Modulated critical currents of spin-transfer torque-induced resistance changes in NiCu/Cu multilayered nanowires

• Mengqi Fu,
• Roman Hartmann,
• Julian Braun,
• Sergej Andreev,
• Torsten Pietsch and
• Elke Scheer

Beilstein J. Nanotechnol. 2024, 15, 360–366, doi:10.3762/bjnano.15.32

• vertically patterned magnetic nanowires on a Si substrate. With this approach we fabricated three-dimensional nanowire-based spin valve devices without the need of complex etching processes or additional spacer coating. Through this method, we successfully obtained NiCu/Cu multilayered nanowire arrays with a

• fabricated through a newly developed method, which enables to selectively deposit the magnetic nanowires on the Si substrate and to fabricate three-dimensional (3D) devices contacting a few or even single nanowires without complex etching processes [17] or additional spacer coating [18][19]. Results and

• Discussion The AAO template was fabricated by directly anodizing a ca. 1 µm thick aluminum (Al) film on a silicon (Si) substrate covered with 200 nm SiO2 and patterned Ti/Au (5/50 nm) bottom electrodes. It has pores with a diameter of around 35 nm, an interpore distance of around 50 nm, and a height of

Controllable physicochemical properties of WO_x thin films grown under glancing angle

• Rupam Mandal,
• Aparajita Mandal,
• Alapan Dutta,
• Rengasamy Sivakumar,
• Sanjeev Kumar Srivastava and
• Tapobrata Som

Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31

• ultrapure Ar gas (99.99%) using a mass flow controller at 30 sccm flow rate. The substrate holder was kept 12.5 cm away from the target at a glancing angle of 87° and 50 W rf power (Advanced Energy) was applied to the target, keeping the substrate holder grounded. Pre-sputtering was carried out for a

• duration of 1200 s to achieve stability in depositions and contamination-free films. A constant substrate rotation (10 rpm) was maintained to achieve uniform WOx films. Post-growth annealing of all WOx films (grown under the same conditions) was performed at 673 K for 60 min in a vacuum environment (3 × 10

• transport through the same. The I–V characteristics were recorded with a positive bias applied to the p-Si substrate. Figure 6a and Figure 6b show, respectively, the semi-log I–V curves (linear I–V curves are presented in Figure S4 of Supporting Information File 1) of WOx/p-Si heterostructures before and

Determining by Raman spectroscopy the average thickness and N-layer-specific surface coverages of MoS₂ thin films with domains much smaller than the laser spot size

• Felipe Wasem Klein,
• Jean-Roch Huntzinger,
• Vincent Astié,
• Damien Voiry,
• Romain Parret,
• Houssine Makhlouf,
• Sandrine Juillaguet,
• Jean-Manuel Decams,
• Sylvie Contreras,
• Périne Landois,
• Ahmed-Azmi Zahab,
• Jean-Louis Sauvajol and
• Matthieu Paillet

Beilstein J. Nanotechnol. 2024, 15, 279–296, doi:10.3762/bjnano.15.26

• range of A and B excitons [35]. All Raman spectra reported in this paper were recorded on different samples deposited on SiO2/Si(100) substrate. Hence, the second parameter essential to define is the SiO2 thickness. Indeed, the multiple reflection interferences that occur in the air/MoS2/SiO2/Si

• ) on the precise evaluation of the integrated intensities of the phonon modes of MoS2, namely A(A1g) and A(E12g), with respect to the integrated intensity of the 521 cm−1 mode from a bare area of the oxidized silicon substrate, A0(Si), used as an intensity reference [31], or from the silicon substrate

• evaluation of the temperature of MoS2 flakes prepared in different ways and that of the Si substrate as functions of the laser power impinging on the sample through a 100× objective (N.A. 0.9). The power was cycled between ≈5 μW and ≈2 mW. The temperature of MoS2 flakes is evaluated from the Stokes/anti

Ultrasensitive and ultrastretchable metal crack strain sensor based on helical polydimethylsiloxane

• Shangbi Chen,
• Dewen Liu,
• Weiwei Chen,
• Huajiang Chen,
• Jiawei Li and
• Jinfang Wang

Beilstein J. Nanotechnol. 2024, 15, 270–278, doi:10.3762/bjnano.15.25

• metal crack sensors that exhibit exceptional performance in terms of ultrahigh sensitivity and ultrahigh stretchability. This is achieved by incorporating a helical structure into the substrate through a modeling process and, subsequently, depositing a thin film of gold onto the polydimethylsiloxane

• substrate via sputter deposition. The metal thin film is then pre-stretched to generate microcracks. The sensor demonstrates a remarkable stretchability of 300%, an exceptional sensitivity with a maximum gauge factor reaching 107, a rapid response time of 158 ms, minimal hysteresis, and outstanding

• film deposited on a microstructured polydimethylsiloxane (PDMS) substrate [21]. The sensor exhibits exceptional strain sensitivity, allowing for stretching of up to 20% strain. Liu et al. have successfully developed a strain sensor that exhibits high-performance characteristics [22]. A fish-scale-like

Design, fabrication, and characterization of kinetic-inductive force sensors for scanning probe applications

• August K. Roos,
• Ermes Scarano,
• Elisabet K. Arvidsson,
• Erik Holmgren and
• David B. Haviland

Beilstein J. Nanotechnol. 2024, 15, 242–255, doi:10.3762/bjnano.15.23

• meets the Si substrate. The FEM model gives the distribution of strain at the surface. Figure 2a shows the distribution of longitudinal strain εxx(x, y) for the fundamental bending mode of interest. The strain is normalized to its maximum value at the center of the clamping line. Figure 2b displays this

• 60 s. With the front side of the wafer protected, we flip over the wafer and etch through the Si-N using the same CHF3/SF6 process as in step (f) and the etch mask defined in step (c). We then use a Bosch process to etch through most of the Si substrate (approximately 450 μm deep) with an etch rate

• etch under the triangular silicon nitride plate and form a very straight clamping line to the Si substrate. However, the KOH etch is slow compared to the isotropic RIE process and attacks the Nb-Ti-N superconducting film. An additional lithography step was needed to protect the superconducting circuit

Quantitative wear evaluation of tips based on sharp structures

• Ke Xu and
• Houwen Leng

Beilstein J. Nanotechnol. 2024, 15, 230–241, doi:10.3762/bjnano.15.22

• studies. Another approach involves blind reconstruction based on AFM images. Bellotti et al. [15] introduced a uniquely shaped nanoparticle as a tip characterizer. They conducted tip shape analysis using AFM images centered on a single nanoparticle on a flat substrate to investigate the critical size of

• can be characterized by its distinct sharp structures, as shown in Figure 1. When the AFM tip scans over a minute columnar protrusion on the substrate, the resulting image contains information about the tip’s structure. By either analyzing the profile of these AFM images or directly observing the

Ion beam processing of DNA origami nanostructures

• Leo Sala,
• Agnes Zerolová,
• Violaine Vizcaino,
• Alain Mery,
• Alicja Domaracka,
• Hermann Rothard,
• Philippe Boduch,
• Dominik Pinkas and
• Jaroslav Kocišek

Beilstein J. Nanotechnol. 2024, 15, 207–214, doi:10.3762/bjnano.15.20

• ]. However, the situation can be different in DNA origami nanostructures stabilized by highly cross-linked and compact structures. When deposited on the surface, the strong immobilization by cations in between the DNA origami nanostructures and a hydrophilic substrate offer additional stability [16]. Indeed

• nanometer scale and the nanometric precision of DNA origami-based assembly open possibilities in more precise tuning and control of nanofabrication. Here we analyze the consequences of ion beam irradiation on 2D DNA origami nanotriangles deposited on Si as a model substrate and resulting nanostructure

• °C nor 150 °C was reached under the irradiation conditions in the present experiments on the macroscopic level. The samples are placed on an aluminum block, and even at the highest fluences the substrate temperature is below 50 °C. The observed material evaporation resulting in the loss of

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• nanopatterning, we have found significant morphological changes induced in the SiO2 substrate even at low electron dose values (<8 nC/μm2). We demonstrate that graphene etching and topographical changes in SiO2 substrates can be controlled via electron beam parameters such as dwell time and dose. Keywords

• applicable due to the high impact on the underlying substrate. Helium ion milling was believed to be the most suitable tool for structuring graphene [12]. However, it requires expensive equipment, and even this technique introduces a substantial number of defects into the graphene layer, as shown by Kim et

• of concept of water-assisted graphene etching. Moreover, the effects of changes in the topography of Si/SiO2 substrate during this process have not been addressed so far, as they may be observed only under certain experimental conditions. In a standard scanning electron microscope, the morphological

CdSe/ZnS quantum dots as a booster in the active layer of distributed ternary organic photovoltaics

• Gabriela Lewińska,
• Piotr Jeleń,
• Zofia Kucia,
• Maciej Sitarz,
• Łukasz Walczak,
• Bartłomiej Szafraniak,
• Jerzy Sanetra and
• Konstanty W. Marszalek

Beilstein J. Nanotechnol. 2024, 15, 144–156, doi:10.3762/bjnano.15.14

• ultrasonicated for 20 s and then applied to the substrate according to the test method. The angular velocity of the spin coater was also determined by the specific test method and its required film thickness. To keep the typical ratio of the donor and acceptor equal to 1:1 and simultaneously highlight the QD

• carried out for three incidence angles (65°, 70°, and 75°). A Bruker atomic force microscope (AFM) MULTIMODE 8 was used in the measurements in the ScanAsyst in Air mode, using silicon nitride probes (with a nominal tip radius of 2 nm and a spring constant equal to 0.4 N/m). The substrate was

• monocrystalline silicon. A WITec Alpha 300 M+ spectrometer with a 488 nm laser, 600 groove grating, and a 100× ZEISS objective was used for Raman measurements. The samples were deposited on a glass substrate. Ultraviolet photoelectron spectroscopy (UPS) was conducted in an ultrahigh-vacuum chamber with a base

In situ optical sub-wavelength thickness control of porous anodic aluminum oxide

• Aleksandrs Dutovs,
• Raimonds Popļausks,
• Oskars Putāns,
• Vladislavs Perkanuks,
• Aušrinė Jurkevičiūtė,
• Tomas Tamulevičius,
• Uldis Malinovskis,
• Iryna Olyshevets,
• Donats Erts and
• Juris Prikulis

Beilstein J. Nanotechnol. 2024, 15, 126–133, doi:10.3762/bjnano.15.12

• heating, electrolyte flow [19], arrangement of the electrodes, and crystallographic orientation of the aluminum substrate [20]. In this work, we continuously recorded the reflectance spectra from a PAAO-coated aluminum surface during anodization. In a similar reflective interference spectroscopy (RIfS

• -center distance, and ≈30 nm pore diameter corresponded well to the expected results of using anodization in 0.3 M oxalic acid electrolyte and 40 V voltage [24][25]. PAAO is not a homogeneous material; instead, it consists of a porous layer and the barrier layer on top of the Al substrate (Figure 1b). To

• consistent thickness determination during anodization using reflectance measurements at normal incidence, it was sufficient to assume a single PAAO layer with the effective RI neff. A simplified model consisting of an Al substrate with the complex RI [29], PAAO with constant neff, and water with RI [30

New application of bimetallic Ag/Pt nanoplates in a colorimetric biosensor for specific detection of E. coli in water

• Azam Bagheri Pebdeni,
• Mohammad N. AL-Baiati and
• Morteza Hosseini

Beilstein J. Nanotechnol. 2024, 15, 95–103, doi:10.3762/bjnano.15.9

• . This nanobiosensor has the ability to specifically bind to E. coli, increasing the peroxidase activity of the apt-Ag/Pt NPL. Finally, the blue color of the solution in the contaminated water samples was increased in the presence of 3,3′,5,5′-tetramethylbenzidine (TMB) as a substrate and H2O2. The assay

• of a chromogenic substrate, such as 3,3′,5,5′-tetramethylbenzidine (TMB), is widely employed. This conversion process can generate vibrant products when H2O2 is present [11][12]. Colorimetric biosensors often use chromogenic substrates such as TMB, ABTS, and o-phenylenediamine (OPD) to produce a

• visual readout signal through peroxidase mimetic activity. The TMB is preferred due to its reliance on a single organic substrate, eliminating the need for a helper molecule. Studies have shown TMB to be non-mutagenic, but it may still be carcinogenic. However, the low solubility of TMB in water requires

Study of the reusability and stability of nylon nanofibres as an antibody immobilisation surface

• Inés Peraile,
• Matilde Gil-García,
• Laura González-López,
• Nushin A. Dabbagh-Escalante,
• Juan C. Cabria-Ramos and
• Paloma Lorenzo-Lozano

Beilstein J. Nanotechnol. 2024, 15, 83–94, doi:10.3762/bjnano.15.8

• mouse antibody, made in collaboration with the National Center for Biotechnology (CNB) – CSIC. 10-Acetyl-3,7-dihydroxyphenoxazine (ADHP, Ampliflu) was used as a fluorogenic substrate for horseradish peroxidase (HRP) (Sigma-Aldrich). BSA, from Sigma-Aldrich, labelled with RPE was selected as toxin

• excess reagents. Peroxidase-labelled streptavidin was added to detect immunocaptured ricin through biotin and streptavidin binding. A fluorescent peroxidase substrate (ADH, Ampliflu) was added, and the fluorescence was measured (λemission = 530 nm and λexcitation = 590 nm). This value was divided by the

Measurements of dichroic bow-tie antenna arrays with integrated cold-electron bolometers using YBCO oscillators

• Leonid S. Revin,
• Dmitry A. Pimanov,
• Alexander V. Chiginev,
• Anton V. Blagodatkin,
• Viktor O. Zbrozhek,
• Andrey V. Samartsev,
• Anastasia N. Orlova,
• Dmitry V. Masterov,
• Alexey E. Parafin,
• Victoria Yu. Safonova,
• Anna V. Gordeeva,
• Andrey L. Pankratov,
• Leonid S. Kuzmin,
• Anatolie S. Sidorenko,
• Silvia Masi and
• Paolo de Bernardis

Beilstein J. Nanotechnol. 2024, 15, 26–36, doi:10.3762/bjnano.15.3

• We consider properties of dichroic antenna arrays on a silicon substrate with integrated cold-electron bolometers to detect radiation at frequencies of 210 and 240 GHz. This frequency range is widely used in cosmic microwave background experiments in space, balloon, and ground-based missions such as

• dichroic receiving systems, one should overcome the limitation of a silicon substrate, whose thickness affects the efficiency of detection as a refractive medium. In the case of close frequencies, however, one can find a compromise of matching the average frequency of both arrays with reasonable detection

• ] (Figure 1a). The basic element of the receiving matrix is a dipole bow-tie antenna, in the gap of which the CEB is embedded (Figure 1b). This matrix is located on a silicon substrate, which is 260 µm thick. Since the operation of the CEB in the matrix is assumed to be in the voltage bias mode, the

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

• Joshua Williams,
• Michael I. Faley,
• Joseph Vimal Vas,
• Peng-Han Lu and
• Rafal E. Dunin-Borkowski

Beilstein J. Nanotechnol. 2024, 15, 1–12, doi:10.3762/bjnano.15.1

• submicrometer apertures were milled on SiN membranes using a focused ion beam. Furthermore, we have developed a new TEM sample preparation method, where we fabricated Py nanostructures on a bulk substrate with a SiN buffer layer and etched the substrate to create a thin SiN membrane under the Py nanostructure

• ion beam. This method avoids the resist-based fabrication, which is common in preparing nanodisk samples for TEM [8][20]. We have also developed a method of sample preparation for patterned nanostructures starting from a bulk substrate. This method is versatile and might be useful for more complicated

• magnetron sputtering through the resist aperture. We used DC magnetron sputtering in a pure Ar environment at a pressure of 1 Pa to deposit Py at room temperature. The effective permalloy target had a diameter of 8 mm. The sputtered material almost forms a parallel beam when it approaches the substrate at a

Determination of the radii of coated and uncoated silicon AFM sharp tips using a height calibration standard grating and a nonlinear regression function

• Perawat Boonpuek and
• Jonathan R. Felts

Beilstein J. Nanotechnol. 2023, 14, 1200–1207, doi:10.3762/bjnano.14.99

• of SiO2 with height = 20 nm, grate distance = 2 µm, and pitch distance = 5 µm, on top of a silicon substrate, which allows for more space for the AFM tips to sweep along the height grate geometry. The corner edge radius of the grating height is not provided in the specification [15]. However, recent

• standard purchased from Budget Sensor [15], the grate height pattern made of silicon oxide (SiO2) has a height of 20 nm, a grate distance of 2 µm, and a pitch distance of 5 µm on top of the silicon substrate. So, the height distance that the tip end can slide along is equal to the distance measured from

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

• the potential to widen the scope of applicable nanomaterials. In FEBID, a focused electron beam is directed onto the surface of a substrate in close proximity to a gas inlet, through which a precursor compound is supplied to deliver the material for the nanostructures to be built. For metallic

• structures, these precursor molecules are commonly organometallics that adsorb on the substrate and are decomposed by the electron beam irradiation. Ideally, a pure metal is deposited while fragmented volatile ligands are pumped away [11][12][13]. Several parameters affect the FEBID process, including the

• electron beam energy and current, the substrate material, the environment inside the deposition chamber, and the composition of the precursor [14][15][16][17]. Heretofore, various chemical vapor deposition (CVD) precursors have been applied for FEBID depositions. For gold nanostructures, these include, for

Spatial variations of conductivity of self-assembled monolayers of dodecanethiol on Au/mica and Au/Si substrates

• Julian Skolaut,
• Jędrzej Tepper,
• Federica Galli,
• Wulf Wulfhekel and
• Jan M. van Ruitenbeek

Beilstein J. Nanotechnol. 2023, 14, 1169–1177, doi:10.3762/bjnano.14.97

• rougher and a flatter gold substrate on the lateral variation of the conductivity. We find that the roughness of the substrate crucially defines this variation. We conclude that it is paramount to adequately choose a gold substrate for investigations on molecular layer conductivity. Keywords: Au/mica; Au

• the use in applications, the properties of such layers of molecules and the interface they form with the metal substrate have to be investigated carefully and systematically. In order to achieve comparability between different types of molecules, ordered layers are favorable, which makes self

• substrate and the mercury electrode yields the conductivity of the SAM, averaged over the contact area of the mercury droplet. In such studies, one of the crucial problems was mercury filling out defects in the SAMs, which leads to short circuits and unreliable currents running through the microcontact

Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• nerves are few and far between. Thus, further work is necessary to ascertain the potential of such structures for peripheral nerve regeneration. One of the reasons for the limited work on discrete nanostructures and hierarchical structures may be the expensive or non-versatile techniques for substrate

• Supporting Information File 1, Figure S2). Scanning electron microscopy (SEM) images (Figure 1C–E) confirm the featureless surface of flat PU and the ordered arrays of nanopillars and nanoholes on the nanopatterned films. For the PU nanopillar substrate, some short pillars occassionally appeared (Figure 1D

• nanopillar substrate having the smallest CAs (CA ≈ 30°). Based on confocal fluorescence microscopy of immunostained samples (Figure 1J–L), laminin successfully adsorbed onto the O2 plasma-treated PU samples. There was good laminin coverage on all of the samples, even on the nanostructures, as indicated by

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

• François Piquemal,
• Khaled Kaja,
• Pascal Chrétien,
• José Morán-Meza,
• Frédéric Houzé,
• Christian Ulysse and
• Abdelmounaim Harouri

Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94

• -AFM imaging and I–V curves measurement to define the conditions for calibrated measurements. Calibration sample design and fabrication The sample developed in this work consisted of a square fused silica substrate (11 mm wide, 2 mm thick), on which gold connection lines and pads were fabricated by

• droplets (F42240, lead-free solder paste – class 5, CIF, France). The fused silica substrate was placed on a heating plate set to 270 °C, which required around 3 min to reach the melting temperature of the solder droplets (217 °C), as observed under an optical microscope. Upon cooling, 16 SMD resistors

• were fixed on the sample surface, creating a set of 15 resistance values, as shown in Figure 1a. The substrate was fixed onto a circular metallic plate (15 mm diameter), which acts as a back electrode connected to all resistances using a peripheral gold line and dashes of silver paste deposited on the

Sulfur nanocomposites with insecticidal effect for the control of Bactericera cockerelli

• Lany S. Araujo-Yépez,
• Juan O. Tigrero-Salas,
• Vicente A. Delgado-Rodríguez,
• Vladimir A. Aguirre-Yela and
• Josué N. Villota-Méndez

Beilstein J. Nanotechnol. 2023, 14, 1106–1115, doi:10.3762/bjnano.14.91

• , and O, corresponding to the by-products of the reduction of sodium thiosulfate to sulfur (see Experimental section), were found [19][31][34]. Carbon is from the substrate used in the EDS analysis [35][36]. The TEM micrograph in Figure 3a reveals the formation of spherical SNPs that agglomerate into

Density functional theory study of Au-fcc/Ge and Au-hcp/Ge interfaces

• Olga Sikora,
• Małgorzata Sternik,
• Benedykt R. Jany,
• Franciszek Krok,
• Przemysław Piekarz and
• Andrzej M. Oleś

Beilstein J. Nanotechnol. 2023, 14, 1093–1105, doi:10.3762/bjnano.14.90

• crystalline phases on a specific substrate [2][3]. The structure of a heterophase can be studied using advanced atomic-resolution experiments, such as high-resolution electron microscopy [4], high-resolution secondary-electron microscopy [5], scanning transmission electron microscopy [6][7] or scanning

• , involving a hexagonal AuGe β phase present during the intermediate stages of growth. Interestingly, while the fcc crystallites were randomly oriented with respect to the Ge substrate, the hcp nanostructures were typically found with (001) planes at 60–65° to the (111) Ge planes [22]. In a recent experiment

• , stable hcp nanoislands were obtained under controlled annealing conditions on the germanium substrate [23]. After initial crystallization of the fcc gold phase, the hcp phase grows from the eutectic Au/Ge liquid. The atomically resolved STEM-HAADF measurements as well as electron backscatter diffraction

Properties of tin oxide films grown by atomic layer deposition from tin tetraiodide and ozone

• Kristjan Kalam,
• Peeter Ritslaid,
• Tanel Käämbre,
• Aile Tamm and
• Kaupo Kukli

Beilstein J. Nanotechnol. 2023, 14, 1085–1092, doi:10.3762/bjnano.14.89

• . Suitable evaporation temperatures for the SnI4 precursor as well as the relationship between growth per cycle and substrate temperature were determined. Crystal growth in the films in the temperature range of 225–600 °C was identified. Spectroscopic analyses revealed low amounts of residual iodine and

• photocurrent and normalising the signal to a reference photocurrent signal from a clean gold mesh located behind the last optical element of the beamline. Results and Discussion To establish the evaporator temperature that provides the maximum coverage of substrate surface with precursor molecules and

• at the early stage of the ALD process (Figure 4). The highest GPC of the films was obtained at a substrate temperature of 300 °C (Figure 4). Obviously, there was no significant temperature window for saturation [20], that is, the so-called ALD window, in any temperature range. This may be related to

Dual-heterodyne Kelvin probe force microscopy

• Benjamin Grévin,
• Fatima Husainy,
• Dmitry Aldakov and
• Cyril Aumaître

Beilstein J. Nanotechnol. 2023, 14, 1068–1084, doi:10.3762/bjnano.14.88

• reference substrate, a bulk organic photovoltaic heterojunction thin film, and an optoelectronic interface obtained by depositing caesium lead bromide perovskite nanosheets on a graphite surface. The conclusion provides perspectives for future improvements and applications. Keywords: heterodyne

• applications of KPFM are extremely broad. It is now used by physicists, chemists, and biologists to characterize the nanoscale electronic/electrostatic properties of an ever-expanding range of materials, interfaces, and devices, in ambient conditions, under ultrahigh vacuum, or at the liquid–substrate

• components (modulus and phase) onto a 2D grid. The validity of DHe-KPFM implementation is first demonstrated by carrying out measurements on a conducting reference substrate under electrical pumping. The results confirm that – thanks to the constant transfer function over the entire spectrum provided by the

Spatial mapping of photovoltage and light-induced displacement of on-chip coupled piezo/photodiodes by Kelvin probe force microscopy under modulated illumination

• Zeinab Eftekhari,
• Nasim Rezaei,
• Hidde Stokkel,
• Jian-Yao Zheng,
• Andrea Cerreta,
• Ilka Hermes,
• Minh Nguyen,
• Guus Rijnders and
• Rebecca Saive

Beilstein J. Nanotechnol. 2023, 14, 1059–1067, doi:10.3762/bjnano.14.87

• . This final step was carried out to minimize the clamping effect of the actuator on the silicon substrate, thus enhancing the movement of the membrane. Kelvin probe force microscopy under modulated illumination In this experiment, we used KPFM with modulated illumination to study device type-I, namely

• membrane with a maximum of 946 pm, while decreasing to a few picometers at the side edges. The decay of displacement from the center to the edge is expected from the clamping effect at the edges, where the Si substrate is thicker [38]. The measured CPD shift in Figure 3b indicates that the photovoltage

• . Figure 4a–d exhibits the spatial mappings of one-quarter of the voltage-driven piezoelectric actuators (device type-II) with different dimensions from large to small sizes, respectively. The backside etching of the silicon substrate is marked by the dashed line. The measured displacement for each point

A visible-light photodetector based on heterojunctions between CuO nanoparticles and ZnO nanorods

• Doan Nhat Giang,
• Nhat Minh Nguyen,
• Duc Anh Ngo,
• Thanh Trang Tran,
• Le Thai Duy,
• Cong Khanh Tran,
• Thi Thanh Van Tran,
• Phan Phuong Ha La and
• Vinh Quang Dang

Beilstein J. Nanotechnol. 2023, 14, 1018–1027, doi:10.3762/bjnano.14.84

• -emission scanning electron microscopy (FESEM) image of ZnO NRs exhibits nanorods with hexagonal cross section, well aligned with the glass substrate (Figure 1a). Figure 1b indicates that many spherical nanoparticles are formed on the ZnO NRs after spraying the CuO NP solution with a concentration of 0.05 M

• bonding between nanoparticles and nanorods. To fabricate the photodetector, CuO NPs/ZnO NRs were deposited on a glass substrate initially. Then, silver electrodes with a thickness of 100 nm were directly patterned on the glass substrate by a sputtering process using a shadow mask with 0.3 cm channel