Localized surface plasmons in structures with linear Au nanoantennas on a SiO₂/Si surface

• Ilya A. Milekhin,
• Sergei A. Kuznetsov,
• Ekaterina E. Rodyakina,
• Alexander G. Milekhin,
• Alexander V. Latyshev and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2016, 7, 1519–1526, doi:10.3762/bjnano.7.145

• to a few micrometers, while having a width of about 100 nm that is defined by conventional nanolithography used for nanoantenna fabrication. Such nanoantennas exhibit the effect of the localized surface plasmon resonance (LSPR), which is observed when the eigenfrequency of electron oscillations in

• nanoantenna arrays with the aforementioned structural parameters providing the longitudinal LSPR energy in the range of 600–4500 cm−1 were fabricated using electron beam nanolithography. We employed the directly writing nanolithographic machine Raith-150 (Raith GmbH, Germany) using technological steps

• a conventional ellipsometric technique which provided an accuracy of 1 nm in the thickness evaluation. Results and Discussion In this work, a set of uniform nanoantenna arrays with different lengths ranging from 500 to 1900 nm was fabricated by using nanolithography. Typical SEM images of the

NO gas sensing at room temperature using single titanium oxide nanodot sensors created by atomic force microscopy nanolithography

• Li-Yang Hong and
• Heh-Nan Lin

Beilstein J. Nanotechnol. 2016, 7, 1044–1051, doi:10.3762/bjnano.7.97

• atomic force microscopy nanolithography methods, nanomachining and nano-oxidation, are employed. A single titanium nanowire (NW) is created first along with contact electrodes and a single titanium oxide ND is subsequently produced in the NW. Gas sensing is realized by the photo-activation and the photo

• potential application of single metal oxide NDs for gas sensing with a performance that is comparable with that of metal oxide nanowire gas sensors. Keywords: atomic force microscopy nanolithography; photo-activation; photo-recovery; resistive NO gas sensor; titanium oxide nanodot sensor; Introduction In

• ][18][19][20][23], In2O3 [22], and TiO2 [24][27][28][29]. AFM nanolithography is a valuable technique for the fabrication of nanostructures and sensors [30][31]. Recently, we have reported on the fabrication of single titanium oxide nanodot (ND) ultraviolet (UV) sensors by AFM nanomachining and nano

Large-scale fabrication of achiral plasmonic metamaterials with giant chiroptical response

• Morten Slyngborg,
• Yao-Chung Tsao and
• Peter Fojan

Beilstein J. Nanotechnol. 2016, 7, 914–925, doi:10.3762/bjnano.7.83

• [31], preassembled nanoparticles [32][33][34] and a variety of colloidal nanolithography techniques [35][36][37]. Compared to the above mentioned PCMs, the experimentally proven ECMs only comprise structures from polystyrene sphere templates for gold deposition [26], structures formed by carbon

Investigating organic multilayers by spectroscopic ellipsometry: specific and non-specific interactions of polyhistidine with NTA self-assembled monolayers

• Ilaria Solano,
• Pietro Parisse,
• Ornella Cavalleri,
• Federico Gramazio,
• Loredana Casalis and
• Maurizio Canepa

Beilstein J. Nanotechnol. 2016, 7, 544–553, doi:10.3762/bjnano.7.48

• after reaction with competitive ligands. The films were investigated in liquid, and ex situ in ambient air. The SE investigation has been complemented by AFM measurements based on nanolithography methods (nanografting mode). Conclusion: Our approach to the SE data, exploiting the full spectroscopic

• nanolithography methods, such as the so-called nanoshaving [49], that considerably helped to reduce the uncertainty related to the correlation between thickness and refractive index that is typical of ultrathin films. A step forward, we intend to apply the same methods to control the adsorption of the analyte

• determined by SE and AFM nanolithography [49]. The shape of the NTA spectra closely resembles that of T-OEG SAMS and does not show any evident features typical of intrinsic molecular optical absorptions [47][50]. Thus, the data are presented in comparison with a set of simulations based on the model of a

Organized films

• Maurizio Canepa and
• Helmuth Möhwald

Beilstein J. Nanotechnol. 2016, 7, 406–408, doi:10.3762/bjnano.7.35

• modifying films, opening the way to patterning and even to nanolithography methods [14]. This was a crucial step in the development of nanosensors and biochips, especially in new and emerging fields such as nanomedicine. Coming back to LB films, irrespective of other technical difficulties in fabrication

Rigid multipodal platforms for metal surfaces

• Michal Valášek,
• Marcin Lindner and
• Marcel Mayor

Beilstein J. Nanotechnol. 2016, 7, 374–405, doi:10.3762/bjnano.7.34

• nanolithography and scanning-probe techniques enable one to study the electrical properties of single molecules [8][9][10][11]. Current methods and approaches to characterize the behavior of single molecules in metal–molecule–metal junctions [12] are so varied. The most common measurements on single molecular

Mismatch detection in DNA monolayers by atomic force microscopy and electrochemical impedance spectroscopy

• Maryse D. Nkoua Ngavouka,
• Pietro Capaldo,
• Elena Ambrosetti,
• Giacinto Scoles,
• Loredana Casalis and
• Pietro Parisse

Beilstein J. Nanotechnol. 2016, 7, 220–227, doi:10.3762/bjnano.7.20

• force microscopy-based nanolithography to create ssDNA nano-arrays on gold surfaces. AFM topography measurements then monitor the variation of height of the nanostructures upon biorecognition and then follow annealing at different temperatures. This strategy allowed us to clearly detect the presence of

• limitations [22]. We present here two platforms, which are based on different sensing strategies, to detect mismatched and/or perfectly matched hybridization of complementary DNA strands into ssDNA oligonucleotide monolayers. The first platform exploits atomic force microscopy-based nanolithography

Nanoscale rippling on polymer surfaces induced by AFM manipulation

• Mario D’Acunto,
• Franco Dinelli and
• Pasqualantonio Pingue

Beilstein J. Nanotechnol. 2015, 6, 2278–2289, doi:10.3762/bjnano.6.234

• for the fabrication of self-assembled and ordered ripples. Napolitano et al. [24] have carried out a series of experiments on PET films focusing their attention on the dependence of the ripple orientation on the boundary conditions. In particular, they have performed nanolithography by scanning the

• (relative humidity: 50 to 60% and T = 22–23 °C). How to avoid ripple formation The nanoripple formation can be either a nuisance or an opportunity. In the framework of nanolithography, one should consider the development of tools for creating but also preventing the pattern formation. Regarding this second

Template-controlled mineralization: Determining film granularity and structure by surface functionality patterns

• Nina J. Blumenstein,
• Jonathan Berson,
• Stefan Walheim,
• Petia Atanasova,
• Johannes Baier,
• Joachim Bill and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2015, 6, 1763–1768, doi:10.3762/bjnano.6.180

• lithography (where increasingly smaller structures are sought, e.g., in the field of semiconductor nanolithography). Here, the copying of a given structure by self-templating may provide an alternative to conventional replication. In this study, ZnO-containing films were prepared using chemical bath

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• nanolithography technique, based on the local dissociation of adsorbates upon the irradiation with electrons [1]. The molecules are delivered into the microscope chamber by a gas injection system (GIS) where they reversibly physisorb onto the substrate surface. Part of the energy from the primary electron beam or

Structural transitions in electron beam deposited Co–carbonyl suspended nanowires at high electrical current densities

• Gian Carlo Gazzadi and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2015, 6, 1298–1305, doi:10.3762/bjnano.6.134

• deposition (FEBID), a direct-write nanolithography based on the decomposition of gas precursors molecules with electron beams [1]. This technology, in fact, allows for the deposition of various materials on planar and non-planar substrates with nanoscale resolution [2], and it can be easily implemented on

Fabrication of high-resolution nanostructures of complex geometry by the single-spot nanolithography method

• Alexander Samardak,
• Margarita Anisimova,
• Aleksei Samardak and
• Alexey Ognev

Beilstein J. Nanotechnol. 2015, 6, 976–986, doi:10.3762/bjnano.6.101

• semiconductor substrates, but also on conductive surfaces such as a Au thin film. A similar sub-20 nm resolution is possibly using state-of-the-art, high-energy e-beam lithography systems with a beam acceleration of 50–100 kV on positive and negative resists [19]. In the single-spot nanolithography, there are

• were sputtered with a magnetron in vacuum with a 20 nm-thick cobalt film. This resulted in 3D magnetic nanostructures with unusual spin configurations that potentially can be used in magnetic sensing technologies, memory, logic and biomedical applications [20]. Moreover, the single-spot nanolithography

Combination of surface- and interference-enhanced Raman scattering by CuS nanocrystals on nanopatterned Au structures

• Alexander G. Milekhin,
• Nikolay A. Yeryukov,
• Larisa L. Sveshnikova,
• Tatyana A. Duda,
• Ekaterina E. Rodyakina,
• Victor A. Gridchin,
• Evgeniya S. Sheremet and
• Dietrich R. T. Zahn

Beilstein J. Nanotechnol. 2015, 6, 749–754, doi:10.3762/bjnano.6.77

• resonance [10][11]. SERS by LO phonons of CdTe was investigated in mixed Ag-CdTe NCs with a controllable Ag nanoparticle/CdTe NC mixture ratio [12]. The first report on the observation of the SERS effect by optical phonons in CuS NCs on ordered arrays of Au nanoclusters fabricated in a nanolithography

• , CuS NCs were deposited on arrays of Au nanoclusters fabricated using nanolithography on a 75 nm thick SiO2 layer. Obviously, the LSPR energy of the Au nanocluster arrays fabricated on a SiO2 layer and on a Si substrate can be different due to the difference of dielectric functions of SiO2 and Si [22

Hollow plasmonic antennas for broadband SERS spectroscopy

• Gabriele C. Messina,
• Mario Malerba,
• Pierfrancesco Zilio,
• Ermanno Miele,
• Michele Dipalo,
• Lorenzo Ferrara and
• Francesco De Angelis

Beilstein J. Nanotechnol. 2015, 6, 492–498, doi:10.3762/bjnano.6.50

• based on surface enhanced Raman scattering (SERS) enhancement [1][2][3], fluorescence [4][5], the surface plasmon resonance effect [6][7], mapping and imaging [8][9][10], to nanotechnology, with several works related to nanolithography [11][12], nanofocusing [13][14], nanolasers [15][16], waveguides [17

Boosting the local anodic oxidation of silicon through carbon nanofiber atomic force microscopy probes

• Gemma Rius,
• Matteo Lorenzoni,
• Soichiro Matsui,
• Masaki Tanemura and
• Francesc Perez-Murano

Beilstein J. Nanotechnol. 2015, 6, 215–222, doi:10.3762/bjnano.6.20

• –sample direct mechanical contact or long range interactions, such as based on van der Waals or electrostatic forces. Because of this, AFM-based SPL can be achieved through oxidation, indentation, as well as various other implementations such as dip-pen nanolithography [5]. Early works on AFM-based SPL

Advanced atomic force microscopy techniques II

• Thilo Glatzel,
• Ricardo Garcia and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2014, 5, 2326–2327, doi:10.3762/bjnano.5.241

• force microscopy [8] are presented as well as molecular structures such as the self-assembly of multidentate organothiols onto Au(111), which were studied in situ by using scanning probe nanolithography and time-lapse AFM [9]. Patterns of thiol-based self-assembled monolayers for the site-selective

Near-field photochemical and radiation-induced chemical fabrication of nanopatterns of a self-assembled silane monolayer

• Ulrich C. Fischer,
• Carsten Hentschel,
• Florian Fontein,
• Linda Stegemann,
• Christiane Hoeppener,
• Harald Fuchs and
• Stefanie Hoeppener

Beilstein J. Nanotechnol. 2014, 5, 1441–1449, doi:10.3762/bjnano.5.156

• growth and mobility of cells on surfaces [14]. Top-down as well as bottom-up fabrication methods are applied in the field of chemical nanostructuring. Thus, chemical nanopatterns were formed by using different approaches, including electro-oxidative nanolithography [15], electron beam lithography [16

• ], self-assembled block-copolymer structures [17], block-copolymer micelle nanolithography [18] as well as polymer blend lithography [19]. Moreover, gold nanoparticles with functional groups have been arranged in many different approaches to form chemical nanopatterns [14]. With parallel lithographic

• exploited to test the resolution potential of the fabrication methods, other methods of bottom-up fabrication of the metal masks are desirable for this purpose. For the fabrication of metal masks as used here the block-copolymer micelle nanolithography [18], the silver decoration technique or other

Hole-mask colloidal nanolithography combined with tilted-angle-rotation evaporation: A versatile method for fabrication of low-cost and large-area complex plasmonic nanostructures and metamaterials

• Jun Zhao,
• Bettina Frank,
• Frank Neubrech,
• Chunjie Zhang,
• Paul V. Braun and
• Harald Giessen

Beilstein J. Nanotechnol. 2014, 5, 577–586, doi:10.3762/bjnano.5.68

• MSEB, MC-246, 1304 W. Green Street, Urbana, Illinois 61801, United States 10.3762/bjnano.5.68 Abstract Many nano-optical applications require a suitable nanofabrication technology. Hole-mask colloidal nanolithography has proven to be a low-cost and large-area alternative for the fabrication of complex

• Beilstein TV. Keywords: hole-mask colloidal nanolithography; localized surface plasmon resonance sensing; low-cost large-area plasmonic nanostructures; multilayer fabrication; surface-enhanced infrared absorption spectroscopy (SERS); Introduction Optics with metallic nanostructures has generated keen

• ]. Here, we present an overview over hole-mask colloidal nanolithography [22], which we combine with tilted angle rotation evaporation [23]. Our method is inherently large-area, low-cost (as it can be added simply to standard thermal or electron-gun evaporators), flexible (as programming of stepper motors

Nanoscale patterning of a self-assembled monolayer by modification of the molecule–substrate bond

• Cai Shen and
• Manfred Buck

Beilstein J. Nanotechnol. 2014, 5, 258–267, doi:10.3762/bjnano.5.28

• followed by adsorption of AdSH. The appearance of Au adatom islands upon the thiol exchange suggests that the interfacial structures of BP2 and AdSH SAMs are different. Keywords: copper; electrodeposition; gold adatoms; nanolithography; negative resist; Introduction The applications of organic adsorbates

Surface assembly and nanofabrication of 1,1,1-tris(mercaptomethyl)heptadecane on Au(111) studied with time-lapse atomic force microscopy

• Tian Tian,
• Burapol Singhana,
• Lauren E. Englade-Franklin,
• Xianglin Zhai,
• T. Randall Lee and
• Jayne C. Garno

Beilstein J. Nanotechnol. 2014, 5, 26–35, doi:10.3762/bjnano.5.3

• , Texas 77204-5003, USA 10.3762/bjnano.5.3 Abstract The solution self-assembly of multidentate organothiols onto Au(111) was studied in situ using scanning probe nanolithography and time-lapse atomic force microscopy (AFM). Self-assembled monolayers (SAMs) prepared from dilute solutions of multidentate

• –Au bonds to the substrate. Keywords: liquid AFM; multidentate; nanografting; nanolithography; self-assembly; Introduction Multidentate thiol-based adsorbates attach to gold surfaces through multiple bonds that provide enhanced stability to self-assembled monolayers (SAMs) [1][2]. Although detailed

• nanolithography enable side-by-side comparisons of the surface structures of multidentate adsorbates versus n-alkanethiol monolayers (i.e., film thickness, morphology). Our experimental strategies rely on using a liquid sample cell for AFM studies, since fresh reagents can be introduced to the system, and

Cyclic photochemical re-growth of gold nanoparticles: Overcoming the mask-erosion limit during reactive ion etching on the nanoscale

• Burcin Özdemir,
• Axel Seidenstücker,
• Alfred Plettl and
• Paul Ziemann

Beilstein J. Nanotechnol. 2013, 4, 886–894, doi:10.3762/bjnano.4.100

• nanolithography (BCML). It is demonstrated that evaporated octadecyltrimethoxysilane (OTMS) layers act as stabilizer on the NP position, which allows for an increase of their size up to 50 nm by an electroless photochemical process. In this way, ordered arrays of silica nanopillars are obtained with maximum

• important role in the context of nanolithography. For this purpose, NP that are deposited onto a given substrate are applied as masks during the subsequent anisotropic etching processes such as reactive ion etching (RIE). In this way, the original pattern of NP positions is transferred into the subjacent

Site-selective growth of surface-anchored metal-organic frameworks on self-assembled monolayer patterns prepared by AFM nanografting

• Tatjana Ladnorg,
• Alexander Welle,
• Stefan Heißler,
• Christof Wöll and
• Hartmut Gliemann

Beilstein J. Nanotechnol. 2013, 4, 638–648, doi:10.3762/bjnano.4.71

• first one is based on 3-mercaptopropionic acid molecules which are grafted in a 1-decanethiolate SAM, which serves as a matrix for this nanolithography. The second approach uses 16-mercaptohexadecanoic acid, which is grafted in a matrix of an 1-octadecanethiolate SAM. In both cases a site-selective

Porous polymer coatings as substrates for the formation of high-fidelity micropatterns by quill-like pens

• Michael Hirtz,
• Marcus Lyon,
• Wenqian Feng,
• Andrea E. Holmes,
• Harald Fuchs and
• Pavel A. Levkin

Beilstein J. Nanotechnol. 2013, 4, 377–384, doi:10.3762/bjnano.4.44

• Discussion Pattern generation The microarrays were fabricated by spotting the dye solution with quill-like microchannel cantilevers, called surface patterning tools (SPTs) [9], attached to a dip-pen nanolithography (DPN) platform (NLP 2000, NanoInk, USA) for precise control in x- y- and z-direction (Figure 1

Selective surface modification of lithographic silicon oxide nanostructures by organofunctional silanes

• Thomas Baumgärtel,
• Christian von Borczyskowski and
• Harald Graaf

Beilstein J. Nanotechnol. 2013, 4, 218–226, doi:10.3762/bjnano.4.22

• coverage of the dye molecules on length scale that is not accessible by standard AFM measurements. Keywords: AFM lithography; amino-functionalization; local anodic oxidation; octadecyl-trichlorosilane; silicon oxide nanostructures; Introduction Local anodic oxidation (LAO) nanolithography is a reliable

Physics, chemistry and biology of functional nanostructures

• Paul Ziemann and
• Thomas Schimmel

Beilstein J. Nanotechnol. 2012, 3, 843–845, doi:10.3762/bjnano.3.94

• broader view on biomimetic approaches can be found in [8]. The choice of these recommendations becomes obvious on summarizing the main topics of the present Thematic Series: Nanolithography approaches based on self-organized colloidal systems Experimental and theoretical description of electrical