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Search for "dwell time" in Full Text gives 73 result(s) in Beilstein Journal of Nanotechnology.

Phosphorus monolayer doping (MLD) of silicon on insulator (SOI) substrates

  • Noel Kennedy,
  • Ray Duffy,
  • Luke Eaton,
  • Dan O’Connell,
  • Scott Monaghan,
  • Shane Garvey,
  • James Connolly,
  • Chris Hatem,
  • Justin D. Holmes and
  • Brenda Long

Beilstein J. Nanotechnol. 2018, 9, 2106–2113, doi:10.3762/bjnano.9.199

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  • dwell time of 0.3 s and a pass energy of 50 eV. Core-level scans were acquired at the applicable binding energy range with a step size of 0.1 eV, dwell time of 0.1 s and pass energy of 20 eV averaged over 10 scans. A non-monochromated Al Kα X-ray source at 200 W power was used for all scans. All spectra
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Published 06 Aug 2018

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

  • Kahraman Keskinbora,
  • Umut Tunca Sanli,
  • Margarita Baluktsian,
  • Corinne Grévent,
  • Markus Weigand and
  • Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

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  • the beam path), the current and the dwell time need to be precisely adjusted. Following the structuring of the zones, a ca. 3 µm thick beamstop was deposited in the central inactive region via focused ion beam induced deposition (FIBID) of Pt using trimethyl(cyclopentadienyl)platinum(IV), (CH3
  • with equally high contrast. The innermost spokes were resolved by a line-by-line scan, using a relatively short pixel dwell time of 0.94 ms. A higher-magnification image of the innermost portion was obtained by a point by point scan shown in Figure 3b. It is seen from this image that the 30 nm features
  • ion beam with a nominal beam size of 16 nm was utilized. By using a step size of 8 nm and a dwell time of 0.2133 the linear dosage was 0.8 pC/µm. The array was fabricated by replicating the pattern in a matrix form with 55 µm steps in the x- and y-directions. Dark-field scanning transmission electron
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Published 25 Jul 2018

Magnetic properties of Fe3O4 antidot arrays synthesized by AFIR: atomic layer deposition, focused ion beam and thermal reduction

  • Juan L. Palma,
  • Alejandro Pereira,
  • Raquel Álvaro,
  • José Miguel García-Martín and
  • Juan Escrig

Beilstein J. Nanotechnol. 2018, 9, 1728–1734, doi:10.3762/bjnano.9.164

Graphical Abstract
  • dose of 30 mC/cm2. The dwell time was chosen to be sure that the ion beam completely perforated the Fe2O3 film and that the hole diameter was quite homogeneous, so at least 20 nm of the substrate were also etched. These antidot arrays are then placed into a furnace GSL-1100X from MTI Corporation, which
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Published 11 Jun 2018

Cathodoluminescence as a probe of the optical properties of resonant apertures in a metallic film

  • Kalpana Singh,
  • Evgeniy Panchenko,
  • Babak Nasr,
  • Amelia Liu,
  • Lukas Wesemann,
  • Timothy J. Davis and
  • Ann Roberts

Beilstein J. Nanotechnol. 2018, 9, 1491–1500, doi:10.3762/bjnano.9.140

Graphical Abstract
  • different transverse parameters were milled using a helium ion microscope (Nanofab Orion, Zeiss) operating at an accelerating voltage of 30 kV and a beam current of 0.1 to 100 pA. A Fibics NPVE pattern generator was used to control the milling parameters such as dose, beam step size and dwell time. Test
  • writing was performed on a 100 nm thick Au film on a borosilicate glass substrate. Initial exposures indicated a dose of 15 nC/cm2 as the optimal initial setting for the ion beam with a 1 µs dwell time and 50% beam overlap. The optimised ion beam current selected for milling was 1.5–2.4 pA, producing the
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Published 18 May 2018

A novel copper precursor for electron beam induced deposition

  • Caspar Haverkamp,
  • George Sarau,
  • Mikhail N. Polyakov,
  • Ivo Utke,
  • Marcos V. Puydinger dos Santos,
  • Silke Christiansen and
  • Katja Höflich

Beilstein J. Nanotechnol. 2018, 9, 1220–1227, doi:10.3762/bjnano.9.113

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  • dwell time, 3 nm point-to-point distance using a serpentine scanning routine. The number of scans increased from 30 to 300. The square pads had an edge length of 10 μm. The AFM image revealed the top edge of the pad being higher than the point in the center, giving an indented shape. This indicates a
  • 50 pA beam current and point irradiation times of 60 seconds. The helix was achieved by a circular pattern with a radius of 120 nm, point-to-point distance of 0.5 nm and dwell time of 30 ms using two repetitions for two helix turns. Figure 4 shows scanning electron micrographs of both types of
  • of 8 × 8 nanocones with a distance of 400 nm and a base diameter of 80 nm (Figure 5a). It was fabricated using 50 pA beam current and a dwell time of 8 seconds for each cone. The scattering intensity was measured by dark-field reflection spectroscopy and compared to FDTD simulations. Figure 5b shows
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Published 18 Apr 2018

Magnetic characterization of cobalt nanowires and square nanorings fabricated by focused electron beam induced deposition

  • Federico Venturi,
  • Gian Carlo Gazzadi,
  • Amir H. Tavabi,
  • Alberto Rota,
  • Rafal E. Dunin-Borkowski and
  • Stefano Frabboni

Beilstein J. Nanotechnol. 2018, 9, 1040–1049, doi:10.3762/bjnano.9.97

Graphical Abstract
  • , revealing different magnetization states and allowing for step-by-step imaging of magnetization reversal processes. Experimental FEBID was performed in a dual-beam system (FEI Strata DB 235M) using the following electron beam parameters: 1 μs dwell time, 90% overlap and 85 and 130 pA beam currents for
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Published 03 Apr 2018

Comparative study of antibacterial properties of polystyrene films with TiOx and Cu nanoparticles fabricated using cluster beam technique

  • Vladimir N. Popok,
  • Cesarino M. Jeppesen,
  • Peter Fojan,
  • Anna Kuzminova,
  • Jan Hanuš and
  • Ondřej Kylián

Beilstein J. Nanotechnol. 2018, 9, 861–869, doi:10.3762/bjnano.9.80

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  • of 90° using an Al Kα X-rays source (1486.6 eV, 200 W, Specs). High-resolution Ti 2p spectra are recorded at pass energy of 10 eV with 10 scans (dwell time 100 ms, step 0.05 eV). Prior the analysis, XPS spectra are charge referenced to adventitious carbon peak at 285 eV. Spectral analysis is
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Published 12 Mar 2018

Towards the third dimension in direct electron beam writing of silver

  • Katja Höflich,
  • Jakub Mateusz Jurczyk,
  • Katarzyna Madajska,
  • Maximilian Götz,
  • Luisa Berger,
  • Carlos Guerra-Nuñez,
  • Caspar Haverkamp,
  • Iwona Szymanska and
  • Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 842–849, doi:10.3762/bjnano.9.78

Graphical Abstract
  • pentafluoropropionate were investigated with respect to their dwell-time-dependent deposition behavior and growth characteristics. While silver 2,2-dimethylbutyrate showed a strong depletion in the center of the impinging electron beam profile hindering any vertical growth, silver pentafluoropropionate indicated a
  • pronounced dependency of the deposit height on the dwell time. Truly three-dimensional silver structures could be realized with silver pentafluoropropionate. The pillars were polycrystalline with silver contents of more than 50 atom % and exhibit strong Raman enhancement. This constitutes a promising route
  • . For the dwell time study and the pillar growth beam currents of 50, 150 and 500 pA were used. These correspond to FWHM of the primary electron beam of 100, 200 and 350 nm, respectively, as determined by imaging of lacey carbon edges. The acceleration voltage was kept constant at 15 kV throughout the
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Published 08 Mar 2018

Electron interactions with the heteronuclear carbonyl precursor H2FeRu3(CO)13 and comparison with HFeCo3(CO)12: from fundamental gas phase and surface science studies to focused electron beam induced deposition

  • Ragesh Kumar T P,
  • Paul Weirich,
  • Lukas Hrachowina,
  • Marc Hanefeld,
  • Ragnar Bjornsson,
  • Helgi Rafn Hrodmarsson,
  • Sven Barth,
  • D. Howard Fairbrother,
  • Michael Huth and
  • Oddur Ingólfsson

Beilstein J. Nanotechnol. 2018, 9, 555–579, doi:10.3762/bjnano.9.53

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Published 14 Feb 2018

Gas-assisted silver deposition with a focused electron beam

  • Luisa Berger,
  • Katarzyna Madajska,
  • Iwona B. Szymanska,
  • Katja Höflich,
  • Mikhail N. Polyakov,
  • Jakub Jurczyk,
  • Carlos Guerra-Nuñez and
  • Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 224–232, doi:10.3762/bjnano.9.24

Graphical Abstract
  • have a measured full width at half maximum varying from 180 to 400 nm, according to the beam parameters (Table S1, Supporting Information File 1). The electron beam was controlled by a Xenos patterning engine which controls the shape, step size, dwell time and number of passes of the deposit. The line
  • deposit lineXENOS was written with this system using 10 µs dwell time, 6 nm step size (corresponds to an effective dwell time of 667 µs per FWHM) and 2000 passes. Each pixel had a refreshment time of 660 ms. The line deposit lineTV was written with a dwell time per FWHM of 171 µs, 75000 passes and a
  • refreshment time of 20 ms. The boxTV deposit was written with a dwell time per FWHM of 17.3 µs, 15000 passes and a refreshment time of 40 ms. The boxSLOW deposit was obtained with 4320 µs dwell time per FWHM, 6000 passes and a refreshment time of 10000 ms. For the four latter deposits the line and area scan
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Published 19 Jan 2018

Comparative study of post-growth annealing of Cu(hfac)2, Co2(CO)8 and Me2Au(acac) metal precursors deposited by FEBID

  • Marcos V. Puydinger dos Santos,
  • Aleksandra Szkudlarek,
  • Artur Rydosz,
  • Carlos Guerra-Nuñez,
  • Fanny Béron,
  • Kleber R. Pirota,
  • Stanislav Moshkalev,
  • José Alexandre Diniz and
  • Ivo Utke

Beilstein J. Nanotechnol. 2018, 9, 91–101, doi:10.3762/bjnano.9.11

Graphical Abstract
  • substrate was kept at room temperature during all depositions, which were performed using a Hitachi S-3600 SEM with a tungsten filament, beam energy of 15 keV, 1.5 nA beam current, electron flux of 2.6 × 1018 s−1·cm−2, 10 μs dwell time per pixel, 9.6 ms refreshment time, serpentine scan and 10 nm pixel-to
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Published 09 Jan 2018

Patterning of supported gold monolayers via chemical lift-off lithography

  • Liane S. Slaughter,
  • Kevin M. Cheung,
  • Sami Kaappa,
  • Huan H. Cao,
  • Qing Yang,
  • Thomas D. Young,
  • Andrew C. Serino,
  • Sami Malola,
  • Jana M. Olson,
  • Stephan Link,
  • Hannu Häkkinen,
  • Anne M. Andrews and
  • Paul S. Weiss

Beilstein J. Nanotechnol. 2017, 8, 2648–2661, doi:10.3762/bjnano.8.265

Graphical Abstract
  • data points were acquired with a 200 ms dwell time. For adequate signal-to-noise, the number of scans was adjusted for different regions of the spectrum to account for different relative sensitivity factors and low amounts of Au, ranging from 20 scans for C 1s to 100 scans for Au 4f. Because PDMS is an
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Published 08 Dec 2017

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

  • Domagoj Belić,
  • Mostafa M. Shawrav,
  • Emmerich Bertagnolli and
  • Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

Graphical Abstract
  • variation, which we deem more likely. To maximize the deposition rate, i.e., to reduce the total deposition time, the electron beam parameters – acceleration voltage, i.e., high tension (HT), current (I), dwell time (DT), and pixel-to-pixel spacing (PPS) – had to be properly adjusted. It was experimentally
  • differences between the opposite sides of planar structures. This behaviour in planar Au nanostructures seems fundamentally equal to the one observed earlier in the study of Au NPs, where the bottom sections of NPs were consistently Au-richer than the top sections. In particular, the long dwell time “planar
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Published 29 Nov 2017

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

  • Julie A. Spencer,
  • Michael Barclay,
  • Miranda J. Gallagher,
  • Robert Winkler,
  • Ilyas Unlu,
  • Yung-Chien Wu,
  • Harald Plank,
  • Lisa McElwee-White and
  • D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

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  • pA in a serpentine patterning sequence. A point pitch of 26 nm and a dwell time of 250 µs were used to ensure a flat-top deposit shape [49]. Nine different deposition heights, ranging from 14 to 73 nm were achieved by a variation of loops (1–9 loops), resulting in a variation of the total exposure
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Published 15 Nov 2017

Magnetic properties of optimized cobalt nanospheres grown by focused electron beam induced deposition (FEBID) on cantilever tips

  • Soraya Sangiao,
  • César Magén,
  • Darius Mofakhami,
  • Grégoire de Loubens and
  • José María De Teresa

Beilstein J. Nanotechnol. 2017, 8, 2106–2115, doi:10.3762/bjnano.8.210

Graphical Abstract
  • ], high resolution provided by the fine electron beam spot [29], tuning of growth parameters (beam dwell time, precursor flux, etc.) [30][31] and flexibility in the type of substrate used (rigid or flexible, flat or curved, conductive or insulating) [32]. An important aspect to consider in the growth by
  • FEBID is the metal content, which is generally linked to the functionality of the deposit. In the case of magnetic deposits grown by FEBID, the metal content can be finely tuned in various ways. The beam current [7][33], the beam dwell time [30], the precursor flux [5], the beam voltage [34] and the
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Published 09 Oct 2017

Oxidative stabilization of polyacrylonitrile nanofibers and carbon nanofibers containing graphene oxide (GO): a spectroscopic and electrochemical study

  • İlknur Gergin,
  • Ezgi Ismar and
  • A. Sezai Sarac

Beilstein J. Nanotechnol. 2017, 8, 1616–1628, doi:10.3762/bjnano.8.161

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  • , heating rate, tension of the fiber, total stabilization time and dwell time, air flow rate and pre-stabilization treatment [13]. Carbonization is the next step in the process. The carbonization processes can be divided into low-temperature and high-temperature carbonization, and graphitization above 2000
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Published 07 Aug 2017

3D Nanoprinting via laser-assisted electron beam induced deposition: growth kinetics, enhanced purity, and electrical resistivity

  • Brett B. Lewis,
  • Robert Winkler,
  • Xiahan Sang,
  • Pushpa R. Pudasaini,
  • Michael G. Stanford,
  • Harald Plank,
  • Raymond R. Unocic,
  • Jason D. Fowlkes and
  • Philip D. Rack

Beilstein J. Nanotechnol. 2017, 8, 801–812, doi:10.3762/bjnano.8.83

Graphical Abstract
  • electron beam dwell time while at the same time maintaining minimal thermal drift. Finally, in this work, we investigate the effect of reactive gas on the laser-assisted in situ purification of 3D features synthesized using EBID from the commonly employed precursor MeCpPt(IV)Me3. Notably, we explore the
  • for the standard conditions and varied as discussed to control the precursor flux. 3D structures were patterned by controlling the spatial coordinates of the electron beam as well as the dwell time at each point via a text file read by the microscope software. For all patterns, a pixel point pitch of
  • Growth rates The relation between the vertical and lateral growth rates is a critical parameter required to accurately and reproducibly construct 3D nanostructures. Once this relation is known, the beam dwell time and pitch can be adjusted as necessary to construct more complex shapes [60]. A simple unit
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Published 07 Apr 2017

Phospholipid arrays on porous polymer coatings generated by micro-contact spotting

  • Sylwia Sekula-Neuner,
  • Monica de Freitas,
  • Lea-Marie Tröster,
  • Tobias Jochum,
  • Pavel A. Levkin,
  • Michael Hirtz and
  • Harald Fuchs

Beilstein J. Nanotechnol. 2017, 8, 715–722, doi:10.3762/bjnano.8.75

Graphical Abstract
  • substrate (dwell time), different feature sizes can be obtained (Figure 1). The diameter of the spotted features varies from 6 +/− 0.3 µm to 4 +/− 0.2 µm for dwell times from 3 to 0.1 s. Interestingly, not only feature size, but also fluorescence intensity varies with dwell time (Figure 1b). This can be
  • explained by the 3D nature of the features as they are actually embedded in the porous HEMA-EDMA substrate [10]. While on a flat glass substrate, features can only grow into 2D with dwell time, while in the present case features will also grow into the depth of the HEMA-EDMA film, resulting in brighter
  • intensity against dwell time (Figure 3b) indicates a slight dependence of fluorescence intensity on dwell time (suggesting the infiltrated nature of the features as explained above). Though the difference between 2 s, 1 s and 0.5 s dwell time is not as strongly pronounced as in the case of the DOPC ink
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Published 27 Mar 2017

Ion beam profiling from the interaction with a freestanding 2D layer

  • Ivan Shorubalko,
  • Kyoungjun Choi,
  • Michael Stiefel and
  • Hyung Gyu Park

Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73

Graphical Abstract
  • method to extract pore-diameter values for each parameter set of the ion beam exposure. Figure 1d shows the dependency of the pore diameters on the Ga+ ion dose extracted from beam current and dwell time. Data for two instrument apertures corresponding to two different beam currents are presented
  • doses and then gradually increase for larger doses. For 1.5 pA Ga-FIB current and 0.5 ms dwell time pores with diameters as small as 5 nm could be reliably created and identified. Dwell times of 0.3 ms resulted in a large statistical variation of pore diameters: from a few nanometers down to no pores
  • , the rather flat top part of the beam profile will create enough collision events with graphene to open the initial pore. This process is unstable and very sensitive to the dwell time. Thus, initial pore formation can be seen as a stochastic process. Once the initial pore is created the graphene
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Published 23 Mar 2017

Thickness-modulated tungsten–carbon superconducting nanostructures grown by focused ion beam induced deposition for vortex pinning up to high magnetic fields

  • Ismael García Serrano,
  • Javier Sesé,
  • Isabel Guillamón,
  • Hermann Suderow,
  • Sebastián Vieira,
  • Manuel Ricardo Ibarra and
  • José María De Teresa

Beilstein J. Nanotechnol. 2016, 7, 1698–1708, doi:10.3762/bjnano.7.162

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  • grown. The growth parameters used in the FIBID fabrication process were: Vbeam = 30 kV, Ibeam = 80 pA, beam spot diameter = 39 nm, beam dwell time = 200 ns, x-pitch = 100 nm, number of passes = 177988, raster scan mode, precursor temperature = 55 °C, chamber base pressure ≈1 × 10−6 mbar, chamber growth
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Published 14 Nov 2016

Efficient electron-induced removal of oxalate ions and formation of copper nanoparticles from copper(II) oxalate precursor layers

  • Kai Rückriem,
  • Sarah Grotheer,
  • Henning Vieker,
  • Paul Penner,
  • André Beyer,
  • Armin Gölzhäuser and
  • Petra Swiderek

Beilstein J. Nanotechnol. 2016, 7, 852–861, doi:10.3762/bjnano.7.77

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  • . A dwell time per pixel between 30 and 100 μs without averaging as well as 1 μs with averaging 64 lines was used. The HIM micrographs were recorded with pixel sizes between 0.49 and 0.98 nm. Results Reflection absorption infrared spectroscopy As described previously, the deposition of copper(II
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Published 13 Jun 2016

Single pyrimidine discrimination during voltage-driven translocation of osmylated oligodeoxynucleotides via the α-hemolysin nanopore

  • Yun Ding and
  • Anastassia Kanavarioti

Beilstein J. Nanotechnol. 2016, 7, 91–101, doi:10.3762/bjnano.7.11

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  • a less favored configuration as well as to a different solvation shell that “carries along” only what is critically important; all these changes are then detected as current modulation and slower dwell time. In an attempt to understand the source of the differences between dT(OsBp) and dC(OsBp) we
  • . The observation that the nanopore discriminates by both residual current and dwell time, among a single dT(OsBp), a single dC(OsBp), and a purine, provide proof-of-principle for nanopore-based sequencing using osmylated DNA as a surrogate. Further optimization of the conditions is necessary to
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Published 22 Jan 2016

Fabrication of hybrid nanocomposite scaffolds by incorporating ligand-free hydroxyapatite nanoparticles into biodegradable polymer scaffolds and release studies

  • Balazs Farkas,
  • Marina Rodio,
  • Ilaria Romano,
  • Alberto Diaspro,
  • Romuald Intartaglia and
  • Szabolcs Beke

Beilstein J. Nanotechnol. 2015, 6, 2217–2223, doi:10.3762/bjnano.6.227

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  • Berkovich tip with a maximum load of 0.6 mN, a dwell time at maximum load of 30 s, loading and unloading periods of 30 and 15 s, respectively. Every sample has been measured at 16 different points (in a matrix of 4 × 4, the distance between measurement points was 50 μm). Young’s modulus was calculated
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Published 25 Nov 2015

The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

  • Rachel M. Thorman,
  • Ragesh Kumar T. P.,
  • D. Howard Fairbrother and
  • Oddur Ingólfsson

Beilstein J. Nanotechnol. 2015, 6, 1904–1926, doi:10.3762/bjnano.6.194

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  • the electron beam and the vertical dimensions are controlled through variation of the dwell time. Precursor molecules used for depositing metal-containing nanostructures are typically organometallic compounds with a central metal atom and ligand architectures that lend the compounds the following
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Published 16 Sep 2015

Imaging of carbon nanomembranes with helium ion microscopy

  • André Beyer,
  • Henning Vieker,
  • Robin Klett,
  • Hanno Meyer zu Theenhausen,
  • Polina Angelova and
  • Armin Gölzhäuser

Beilstein J. Nanotechnol. 2015, 6, 1712–1720, doi:10.3762/bjnano.6.175

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  • rather than from the freestanding CNMs itself, as schematically depicted in Figure 1e. The intact CNMs completely block the path of such secondary electrons to the detector while partially ruptured CNMs do not. The reduction of the beam current, the dwell time per pixel, the use of frame averaging as
  • hitting the holey carbon film, as illustrated in Figure 4e. Figure 5 gives an image series that demonstrates the effect of charging. All images were recorded with a very low dwell time, maximum frame averaging, but without charge compensation and with different beam currents. The contrast and brightness
  • images, the working distance was chosen to be as high as 37 mm, which allowed the acquisition of images with a very large field of view. The following imaging parameters were employed for optimized CNM imaging: a dwell time of 0.5 µs, up to 255 frame averages, and with the electron flood gun operated in
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Published 12 Aug 2015
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