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Search for "nanopatterning" in Full Text gives 42 result(s) in Beilstein Journal of Nanotechnology.

Ion beam processing of DNA origami nanostructures

  • Leo Sala,
  • Agnes Zerolová,
  • Violaine Vizcaino,
  • Alain Mery,
  • Alicja Domaracka,
  • Hermann Rothard,
  • Philippe Boduch,
  • Dominik Pinkas and
  • Jaroslav Kocišek

Beilstein J. Nanotechnol. 2024, 15, 207–214, doi:10.3762/bjnano.15.20

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  • nanopatterning approach. Direct combination of this approach with top-down nanotechnology, such as ion beams, has not been considered because of the soft nature of the DNA material. Here we demonstrate that the shape of 2D DNA origami nanostructures deposited on Si substrates is well preserved upon irradiation
  • in the present context are works on the use of DNA origami nanostructures in top-down or bottom-up nanopatterning approaches [7][8][9][10]. So far, DNA origami has been proposed only as a resist or as a platform to precisely arrange nanostructure precursors in lithography [11][12][13]. Incorporating
  • impact. Such shape modifications are becoming important with the development of higher-order DNA origami nanostructures [43], particularly lattices for surface nanopatterning [44][45]. Ion beam lattice trimming can be used in combined lithographic approaches as well as in forming well-defined nano-bio
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Published 12 Feb 2024

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO2 substrates

  • Aleksandra Szkudlarek,
  • Jan M. Michalik,
  • Inés Serrano-Esparza,
  • Zdeněk Nováček,
  • Veronika Novotná,
  • Piotr Ozga,
  • Czesław Kapusta and
  • José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

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  • processes using the so-called focused electron-beam-induced etching (FEBIE), with a spatial resolution of ten nanometers. Nanopatterning graphene with such a method in one single step and without using a physical mask or resist is a very appealing approach. During the process, on top of graphene
  • nanopatterning, we have found significant morphological changes induced in the SiO2 substrate even at low electron dose values (<8 nC/μm2). We demonstrate that graphene etching and topographical changes in SiO2 substrates can be controlled via electron beam parameters such as dwell time and dose. Keywords
  • : direct writing; dwell time; electron dose; etching; graphene; maskless lithography; nanopatterning; Introduction The discovery of extraordinary and controllable electrical conductivity in graphene back in 2004 made it the most recognized 2D material [1]. The newly discovered phenomena, such as
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Published 07 Feb 2024

Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

  • Lester Uy Vinzons,
  • Guo-Chung Dong and
  • Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

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  • . However, few studies have investigated the impact of discrete nanostructures, such as nanopillars and nanoholes, and their combination with microgrooves on neurite outgrowth and alignment. Furthermore, numerous techniques have been developed for surface micro-/nanopatterning, but simple and low-cost
  • patterned nano-/microstructured PU films enhance both PC12 neurite elongation and alignment, showing the potential use of our proposed method for the micro-/nanopatterning of polymers for nerve tissue engineering. Keywords: hierarchical; nanopatterning; neurite alignment; neurite outgrowth; topography
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Published 29 Nov 2023

Two-dimensional molecular networks at the solid/liquid interface and the role of alkyl chains in their building blocks

  • Suyi Liu,
  • Yasuo Norikane and
  • Yoshihiro Kikkawa

Beilstein J. Nanotechnol. 2023, 14, 872–892, doi:10.3762/bjnano.14.72

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  • Applied Sciences, University of Tsukuba, Ibaraki, 305-8571, Japan 10.3762/bjnano.14.72 Abstract Nanoarchitectonics has attracted increasing attention owing to its potential applications in nanomachines, nanoelectronics, catalysis, and nanopatterning, which can contribute to overcoming global problems
  • -assembly; solid/liquid interface; two-dimensional networks; Introduction The fabrication of ordered nanostructures using the concept of nanoarchitectonics [1][2][3][4] for various applications such as nanomachines, nanoelectronics, catalysis, and nanopatterning remains challenging [5][6][7]. Design and
  • , understanding the effects of alkyl chains and combining them with other interactions is an important strategy in the design and control of 2D nanoarchitectures. We hope that this review can evoke the unprecedented idea of nano-architecture design for the application regarding nanodevices and nanopatterning
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Published 23 Aug 2023

Effects of focused electron beam irradiation parameters on direct nanostructure formation on Ag surfaces

  • Jānis Sniķeris,
  • Vjačeslavs Gerbreders,
  • Andrejs Bulanovs and
  • Ēriks Sļedevskis

Beilstein J. Nanotechnol. 2022, 13, 1004–1010, doi:10.3762/bjnano.13.87

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  • nanopatterning of metal surfaces, but it is a complicated and expensive multistep process [8]. Electron beam induced deposition (EBID) is a direct-write lithography technique, which is capable of creating 2D and free-standing 3D nanostructures by using electron irradiation to dissociate volatile precursor
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Published 22 Sep 2022

Bioselectivity of silk protein-based materials and their bio-inspired applications

  • Hendrik Bargel,
  • Vanessa T. Trossmann,
  • Christoph Sommer and
  • Thomas Scheibel

Beilstein J. Nanotechnol. 2022, 13, 902–921, doi:10.3762/bjnano.13.81

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  • and antifouling surfaces have been successfully generated by soft photolithography, micro-molding or nanopatterning techniques [57]. Moreover, the biomimetic application Sharklet® textured similarly to shark skin has not only been reported to be antiadhesive against green algae spores and bacterial
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Published 08 Sep 2022

Micro- and nanotechnology in biomedical engineering for cartilage tissue regeneration in osteoarthritis

  • Zahra Nabizadeh,
  • Mahmoud Nasrollahzadeh,
  • Hamed Daemi,
  • Mohamadreza Baghaban Eslaminejad,
  • Ali Akbar Shabani,
  • Mehdi Dadashpour,
  • Majid Mirmohammadkhani and
  • Davood Nasrabadi

Beilstein J. Nanotechnol. 2022, 13, 363–389, doi:10.3762/bjnano.13.31

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Published 11 Apr 2022

The patterning toolbox FIB-o-mat: Exploiting the full potential of focused helium ions for nanofabrication

  • Victor Deinhart,
  • Lisa-Marie Kern,
  • Jan N. Kirchhof,
  • Sabrina Juergensen,
  • Joris Sturm,
  • Enno Krauss,
  • Thorsten Feichtner,
  • Sviatoslav Kovalchuk,
  • Michael Schneider,
  • Dieter Engel,
  • Bastian Pfau,
  • Bert Hecht,
  • Kirill I. Bolotin,
  • Stephanie Reich and
  • Katja Höflich

Beilstein J. Nanotechnol. 2021, 12, 304–318, doi:10.3762/bjnano.12.25

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  • asymmetric magnetic interactions as in Co/Pt films, enabling the formation of desired spin textures [4]. As the actual device geometry determines the response to external stimuli, the coupling strengths, and the corresponding figures of merit, ultimate control in nanopatterning down to the single-digit
  • decay of the plasmonic near field. Hence, a nanopatterning approach that is able to realize sub-10 nm gaps in a reproducible manner is highly desired. He ion beam milling already demonstrated these capabilities in the fabrication of strongly coupled dimers with gap distances of less than 6 nm [62][63
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Published 06 Apr 2021

Electron beam-induced deposition of platinum from Pt(CO)2Cl2 and Pt(CO)2Br2

  • Aya Mahgoub,
  • Hang Lu,
  • Rachel M. Thorman,
  • Konstantin Preradovic,
  • Titel Jurca,
  • Lisa McElwee-White,
  • Howard Fairbrother and
  • Cornelis W. Hagen

Beilstein J. Nanotechnol. 2020, 11, 1789–1800, doi:10.3762/bjnano.11.161

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  • -dispersive X-ray spectroscopy (EDX); focused electron beam-induced deposition (FEBID); nanofabrication; platinum precursors; scanning electron microscopy (SEM); thermogravimetric analysis (TGA); Introduction Focused electron beam-induced deposition (FEBID) is a direct-write nanopatterning technique. FEBID
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Published 27 Nov 2020

Out-of-plane surface patterning by subsurface processing of polymer substrates with focused ion beams

  • Serguei Chiriaev,
  • Luciana Tavares,
  • Vadzim Adashkevich,
  • Arkadiusz J. Goszczak and
  • Horst-Günter Rubahn

Beilstein J. Nanotechnol. 2020, 11, 1693–1703, doi:10.3762/bjnano.11.151

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  • irradiation-induced mechanical strain in the patterning process are elaborated and discussed. Keywords: direct patterning; focused helium ion beam; out-of-plane nanopatterning; polymers; thin films; Introduction Micro- and nanofabrication with focused ion beams (FIBs) is currently a subject of strong
  • + and Ga+ ions (20 and 70 amu, respectively) when compared to He+ ions (4 amu). Thus, these results confirm that ions with intermediate and high mass values cannot be used in the scope of our nanopatterning technique since they destroy the pristine surface morphology and sputter away the pre-deposited
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Published 06 Nov 2020

Optically and electrically driven nanoantennas

  • Monika Fleischer,
  • Dai Zhang and
  • Alfred J. Meixner

Beilstein J. Nanotechnol. 2020, 11, 1542–1545, doi:10.3762/bjnano.11.136

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  • top-down approaches such as thin film deposition and nanopatterning, as well as bottom-up approaches such as chemical synthesis and self-assembly [38]. Gap sizes may range from a few tens of nanometers down to sub-nanometer tunnel junctions, where the classical description of the plasmonic behavior
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Published 07 Oct 2020

Wafer-level integration of self-aligned high aspect ratio silicon 3D structures using the MACE method with Au, Pd, Pt, Cu, and Ir

  • Mathias Franz,
  • Romy Junghans,
  • Paul Schmitt,
  • Adriana Szeghalmi and
  • Stefan E. Schulz

Beilstein J. Nanotechnol. 2020, 11, 1439–1449, doi:10.3762/bjnano.11.128

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  • fabrication uses cost-efficient subprocesses and omits expensive processes such as nanopatterning with high-resolution lithography. One low-cost method for the fabrication of such high aspect ratio templates and structures is metal-assisted chemical etching (MACE). This process uses a noble metal catalyst
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Published 23 Sep 2020

Biocatalytic oligomerization-induced self-assembly of crystalline cellulose oligomers into nanoribbon networks assisted by organic solvents

  • Yuuki Hata,
  • Yuka Fukaya,
  • Toshiki Sawada,
  • Masahito Nishiura and
  • Takeshi Serizawa

Beilstein J. Nanotechnol. 2019, 10, 1778–1788, doi:10.3762/bjnano.10.173

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  • nanoarchitectonics [1][4][11]. Achievements include nanopatterning [12], drug delivery [13], molecular sensing [14], nanodevices [15][16], and cell architectures [17][18]. On the other hand, crystalline poly- and oligosaccharides, such as cellulose and chitin, lag behind in nanoarchitectonics despite the superiority
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Published 26 Aug 2019

Precise local control of liquid crystal pretilt on polymer layers by focused ion beam nanopatterning

  • Maxim V. Gorkunov,
  • Irina V. Kasyanova,
  • Vladimir V. Artemov,
  • Alena V. Mamonova and
  • Serguei P. Palto

Beilstein J. Nanotechnol. 2019, 10, 1691–1697, doi:10.3762/bjnano.10.164

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  • beam nanopatterning; nematic liquid crystal; optical retardation; pretilt control; surface anchoring; Introduction Liquid crystal (LC) interactions with adjacent interfaces play a key role in LC-based optical devices as they are responsible for stabilizing mono-domain LC configurations and ensuring
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Published 12 Aug 2019

Charged particle single nanometre manufacturing

  • Philip D. Prewett,
  • Cornelis W. Hagen,
  • Claudia Lenk,
  • Steve Lenk,
  • Marcus Kaestner,
  • Tzvetan Ivanov,
  • Ahmad Ahmad,
  • Ivo W. Rangelow,
  • Xiaoqing Shi,
  • Stuart A. Boden,
  • Alex P. G. Robinson,
  • Dongxu Yang,
  • Sangeetha Hari,
  • Marijke Scotuzzi and
  • Ejaz Huq

Beilstein J. Nanotechnol. 2018, 9, 2855–2882, doi:10.3762/bjnano.9.266

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  • which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the subject of a recently completed European Union Project entitled “Single Nanometre Manufacturing: Beyond CMOS
  • ). 2.2.2 Focused electron beam induced processing. Focused electron beam induced processing (FEBIP) is a high-resolution direct-write nanopatterning method comprising two complementary techniques, namely electron beam induced deposition (EBID) and etching (EBIE). The advantages of FEBIP lie not only in the
  • and spaces on bulk silicon. Figure 11 shows schematically the evolution of EBID into a controlled nanopatterning technique since the first demonstration of its high resolution, followed by simulations and experiments on thin films to study the ultimate resolution achievable. This has ultimately
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Published 14 Nov 2018

High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

  • Kahraman Keskinbora,
  • Umut Tunca Sanli,
  • Margarita Baluktsian,
  • Corinne Grévent,
  • Markus Weigand and
  • Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

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  • ) radiation; focused ion beam (FIB); Fresnel zone plate; ion beam lithography (IBL); nanopatterning; soft X-rays; Introduction Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or
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Published 25 Jul 2018

Defect formation in multiwalled carbon nanotubes under low-energy He and Ne ion irradiation

  • Santhana Eswara,
  • Jean-Nicolas Audinot,
  • Brahime El Adib,
  • Maël Guennou,
  • Tom Wirtz and
  • Patrick Philipp

Beilstein J. Nanotechnol. 2018, 9, 1951–1963, doi:10.3762/bjnano.9.186

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  • total irradiation fluences of the MWCNT samples ranged from 1014 to 1018 ions/cm2. Beam position and primary ion fluence were controlled by the Fibics Nanopatterning and Visualisation Engine (NPVE) (http://www.fibics.com/). The FIBICS nano-patterning software allows for high-performance milling and ion
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Published 09 Jul 2018

Preparation of micro/nanopatterned gelatins crosslinked with genipin for biocompatible dental implants

  • Reika Makita,
  • Tsukasa Akasaka,
  • Seiichi Tamagawa,
  • Yasuhiro Yoshida,
  • Saori Miyata,
  • Hirofumi Miyaji and
  • Tsutomu Sugaya

Beilstein J. Nanotechnol. 2018, 9, 1735–1754, doi:10.3762/bjnano.9.165

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  • . Thus, gelatin surfaces patterned using genipin crosslinking are now an available option for biocompatible material patterning. Keywords: cell attachment; cell proliferation; dental implants; gelatin; genipin; nanopatterning; Introduction Topography on the micro- and nanoscale is an important property
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Published 11 Jun 2018
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  • studies without nanopatterning steps investigated the application of CMPS as a coupling layer for the addition of H2TPyP to produce a porphyrin thin film [2][3]. Multilayer films are stabilized by siloxane bonds that form the backbone of the CMPS linker, as well as by weaker π–π interactions between the
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Published 17 Apr 2018

Micro- and nano-surface structures based on vapor-deposited polymers

  • Hsien-Yeh Chen

Beilstein J. Nanotechnol. 2017, 8, 1366–1374, doi:10.3762/bjnano.8.138

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  • nanostamping (SuNS) [26] technology on another vapor-deposited poly(4-formyl-p-xylylene-co-p-xylylene) coating surface, and patterns of DNA molecules were resolved with sizes down to 100 nm. The combination of SuNS with the vapor deposition process enables the extension of the nanopatterning protocols to a
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Published 04 Jul 2017

Ion beam profiling from the interaction with a freestanding 2D layer

  • Ivan Shorubalko,
  • Kyoungjun Choi,
  • Michael Stiefel and
  • Hyung Gyu Park

Beilstein J. Nanotechnol. 2017, 8, 682–687, doi:10.3762/bjnano.8.73

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  • which results in much smaller sputtering yields [14][15]. We choose 10 pA beam current for the experiment here. This high current is relevant for increasing the He-FIB nanopatterning speed. It is also expected to have a large enough beam diameter to be resolved in the presented imaging methods. Arrays
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Published 23 Mar 2017

Nano- and microstructured materials for in vitro studies of the physiology of vascular cells

  • Alexandra M. Greiner,
  • Adria Sales,
  • Hao Chen,
  • Sarah A. Biela,
  • Dieter Kaufmann and
  • Ralf Kemkemer

Beilstein J. Nanotechnol. 2016, 7, 1620–1641, doi:10.3762/bjnano.7.155

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  • a different work, a plasmon was used to pattern a photoresist layer by means of NSOM (near-field scanning optical microscopy). A lateral resolution of about 50 nm was achieved, with a fabrication speed of ca 10 mm/s [65]. Nanoimprint lithography (NIL) is a low-cost nanopatterning technique for 2D
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Published 08 Nov 2016

Dealloying of gold–copper alloy nanowires: From hillocks to ring-shaped nanopores

  • Adrien Chauvin,
  • Cyril Delacôte,
  • Mohammed Boujtita,
  • Benoit Angleraud,
  • Junjun Ding,
  • Chang-Hwan Choi,
  • Pierre-Yves Tessier and
  • Abdel-Aziz El Mel

Beilstein J. Nanotechnol. 2016, 7, 1361–1367, doi:10.3762/bjnano.7.127

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  • a nodular morphology. The stages of the process are as follow: (1) nanopatterning on a photoresist film on a silicon substrate using laser interference lithography, (2) etching the silicon substrate through the photoresist mask to form nanograted silicon structures, (3) partial etching of the
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Published 29 Sep 2016

Nanostructured surfaces by supramolecular self-assembly of linear oligosilsesquioxanes with biocompatible side groups

  • Maria Nowacka,
  • Anna Kowalewska and
  • Tomasz Makowski

Beilstein J. Nanotechnol. 2015, 6, 2377–2387, doi:10.3762/bjnano.6.244

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  • derivatives of N-acetylcysteine (NAC), cysteine hydrochloride (Cys-HCl) and glutathione (GSH). Such self-assembled PSAMs based on polysilsesquioxane materials are attractive for surface nanopatterning and bioengineering, including preparation of surfaces rich in organic groups typical of the extracellular
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Published 11 Dec 2015

Nanoscale rippling on polymer surfaces induced by AFM manipulation

  • Mario D’Acunto,
  • Franco Dinelli and
  • Pasqualantonio Pingue

Beilstein J. Nanotechnol. 2015, 6, 2278–2289, doi:10.3762/bjnano.6.234

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  • therefore of polymer nanomanipulation requires a precise knowledge of all the parameters involved in the process. With the increasing number of observations, various models have been put forward to explain the occurrence of the nanopatterns. The main mechanisms proposed for nanopatterning induced by means
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Published 02 Dec 2015
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