Interaction-tailored organization of large-area colloidal assemblies

• Silvia Rizzato,
• Elisabetta Primiceri,
• Anna Grazia Monteduro,
• Adriano Colombelli,
• Angelo Leo,
• Maria Grazia Manera,
• Roberto Rella and
• Giuseppe Maruccio

Beilstein J. Nanotechnol. 2018, 9, 1582–1593, doi:10.3762/bjnano.9.150

• . Successively, reactive ion etching was used to selectively remove the portion of the gold film not protected by the nanospheres. The etch rate (2.9 nm/min) was estimated measuring the thickness of the gold film for different etching times. Finally, the nanosphere residues were removed by oxygen plasma

Chemistry for electron-induced nanofabrication

• Petra Swiderek,
• Hubertus Marbach and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2018, 9, 1317–1320, doi:10.3762/bjnano.9.124

• simultaneous injection of a reactive gas [25]. Also, it is demonstrated that the metal content of a Au deposit can be significantly increased by continued electron irradiation and a final boost of oxygen plasma cleaning [26] and that the purity of deposits from different metals is enhanced by thermal treatment

A simple extension of the commonly used fitting equation for oscillatory structural forces in case of silica nanoparticle suspensions

• Sebastian Schön and
• Regine von Klitzing

Beilstein J. Nanotechnol. 2018, 9, 1095–1107, doi:10.3762/bjnano.9.101

• (RCA method) [59]. The substrates were then rinsed extensively with water and dried in a nitrogen stream. Afterwards they were stored in a closed vessel in isopropanol (99.5% Geyer). Both, wafers and cantilevers were cleaned using an oxygen plasma (Diener electronics Femto) for 20 min immediately

Comparative study of antibacterial properties of polystyrene films with TiO_x and Cu nanoparticles fabricated using cluster beam technique

• Vladimir N. Popok,
• Cesarino M. Jeppesen,
• Peter Fojan,
• Anna Kuzminova,
• Jan Hanuš and
• Ondřej Kylián

Beilstein J. Nanotechnol. 2018, 9, 861–869, doi:10.3762/bjnano.9.80

• exposed to an RF capacitively coupled oxygen plasma (Figure 7b). Oxygen plasma treatment is performed at a pressure of 4 Pa, an applied RF power of 40 W and at a distance between RF electrode and a sample of 4 cm. For “type 3”, the clusters are in-flight plasma-treated prior to the deposition on a

• of (a) cluster deposition for samples of type 1, (b) treatment with oxygen plasma for samples of type 2 and (c) in-flight oxidation of the clusters for samples of type 3. Schematic picture of setup for antibacterial experiments with TiOx NPs. Survival ratio of E.coli cells deposited on TiOx and Cu

A review of carbon-based and non-carbon-based catalyst supports for the selective catalytic reduction of nitric oxide

• Shahreen Binti Izwan Anthonysamy,
• Syahidah Binti Afandi,
• Mehrnoush Khavarian and
• Abdul Rahman Bin Mohamed

Beilstein J. Nanotechnol. 2018, 9, 740–761, doi:10.3762/bjnano.9.68

• after being treated at 500 °C. Meanwhile, Zhu et al. [96] modified ACF through low-temperature oxygen plasma and nitric acid, which are respectively denoted as activated carbon modified by plasma (ACFP) and activated carbon modified by nitric acid (ACFN). The results indicate that the CeO2 species on

Synthesis and characterization of two new TiO₂-containing benzothiazole-based imine composites for organic device applications

• Anna Różycka,
• Agnieszka Iwan,
• Krzysztof Artur Bogdanowicz,
• Michal Filapek,
• Natalia Górska,
• Damian Pociecha,
• Marek Malinowski,
• Patryk Fryń,
• Agnieszka Hreniak,
• Jakub Rysz,
• Paweł Dąbczyński and
• Monika Marzec

Beilstein J. Nanotechnol. 2018, 9, 721–739, doi:10.3762/bjnano.9.67

• )/Au multilayer structures. First, the ITO-coated glass substrate was cleaned by ultrasonication in acetone and isopropanol for ≈20 min and oxygen plasma for 30 s. TiO2 (3Dnano P25, average particle size 21 ± 5 nm, mixed rutile (20%)/anatase (80%) phases, and a surface area of 50 m2/g) was mixed with

Wafer-scale bioactive substrate patterning by chemical lift-off lithography

• Chong-You Chen,
• Chang-Ming Wang,
• Hsiang-Hua Li,
• Hong-Hseng Chan and
• Wei-Ssu Liao

Beilstein J. Nanotechnol. 2018, 9, 311–320, doi:10.3762/bjnano.9.31

• activated by 40 s of oxygen plasma exposure at a power of 18 W with 0.5 mbar oxygen flow. Thereafter, the stamps were conformally sealed onto the SAM-modified substrates to initiate a contact-induced reaction for typically 60 min. After separating the contact-sealed stamps from the Au substrates, 0.5 μM

• deionized water between single steps. Multiplexed biological probe-anchored platform. After 40 s of oxygen plasma treatment, a flat PDMS stamp was conformally sealed onto a MCU SAM modified Au substrate for 60 min. After the stamp removal, the Au substrate was conformally sealed to another plasma-treated

• recognition. Hydrophilic group-terminated alkanethiol molecules provide a strong interaction toward an oxygen-plasma-treated PDMS surface, which is the best option for generating SAM ruptures by substrate top layer Au–Au bond breakage [11][28][29][30][31][32]. Another important task in the CLL operation is

Bombyx mori silk/titania/gold hybrid materials for photocatalytic water splitting: combining renewable raw materials with clean fuels

• Stefanie Krüger,
• Michael Schwarze,
• Otto Baumann,
• Christina Günter,
• Michael Bruns,
• Christian Kübel,
• Dorothée Vinga Szabó,
• Rafael Meinusch,
• Verónica de Zea Bermudez and
• Andreas Taubert

Beilstein J. Nanotechnol. 2018, 9, 187–204, doi:10.3762/bjnano.9.21

• et al. used tetrabutylorthotitanate, Ti(OBu)4, and bis(P,P-bis-ethylhexyldiphosphato)ethanediolatotitanate (BPET, C34H74O16P4Ti) in a cold oxygen plasma to coat B. mori silk fabrics with TiO2 to produce a UV resistant material [36]. The current study also focuses on B. mori silk rather than cotton as

Atomic layer deposition and properties of ZrO₂/Fe₂O₃ thin films

• Kristjan Kalam,
• Helina Seemen,
• Peeter Ritslaid,
• Mihkel Rähn,
• Aile Tamm,
• Kaupo Kukli,
• Aarne Kasikov,
• Joosep Link,
• Raivo Stern,
• Salvador Dueñas,
• Helena Castán and
• Héctor García

Beilstein J. Nanotechnol. 2018, 9, 119–128, doi:10.3762/bjnano.9.14

• ferromagnetic properties. The ferroelectric properties of ALD-grown undoped zirconia have also been investigated [20]. ZrO2 thin films were deposited by remote plasma ALD from tetrakis(dimethylamido)zirconium(IV) and oxygen plasma, and were found to exhibit ferroelectric behavior. ALD and physical vapor

Patterning of supported gold monolayers via chemical lift-off lithography

• Liane S. Slaughter,
• Kevin M. Cheung,
• Sami Kaappa,
• Huan H. Cao,
• Qing Yang,
• Thomas D. Young,
• Andrew C. Serino,
• Sami Malola,
• Jana M. Olson,
• Stephan Link,
• Hannu Häkkinen,
• Anne M. Andrews and
• Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

• trimmed with a diamond scribe to ≈1 × 1 cm sample size. The substrates were annealed with a hydrogen flame and incubated in 1.0 mM ethanolic solutions of mercaptoundecanol overnight at room temperature and ambient pressure to form SAMs. The patterned PDMS stamps were treated with oxygen plasma (Harrick

• and degassed for an additional 5–10 min. Flat PDMS films were physically attached to glass slide pieces to minimize damage to their surfaces during handling. Dry glass slide pieces were treated with an oxygen plasma for 40 s. Upon removing the silicon pieces with PDMS from the desiccator, a small drop

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• . Carbon contamination had a pronounced negative influence on the activity of the EBID deposits. The CNT yield on these deposits was low and post-treatment with oxygen plasma was necessary to clean the EBID Co deposits before the corresponding CVD experiment could be successfully conducted with sufficient

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• atom %, depending on the sustained electron beam dose. As a second step, oxygen-plasma treatment is established to further enhance the Au content in the structures, while preserving their morphology to a high degree. This two-step process represents a simple, feasible and high-throughput method for

• direct writing of purer gold nanostructures that can enable their future use for demanding applications. Keywords: FEBID; gold nanostructures; oxygen plasma; postdeposition purification; Introduction Focused electron beam induced deposition (FEBID) is an additive direct-write method for making complex

• issue. For that reason, this study focuses on the optimization of deposition mechanism using a commercially available metal-organic gold precursor and explores oxygen-plasma treatment as a potentially viable large-scale postdeposition purification method for 2D and 3D nanostructures. Over the last few

Strategy to discover full-length amyloid-beta peptide ligands using high-efficiency microarray technology

• Clelia Galati,
• Natalia Spinella,
• Lucio Renna,
• Danilo Milardi,
• Francesco Attanasio,
• Michele Francesco Maria Sciacca and
• Corrado Bongiorno

Beilstein J. Nanotechnol. 2017, 8, 2446–2453, doi:10.3762/bjnano.8.243

• slides were properly prepared. Oxygen-plasma treatment was utilized to remove surface contaminations. This cleaning processing is useful to obtain slides with low fluorescence background, becoming a mandatory path when no wet cleaning protocol can be applied, such as in innovative integrated technologies

A systematic study of the controlled generation of crystalline iron oxide nanoparticles on graphene using a chemical etching process

• Peter Krauß,
• Jörg Engstler and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2017, 8, 2017–2025, doi:10.3762/bjnano.8.202

• ). After synthesis, the copper foil was rapidly removed from the heating zone of the setup under reduced pressure in a pure hydrogen atmosphere. Modified chemical etching The backside of the copper foil was etched in oxygen plasma (Diener Electronics, Plasma System Femto, 300 W power limited to 200 W). The

Bi-layer sandwich film for antibacterial catheters

• Gerhard Franz,
• Florian Schamberger,
• Hamideh Heidari Zare,
• Sara Felicitas Bröskamp and
• Dieter Jocham

Beilstein J. Nanotechnol. 2017, 8, 1982–2001, doi:10.3762/bjnano.8.199

• temperatures, typically at 70 °C. Of paramount importance is the pre-treatment of the hydrophobic substrates (polyurethane and polysilicon), which can be carried out with an oxygen plasma, either by microwave generation (100 E TechnicsPlasma, Kirchheim, Germany), or by RF generation (PlasmaLab 80, Oxford

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

• Laura Evangelio,
• Federico Gramazio,
• Matteo Lorenzoni,
• Michaela Gorgoi,
• Francisco Miguel Espinosa,
• Ricardo García,
• Francesc Pérez-Murano and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

• silicon wafer, left in the Figure) and the block copolymer domains. The first DSA (two steps) process uses electron beam lithography (EBL) [12] on a poly(methyl methacrylate) (PMMA) resist with a subsequent substrate functionalization with oxygen plasma of the uncovered areas (top of Figure 1). The two

• the brush surface while applying a voltage under high humidity conditions. Details on the preparation methods can be found in the Experimental section. Results and Discussion Two-step electron beam and oxygen plasma modification Figure 2 shows SEM images of directed self-assembled films of PS-b-PMMA

• BCP prepared on substrates modified with EBL and oxygen plasma and annealed using the two selected annealing processes described above: (Figure 2a) 230 °C in nitrogen atmosphere for 5 min and cooling in nitrogen and (Figure 2b) 260 °C in nitrogen atmosphere for 5 min and cooling in air. A scheme with

Parylene C as a versatile dielectric material for organic field-effect transistors

• Tomasz Marszalek,
• Maciej Gazicki-Lipman and
• Jacek Ulanski

Beilstein J. Nanotechnol. 2017, 8, 1532–1545, doi:10.3762/bjnano.8.155

• , namely charge trapping caused by mechanical bending [33]. In another work, ultra-thin Parylene C insulating layers were fabricated on Au gate electrodes by reducing the parylene film thickness to 18 nm with the help of oxygen plasma etching [33]. This procedure enabled the manufacturing of OFET devices

• ]. It appears that adhesion forces of Parylene C not only depend on the type of substrate, but they can also be easily modified by surface processing, such as oxygen plasma treatment or thermal annealing [64]. Which procedure is to be applied strongly depends on the material used and on the further

A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls

• Carlos Angulo Barrios and
• Víctor Canalejas-Tejero

Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124

• on conventional microelectronic fabrication processes and exploits the permeability of thin metal films to hollow-out polymer-filled metal nanocages through an oxygen-plasma process. The technique is used for fabricating arrays of cylindrical nanocages made of thin Al shells on silicon substrates

• template by means of an oxygen-plasma treatment (ashing). The latter is enabled by the permeability and thinness of the metal film deposited on the nanopatterned resist sidewalls, which allows oxygen species to react with the organic polymer template. The technique is demonstrated through the fabrication

• nanopillar slope favors metal deposition on the sidewalls, as evidenced by the granular appearance of these surfaces. Finally, an oxygen-plasma treatment is applied to the structure leading to the result shown in Figure 1c. The pillars look transparent to the electron beam, revealing the thinness of the Al

Hierarchically structured nanoporous carbon tubes for high pressure carbon dioxide adsorption

• Julia Patzsch,
• Deepu J. Babu and
• Jörg J. Schneider

Beilstein J. Nanotechnol. 2017, 8, 1135–1144, doi:10.3762/bjnano.8.115

• functionalization was carried out on a radio frequency (13.56 MHz) parallel plate plasma setup (Femto, Diener electronic GmbH, Germany) with a maximum power rating of 300 W. After the chamber was evacuated to low-pressure residual air (0.3 mbar), the PS fibre samples (1) were treated with an oxygen plasma generated

Ultrasmall magnetic field-effect and sign reversal in transistors based on donor/acceptor systems

• Thomas Reichert and
• Tobat P. I. Saragi

Beilstein J. Nanotechnol. 2017, 8, 1104–1114, doi:10.3762/bjnano.8.112

• laboratory. Prior to the deposition of Spiro-TTB and HAT-CN, the predefined substrates were cleaned with acetone, 2-propanol and deionized water, followed by oxygen-plasma treatment and exposure to hexamethyldisilazane to replace the natural hydroxyl end group of SiO2 with an apolar methoxy group. Finally

Optical response of heterogeneous polymer layers containing silver nanostructures

• Miriam Carlberg,
• Florent Pourcin,
• Olivier Margeat,
• Judikaël Le Rouzo,
• Gérard Berginc,
• Rose-Marie Sauvage,
• Jörg Ackermann and
• Ludovic Escoubas

Beilstein J. Nanotechnol. 2017, 8, 1065–1072, doi:10.3762/bjnano.8.108

• optical index difference between the substrate and the thin film layer, thus a silicon wafer was chosen. The substrates were cleaned in an ultrasonic bath in acetone and ethanol, dried by nitrogen flow and an oxygen plasma. The latter step also increased the wettability of the substrate. The deposition of

The integration of graphene into microelectronic devices

• Guenther Ruhl,
• Sebastian Wittmann,
• Matthias Koenig and
• Daniel Neumaier

Beilstein J. Nanotechnol. 2017, 8, 1056–1064, doi:10.3762/bjnano.8.107

• etch the hardmask by a selective plasma etch or wet etch, followed by a second highly substrate-selective oxygen-plasma etch step to remove graphene. Both methods are schematically depicted in Figure 8a. The first method seems to be more suitable for the fabrication of side contacts. However, it needs

Synthesis of coaxial nanotubes of polyaniline and poly(hydroxyethyl methacrylate) by oxidative/initiated chemical vapor deposition

• Alper Balkan,
• Efe Armagan and
• Gozde Ozaydin Ince

Beilstein J. Nanotechnol. 2017, 8, 872–882, doi:10.3762/bjnano.8.89

• and then the coated templates were exposed to oxygen plasma to remove excess polymer layer on top of AAO membranes. Subsequently, PANI-coated templates were put inside an iCVD chamber for pHEMA deposition. During iCVD depositions, HEMA and EGDMA were heated up to 70 and 85°C, respectively, and TBPO

• was kept at room temperature. The deposition was performed at 120 mTorr with a stage temperature of 40 °C. The flowrates of HEMA, EGDMA and TBPO were set to 0.8, 0.11 and 1 sccm, respectively. After the deposition, AAO templates coated with PANI and pHEMA were exposed to oxygen plasma (Torr) at 50 W

Phospholipid arrays on porous polymer coatings generated by micro-contact spotting

• Sylwia Sekula-Neuner,
• Monica de Freitas,
• Lea-Marie Tröster,
• Tobias Jochum,
• Pavel A. Levkin,
• Michael Hirtz and
• Harald Fuchs

Beilstein J. Nanotechnol. 2017, 8, 715–722, doi:10.3762/bjnano.8.75

• chloroform with 1 mol % fluorescent dye admixture. The chloroform was evaporated and lipids were reconstituted with an ethanol and glycerol mixture in 7:3 v/v ratio. The ink was loaded onto a freshly oxygen plasma activated SPT and directly used for spotting. When varying the contact time between SPT and

• polymer nanoglobules with pores of around 150 nm. Microcontact spotting The patterning of lipid arrays was performed on a NLP 2000 system (NanoInk, USA) with oxygen plasma activated (0.2 mbar O2, 2 min) SPT probes (SPT-S-C10S, BioForce Nanosciences, USA). All lipids were purchased from Avanti Polar Lipids

Study of the surface properties of ZnO nanocolumns used for thin-film solar cells

• Neda Neykova,
• Jiri Stuchlik,
• Karel Hruska,
• Ales Poruba,
• Zdenek Remes and
• Ognen Pop-Georgievski

Beilstein J. Nanotechnol. 2017, 8, 446–451, doi:10.3762/bjnano.8.48

• plasma treatment was proven to be more efficient in the surface activation of the ZnO NC, the PDS analysis showed that the plasma treatment left the optical and photoelectrical features of the ZnO NCs intact. Thus, it was proven that the selected oxygen plasma treatment can be of great benefit for the

• . Solar cell deposition is a multistep process during which different plasma processes are being used. Oxygen plasma is applied for both, activation of the surface and stripping of the polymer mask used for fabrication of periodically ordered ZnO NCs, while hydrogen plasma is usually used immediately

• of the dense NCs induced by hydrogen and oxygen plasma treatment under conditions typical for plasma processing of thin-film silicon solar cells. XPS was used to determine the changes in surface composition as a result of the different plasma treatments. Results and Discussion Figure 1 reports SEM