High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• ) radiation; focused ion beam (FIB); Fresnel zone plate; ion beam lithography (IBL); nanopatterning; soft X-rays; Introduction Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or

• (SEM), focused ion beam (FIB) dual-beam instrument, installed with a lithography attachment (Please see the Experimental section for details). Several exposure, milling or patterning strategies can be adopted in an IBL process. A few such processing procedures relevant to present work are illustrated

• the beam path), the current and the dwell time need to be precisely adjusted. Following the structuring of the zones, a ca. 3 µm thick beamstop was deposited in the central inactive region via focused ion beam induced deposition (FIBID) of Pt using trimethyl(cyclopentadienyl)platinum(IV), (CH3

Know your full potential: Quantitative Kelvin probe force microscopy on nanoscale electrical devices

• Amelie Axt,
• Ilka M. Hermes,
• Victor W. Bergmann,
• Niklas Tausendpfund and
• Stefan A. L. Weber

Beilstein J. Nanotechnol. 2018, 9, 1809–1819, doi:10.3762/bjnano.9.172

• stronger lateral averaging of the AM-KPFM in lift mode and the presence of a stray electric field. Such a field could originate from gallium ions deposited into the glass substrate during the focused ion beam polishing of the cross section. Our general recommendation for quantitative device measurements is

• compact MAPI capping layer, the hole transport material spiro-OMETAD and a gold electrode. Prior to the measurement the cross section of the solar cell was polished with a focused ion beam (FIB) to minimize topographic crosstalk. The CPD line profiles in a) were extracted from double side band frequency

Magnetic properties of Fe₃O₄ antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

• Juan L. Palma,
• Alejandro Pereira,
• Raquel Álvaro,
• José Miguel García-Martín and
• Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

• .9.164 Abstract Magnetic films of magnetite (Fe3O4) with controlled defects, so-called antidot arrays, were synthesized by a new technique called AFIR. AFIR consists of the deposition of a thin film by atomic layer deposition, the generation of square and hexagonal arrays of holes using focused ion beam

• variable lattice parameters. Keywords: antidot arrays; atomic layer deposition; focused ion beam; magnetic properties; thermal reduction; Introduction Magnetic antidots, magnetic thin films with periodic arrays of holes, are currently an important topic for both the fundamental understanding of low

• [23] and colloidal [24] lithography, porous anodic alumina [25][26], block copolymer templates [27], nanochannel glass [28] and focused ion beam (FIB) patterning [29][30]. Recently, we have proposed the fabrication of disordered antidot arrays through the thermal reduction of thin films synthesized by

Toward the use of CVD-grown MoS₂ nanosheets as field-emission source

• Geetanjali Deokar,
• Nitul S. Rajput,
• Junjie Li,
• Francis Leonard Deepak,
• Wei Ou-Yang,
• Nicolas Reckinger,
• Carla Bittencourt,
• Jean-Francois Colomer and
• Mustapha Jouiad

Beilstein J. Nanotechnol. 2018, 9, 1686–1694, doi:10.3762/bjnano.9.160

• sulfurized Mo films on SiO2/Si substrates was characterized using field-emission scanning electron microscopy (FE-SEM) combined with a Helios FEITM NanoLab 650 focused ion beam (FIB) system. Transmission electron microscopy (TEM) lamella were prepared using the standard FIB lift-out technique described in an

Friction force microscopy of tribochemistry and interfacial ageing for the SiO_x/Si/Au system

• Christiane Petzold,
• Marcus Koch and
• Roland Bennewitz

Beilstein J. Nanotechnol. 2018, 9, 1647–1658, doi:10.3762/bjnano.9.157

• tip height. One Au/Si tip apex was analyzed by transmission electron microscopy (TEM; JEM-2100(HR) LaB6, JEOL GmbH, Eching, Germany, 200 kV acceleration voltage) after activation on Au(111) and sliding experiments. The tip was cut using a focused ion beam (Versa3D; FEI, Eindhoven, Netherlands) to a

Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• ; this is why a proper fabrication tool, able to guarantee good flexibility, is required to meet research goals. Typically, the fabrication of nanostructured systems involves techniques such as electron beam and focused ion beam lithography in order to realize arrays of nanoscale features with precise

Correlative electrochemical strain and scanning electron microscopy for local characterization of the solid state electrolyte Li_1.3Al_0.3Ti_1.7(PO₄)₃

• Nino Schön,
• Deniz Cihan Gunduz,
• Shicheng Yu,
• Hermann Tempel,
• Roland Schierholz and
• Florian Hausen

Beilstein J. Nanotechnol. 2018, 9, 1564–1572, doi:10.3762/bjnano.9.148

• detail, a different preparation method has been employed to obtain a significantly smoother LATP surface. Figure 4 shows an SEM picture of the area on LATP sintered at 1000 °C that was polished by means of a focused ion beam (FIB). Please note that the color contrast is inverted in this case as the SEM

• preannealing, shaping, pressing and sintering in air at 1000 °C or 1050 °C for 8 h as indicated. For both AFM as well as SEM measurements, the pellets were subject to a polishing step by hand polishing or by focused-ion beam. Hand polishing Smooth LATP surfaces suitable for SEM and AFM analysis were achieved

• master polish. Afterwards, the pellets were rinsed thoroughly with isopropanol. Focused-ion beam polishing For comparison, a second sample was additionally polished using a focused-ion beam (FEI (now Thermo-Fisher) Helios 460F1) [33]. For this, a polished SEM sample was used. A protective Pt-layer the

Absence of free carriers in silicon nanocrystals grown from phosphorus- and boron-doped silicon-rich oxide and oxynitride

• Daniel Hiller,
• Julian López-Vidrier,
• Keita Nomoto,
• Michael Wahl,
• Wolfgang Bock,
• Tomáš Chlouba,
• František Trojánek,
• Sebastian Gutsch,
• Margit Zacharias,
• Dirk König,
• Petr Malý and
• Michael Kopnarski

Beilstein J. Nanotechnol. 2018, 9, 1501–1511, doi:10.3762/bjnano.9.141

• (≈40 K) and a chamber pressure of 10−12–10−11 Torr. The atom detection efficiency is 57%. For data reconstruction IVAS™ software (version 3.6.6) was used. APT specimen (needle-shaped tips attached onto the apex of a Mo support grid) were structured using an Auriga (Zeiss) focused ion beam scanning

A novel copper precursor for electron beam induced deposition

• Caspar Haverkamp,
• George Sarau,
• Mikhail N. Polyakov,
• Ivo Utke,
• Marcos V. Puydinger dos Santos,
• Silke Christiansen and
• Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

• . Cross-sectional samples from planar deposits for imaging by TEM were prepared by a focused ion beam (FIB) lift-out technique in a Zeiss Crossbeam 340 KMAT. TEM on the cross-sections was performed on a JEOL JEM2200fs CM12. SAED pattern indexing was carried out using CSpot software (CrystOrient

Effect of annealing treatments on CeO₂ grown on TiN and Si substrates by atomic layer deposition

• Silvia Vangelista,
• Rossella Piagge,
• Satu Ek and
• Alessio Lamperti

Beilstein J. Nanotechnol. 2018, 9, 890–899, doi:10.3762/bjnano.9.83

• [25]. Focused ion beam has been used to prepare lamellae of selected samples for transmission electron microscopy (TEM) analysis (cross and plan view, Fei Tecnai G2) in bright or dark field at a voltage of 200 kV. Plan view images are treated with free software to obtain the crystallite size

Single-step process to improve the mechanical properties of carbon nanotube yarn

• Maria Cecilia Evora,
• Xinyi Lu,
• Nitilaksha Hiremath,
• Nam-Goo Kang,
• Kunlun Hong,
• Roberto Uribe,
• Gajanan Bhat and
• Jimmy Mays

Beilstein J. Nanotechnol. 2018, 9, 545–554, doi:10.3762/bjnano.9.52

• ). CNT yarn is cylindrical and the diameter ranges between 50 a 60 µm. The tensile testing of the yarn samples were kept constant in terms of length of 25.4 mm. The morphology of CNT yarns was investigated using a Zeiss Auriga dual beam focused ion beam (FIB) and scanning electron microscope (SEM) in

Al₂O₃/TiO₂ inverse opals from electrosprayed self-assembled templates

• Arnau Coll,
• Sandra Bermejo,
• David Hernández and
• Luís Castañer

Beilstein J. Nanotechnol. 2018, 9, 216–223, doi:10.3762/bjnano.9.23

• layers of 360 nm polystyrene nanoparticles can be seen. The layer is almost free of defects besides some missing beads that can be identified in the top surface. A focused ion beam (FIB) drill in two orthogonal vertical planes confirms that the order is fully three-dimensional. The total thickness of the

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• well-defined configurations for building integrated systems for micro- and nanoelectronics. In this regard, classical methods like optical lithography (OL) [13] and electron beam lithography (EBL) [14], but also focused ion beam (FIB) processing [15], have been successfully applied to fabricate

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• widely utilized [8][9][10] due to the growing number of modern scanning electron microscopes (SEMs) which can be combined with focused ion beam (FIB) systems that are equipped with gas injection systems by default. Rather than being merely characterization instruments, such SEMs are now becoming

Magnetic properties of optimized cobalt nanospheres grown by focused electron beam induced deposition (FEBID) on cantilever tips

• Soraya Sangiao,
• César Magén,
• Darius Mofakhami,
• Grégoire de Loubens and
• José María De Teresa

Beilstein J. Nanotechnol. 2017, 8, 2106–2115, doi:10.3762/bjnano.8.210

• observation in a specific geometry. Firstly, the cantilever pyramid tip is cut by focused ion beam (FIB) milling and lifted-out by a micromanipulator. Then, the cantilever tip is welded onto a TEM copper grid by a FIB-induced Pt deposition, as illustrated in Figure 3a. Then, the FEBID cobalt nanosphere is

Growth, structure and stability of sputter-deposited MoS₂ thin films

• Reinhard Kaindl,
• Bernhard C. Bayer,
• Roland Resel,
• Thomas Müller,
• Viera Skakalova,
• Gerlinde Habler,
• Rainer Abart,
• Alexey S. Cherevan,
• Dominik Eder,
• Maxime Blatter,
• Fabian Fischer,
• Jannik C. Meyer,
• Dmitry K. Polyushkin and
• Wolfgang Waldhauser

Beilstein J. Nanotechnol. 2017, 8, 1115–1126, doi:10.3762/bjnano.8.113

• incident angle of αi = 0.13° was chosen to enhance the scattered intensities of the adsorbate. The angular scans have been transferred to scattering vector notation using q = 4πsin(Θ)/λxt. Scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDX) and focused ion beam (FIB

Ion beam profiling from the interaction with a freestanding 2D layer

• Ivan Shorubalko,
• Kyoungjun Choi,
• Michael Stiefel and
• Hyung Gyu Park

Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73

• , Department of Mechanical and Process Engineering, Eidgenössische Technische Hochschule (ETH) Zürich, Tannenstrasse 3, CH-8092 Zürich, Switzerland 10.3762/bjnano.8.73 Abstract Recent years have seen a great potential of the focused ion beam (FIB) technology for the nanometer-scale patterning of a

• source. Our method of profiling ion beams with 2D-layer perforation provides more information on ion beam profiles than the conventional sharp-edge scan method does. Keywords: exposure dose; focused ion beam; freestanding 2D layer; graphene; ion beam diameter; ion beam point spread function

• focused ion beam across the knife edge can change the edge shape because of a milling effect incurred by the ion beam irradiation itself. Increasing the scan speed over the edge in order to avert the damage, gives rise to other problems such as shot noise and statistical beam fluctuations. Another

Flexible photonic crystal membranes with nanoparticle high refractive index layers

• Torben Karrock,
• Moritz Paulsen and
• Martina Gerken

Beilstein J. Nanotechnol. 2017, 8, 203–209, doi:10.3762/bjnano.8.22

• (SEM). The cross-section was created with a focused ion beam (FIB). To protect the cutting edge, a layer of platinum was added on top of the sample. The structure itself is emphasized because of charging effects at the PDMS material border. For optical enhancement dotted guiding lines were drawn into

Grazing-incidence optical magnetic recording with super-resolution

• Gunther Scheunert,
• Sidney. R. Cohen,
• René Kullock,
• Ryan McCarron,
• Katya Rechev,
• Ifat Kaplan-Ashiri,
• Ora Bitton,
• Paul Dawson,
• Bert Hecht and
• Dan Oron

Beilstein J. Nanotechnol. 2017, 8, 28–37, doi:10.3762/bjnano.8.4

• -fields antiparallel to the DC field, and thus created a more manageable background. Transmission electron microscopy (TEM) cross-sectional imaging was done on a sample lamella prepared via focused ion beam (FIB) of one of the Seagate platters to identify the thin-film layer structure used for modelling

Annealing-induced recovery of indents in thin Au(Fe) bilayer films

• Anna Kosinova,
• Ruth Schwaiger,
• Leonid Klinger and
• Eugen Rabkin

Beilstein J. Nanotechnol. 2016, 7, 2088–2099, doi:10.3762/bjnano.7.199

• ) on the Au (111) reflection. Cross-section samples were prepared in a dual-beam focused ion beam microscope (FIB; FEI Strata 400-S). Appendix Topography evolution of an axisymmetrical indent by surface diffusion (small slope approximation) To check whether surface diffusion alone can lead to indent

Thickness-modulated tungsten–carbon superconducting nanostructures grown by focused ion beam induced deposition for vortex pinning up to high magnetic fields

• Ismael García Serrano,
• Javier Sesé,
• Isabel Guillamón,
• Hermann Suderow,
• Sebastián Vieira,
• Manuel Ricardo Ibarra and
• José María De Teresa

Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162

• Materiales de Aragón (ICMA), CSIC - Universidad de Zaragoza, 50009 Zaragoza, Spain 10.3762/bjnano.7.162 Abstract We report efficient vortex pinning in thickness-modulated tungsten–carbon-based (W–C) nanostructures grown by focused ion beam induced deposition (FIBID). By using FIBID, W–C superconducting

• pinning potentials, maximizing the opportunities for the investigation of fundamental aspects in vortex science under changing external stimuli (e.g., temperature, magnetic field, electrical current). Keywords: focused ion beam induced deposition; magnetotransport; superconductivity; vortex lattice

• ] and insertion of structural defects [35][37][43] are other common pinning strategies. The use of a focused ion beam (FIB) for enhanced vortex pinning through local removal of the superconducting material has been explored as well [40][42][46][47][48]. In contrast to our approach followed here, such

Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

• Alexandra M. Greiner,
• Adria Sales,
• Hao Chen,
• Sarah A. Biela,
• Dieter Kaufmann and
• Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

• lithography [66]), etching (focused-ion beam [67] and electron-beam nanolithography [68]), electrical (electrospinning [69][70][71][72]), mechanical (nanoskiving [46][73], nanoimprint lithography [66]) and colloidal (colloidal lithgraphy [74][75]) are given here. Nanoscale optical photolithography takes

• techniques [76]. In UV-NIL, the mold is brought into contact with a wafer previously coated with photoresist and solidified with UV light. A resolution of 30 nm can be achieved [77]. Focused-ion beam nanolithography relies on a beam of ions to locally modify a surface coating, to mill a substrate or to

• focused-ion beam nanolithography it is also possible to deposit materials. The desired material to deposit is in the gas phase and it is let to adsorb on the surface. Afterwards, the ion beam decomposes the adsorbed molecules into a volatile component and a non-volatile component. The non-volatile

Graphene-enhanced plasmonic nanohole arrays for environmental sensing in aqueous samples

• Christa Genslein,
• Peter Hausler,
• Eva-Maria Kirchner,
• Rudolf Bierl,
• Antje J. Baeumner and
• Thomas Hirsch

Beilstein J. Nanotechnol. 2016, 7, 1564–1573, doi:10.3762/bjnano.7.150

• arrays have been first fabricated 1995 by Masuda and Fukuda using a replication process of an anodized alumina structure [23]. Since then, a vast number of techniques has been invented. For example, as focused ion beam (FBI) milling allows a control of the size and shape of the nanoholes with good

Customized MFM probes with high lateral resolution

• Óscar Iglesias-Freire,
• Miriam Jaafar,
• Eider Berganza and
• Agustina Asenjo

Beilstein J. Nanotechnol. 2016, 7, 1068–1074, doi:10.3762/bjnano.7.100

• , either by using focused ion beam (FIB) milled tips [1][2], electron beam deposited tips [3][4] or stencil-deposited metal dots onto an AFM tip [5]. Following a different approach, probes with carbon nanotubes (CNTs) have been fabricated for MFM imaging either by mechanical attachment [6][7][8] or direct

Signal enhancement in cantilever magnetometry based on a co-resonantly coupled sensor

• Julia Körner,
• Christopher F. Reiche,
• Thomas Gemming,
• Bernd Büchner,
• Gerald Gerlach and
• Thomas Mühl

Beilstein J. Nanotechnol. 2016, 7, 1033–1043, doi:10.3762/bjnano.7.96

• (≈10−5 mbar). First, the cantilever was shortened via focused ion beam milling to increase its resonance frequency. This step also increased the stiffness of the cantilever to about 133.8 N/m (see Table 1) which is rather high compared to typical values in cantilever magnetometry. In a second step, an