Surface engineering of nanoporous substrate for solid oxide fuel cells with atomic layer-deposited electrolyte

• Sanghoon Ji,
• Waqas Hassan Tanveer,
• Wonjong Yu,
• Sungmin Kang,
• Gu Young Cho,
• Sung Han Kim,
• Jihwan An and
• Suk Won Cha

Beilstein J. Nanotechnol. 2015, 6, 1805–1810, doi:10.3762/bjnano.6.184

• deposited on BECs with different thicknesses, whose cross-sectional microstructure was investigated by focused ion beam and field emission scanning electron microscopy (FIB/FE-SEM) imaging: the BECs were 40 nm and 320 nm in thickness. In case of the thinner BEC, a significant amount of ALD YSZ certainly

• -deposited (ALD) yttria-stabilized zirconia (YSZ) electrolyte and 60 nm-thick top electrode catalyst (sputtered porous Pt cathode). (A) Focused ion beam-prepared field emission scanning electron microscopy (FE-SEM) cross-sectional images for 50 nm-thick ALD YSZ films deposited on 80 nm pore AAO supported 40

Lower nanometer-scale size limit for the deformation of a metallic glass by shear transformations revealed by quantitative AFM indentation

• Arnaud Caron and
• Roland Bennewitz

Beilstein J. Nanotechnol. 2015, 6, 1721–1732, doi:10.3762/bjnano.6.176

• metallic glass samples and relate them to our results. We will then discuss alternative concepts leading to homogeneous flow and finally the role of strain rates. The investigation of the plastic flow of micro- and nano-fabricated test samples prepared from metallic glasses by focus ion beam (FIB) with

Imaging of carbon nanomembranes with helium ion microscopy

• André Beyer,
• Henning Vieker,
• Robin Klett,
• Hanno Meyer zu Theenhausen,
• Polina Angelova and
• Armin Gölzhäuser

Beilstein J. Nanotechnol. 2015, 6, 1712–1720, doi:10.3762/bjnano.6.175

• partial and a fully covered opening. CNM charging due to the positively charged He+ ion beam and the emission of negatively charged secondary electrons can only result in positive charging regardless of the secondary electron yield of the CNMs. A positively charged sample will hinder the emission of

• , which was demonstrated with CNMs. Experimental Helium ion microscopy (HIM) was performed with a Carl Zeiss Orion Plus® microscope. The helium ion beam was operated at a current between 0.1–2.7 pA. The secondary electrons were collected by an Everhart–Thornley detector at 500 V grid voltage. For some

Atomic scale interface design and characterisation

• Carla Bittencourt,
• Chris Ewels and
• Arkady V. Krasheninnikov

Beilstein J. Nanotechnol. 2015, 6, 1708–1711, doi:10.3762/bjnano.6.174

• , France Department of Applied Physics, Aalto University, Finland Institute of Ion Beam Physics and Materials Research, Helmholtz Zentrum Dresden-Rossendorf, Germany 10.3762/bjnano.6.174 Keywords: carbon; first-principles simulations; interface; nanomaterials; nanoscale; oxides; spectromicroscopy; While

Formation of pure Cu nanocrystals upon post-growth annealing of Cu–C material obtained from focused electron beam induced deposition: comparison of different methods

• Aleksandra Szkudlarek,
• Alfredo Rodrigues Vaz,
• Yucheng Zhang,
• Andrzej Rudkowski,
• Czesław Kapusta,
• Rolf Erni,
• Stanislav Moshkalev and
• Ivo Utke

Beilstein J. Nanotechnol. 2015, 6, 1508–1517, doi:10.3762/bjnano.6.156

• at room temperature was shown by Chiang et al. [36]. It led to 99 atom % pure Cu films. H2/Ar microplasma-assisted FEBID increased the Cu content from 12 atom % to 41 atom % but also caused extended halo deposits [39]. Ga+ ion beam deposition showed that heating the substrate surface has a crucial

Current–voltage characteristics of manganite–titanite perovskite junctions

• Benedikt Ifland,
• Patrick Peretzki,
• Birte Kressdorf,
• Philipp Saring,
• Andreas Kelling,
• Michael Seibt and
• Christian Jooss

Beilstein J. Nanotechnol. 2015, 6, 1467–1484, doi:10.3762/bjnano.6.152

• acceleration voltages did not result in measureable EBIC in our setup. A cross-section lamella of the sample was prepared by means of a focused ion beam microscope. An EBIC scan across the p–n interface is shown in Figure 3b, together with a simulated EBIC linescan, taking into account only the generation

Peptide-equipped tobacco mosaic virus templates for selective and controllable biomineral deposition

• Klara Altintoprak,
• Axel Seidenstücker,
• Alexander Welle,
• Sabine Eiben,
• Petia Atanasova,
• Nina Stitz,
• Alfred Plettl,
• Joachim Bill,
• Hartmut Gliemann,
• Holger Jeske,
• Dirk Rothenstein,
• Fania Geiger and
• Christina Wege

Beilstein J. Nanotechnol. 2015, 6, 1399–1412, doi:10.3762/bjnano.6.145

• 1.0 ns allowed for high mass resolution. The primary ion beam was rastered across a 500 × 500 µm2 field of view on the sample, and 128 × 128 data points were recorded. Primary ion doses were kept below 1011 ions/cm2 (static SIMS limit). The spectra were calibrated against C−, CH−, CH2−, and Au-, or on

Scalable, high performance, enzymatic cathodes based on nanoimprint lithography

• Dmitry Pankratov,
• Richard Sundberg,
• Javier Sotres,
• Dmitry B. Suyatin,
• Ivan Maximov,
• Sergey Shleev and
• Lars Montelius

Beilstein J. Nanotechnol. 2015, 6, 1377–1384, doi:10.3762/bjnano.6.142

• taken using a Nova NanoLab 600 Dual Beam focused ion beam and scanning electron microscope (FIB-SEM) from FEI Company (Hillsboro, Oregon, USA). The images were taken with an immersion lens at an acceleration voltage of 30 kV and a beam current of 2.4 nA. AFM images were obtained using a Multimode VIII

Influence of the shape and surface oxidation in the magnetization reversal of thin iron nanowires grown by focused electron beam induced deposition

• Luis A. Rodríguez,
• Lorenz Deen,
• Rosa Córdoba,
• César Magén,
• Etienne Snoeck,
• Bert Koopmans and
• José M. De Teresa

Beilstein J. Nanotechnol. 2015, 6, 1319–1331, doi:10.3762/bjnano.6.136

• with a width of 250 nm and nominal thicknesses of 10 and 45 nm were fabricated using a focused Ga+ ion beam and standard lift-out procedures in an FEI Helios 600 Nanolab. The slices were cut perpendicular to the nanowire length to analyze their cross-sectional width profile. The morphology and

Structural transitions in electron beam deposited Co–carbonyl suspended nanowires at high electrical current densities

• Gian Carlo Gazzadi and
• Stefano Frabboni

Beilstein J. Nanotechnol. 2015, 6, 1298–1305, doi:10.3762/bjnano.6.134

• Strata DB235M) combining a Ga-ion focused ion beam (FIB) with a thermal field emission SEM, equipped with a Co–carbonyl (Co2(CO)8) GIS operated at room temperature (RT). The GIS is mounted at a polar angle of 52° and an azimuthal angle of 115° with respect to the sample surface. An injection nozzle with

Magnetic properties of iron cluster/chromium matrix nanocomposites

• Arne Fischer,
• Robert Kruk,
• Di Wang and
• Horst Hahn

Beilstein J. Nanotechnol. 2015, 6, 1158–1163, doi:10.3762/bjnano.6.117

• newly developed UHV cluster ion beam deposition apparatus, which is described elsewhere [2]. Fe clusters are produced in a Haberland-type magnetron sputtering/gas aggregation cluster source. Extracted anions are accelerated by electrostatic lenses and mass-separated in a 90° sector magnet. The mass

• energy-filtered transmission electron microscopy (EFTEM) and scanning transmission electron microscopy (STEM) micrographs of the Fe distribution for a 10 vol % Fe1000/Cr sample, specifically prepared for TEM. To avoid subsequent focused ion beam cutting and possible oxidation, the sample was deposited on

Scanning reflection ion microscopy in a helium ion microscope

• Yuri V. Petrov and
• Oleg F. Vyvenko

Beilstein J. Nanotechnol. 2015, 6, 1125–1137, doi:10.3762/bjnano.6.114

• to make the ion beam paths visible. The detection of SEs excited from the conductive sample occurred when the bias was switched off, as the SEs excited from the conductive sample exceeded the signal of the RI-to-SE converter. For insulating samples, the SE signal from the sample could not be detected

• estimation of the divergence angle of the He-ion beam from the pixel size and the depth of focus. The depth of focus is defined as the distance between the edges of the in-focused part of the image plane divided by the tangent of the grazing angle. From the image in Figure 2, the depth of focus can be

• details of the calculation procedure will be described in the next section. Discussion Contrast formation in scanning reflection ion microscopy The results presented in the previous sections showed that imaging using an incident ion beam at low grazing angles exhibits following properties: RI detection is

High sensitivity and high resolution element 3D analysis by a combined SIMS–SPM instrument

• Yves Fleming and
• Tom Wirtz

Beilstein J. Nanotechnol. 2015, 6, 1091–1099, doi:10.3762/bjnano.6.110

• crystal orientation and the local angle of incidence of the ion beam influence local sputter yields [6]. In case the sample is constituted of different materials, the situation is worsened due to preferential sputtering phenomena. As a consequence, the produced 3D images are affected by uncertainties on

• instrument based on a Cameca NanoSIMS 50 is presented in detail elsewhere [6][7]. The sample was sputtered with a Cs+ primary ion beam at 16 keV impact energy, normal incidence and sample currents between 1.4 and 2.5 pA. The raster frame was set to 256 × 256 pixels. Depending on the analysis, the dwell time

• in Figure 4d, it is clearly noticeable that the topography of the TaN structure is changing. Due to the higher impact angle of the primary ion beam on the ridge’s edge compared to the ridge’s top surface or the trenches, the erosion rate is considerably higher in this area. The ridges therefore

Patterning technique for gold nanoparticles on substrates using a focused electron beam

• Takahiro Noriki,
• Shogo Abe,
• Kotaro Kajikawa and
• Masayuki Shimojo

Beilstein J. Nanotechnol. 2015, 6, 1010–1015, doi:10.3762/bjnano.6.104

• structures with gold and silver nanoparticles using a nanomanipulator. This technique is fascinating, but it may be a time-consuming process for production of relatively large circuits. Nanostructures have also been fabricated using focused ion beam- or focused electron beam-induced deposition [1][7

Effects of swift heavy ion irradiation on structural, optical and photocatalytic properties of ZnO–CuO nanocomposites prepared by carbothermal evaporation method

• Sini Kuriakose,
• D. K. Avasthi and
• Satyabrata Mohapatra

Beilstein J. Nanotechnol. 2015, 6, 928–937, doi:10.3762/bjnano.6.96

• lateral mass flow leading to the formation of larger nanorod like structures with increased width and distinct facets, as can be seen in Figure 1c and Figure 1d. The photocatalysis studies were carried out by taking MB and MO as model organic dyes to demonstrate the capability of ion beam engineering to

• powders were purchased from Merck, India, while Cu powder was purchased from Loba Chemie. Methylene blue (MB) and methyl orange (MO) were procured from SRL, India. All chemicals used were of analytical grade and were used without any further purification. Synthesis and ion beam engineering of ZnO–CuO

Electron-stimulated purification of platinum nanostructures grown via focused electron beam induced deposition

• Brett B. Lewis,
• Michael G. Stanford,
• Jason D. Fowlkes,
• Kevin Lester,
• Harald Plank and
• Philip D. Rack

Beilstein J. Nanotechnol. 2015, 6, 907–918, doi:10.3762/bjnano.6.94

• ]. Additionally, FEBID is a more gentle technique as compared to similar techniques (e.g., ion beam induced deposition (IBID)) which is beneficial for many applications. The major drawback to FEBID is the purity of the final deposits which results from unwanted precursor fragments left after dissociation. The

• grown to a thickness of ca. 400 nm and subsequently purified at 25 °C at various times from 1 to 12 min. After curing, the pads were sectioned using gallium focused ion beam milling to reveal the Pt layer thickness as a function of purification time. The SEM micrographs in Figure 2 depict the bright

• parameters during deposition. As the layer is extremely thin (a few monolayers) it can also be easily removed ex situ by with a brief focused ion beam etch. Microstructure Transmission electron microscopy (TEM) images of the as-deposited and cured PtCx EBID patterns were taken to compare the microstructure

Hollow plasmonic antennas for broadband SERS spectroscopy

• Gabriele C. Messina,
• Mario Malerba,
• Pierfrancesco Zilio,
• Ermanno Miele,
• Michele Dipalo,
• Lorenzo Ferrara and
• Francesco De Angelis

Beilstein J. Nanotechnol. 2015, 6, 492–498, doi:10.3762/bjnano.6.50

• (SERS) and are activated by a wide range of excitation wavelengths. The three-dimensional hollow nanoantennas were produced on an optical resist by a secondary electron lithography approach, generated by fast ion-beam milling on the polymer and then covered with silver in order to obtain plasmonic

• accordance with calculations derived from the FEM method. Experimental Hollow three-dimensional electric field enhancing structures were obtained through an innovative fabrication method based on secondary electron lithography, generated by ion beam milling. The detailed process has been discussed elsewhere

• in depth [23]. Briefly, a layer of optical resist (Shipley S1813) is deposited by spin coating on the top of a silicon nitride membrane. The structure of the antenna is defined from the backside of the membrane by focused ion beam milling (FEI, NanoLab 600 dual beam system) using a gallium ion source

A scanning probe microscope for magnetoresistive cantilevers utilizing a nested scanner design for large-area scans

• Tobias Meier,
• Alexander Förste,
• Ali Tavassolizadeh,
• Karsten Rott,
• Dirk Meyners,
• Roland Gröger,
• Günter Reiss,
• Eckhard Quandt,
• Thomas Schimmel and
• Hendrik Hölscher

Beilstein J. Nanotechnol. 2015, 6, 451–461, doi:10.3762/bjnano.6.46

• prepared by a sequence of MEMS techniques including photolithography, reactive ion etching (RIE), ion beam etching (IBE) and wet etching. The cantilevers used in this study were 300 to 350 μm long and 40 μm wide. To ease the fabrication process thicknesses ranging from 10 μm to 20 μm were chosen. The

• focused ion beam and electron beam deposition, tips can be manually been grown on the apex of the cantilever [59]. The use of such tips enables high lateral resolution as tip radii as small as 30 nm can be achieved. The advantage of this approach is that the tip is subsequently grown and without altering

• different angles of the bias field towards the easy axis. The bias field has a strong influence on the strain sensitivity of the TMR sensor. a) To improve lateral resolution, tips with a tip radius of 30 nm were grown by a combination of focused ion beam and electron beam deposition deposition. b) Atomic

Electrical properties of single CdTe nanowires

• Elena Matei,
• Camelia Florica,
• Andreea Costas,
• María Eugenia Toimil-Molares and
• Ionut Enculescu

Beilstein J. Nanotechnol. 2015, 6, 444–450, doi:10.3762/bjnano.6.45

• . Focused ion beam-induced metallization was used to produce individual nanowires with electrical contacts and electrical measurements were performed on these individual nanowires. The influence of a bottom gate was investigated and it was found that surface passivation leads to improved transport

• combination of lithography and focused ion beam-induced metallization (FIBIM). The electrical properties were determined for individual nanowires prepared under different conditions. Further, the effect of a bottom gate on the charge carriers transported through the nanowire channel was examined. It was also

• nanowire suspension was placed on Si/SiO2 substrates on which interdigitated Ti/Au electrodes were patterned by photolithography (Figure 4). FIBIM is a direct patterning method employed for the design of metallic nanostructures. The method is based on the interaction of an ion beam with the surface

Nanoporous Ge thin film production combining Ge sputtering and dopant implantation

• Jacques Perrin Toinin,
• Alain Portavoce,
• Khalid Hoummada,
• Michaël Texier,
• Maxime Bertoglio,
• Sandrine Bernardini,
• Marco Abbarchi and
• Lee Chow

Beilstein J. Nanotechnol. 2015, 6, 336–342, doi:10.3762/bjnano.6.32

• for the fabrication of nanocrystals by dewetting, such as metals or semiconductors. In addition, the structure of the dewetted layers can be controlled using several techniques such as pulsed laser annealing [35][36] or a substrate patterned by focused ion beam. The study of Ge dewetting on SiO2 [37

• the sample surface, and with an ion beam energy of 130 keV for Se+ ions and of 180 keV for Te+ ions. After implantation, the samples were annealed in different conditions (1 ≤ t ≤ 168 h and 525 ≤ T ≤ 725 °C) in a custom-built furnace under a pressure of 1 × 10−7 mbar during annealing. TEM images were

Oxygen-plasma-modified biomimetic nanofibrous scaffolds for enhanced compatibility of cardiovascular implants

• Anna Maria Pappa,
• Varvara Karagkiozaki,
• Silke Krol,
• Spyros Kassavetis,
• Dimitris Konstantinou,
• Charalampos Pitsalidis,
• Lazaros Tzounis,
• Nikos Pliatsikas and
• Stergios Logothetidis

Beilstein J. Nanotechnol. 2015, 6, 254–262, doi:10.3762/bjnano.6.24

• hydrophobic character [19]. To date, several surface-engineering techniques have been applied in order to chemically modify surfaces of electrospun nanofibers [9][20][21][22], including treatments by flame, corona discharge, plasma, photons, electron beam, ion beam, X-rays, and gamma rays. Among them

Boosting the local anodic oxidation of silicon through carbon nanofiber atomic force microscopy probes

• Gemma Rius,
• Matteo Lorenzoni,
• Soichiro Matsui,
• Masaki Tanemura and
• Francesc Perez-Murano

Beilstein J. Nanotechnol. 2015, 6, 215–222, doi:10.3762/bjnano.6.20

• 3 cm, at nearly room temperature. The basal and working pressures are 1.5 × 10−5 Pa and 2 × 10−2 Pa, respectively. The ion beam energy is 600 eV, and the growth duration is 8 min. CNF elliptical cross section is smaller than 50 nm in diameter, and it is systematically and conveniently aligned with

Bright photoluminescence from ordered arrays of SiGe nanowires grown on Si(111)

• D. J. Lockwood,
• N. L. Rowell,
• A. Benkouider,
• A. Ronda,
• L. Favre and
• I. Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2498–2504, doi:10.3762/bjnano.5.259

• in the substrate by focused ion beam patterning for the preferential nucleation and growth of these well-organized NWs. The NWs thus produced have a diameter of 200 nm, a length of 200 nm, and a Ge concentration x = 0.15. Their photoluminescence (PL) spectra were measured at low temperatures (from 6

• positioned [28]. We have evolved an efficient and simple electrochemical process that joins focused-ion-beam (FIB) lithography and galvanic reaction to selectively prepare gold nanoparticles in well-defined locations. Afterwards these nanoparticles are used for the molecular beam epitaxy (MBE) growth of

• having an Orsay Physics mass filtered ion column operated at 30 keV. A liquid metal alloy ion source (LMAIS) of Au4Si ([Si] = 19%, [Au] = 81%) heated at 450 °C was used for the milling step; a Au2+ or Si+ ion beam was selected independently by a Wien filter. The patterns in the Si/SiO2 substrate were

Si/Ge intermixing during Ge Stranski–Krastanov growth

• Alain Portavoce,
• Khalid Hoummada,
• Antoine Ronda,
• Dominique Mangelinck and
• Isabelle Berbezier

Beilstein J. Nanotechnol. 2014, 5, 2374–2382, doi:10.3762/bjnano.5.246

• uses structures shaped by dual beam focus ion beam (FIB) as tips exhibiting a tip diameter between 50 nm (top of the tip) and 200 nm [38][39]. Figure 1 presents the different steps leading to the formation of APT samples by FIB. After the deposition of a Ni cap for the protection of the sample surface

Nanometer-resolved mechanical properties around GaN crystal surface steps

• Jörg Buchwald,
• Marina Sarmanova,
• Bernd Rauschenbach and
• Stefan G. Mayr

Beilstein J. Nanotechnol. 2014, 5, 2164–2170, doi:10.3762/bjnano.5.225

• substrate by ion beam-assisted molecular beam epitaxy [24]. Measurements for the elastic properties of the GaN film were performed by a CR-AFM, that was custom-built into a commercial Asylum Research MFP-3D AFM [25]. The AFM probe used for CR-AFM imaging was a Si PPP-NCLR (NanoSensors, Switzerland) with a