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Search for "nanolithography" in Full Text gives 59 result(s) in Beilstein Journal of Nanotechnology.

Influence of water contamination on the sputtering of silicon with low-energy argon ions investigated by molecular dynamics simulations

  • Grégoire R. N. Defoort-Levkov,
  • Alan Bahm and
  • Patrick Philipp

Beilstein J. Nanotechnol. 2022, 13, 986–1003, doi:10.3762/bjnano.13.86

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  • , Luxembourg Thermo Fisher Scientific, Hillsboro, OR, 97124, USA 10.3762/bjnano.13.86 Abstract Focused ion beams (FIB) are a common tool in nanotechnology for surface analysis, sample preparation for electron microscopy and atom probe tomography, surface patterning, nanolithography, nanomachining, and
  • probe tomography (APT) [5], and ion beam analysis used for life sciences applications [6][7]), surface patterning [8], nanolithography [9], nanomachining [10][11], and nanoprinting at room [12] and cryogenic temperatures [13]. The development of nanotechnology relies on lower ion beam energies and
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Published 21 Sep 2022

Micro- and nanotechnology in biomedical engineering for cartilage tissue regeneration in osteoarthritis

  • Zahra Nabizadeh,
  • Mahmoud Nasrollahzadeh,
  • Hamed Daemi,
  • Mohamadreza Baghaban Eslaminejad,
  • Ali Akbar Shabani,
  • Mehdi Dadashpour,
  • Majid Mirmohammadkhani and
  • Davood Nasrabadi

Beilstein J. Nanotechnol. 2022, 13, 363–389, doi:10.3762/bjnano.13.31

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Published 11 Apr 2022

Engineered titania nanomaterials in advanced clinical applications

  • Padmavati Sahare,
  • Paulina Govea Alvarez,
  • Juan Manual Sanchez Yanez,
  • Gabriel Luna-Bárcenas,
  • Samik Chakraborty,
  • Sujay Paul and
  • Miriam Estevez

Beilstein J. Nanotechnol. 2022, 13, 201–218, doi:10.3762/bjnano.13.15

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  • /titanium dioxide nanocomposites against biofilm-forming and methicillin-resistant strains of Staphylococcus aureus and Pseudomonas aeruginosa [95]. In another novel approach, dip pen nanolithography and soft lithography were used to form a micropattern of a silica sol modified with TiO2 (5% and 10
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Published 14 Feb 2022

Optically and electrically driven nanoantennas

  • Monika Fleischer,
  • Dai Zhang and
  • Alfred J. Meixner

Beilstein J. Nanotechnol. 2020, 11, 1542–1545, doi:10.3762/bjnano.11.136

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  • breaks down [39][40]. Here, several approaches to create low-cost, large-area SERS substrates that exhibit homogeneous Raman intensity enhancement are introduced. The substrates are based on quasi-hexagonally ordered gold particles prepared by block-copolymer micellar nanolithography and electroless
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Editorial
Published 07 Oct 2020

Quantitative determination of the interaction potential between two surfaces using frequency-modulated atomic force microscopy

  • Nicholas Chan,
  • Carrie Lin,
  • Tevis Jacobs,
  • Robert W. Carpick and
  • Philip Egberts

Beilstein J. Nanotechnol. 2020, 11, 729–739, doi:10.3762/bjnano.11.60

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  • microscopy (AFM) [4][5], and nanolithography techniques [6]. In particular, material parameters, such as interfacial adhesion, friction and wear (in the case of translating surfaces), significantly impact the success of the aforementioned examples. For instance, micromirrors, present in DLP technology
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Published 06 May 2020

Molecular architectonics of DNA for functional nanoarchitectures

  • Debasis Ghosh,
  • Lakshmi P. Datta and
  • Thimmaiah Govindaraju

Beilstein J. Nanotechnol. 2020, 11, 124–140, doi:10.3762/bjnano.11.11

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  • , while relinquishing the use of traditional silicon-based materials also played a key role. Biomolecular nanolithography is a newer approach to create nanopatterned surfaces using biomolecules as scaffolds [101][102]. The interesting features of this technique are the combination of two separate scales
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Published 09 Jan 2020

Gold and silver dichroic nanocomposite in the quest for 3D printing the Lycurgus cup

  • Lars Kool,
  • Floris Dekker,
  • Anton Bunschoten,
  • Glen J. Smales,
  • Brian R. Pauw,
  • Aldrik H. Velders and
  • Vittorio Saggiomo

Beilstein J. Nanotechnol. 2020, 11, 16–23, doi:10.3762/bjnano.11.2

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  • , we embraced the quest of developing a 3D-printable silver nanocomposite material. The first step was to synthesise dichroic AgNP. Described in literature, the “Lycurgus effect” can be obtained on surfaces using nanolithography for producing a square lattice which reflects different wavelengths [10
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Published 02 Jan 2020

Evaluation of click chemistry microarrays for immunosensing of alpha-fetoprotein (AFP)

  • Seyed Mohammad Mahdi Dadfar,
  • Sylwia Sekula-Neuner,
  • Vanessa Trouillet,
  • Hui-Yu Liu,
  • Ravi Kumar,
  • Annie K. Powell and
  • Michael Hirtz

Beilstein J. Nanotechnol. 2019, 10, 2505–2515, doi:10.3762/bjnano.10.241

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  • antibody and antigen, fluorescently labeled AFP ink was spotted onto the antibody-terminated surfaces by µCS within 15 × 15 spot arrays. The spotting process was performed on a nanolithography platform (NLP 2000 system, NanoInk, USA) utilizing surface patterning tool cantilevers (SPT-S-C10S, Bioforce
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Published 16 Dec 2019

Biomimetic synthesis of Ag-coated glasswing butterfly arrays as ultra-sensitive SERS substrates for efficient trace detection of pesticides

  • Guochao Shi,
  • Mingli Wang,
  • Yanying Zhu,
  • Yuhong Wang,
  • Xiaoya Yan,
  • Xin Sun,
  • Haijun Xu and
  • Wanli Ma

Beilstein J. Nanotechnol. 2019, 10, 578–588, doi:10.3762/bjnano.10.59

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  • invaluable in research and industrial application. Researchers have paid attention to physical methods (“top-down” techniques) such as focused ion beam lithography (FIB) [14][15], electron beam lithography (EBL) [16][17] or soft nanoimprint nanolithography (NIL) [18], which can produce controllable shapes
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Published 28 Feb 2019

Charged particle single nanometre manufacturing

  • Philip D. Prewett,
  • Cornelis W. Hagen,
  • Claudia Lenk,
  • Steve Lenk,
  • Marcus Kaestner,
  • Tzvetan Ivanov,
  • Ahmad Ahmad,
  • Ivo W. Rangelow,
  • Xiaoqing Shi,
  • Stuart A. Boden,
  • Alex P. G. Robinson,
  • Dongxu Yang,
  • Sangeetha Hari,
  • Marijke Scotuzzi and
  • Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

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  • ; electron; field emission; ion; nanolithography; Review 1 Introduction Methods for nanostructuring – the fabrication of structures with sizes on the nanoscale – are required for the fabrication of next-generation nanoelectronics, such as quantum-based devices, for nanophotonics, nanobiotechnology
  • lithography are the leading top-down methods. In this review we focus on another top-down generic technology, namely nanostructuring by charged particle beams used to expose a resist, which can be used as a mask for pattern transfer etching and metal deposition etc. Nanolithography using charged particle
  • advantages of SHIBL using He ions over SIBL using Ga ions is clear from the reduced lateral spread of the beam in the top 10–20 nm of the surface where the ultrathin resist layer is located for nanolithography. In practice, the effect of the resist can be ignored and the lateral spread is determined by the
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Published 14 Nov 2018

Controlling surface morphology and sensitivity of granular and porous silver films for surface-enhanced Raman scattering, SERS

  • Sherif Okeil and
  • Jörg J. Schneider

Beilstein J. Nanotechnol. 2018, 9, 2813–2831, doi:10.3762/bjnano.9.263

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  • obtain porous silver nanostructures [12]. Other routes include the use of gold or silver nanoparticles of different shapes in solution and their assembly on a solid substrate [6][13][14][15][16][17], nanosphere lithography [18][19][20][21][22][23][24][25] as well as nanolithography and nanoimprinting [26
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Published 07 Nov 2018

Silencing the second harmonic generation from plasmonic nanodimers: A comprehensive discussion

  • Jérémy Butet,
  • Gabriel D. Bernasconi and
  • Olivier J. F. Martin

Beilstein J. Nanotechnol. 2018, 9, 2674–2683, doi:10.3762/bjnano.9.250

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  • building blocks of plasmonic nanoantennas made by capillary assembly, rectangular arms will be obtained with top-down fabrication techniques, such as nanolithography for example. The arm dimensions are similar to those of the cylindrical nanorods discussed previously; the arm length is 85 nm and its width
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Published 15 Oct 2018

Nanoantenna structures for the detection of phonons in nanocrystals

  • Alexander G. Milekhin,
  • Sergei A. Kuznetsov,
  • Ilya A. Milekhin,
  • Larisa L. Sveshnikova,
  • Tatyana A. Duda,
  • Ekaterina E. Rodyakina,
  • Alexander V. Latyshev,
  • Volodymyr M. Dzhagan and
  • Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2018, 9, 2646–2656, doi:10.3762/bjnano.9.246

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  • between nanoclusters [11]. However, stochastical distribution of metal nanoclusters in terms of size, shape, and orientation reduces the IR enhancement and impedes the study of SEIRA regularities. Further progress was achieved with the development of nanolithography techniques which made possible the
  • wavelength – appearing in the visible spectral range and of interest for optical spectroscopy [16]. It was shown that regular linear nanoantennas fabricated by nanolithography demonstrate enhancement of the SEIRA signal from vibrational modes in organic molecules such as octadecanethiol (ODT) [17] and 4,4
  • as high as 1 × 106. In our earlier papers we demonstrated SEIRA in the mid- and far-infrared for both organic molecules and inorganic NCs deposited on Au linear nanoantenna arrays fabricated on Si substrates by nanolithography [22][23]. The influence of a thin SiO2 layer (0–100 nm) beneath the
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Published 05 Oct 2018

High-throughput micro-nanostructuring by microdroplet inkjet printing

  • Hendrikje R. Neumann and
  • Christine Selhuber-Unkel

Beilstein J. Nanotechnol. 2018, 9, 2372–2380, doi:10.3762/bjnano.9.222

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  • densities is highly important in many fields, ranging from nano-optics to biosensor technologies and biomaterials. A well-established method to fabricate quasi-hexagonal patterns of metal nanoparticles is block copolymer micelle nanolithography, which relies on the self-assembly of metal-loaded micelles on
  • surfaces by a dip-coating or spin-coating process. Using this method, the spacing of the nanoparticles is controlled by the size of the micelles and by the coating conditions. Whereas block copolymer micelle nanolithography is a high-throughput method for generating well-ordered nanoparticle patterns at
  • the nanoscale, so far it has been inefficient in generating a hierarchical overlay structure at the micrometer scale. Here, we show that by combining block copolymer micelle nanolithography with inkjet printing, hierarchical patterns of gold nanoparticles in the form of microstructures can be achieved
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Published 04 Sep 2018

Localized photodeposition of catalysts using nanophotonic resonances in silicon photocathodes

  • Evgenia Kontoleta,
  • Sven H. C. Askes,
  • Lai-Hung Lai and
  • Erik C. Garnett

Beilstein J. Nanotechnol. 2018, 9, 2097–2105, doi:10.3762/bjnano.9.198

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  • SEM images of more silicon nanostructures after photo-electrodeposition of platinum for verification of the effect. Supporting Information File 150: Additional experimental data. Acknowledgements We thank Reinout Jaarsma (Advanced Research Center for Nanolithography - ARCNL institute) for his
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Published 03 Aug 2018

Self-assembled quasi-hexagonal arrays of gold nanoparticles with small gaps for surface-enhanced Raman spectroscopy

  • Emre Gürdal,
  • Simon Dickreuter,
  • Fatima Noureddine,
  • Pascal Bieschke,
  • Dieter P. Kern and
  • Monika Fleischer

Beilstein J. Nanotechnol. 2018, 9, 1977–1985, doi:10.3762/bjnano.9.188

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  • . A combination of micellar nanolithography and electroless deposition (ED) enables the tuning of the spacing and size of the noble metal nanoparticles. Long-range ordered quasi-hexagonal arrays of gold nanoparticles on silicon substrates with a variation of the particle sizes from about 20 nm to 120
  • the size of the gold nanoparticles, a combination of micellar nanolithography and subsequent electroless deposition (ED) makes it possible to increase the size of the particles [18]. In this work, we follow the cost-effective and simple photochemical method outlined in [18], but in the present case
  • nanometers, which are fabricated by block copolymer micellar nanolithography combined with electroless deposition. The resulting particle arrangements are compared for samples prepared with 30 min vs 90 min ED. The dark-field scattering intensity is compared for the different nanoparticle sizes. We
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Published 12 Jul 2018

Chemistry for electron-induced nanofabrication

  • Petra Swiderek,
  • Hubertus Marbach and
  • Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

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  • -Alexander-Universität Erlangen-Nürnberg, Egerlandstr. 3, 91058 Erlangen, Germany, Department of Imaging Physics, Delft University of Technology, Lorentzweg 1, 2628CJ Delft, The Netherlands 10.3762/bjnano.9.124 Keywords: electron-induced chemistry, FEBID; FEBIP; nanofabrication; nanolithography; Electron
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Published 30 Apr 2018
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  • interfaces has been studied using layer-by-layer assembly that incorporates organosilane or organothiol monolayers to functionalize a surface to form multilayer films [2][3]. Dip-pen nanolithography was applied to pattern porphyrazines onto a polycrystalline gold surface to align horizontally or vertically
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Published 17 Apr 2018

Engineering of oriented carbon nanotubes in composite materials

  • Razieh Beigmoradi,
  • Abdolreza Samimi and
  • Davod Mohebbi-Kalhori

Beilstein J. Nanotechnol. 2018, 9, 415–435, doi:10.3762/bjnano.9.41

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  • above techniques summarized in Table 1, there are other less widespread methods such as the dip-pen nanolithography technique [116], uniaxial pressure technique [117][118] and the use of femtosecond laser pulses [119], which are not presented here. Evaluating the arrangement and alignment of CNTs After
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Published 05 Feb 2018

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

  • Alexandra M. Patron,
  • Timothy S. Hooker,
  • Daniel F. Santavicca,
  • Corey P. Causey and
  • Thomas J. Mullen

Beilstein J. Nanotechnol. 2017, 8, 2339–2344, doi:10.3762/bjnano.8.233

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  • , metal-ligated multilayers, both with and without an alkanethiol capping layer, were utilized to create nanogaps between Au features using the molecular-ruler process. Keywords: hybrid nanolithography; metal-ligated multilayer; molecular ruler; self-assembled monolayers; vapor-phase deposition
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Published 07 Nov 2017

Modelling focused electron beam induced deposition beyond Langmuir adsorption

  • Dédalo Sanz-Hernández and
  • Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

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  • deposition; 3D nanoprinting; Langmuir model; Introduction Focused electron beam induced deposition (FEBID) is a direct-write nanolithography technique, based on the local decomposition of gas molecules adsorbed on a substrate and induced by the interaction with a focused beam of electrons [1][2][3]. FEBID
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Published 13 Oct 2017

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

  • Laura Evangelio,
  • Federico Gramazio,
  • Matteo Lorenzoni,
  • Michaela Gorgoi,
  • Francisco Miguel Espinosa,
  • Ricardo García,
  • Francesc Pérez-Murano and
  • Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

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  • other processes are based on direct writing (one-step) methods, thus avoiding the use of a resist. The selected methods are EBL (middle in Figure 1) and parallel oxidation nanolithography [18] (PON) (bottom of the Figure), respectively. The PON method is performed by contacting a conductive mold with
  • promotes higher affinity to PMMA blocks. Electron beam exposure increases sp2 bonding, promoting higher affinity to PS blocks that might be explained by cross-linking of PS. In the case of parallel oxidation nanolithography, HAXPES provides experimental evidence of the existence of a substoichiometric
  • nanolithography methods (middle and bottom) are performed in absence of a resist (direct writing). SEM images of PS-b-PMMA BCP after removal of the PMMA blocks prepared after EBL and oxygen plasma functionalization of grafted PS–OH layers deposited on silicon wafers (see Figure 1) after (a) annealing at 230 °C
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Published 21 Sep 2017

Micro- and nano-surface structures based on vapor-deposited polymers

  • Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

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  • -/microstructures [35]. Similarly, direct writing using a scanning probe microscopy-based nanolithographic technique (dip-pen nanolithography, DPN) was used to deliver chemical substances with submicrometer features on a wide range of poly(p-xylylene) deposited substrates [36]. An array of micro-sized plasma was
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Published 04 Jul 2017

Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

  • Alexandra M. Greiner,
  • Adria Sales,
  • Hao Chen,
  • Sarah A. Biela,
  • Dieter Kaufmann and
  • Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

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  • beam lithography, stereolithography, direct laser writing, and block co-polymer micellar nanolithography are applied. Based on the fabrication approach, fabrication techniques can be divided whether they follow a top-down approach or a bottom-up approach. In the first approach, an already existing bulk
  • lithography [66]), etching (focused-ion beam [67] and electron-beam nanolithography [68]), electrical (electrospinning [69][70][71][72]), mechanical (nanoskiving [46][73], nanoimprint lithography [66]) and colloidal (colloidal lithgraphy [74][75]) are given here. Nanoscale optical photolithography takes
  • techniques [76]. In UV-NIL, the mold is brought into contact with a wafer previously coated with photoresist and solidified with UV light. A resolution of 30 nm can be achieved [77]. Focused-ion beam nanolithography relies on a beam of ions to locally modify a surface coating, to mill a substrate or to
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Published 08 Nov 2016

Localized surface plasmons in structures with linear Au nanoantennas on a SiO2/Si surface

  • Ilya A. Milekhin,
  • Sergei A. Kuznetsov,
  • Ekaterina E. Rodyakina,
  • Alexander G. Milekhin,
  • Alexander V. Latyshev and
  • Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2016, 7, 1519–1526, doi:10.3762/bjnano.7.145

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  • to a few micrometers, while having a width of about 100 nm that is defined by conventional nanolithography used for nanoantenna fabrication. Such nanoantennas exhibit the effect of the localized surface plasmon resonance (LSPR), which is observed when the eigenfrequency of electron oscillations in
  • nanoantenna arrays with the aforementioned structural parameters providing the longitudinal LSPR energy in the range of 600–4500 cm−1 were fabricated using electron beam nanolithography. We employed the directly writing nanolithographic machine Raith-150 (Raith GmbH, Germany) using technological steps
  • a conventional ellipsometric technique which provided an accuracy of 1 nm in the thickness evaluation. Results and Discussion In this work, a set of uniform nanoantenna arrays with different lengths ranging from 500 to 1900 nm was fabricated by using nanolithography. Typical SEM images of the
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Published 26 Oct 2016
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