned surfaces. The patterned surfaces are numerically

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

• Brett B. Lewis,
• Robert Winkler,
• Xiahan Sang,
• Pushpa R. Pudasaini,
• Michael G. Stanford,
• Harald Plank,
• Raymond R. Unocic,
• Jason D. Fowlkes and
• Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

• combination of photolithography and electron beam lithography (EBL) were used to produce the two-contact pads with a spacing of 500 nm. An initial set of gold electrical contacts were patterned using photolithography and deposited with a thickness of 100 nm. A 3 nm titanium adhesion layer was deposited, prior

Computing the T-matrix of a scattering object with multiple plane wave illuminations

• Martin Fruhnert,
• Ivan Fernandez-Corbaton,
• Vassilios Yannopapas and
• Carsten Rockstuhl

Beilstein J. Nanotechnol. 2017, 8, 614–626, doi:10.3762/bjnano.8.66

• metallic disks, usually separated by a dielectric spacer layer. This particle is preferably fabricated by top-down procedures, such as electron beam lithography [5][45]. The investigated object has a disk radius of 60 nm, a disk height of 30 nm and a gap thickness of 10 nm. The metal disks consist of gold

Sub-nanosecond light-pulse generation with waveguide-coupled carbon nanotube transducers

• Felix Pyatkov,
• Svetlana Khasminskaya,
• Vadim Kovalyuk,
• Frank Hennrich,
• Manfred M. Kappes,
• Gregory N. Goltsman,
• Wolfram H. P. Pernice and
• Ralph Krupke

Beilstein J. Nanotechnol. 2017, 8, 38–44, doi:10.3762/bjnano.8.5

• electron beam lithography on top of Si3N4/SiO2/Si substrate. Au/Cr contacts were produced by physical vapor deposition, and 600 nm wide, half-etched Si3N4-waveguides were formed with reactive ion etching. A typical sample contains tens of contact pairs and CNTs that were placed in between using

Effect of Anderson localization on light emission from gold nanoparticle aggregates

• Mohamed H. Abdellatif,
• Marco Salerno,
• Gaser N. Abdelrasoul,
• Ioannis Liakos,
• Alice Scarpellini,
• Sergio Marras and
• Alberto Diaspro

Beilstein J. Nanotechnol. 2016, 7, 2013–2022, doi:10.3762/bjnano.7.192

• localization is due to the increase of the radiative process in the localized field. These results suggest that by fabricating special surface patterns using electron beam lithography or by self-assembly, the localization of light can be engineered. The possibility to generate Anderson localization by control

Thickness-modulated tungsten–carbon superconducting nanostructures grown by focused ion beam induced deposition for vortex pinning up to high magnetic fields

• Ismael García Serrano,
• Javier Sesé,
• Isabel Guillamón,
• Hermann Suderow,
• Sebastián Vieira,
• Manuel Ricardo Ibarra and
• José María De Teresa

Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162

• ][29][30][31][32][33][34][35][36][37][38][39][40][41][42][43][44][45]. In order to design vortex-pinning landscapes, electron beam lithography is commonly used to fabricate arrays of holes [33][40] or arrays of magnetic dots/lines [30][34][36][39][41], whereas selective ion implantation [29][38][41

Role of solvents in the electronic transport properties of single-molecule junctions

• Katharina Luka-Guth,
• Sebastian Hambsch,
• Andreas Bloch,
• Philipp Ehrenreich,
• Bernd Michael Briechle,
• Filip Kilibarda,
• Torsten Sendler,
• Dmytro Sysoiev,
• Thomas Huhn,
• Artur Erbe and
• Elke Scheer

Beilstein J. Nanotechnol. 2016, 7, 1055–1067, doi:10.3762/bjnano.7.99

• is annealed for 6 h at 430 °C in vacuum (10−5 mbar). The polyimide layer serves as an electrical insulator and a sacrificial layer in the subsequent etching process. Prior to performing the electron beam lithography performed in a FEI scanning electron microscope XL30 equipped with a pattern

A terahertz-vibration to terahertz-radiation converter based on gold nanoobjects: a feasibility study

• Kamil Moldosanov and
• Andrei Postnikov

Beilstein J. Nanotechnol. 2016, 7, 983–989, doi:10.3762/bjnano.7.90

• in mind the care to be taken. The second remark is that the above estimated dimensions of GNBs and GNRs are on the edge in yet another way, namely, their size is at the resolution limit for available lithographic techniques (intrinsic resolution of the electron beam lithography [12] is 3–5 nm

Large-scale fabrication of achiral plasmonic metamaterials with giant chiroptical response

• Morten Slyngborg,
• Yao-Chung Tsao and
• Peter Fojan

Beilstein J. Nanotechnol. 2016, 7, 914–925, doi:10.3762/bjnano.7.83

• technique while retaining control and order of the resulting arrays. This signifies a substantial improvement to standard fabrication methods such as focused ion beam and electron beam lithography concerning cost and production time. Furthermore, the use of a small chiral organic molecule and a protein has

• beam lithography or focused ion beam milling, which both are expensive and time consuming methods. Large-scale fabrication of PCMs have been attempted to some degree applying different approaches such as glancing angle deposition [28], scaffold ornamentation [29][30], individual chiral nanoparticles

• gold deposition [26] and structures formed by carbon nanotubes [27]. However, in order to be able to apply these metamaterials in sensing devices of organic molecules and biomolecules a reliable large-area fabrication method is required. State-of-the-art fabrication techniques are based on electron

Direct formation of gold nanorods on surfaces using polymer-immobilised gold seeds

• Majid K. Abyaneh,
• Pietro Parisse and
• Loredana Casalis

Beilstein J. Nanotechnol. 2016, 7, 809–816, doi:10.3762/bjnano.7.72

• noble metal NRs or NWs with various techniques, such as electron-beam lithography [14][15], Langmuir–Blodgett (L–B) methods [16], stretched polymer matrices [17], self-assembly [18][19][20], and electric fields [21]. However, both direct and indirect surface-growth approaches present significant

Thermo-voltage measurements of atomic contacts at low temperature

• Ayelet Ofarim,
• Bastian Kopp,
• Thomas Möller,
• León Martin,
• Johannes Boneberg,
• Paul Leiderer and
• Elke Scheer

Beilstein J. Nanotechnol. 2016, 7, 767–775, doi:10.3762/bjnano.7.68

• gradient is achieved by illuminating the sample locally with a focused laser beam. Results and Discussion Realization of the thermopower measurement The sample was prepared by electron-beam lithography as described earlier [22] but using Kapton Cirlex as substrate material instead of the typical break

• ). This metal layer was removed after electron-beam lithography by soaking the sample in a sodium hydroxide solution for few tens of seconds. An optical cryostat was used, allowing measurements at 77 K or 4 K. Preliminary measurements have shown the necessity to work at low temperature to enhance temporal

Highly compact refractive index sensor based on stripe waveguides for lab-on-a-chip sensing applications

• Chamanei Perera,
• Kristy Vernon,
• Elliot Cheng,
• Juna Sathian,
• Esa Jaatinen and
• Timothy Davis

Beilstein J. Nanotechnol. 2016, 7, 751–757, doi:10.3762/bjnano.7.66

• of the sample arm via a second electron beam lithography (EBL) process, and was used to place sample solution on top of the sample arm. The presence of the sample changes the wavenumber of the propagating plasmon mode hence changes the output intensity at the end of the sample arm. The sample arm and

• . First, the RI sensor designs and alignment marks were patterned on a 300 nm bilayer PMMA resist (950 k A4 / 495 k A4 PMMA resist from Microchem GmbH) using electron beam lithography (JEOL-7800 FE-SEM with Raith Quantum Elphy) with a beam current of ≈75 pA and 20 kV acceleration voltage under optimal

Linear and nonlinear optical properties of hybrid metallic–dielectric plasmonic nanoantennas

• Mario Hentschel,
• Bernd Metzger,
• Bastian Knabe,
• Karsten Buse and
• Harald Giessen

Beilstein J. Nanotechnol. 2016, 7, 111–120, doi:10.3762/bjnano.7.13

• , Germany Fraunhofer Institute for Physical Measurement Techniques IPM, Heidenhofstr. 8, 79110 Freiburg, Germany 10.3762/bjnano.7.13 Abstract We study the linear and nonlinear optical properties of hybrid metallic–dielectric plasmonic gap nanoantennas. Using a two-step-aligned electron beam lithography

• achieve this goal. In all these cases, these techniques such as high-resolution electron beam lithography [78][79], self-assembled molecular monolayers [77], spacer layer engineering via atomic layer deposition [45], self-assembly of metallic nanoparticles with DNA and other molecular binding units [46

• harmonic response from the nanocrystals while the antenna array itself remains “dark” (meaning it does not cause any second harmonic light). Figure 2a illustrates the basic steps in producing these samples. Gold nanoantennas as well as gold alignment marks are fabricated via standard electron beam

Surface-enhanced Raman scattering by colloidal CdSe nanocrystal submonolayers fabricated by the Langmuir–Blodgett technique

• Alexander G. Milekhin,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Volodymyr M. Dzhagan,
• Ovidiu D. Gordan,
• Sergey L. Veber,
• Cameliu Himcinschi,
• Alexander V. Latyshev and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2015, 6, 2388–2395, doi:10.3762/bjnano.6.245

• can be fabricated by means of electron-beam lithography [34][35], nanoimprint lithography [36][37], or nanosphere lithography [38][39], the deposition of homogeneous films of CdSe NCs is possible by using Langmuir–Blodgett (LB) technology [40][41][42][43]. In this paper we report on the study of

• ]. The fabrication details of regular arrays of Au nanoclusters and dimers on a Si substrate are presented in [29]. In addition to regular arrays of Au nanoclusters, arrays of paired Au nanoclusters or dimers were fabricated by electron beam lithography on a Si substrate covered with 75 nm of SiO2. The

Orthogonal chemical functionalization of patterned gold on silica surfaces

• Francisco Palazon,
• Didier Léonard,
• Thierry Le Mogne,
• Francesca Zuttion,
• Céline Chevalier,
• Magali Phaner-Goutorbe,
• Éliane Souteyrand,
• Yann Chevolot and
• Jean-Pierre Cloarec

Beilstein J. Nanotechnol. 2015, 6, 2272–2277, doi:10.3762/bjnano.6.233

• to 100 µm. Electron beam lithography was used to develop the gold nanostructures (typical dimensions of 100 nm). Titanium (8 nm) and gold (30 nm) were deposited by electron beam evaporation. After lift-off, the samples were cleaned by oxygen plasma treatment (Anatech) at 400 sccm of oxygen, 350 W of

Mapping bound plasmon propagation on a nanoscale stripe waveguide using quantum dots: influence of spacer layer thickness

• Chamanei S. Perera,
• Alison M. Funston,
• Han-Hao Cheng and
• Kristy C. Vernon

Beilstein J. Nanotechnol. 2015, 6, 2046–2051, doi:10.3762/bjnano.6.208

• , 750 nm wide with grating using electron beam lithography (EBL). Bilayer PMMA (950k A4 and 495k A4 PMMA from Microchem GmbH) was patterned using EBL and then developed for 30 seconds in MIBK:IPA developer solution. A silver film with 30 nm thickness was evaporated onto the resist using PVD 75 electron

Electrical properties and mechanical stability of anchoring groups for single-molecule electronics

• Riccardo Frisenda,
• Simge Tarkuç,
• Elena Galán,
• Mickael L. Perrin,
• Rienk Eelkema,
• Ferdinand C. Grozema and
• Herre S. J. van der Zant

Beilstein J. Nanotechnol. 2015, 6, 1558–1567, doi:10.3762/bjnano.6.159

• consists of a fine-polished, 500 μm thick, phosphorous bronze sheet coated with 6 μm of insulating polyimide. A gold wire, with a 50 nm wide constriction in the middle, is fabricated on top of the polyimide with standard electron beam lithography, evaporation and lift-off techniques. After a final O2/CF4

The Kirkendall effect and nanoscience: hollow nanospheres and nanotubes

• Abdel-Aziz El Mel,
• Ryusuke Nakamura and
• Carla Bittencourt

Beilstein J. Nanotechnol. 2015, 6, 1348–1361, doi:10.3762/bjnano.6.139

• with other fabrication processes. An example is to apply electron beam lithography to Kirkendall nanotubes, which allows the design of ordered periodic metal nanoparticles confined inside oxide nanotubes (Figure 14) [64]. Another possibility is the combination of the Kirkendall effect with galvanic

Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition

• Luis A. Rodríguez,
• Lorenz Deen,
• Rosa Córdoba,
• César Magén,
• Etienne Snoeck,
• Bert Koopmans and
• José M. De Teresa

Beilstein J. Nanotechnol. 2015, 6, 1319–1331, doi:10.3762/bjnano.6.136

• with widths above 250 nm [26][27] and previously in permalloy [33] and cobalt [34][35][36] nanowires patterned by electron beam lithography. Such dependence was explained by a model in which a small volume in the wire reverses magnetization coherently, propagating across the entire wire. In such a