The role of ligands in coinage-metal nanoparticles for electronics

• Ioannis Kanelidis and
• Tobias Kraus

Beilstein J. Nanotechnol. 2017, 8, 2625–2639, doi:10.3762/bjnano.8.263

• -mediated synthesis [18][19][20], thermal decomposition [21], gamma, and electron beam irradiation [22][23], vapor phase deposition [24] and in situ synthesis through inkjet printing [25]. Such metal nanostructures are useful in inks for printed electronics (Figure 1). They are small enough not to limit

Synthesis of [{AgO₂CCH₂OMe(PPh₃)}_n] and theoretical study of its use in focused electron beam induced deposition

• Jelena Tamuliene,
• Julian Noll,
• Peter Frenzel,
• Tobias Rüffer,
• Alexander Jakob,
• Bernhard Walfort and
• Heinrich Lang

Beilstein J. Nanotechnol. 2017, 8, 2615–2624, doi:10.3762/bjnano.8.262

• O2CCH2OMe− is generated, further following the first fragmentation route. However, at 1.3 eV the initial step is decarboxylation giving [AgCH2OMe(PPh3)], followed by Ag–P and Ag–C bond cleavages. Keywords: DFT; DSC; FEBID; silver(I) carboxylate; solid-state structure; TGA; Introduction Focused electron

• beam induced deposition (FEBID) is a cost efficient direct resist-free chemical vapor deposition technique producing free-standing 3D metal-containing nanoscale structures in a single step on, for example, surfaces of sub-10 nm size using a variety of materials with a high degree of spatial and time

Inelastic electron tunneling spectroscopy of difurylethene-based photochromic single-molecule junctions

• Youngsang Kim,
• Safa G. Bahoosh,
• Dmytro Sysoiev,
• Thomas Huhn,
• Fabian Pauly and
• Elke Scheer

Beilstein J. Nanotechnol. 2017, 8, 2606–2614, doi:10.3762/bjnano.8.261

• the sample. The MCBJ sample preparation [14] is as follows. Polyimide is spin-coated to be 2 μm in thickness on a softly polished bronze wafer (200 μm in thickness, CuSn6), and then the polyimide on the wafer is annealed for 6 hours at 430 °C in vacuum (10−5 mbar). Subsequently, the electron beam

• lithography is performed with a double layer of electron beam resists (copolymer/PMMA). After developing the resists, Au of around 70 nm in thickness is deposited, the electron-beam mask is lifted off in warm acetone, and then the polyimide layer is partially etched away (thickness reduction of ca. 700 nm) by

Localized growth of carbon nanotubes via lithographic fabrication of metallic deposits

• Fan Tu,
• Martin Drost,
• Imre Szenti,
• Janos Kiss,
• Zoltan Kónya and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2017, 8, 2592–2605, doi:10.3762/bjnano.8.260

• morphology, for example, as individual nanotubes or as CNT forests. Electron beam induced deposition (EBID) with subsequent autocatalytic growth (AG) was applied to lithographically produce catalytically active seeds for the localized growth of CNTs via chemical vapor deposition (CVD). With the precursor Fe

• ; electron beam induced deposition; focused electron beam induced processing; iron pentacarbonyl; nanofabrication; Introduction Carbon nanotubes (CNTs) have attracted enormous interest due to their potential as functional building blocks in applications such as molecular electronics, sensors and energy

• well-defined configurations for building integrated systems for micro- and nanoelectronics. In this regard, classical methods like optical lithography (OL) [13] and electron beam lithography (EBL) [14], but also focused ion beam (FIB) processing [15], have been successfully applied to fabricate

Correction: Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2591–2591, doi:10.3762/bjnano.8.259

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.259 Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced deposition; 3D nanoprinting; Langmuir

Interactions of low-energy electrons with the FEBID precursor chromium hexacarbonyl (Cr(CO)₆)

• Jusuf M. Khreis,
• João Ameixa,
• Filipe Ferreira da Silva and
• Stephan Denifl

Beilstein J. Nanotechnol. 2017, 8, 2583–2590, doi:10.3762/bjnano.8.258

• compounds can be used as a precursor to deposit metals on a surface. The conventional lithography techniques are approaching the limits of spatial resolution [1], therefore it is crucial to search and improve new methods and techniques for future technological requirements. Focused electron beam induced

• deposition (FEBID) can be considered an assisted chemical vapour deposition (CVD) technique. However, in the former case the organometallic precursor is not fragmented by thermal energy but instead by a high-energy electron beam. The precursor molecules are delivered to the substrate in the gas phase and

• further irradiated by a high-energy electron beam. The electron beam decomposes the precursor molecules, leaving the metal on the surface and the organic ligands are pumped away [2][3]. FEBID has shown high potential in growing defined three-dimensional structures close to any geometry and to write on

Amplified cross-linking efficiency of self-assembled monolayers through targeted dissociative electron attachment for the production of carbon nanomembranes

• Sascha Koch,
• Christopher D. Kaiser,
• Paul Penner,
• Michael Barclay,
• Lena Frommeyer,
• Daniel Emmrich,
• Patrick Stohmann,
• Tarek Abu-Husein,
• Andreas Terfort,
• D. Howard Fairbrother,
• Oddur Ingólfsson and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2017, 8, 2562–2571, doi:10.3762/bjnano.8.256

• description here. A monochromatic electron beam generated in a trochoidal electron monochromator is crossed with an effuse beam of the target molecules that enters the reaction zone through a capillary connected to the inlet system through a high-precision dosing valve. To record the DEA ion yield curves, the

Direct writing of gold nanostructures with an electron beam: On the way to pure nanostructures by combining optimized deposition with oxygen-plasma treatment

• Domagoj Belić,
• Mostafa M. Shawrav,
• Emmerich Bertagnolli and
• Heinz D. Wanzenboeck

Beilstein J. Nanotechnol. 2017, 8, 2530–2543, doi:10.3762/bjnano.8.253

• microstructures can be fabricated by one-step direct-write lithography process using focused electron beam induced deposition (FEBID). Typically, as-deposited gold nanostructures suffer from a low Au content and unacceptably high carbon contamination. We show that the undesirable carbon contamination can be

• atom %, depending on the sustained electron beam dose. As a second step, oxygen-plasma treatment is established to further enhance the Au content in the structures, while preserving their morphology to a high degree. This two-step process represents a simple, feasible and high-throughput method for

• direct writing of purer gold nanostructures that can enable their future use for demanding applications. Keywords: FEBID; gold nanostructures; oxygen plasma; postdeposition purification; Introduction Focused electron beam induced deposition (FEBID) is an additive direct-write method for making complex

Refractive index sensing and surface-enhanced Raman spectroscopy using silver–gold layered bimetallic plasmonic crystals

• Somi Kang,
• Sean E. Lehman,
• Matthew V. Schulmerich,
• An-Phong Le,
• Tae-woo Lee,
• Stephen K. Gray,
• Rohit Bhargava and
• Ralph G. Nuzzo

Beilstein J. Nanotechnol. 2017, 8, 2492–2503, doi:10.3762/bjnano.8.249

• International) was utilized for substrates prepared for bulk refractive index (bulk RI) sensing experiments and electron beam (e-beam) evaporation (Temescal) was used for samples made for SERS measurement. The schematic illustration of both SOG PC structures is given in Figure 1a and the scanning electron

Comparing postdeposition reactions of electrons and radicals with Pt nanostructures created by focused electron beam induced deposition

• Julie A. Spencer,
• Michael Barclay,
• Miranda J. Gallagher,
• Robert Winkler,
• Ilyas Unlu,
• Yung-Chien Wu,
• Harald Plank,
• Lisa McElwee-White and
• D. Howard Fairbrother

Beilstein J. Nanotechnol. 2017, 8, 2410–2424, doi:10.3762/bjnano.8.240

• from PtCl2 deposits created from cis-Pt(CO)2Cl2 by focused electron beam induced deposition (FEBID) is evaluated. Auger electron spectroscopy (AES) and energy-dispersive X-ray spectroscopy (EDS) measurements as well as thermodynamics calculations support the idea that electrons can remove chlorine from

• of AO restricts its effectiveness as a purification strategy to relatively small nanostructures. Keywords: atomic hydrogen; atomic oxygen; electron beam processing; focused electron beam induced deposition (FEBID); purification; Introduction Focused electron beam induced deposition (FEBID) has

• demonstrated great potential in the field of nanostructure fabrication [1][2][3][4]. In FEBID, a volatile organometallic precursor is introduced into a vacuum chamber (typically a modified scanning electron microscope (SEM)) and irradiated by a focused electron beam [2][3]. The precursor decomposes under

Involvement of two uptake mechanisms of gold and iron oxide nanoparticles in a co-exposure scenario using mouse macrophages

• Dimitri Vanhecke,
• Dagmar A. Kuhn,
• Dorleta Jimenez de Aberasturi,
• Sandor Balog,
• Ana Milosevic,
• Dominic Urban,
• Diana Peckys,
• Niels de Jonge,
• Wolfgang J. Parak,
• Alke Petri-Fink and
• Barbara Rothen-Rutishauser

Beilstein J. Nanotechnol. 2017, 8, 2396–2409, doi:10.3762/bjnano.8.239

• min, rinsing three times with PBS supplemented with 1% BSA, and storage in this buffer at 4 °C until electron microscopic investigation. Wet ESEM-STEM An electron beam with an energy of 30 kV, a spot size of 1 nm, a probe current of 600 pA, and working distances between 6.0 and 6.4 mm were used. The

Electron beam induced deposition of silacyclohexane and dichlorosilacyclohexane: the role of dissociative ionization and dissociative electron attachment in the deposition process

• Ragesh Kumar T P,
• Sangeetha Hari,
• Krishna K Damodaran,
• Oddur Ingólfsson and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2017, 8, 2376–2388, doi:10.3762/bjnano.8.237

• /bjnano.8.237 Abstract We present first experiments on electron beam induced deposition of silacyclohexane (SCH) and dichlorosilacyclohexane (DCSCH) under a focused high-energy electron beam (FEBID). We compare the deposition dynamics observed when growing pillars of high aspect ratio from these compounds

• attachment; dissociative ionization; electron beam induced deposition; low-energy electrons; silacyclohexane; Introduction Focused electron beam induced deposition (FEBID) [1][2] is a 3-D direct writing method suitable for the fabrication of nanostructures, even on non-planar surfaces. This approach is in

• many ways complementary to current mask-based lithography methods and has high potential in areas where these are not applicable. Focused electron beam induced deposition is based on the exposure of precursor molecules, physisorbed on a substrates surface, to a narrowly focused high-energy electron

Increasing the stability of DNA nanostructure templates by atomic layer deposition of Al₂O₃ and its application in imprinting lithography

• Hyojeong Kim,
• Kristin Arbutina,
• Anqin Xu and
• Haitao Liu

Beilstein J. Nanotechnol. 2017, 8, 2363–2375, doi:10.3762/bjnano.8.236

• electron-beam (e-beam) lithography. However, both of these lithography techniques are not suitable to provide sub-10 nm resolution. DUL with ArF lasers (λ = 193 nm) and water immersion lenses is not able to provide a structure with spacing less than 40 nm because of its diffraction-limited resolution [40

Expanding the molecular-ruler process through vapor deposition of hexadecanethiol

• Alexandra M. Patron,
• Timothy S. Hooker,
• Daniel F. Santavicca,
• Corey P. Causey and
• Thomas J. Mullen

Beilstein J. Nanotechnol. 2017, 8, 2339–2344, doi:10.3762/bjnano.8.233

• techniques such as photolithography or electron-beam lithography (Figure 1) [14][15][16][17][18][19][20][21][22][23][24]. In short, a metal structure that has been patterned on a non-metal substrate (e.g., Si) using conventional lithography is subsequently covered by a metal-ligated multilayer through the

Fabrication of gold-coated PDMS surfaces with arrayed triangular micro/nanopyramids for use as SERS substrates

• Jingran Zhang,
• Yongda Yan,
• Peng Miao and
• Jianxiong Cai

Beilstein J. Nanotechnol. 2017, 8, 2271–2282, doi:10.3762/bjnano.8.227

• ], such as electron-beam lithography (EBL) [11][12], soft interference lithography (SIL) [13][14], and nanosphere lithography (NSL) [15][16]. To improve the reproducibility and production quantity of SERS substrates, researchers have focused on replicating molded micro/nanostructures as SERS substrates

Dissociative electron attachment to coordination complexes of chromium: chromium(0) hexacarbonyl and benzene-chromium(0) tricarbonyl

• Janina Kopyra,
• Paulina Maciejewska and
• Jelena Maljković

Beilstein J. Nanotechnol. 2017, 8, 2257–2263, doi:10.3762/bjnano.8.225

• [1][2][3]. However, they also play an important role in nanotechnology. In fact, a number of organometallic complexes, originally designed for chemical vapor deposition (CVD) purposes, have also been recognized as promising precursors for focused electron beam induced deposition (FEBID), a process to

• fabricate three-dimensional metal-containing nanoscale structures [4][5]. FEBID is a direct-write technique in which a highly focused, high-energy electron beam impinges on precursor molecules physisorbed onto a substrate, thereby causing their dissociation, and in the ideal case, leading to pure deposit

• a secondary electron multiplier, which are housed in a high vacuum chamber. The electron beam (energy resolution in the range of 150–200 meV (FWHM), electron current I ≈ 10 nA) generated with the TEM intersects with an effusive molecular beam, resulting in the formation of fragment anions. The

Comprehensive investigation of the electronic excitation of W(CO)₆ by photoabsorption and theoretical analysis in the energy region from 3.9 to 10.8 eV

• Mónica Mendes,
• Khrystyna Regeta,
• Filipe Ferreira da Silva,
• Nykola C. Jones,
• Søren Vrønning Hoffmann,
• Gustavo García,
• Chantal Daniel and
• Paulo Limão-Vieira

Beilstein J. Nanotechnol. 2017, 8, 2208–2218, doi:10.3762/bjnano.8.220

• of relevance to estimate neutral dissociation cross sections of W(CO)6, a precursor molecule in focused electron beam induced deposition (FEBID) processes, from electron scattering measurements. Keywords: cross sections; density functional theory (DFT) calculations; focused electron beam induced

• *-orbitals, which play a significant role in the stability of carbonyl complexes, and in particular for W(CO)6 where the tungsten oxidation state is zero. W(CO)6 is a precursor molecule used in electron beam induced deposition (EBID) to produce well-defined tungsten-containing nanostructures [21][22

• initio molecular dynamics simulations of focused electron beam induced deposition (FEBID) precursor molecules adsorbed on fully and partially hydroxylated SiO2 surfaces [24]. Electron-induced reactions in FEBID processes are initiated by low-energy secondary electrons rather than the high-energy primary

Suppression of low-energy dissociative electron attachment in Fe(CO)₅ upon clustering

• Jozef Lengyel,
• Peter Papp,
• Štefan Matejčík,
• Jaroslav Kočišek,
• Michal Fárník and
• Juraj Fedor

Beilstein J. Nanotechnol. 2017, 8, 2200–2207, doi:10.3762/bjnano.8.219

• located in Prague, Czech Republic [12][15]. The clusters were produced by a supersonic expansion into vacuum, and the beam was skimmed and passed through three differentially pumped chambers (one containing a pickup cell) into an interaction chamber where it was crossed with an electron beam of variable

• Fe(CO)5 molecules were picked-up. They coagulate efficiently and form small Fe(CO)5 aggregates on the surface of the argon nanoparticles. The electron beam in CLUB was produced in a three-lens focusing electron gun. The created anions were then analyzed in a reflectron time-of-flight mass

• spectrometer (RTOF). The whole experiment was pulsed: the electron beam passed the interaction region for 1 μs while it was field free and then the extraction field of 2 kV/cm was applied to accelerate anions into the RTOF. The repetition frequency was 10 kHz. The electron-energy scale has been calibrated

Modelling focused electron beam induced deposition beyond Langmuir adsorption

• Dédalo Sanz-Hernández and
• Amalio Fernández-Pacheco

Beilstein J. Nanotechnol. 2017, 8, 2151–2161, doi:10.3762/bjnano.8.214

• Dedalo Sanz-Hernandez Amalio Fernandez-Pacheco Cavendish Laboratory, University of Cambridge, JJ Thomson Cambridge, CB3 0HE, United Kingdom 10.3762/bjnano.8.214 Abstract In this work, the continuum model for focused electron beam induced deposition (FEBID) is generalized to account for multilayer

• types of growth regimes are possible for FEBID under no diffusion, resulting into four types of adsorption isotherms. We propose the use of these maps as a powerful tool for the analysis of FEBID processes. Keywords: adsorption isotherm theory; BET model; continuum model; focused electron beam induced

• deposition; 3D nanoprinting; Langmuir model; Introduction Focused electron beam induced deposition (FEBID) is a direct-write nanolithography technique, based on the local decomposition of gas molecules adsorbed on a substrate and induced by the interaction with a focused beam of electrons [1][2][3]. FEBID

Magnetic properties of optimized cobalt nanospheres grown by focused electron beam induced deposition (FEBID) on cantilever tips

• Soraya Sangiao,
• César Magén,
• Darius Mofakhami,
• Grégoire de Loubens and
• José María De Teresa

Beilstein J. Nanotechnol. 2017, 8, 2106–2115, doi:10.3762/bjnano.8.210

• work, we present a detailed investigation of the magnetic properties of cobalt nanospheres grown on cantilever tips by focused electron beam induced deposition (FEBID). The cantilevers are extremely soft and the cobalt nanospheres are optimized for magnetic resonance force microscopy (MRFM) experiments

• . Keywords: cobalt nanostructures; electron holography; focused electron beam induced deposition; magnetic deposits; magnetic resonance force microscopy; Introduction Through the local decomposition of magnetic precursor molecules by the action of an incoming electron beam, a wide range of functional

• magnetic nanostructures have been produced in last years by the focused electron beam induced deposition (FEBID) technique [1][2]. The extensive list of nanostructures includes: (a) planar deposits in the shape of Hall bars for sensing purposes [3][4][5][6]; (b) magnetic nanopillars for functionalization

A comparative study of the nanoscale and macroscale tribological attributes of alumina and stainless steel surfaces immersed in aqueous suspensions of positively or negatively charged nanodiamonds

• Colin K. Curtis,
• Antonin Marek,
• Alex I. Smirnov and
• Jacqueline Krim

Beilstein J. Nanotechnol. 2017, 8, 2045–2059, doi:10.3762/bjnano.8.205

• after exposure to NDs followed by rinsing in DI water. Alumina samples became rapidly charged upon an exposure to an electron beam (presumably due electrically isolating alumina layer still present on the electrode surface), preventing high quality SEM images from being recorded. Features associated

Identifying the nature of surface chemical modification for directed self-assembly of block copolymers

• Laura Evangelio,
• Federico Gramazio,
• Matteo Lorenzoni,
• Michaela Gorgoi,
• Francisco Miguel Espinosa,
• Ricardo García,
• Francesc Pérez-Murano and
• Jordi Fraxedas

Beilstein J. Nanotechnol. 2017, 8, 1972–1981, doi:10.3762/bjnano.8.198

• silicon wafer, left in the Figure) and the block copolymer domains. The first DSA (two steps) process uses electron beam lithography (EBL) [12] on a poly(methyl methacrylate) (PMMA) resist with a subsequent substrate functionalization with oxygen plasma of the uncovered areas (top of Figure 1). The two

• the brush surface while applying a voltage under high humidity conditions. Details on the preparation methods can be found in the Experimental section. Results and Discussion Two-step electron beam and oxygen plasma modification Figure 2 shows SEM images of directed self-assembled films of PS-b-PMMA

• sample (discontinuous black line), which shows a narrow peak centered at 284.4 eV, characteristic of sp2 bonding. Such increase in sp2 bonding is in line, although not a direct proof, with the cross-linking of PS due to electron beam exposure, as has been reported in the literature [22][23]. This

Fixation mechanisms of nanoparticles on substrates by electron beam irradiation

• Daichi Morioka,
• Tomohiro Nose,
• Taiki Chikuta,
• Kazutaka Mitsuishi and
• Masayuki Shimojo

Beilstein J. Nanotechnol. 2017, 8, 1523–1529, doi:10.3762/bjnano.8.153

• . Beilstein J. Nanotechnol. 2015, 6, 1010–1015). This technique consists of three steps: Firstly, nanoparticles are placed over the entire surface of a substrate. Secondly, the nanoparticles are fixed on the substrate by focused electron beam irradiation. The electron beam decomposes the organic molecules

• -scattering leads to an increase in line width and thus reduces the resolution of this patterning technique. Keywords: accelerating voltage; electron beam; gold; Monte Carlo simulation; nanoparticle array; Introduction Techniques to fabricate assemblies or arrays of nanostructures on a desired area have

• produced by focused electron beam induced deposition (FEBID) [6], photo-lithography (PL), or micro-contact printing (μCP) [7]. However, the purity of the deposits from FEBID is generally low, and PL and μCP require complicated processes including the fabrication of masks or masters, exposure or stamping

Micro- and nano-surface structures based on vapor-deposited polymers

• Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

• attempted by direct electron beam (e-beam) lithography on vapor-deposited PPMA coatings, and 200 nm-sized features were obtained on the vapor-deposited poly(propargyl methacrylate) (PPMA) films [34]. Direct writing using a two-photon laser was also demonstrated on poly(p-xylylene) to fabricate 3D nano

A top-down approach for fabricating three-dimensional closed hollow nanostructures with permeable thin metal walls

• Carlos Angulo Barrios and
• Víctor Canalejas-Tejero

Beilstein J. Nanotechnol. 2017, 8, 1231–1237, doi:10.3762/bjnano.8.124

• fabrication sequence of an array of closed nanocages (hollow nanopillars) made of thin-walled Al. First, an array of SU-8 negative resist nanopillars are created by electron-beam lithography (EBL) on an Al-coated Si substrate (Figure 1a). The SU-8 nanopillars exhibit a smooth surface with rounded top edges

• nanopillar slope favors metal deposition on the sidewalls, as evidenced by the granular appearance of these surfaces. Finally, an oxygen-plasma treatment is applied to the structure leading to the result shown in Figure 1c. The pillars look transparent to the electron beam, revealing the thinness of the Al

• (Microchem Corp.) was spun at 3000 rpm on a 100 nm thick Al film, which was previously deposited on a Si substrate, and soft-baked at 110 °C for 1 min on a hot plate. Next, a 600 nm period square lattice of circular solid nanodots was written in the resist film by electron beam lithography (EBL) at 50 kV and