Out-of-plane polarization induces a picosecond photoresponse in rhombohedral stacked bilayer WSe₂

• Guixian Liu,
• Yufan Wang,
• Zhoujuan Xu,
• Zhouxiaosong Zeng,
• Lanyu Huang,
• Cuihuan Ge and
• Xiao Wang

Beilstein J. Nanotechnol. 2024, 15, 1362–1368, doi:10.3762/bjnano.15.109

• monolayers of WSe2 were aligned at a 0° angle to form the 3R phase. The graphene/3R WSe2/graphene heterojunctions were aligned and assembled onto a SiO2/Si substrate by the all-dry transfer method. Au/Cr (50/10 nm) electrodes were patterned using standard electron-beam lithography (EBL, Raith 150 Two) and

New design of operational MEMS bridges for measurements of properties of FEBID-based nanostructures

• Bartosz Pruchnik,
• Krzysztof Kwoka,
• Ewelina Gacka,
• Dominik Badura,
• Piotr Kunicki,
• Andrzej Sierakowski,
• Paweł Janus,
• Tomasz Piasecki and
• Teodor Gotszalk

Beilstein J. Nanotechnol. 2024, 15, 1273–1282, doi:10.3762/bjnano.15.103

• Photonics, Łukasiewicz Research Network, Lotników 32/46, 02-668, Warsaw, Poland 10.3762/bjnano.15.103 Abstract Focused electron beam-induced deposition (FEBID) is a novel technique for the development of multimaterial nanostructures. More importantly, it is applicable to the fabrication of free-standing

• emission occur [3][4][5]. There are only a few processes with resolution and repeatability suitable for creating nanostructures, and even fewer are available for self-standing nanostructures. That includes epitaxial techniques as well as focused electron beam-induced deposition (FEBID) [6][7]. Integration

• effect using operational microelectromechanical systems” (Grant No. 2020/37/B/ST7/03792) and PRELUDIUM-21 grant “Nanometrology of field emission phenomena from electron beam deposited nanowires operating as nano- and picodeflection sensors – FEmet” (Grant No. 2022/45/N/ST7/03049) with help from the

A low-kiloelectronvolt focused ion beam strategy for processing low-thermal-conductance materials with nanoampere currents

• Annalena Wolff,
• Nico Klingner,
• William Thompson,
• Yinghong Zhou,
• Jinying Lin and
• Yin Xiao

Beilstein J. Nanotechnol. 2024, 15, 1197–1207, doi:10.3762/bjnano.15.97

• light interactions with biological tissue [18] as well as focused electron beam-induced deposition (FEBID) [19]. The general approach to assess the beam-induced heat damage and undesired artifacts, regardless if working with ions [17], photons [18], or electrons [19], compares experiments to models

• based on heat transfer and to Monte Carlo or finite element simulations [17][18][19]. Open source programs that assess heat deposition and diffusion are readily available to assess damage in light–tissue interactions [18]. For electron beams, multidimensional models predicting electron beam-induced

Direct electron beam writing of silver using a β-diketonate precursor: first insights

• Katja Höflich,
• Krzysztof Maćkosz,
• Chinmai S. Jureddy,
• Aleksei Tsarapkin and
• Ivo Utke

Beilstein J. Nanotechnol. 2024, 15, 1117–1124, doi:10.3762/bjnano.15.90

• , Feuerwerkerstrasse 39, CH 3602 Thun, Switzerland 10.3762/bjnano.15.90 Abstract Direct electron beam writing is a powerful tool for fabricating complex nanostructures in a single step. The electron beam locally cleaves the molecules of an adsorbed gaseous precursor to form a deposit, similar to 3D printing but

• without the need for a resist or development step. Here, we employ for the first time a silver β-diketonate precursor for focused electron beam-induced deposition (FEBID). The used compound (hfac)AgPMe3 operates at an evaporation temperature of 70–80 °C and is compatible with commercially available gas

• injection systems used in any standard scanning electron microscope. Growth of smooth 3D geometries could be demonstrated for tightly focused electron beams, albeit with low silver content in the deposit volume. The electron beam-induced deposition proved sensitive to the irradiation conditions, leading to

Interface properties of nanostructured carbon-coated biological implants: an overview

• Mattia Bartoli,
• Francesca Cardano,
• Erik Piatti,
• Stefania Lettieri,
• Andrea Fin and
• Alberto Tagliaferro

Beilstein J. Nanotechnol. 2024, 15, 1041–1053, doi:10.3762/bjnano.15.85

• which the deposition occurs. During electron beam evaporation, an electron beam is used to vaporize the target material, while during sputtering, a high-energy ion beam is used to bombard the target. In both cases, atoms are ejected from the target and subsequently condense onto the substrate. The

Recent progress on field-effect transistor-based biosensors: device perspective

• Billel Smaani,
• Fares Nafa,
• Mohamed Salah Benlatrech,
• Ismahan Mahdi,
• Hamza Akroum,
• Mohamed walid Azizi,
• Khaled Harrar and
• Sayan Kanungo

Beilstein J. Nanotechnol. 2024, 15, 977–994, doi:10.3762/bjnano.15.80

• -care diagnostic systems. This device was realized using a top-to-down approach with an anisotropic and cost-effective self-stop etching method [85][86]. A novel CMOS anisotropic technique was implemented for the etching process, combining classical optical and electron beam lithography with anisotropic

Water-assisted purification during electron beam-induced deposition of platinum and gold

• Cristiano Glessi,
• Fabian A. Polman and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 884–896, doi:10.3762/bjnano.15.73

• microscope using commercially available components and chemicals, which paves the way for a broader application of direct etching-assisted FEBID to obtain pure metallic structures. Keywords: FEBID; gold; nanofabrication; platinum; purification; Introduction Focused electron beam-induced deposition (FEBID

• focused electron beam. As a result, a solid deposit is formed, and organic and inorganic volatile fragments are removed by the vacuum pumps of the chamber. In the case of an organometallic precursor gas, in an ideal scenario, only metal is deposited, and all fragments arising from organic and inorganic

• , during electron beam exposure, successful purification of the deposited material occurs only if the deposited metal is inherently resistant to oxidation, such as Au, Pt, and Ru [34]. In the case of iron [35], the removal of carbon is accompanied by a large incorporation of oxygen in the deposit

Synthesis of silver–palladium Janus nanoparticles using co-sputtering of independent sources: experimental and theorical study

• Maria J. Martínez-Carreón,
• Francisco Solís-Pomar,
• Abel Fundora,
• Claudio D. Gutiérrez-Lazos,
• Sergio Mejía-Rosales,
• Hector N. Fernández-Escamilla,
• Jonathan Guerrero-Sánchez,
• Manuel F. Meléndrez and
• Eduardo Pérez-Tijerina

Beilstein J. Nanotechnol. 2024, 15, 808–816, doi:10.3762/bjnano.15.67

• -defined regions in the TEM micrographs. In STEM, the main differences in intensity are expected to occur when two elements with notably different atomic numbers interact with the electron beam; in this case, the two elements involved have very similar atomic numbers (46 for Pd and 47 for Ag); thus the

Electron-induced ligand loss from iron tetracarbonyl methyl acrylate

• Hlib Lyshchuk,
• Atul Chaudhary,
• Thomas F. M. Luxford,
• Miloš Ranković,
• Jaroslav Kočišek,
• Juraj Fedor,
• Lisa McElwee-White and
• Pamir Nag

Beilstein J. Nanotechnol. 2024, 15, 797–807, doi:10.3762/bjnano.15.66

• . Interesting differences also appear when this precursor is compared to structurally similar iron pentacarbonyl. The present findings shed light on the recent electron-induced chemistry of Fe(CO)4MA on a surface under ultrahigh vacuum. Keywords: electron collision; focused electron beam-induced deposition

• (FEBID); FEBID precursor; iron tetracarbonyl methyl acrylate; Introduction In recent years, a wave of interest in the electron-induced loss of ligands from organometallic and coordination compounds appeared, which has been motivated by the need to understand focused electron beam-induced deposition

• (FEBID). FEBID is an emerging method for the fabrication of 3D nanostructures. It relies on the local decomposition of precursors in the focal area of an electron beam [1][2][3][4]. In the case of deposition of metals, the interaction with the electrons should ideally lead to a cleavage of all metal

Effect of repeating hydrothermal growth processes and rapid thermal annealing on CuO thin film properties

• Monika Ozga,
• Eunika Zielony,
• Aleksandra Wierzbicka,
• Anna Wolska,
• Marcin Klepka,
• Marek Godlewski,
• Bogdan J. Kowalski and
• Bartłomiej S. Witkowski

Beilstein J. Nanotechnol. 2024, 15, 743–754, doi:10.3762/bjnano.15.62

• cracking. This phenomenon was manifested, for example, during SEM measurements, when the sample was locally heated by an electron beam, as shown in Figure 1. Simultaneously, exposing the samples to thermal processing results in a reduction of the content of carbon atoms. On this basis, it is postulated

• films surface prior to (left) and after exposure of the indicated area to an electron beam for 30 s (right). The C 1s peaks in high-resolution XPS spectra of as-grown films (left) and processed using the HT+RTA procedure (2×) (right). SEM and AFM images of the surface of the as-grown, 1×, 2×, and 3

Electron-induced deposition using Fe(CO)₄MA and Fe(CO)₅ – effect of MA ligand and process conditions

• Hannah Boeckers,
• Atul Chaudhary,
• Petra Martinović,
• Amy V. Walker,
• Lisa McElwee-White and
• Petra Swiderek

Beilstein J. Nanotechnol. 2024, 15, 500–516, doi:10.3762/bjnano.15.45

• new precursor for focused electron beam-induced deposition (FEBID), was investigated by surface science experiments under UHV conditions. Auger electron spectroscopy was used to monitor deposit formation. The comparison between Fe(CO)4MA and Fe(CO)5 revealed the effect of the modified ligand

• heteroleptic precursor Fe(CO)4MA, thus, offers the possibility to suppress contributions of thermal reactions, which can compromise control over the deposit shape and size in FEBID processes. Keywords: autocatalytic growth; cryo-EBID; electron beam-induced deposition; heteroleptic iron precursor; thermal

• surface reactions; Introduction Focused electron beam-induced deposition (FEBID) is a state-of-the-art direct-write process for the fabrication of nanoscale materials and devices with arbitrary shape and size down to the sub-10 nm regime [1][2][3]. In FEBID, precursor molecules that contain the element

Superconducting spin valve effect in Co/Pb/Co heterostructures with insulating interlayers

• Andrey A. Kamashev,
• Nadir N. Garif’yanov,
• Aidar A. Validov,
• Vladislav Kataev,
• Alexander S. Osin,
• Yakov V. Fominov and
• Ilgiz A. Garifullin

Beilstein J. Nanotechnol. 2024, 15, 457–464, doi:10.3762/bjnano.15.41

• the magnetization of the Co1 layer. The layers were deposited using electron beam evaporation (Co, Pb) and AC sputtering (Si3N4). The deposition setup had a load-lock station with vacuum shutters, allowing one to transfer the sample holder without breaking the ultrahigh vacuum in the deposition

Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• ., Delftechpark 37j, 2628 XJ, Delft, Netherlands Thermo Fisher Scientific, Achtseweg Noord 5, 5651 GG Eindhoven, Netherlands 10.3762/bjnano.15.40 Abstract Structures fabricated using focused electron beam-induced deposition (FEBID) have sloped sidewalls because of the very nature of the deposition process. For

• applications this is highly undesirable, especially when neighboring structures are interconnected. A new technique combining FEBID and focused electron beam-induced etching (FEBIE) has been developed to fabricate structures with vertical sidewalls. The sidewalls of carbon FEBID structures have been modified

• ; FEBIP; side wall angle; Introduction Focused electron beam-induced processing (FEBIP) is a technique in which a focused electron beam is directed onto a substrate with an adsorbed layer of precursor molecules. The precursor molecules are supplied from a gas injection system through a nozzle at close

Heat-induced morphological changes in silver nanowires deposited on a patterned silicon substrate

• Elyad Damerchi,
• Sven Oras,
• Edgars Butanovs,
• Allar Liivlaid,
• Mikk Antsov,
• Boris Polyakov,
• Annamarija Trausa,
• Veronika Zadin,
• Andreas Kyritsakis,
• Loïc Vidal,
• Karine Mougin,
• Siim Pikker and
• Sergei Vlassov

Beilstein J. Nanotechnol. 2024, 15, 435–446, doi:10.3762/bjnano.15.39

• significant bending in the suspended part in the heating scheme 2. The onset temperature of this phenomenon is difficult to determine as the deformation can be below the detection limits of SEM. Moreover, in SEM we only see the 2D projection normal to the electron beam. If NWs are bent out of the substrate

Investigating ripple pattern formation and damage profiles in Si and Ge induced by 100 keV Ar⁺ ion beam: a comparative study

• Indra Sulania,
• Harpreet Sondhi,
• Tanuj Kumar,
• Sunil Ojha,
• G R Umapathy,
• Ambuj Mishra,
• Ambuj Tripathi,
• Richa Krishna,
• Devesh Kumar Avasthi and
• Yogendra Kumar Mishra

Beilstein J. Nanotechnol. 2024, 15, 367–375, doi:10.3762/bjnano.15.33

• of the electron beam rather than the range of the ion beam. The d-spacing found for Si was 0.31 nm and for Ge was 0.34 nm. The SAED pattern clearly shows a good diffraction pattern for Ge indicating that crystallinity remained intact for Ge even after irradiation at a higher ion fluence than that

Controllable physicochemical properties of WO_x thin films grown under glancing angle

• Rupam Mandal,
• Aparajita Mandal,
• Alapan Dutta,
• Rengasamy Sivakumar,
• Sanjeev Kumar Srivastava and
• Tapobrata Som

Beilstein J. Nanotechnol. 2024, 15, 350–359, doi:10.3762/bjnano.15.31

• films was studied in cross-section view mode using a field-emission scanning electron microscope (FESEM) (Carl Zeiss). The samples were cleaved using a diamond cutter and placed on the SEM sample holder with the cross-sectional area facing the electron beam. All SEM images were captured using 5 keV

Design, fabrication, and characterization of kinetic-inductive force sensors for scanning probe applications

• August K. Roos,
• Ermes Scarano,
• Elisabet K. Arvidsson,
• Erik Holmgren and
• David B. Haviland

Beilstein J. Nanotechnol. 2024, 15, 242–255, doi:10.3762/bjnano.15.23

• the coupling to the transmission line used to measure the microwave resonance. A detailed description of our fabrication is presented, including information about the process parameters used for each layer. We also discuss the fabrication of sharp tips on the cantilever using focused electron beam

• expose with a dose of 450 mJ/cm2 using an MLA150 from Heidelberg Instruments. We develop the pattern in maD533s for roughly 45 s and then deposit 10 nm chromium and 40 nm of gold by electron-beam evaporation in an Auto306 from Edwards Vacuum. Lift-off in mrREM700 removes the resist mask, and the

• adhesion of the following 150 nm deposition of chromium with electron-beam evaporation in the Auto306 from Edwards. After the lift-off in mrREM700, we also strip the protective PMMA layer on the front side with AR600–71, and we clean the wafer in isopropanol (IPA). (d) Coarse circuit pattern. A layer of

Quantitative wear evaluation of tips based on sharp structures

• Ke Xu and
• Houwen Leng

Beilstein J. Nanotechnol. 2024, 15, 230–241, doi:10.3762/bjnano.15.22

• shown in Figure 6. The crest’s location in the plane view indicates potential tips of structures. Images of the AFM probes were acquired using a Thermo Fisher Scientific Quattro model scanning electron microscope system. The imaging parameters for the SEM were set to 20 kV electron beam voltage with a

• morphology to verify the reliability of the tip morphology determination based on TipCheck samples. The findings in Figure 9 show that as the number of scans increases during SEM observation, the tip diameter fluctuates, and the ETD rises. This observation suggests that a high-intensity electron beam scan

Ion beam processing of DNA origami nanostructures

• Leo Sala,
• Agnes Zerolová,
• Violaine Vizcaino,
• Alain Mery,
• Alicja Domaracka,
• Hermann Rothard,
• Philippe Boduch,
• Dominik Pinkas and
• Jaroslav Kocišek

Beilstein J. Nanotechnol. 2024, 15, 207–214, doi:10.3762/bjnano.15.20

• widths of 137 ± 3 nm from rim to rim and depths of ∼41 ± 1 nm from the average surface level to the bottom of the trench, as measured ex situ in AFM. The irradiation was done in vacuum (∼10−7 mbar) and at ambient temperature. The default configuration of the sample stage is perpendicular to the electron

• beam of the SEM component; hence, for irradiation, the sample is tilted at 55° through the motorized compucentric stage from the default configuration to be exactly perpendicular to the ion beam. Results and Discussion Fe beam irradiation in vacuum Dry DNA origami nanotriangles deposited on Si

Graphene removal by water-assisted focused electron-beam-induced etching – unveiling the dose and dwell time impact on the etch profile and topographical changes in SiO₂ substrates

• Aleksandra Szkudlarek,
• Jan M. Michalik,
• Inés Serrano-Esparza,
• Zdeněk Nováček,
• Veronika Novotná,
• Piotr Ozga,
• Czesław Kapusta and
• José María De Teresa

Beilstein J. Nanotechnol. 2024, 15, 190–198, doi:10.3762/bjnano.15.18

• processes using the so-called focused electron-beam-induced etching (FEBIE), with a spatial resolution of ten nanometers. Nanopatterning graphene with such a method in one single step and without using a physical mask or resist is a very appealing approach. During the process, on top of graphene

• nanopatterning, we have found significant morphological changes induced in the SiO2 substrate even at low electron dose values (<8 nC/μm2). We demonstrate that graphene etching and topographical changes in SiO2 substrates can be controlled via electron beam parameters such as dwell time and dose. Keywords

• shape control are very limited in those cases. Conventional electron beam lithography (EBL) reaches the resolution of a few nanometers. However, it leaves residual resists on the surface [9], which strongly affects electrical transport properties [10]. A similar high resolution can be achieved with e

Measurements of dichroic bow-tie antenna arrays with integrated cold-electron bolometers using YBCO oscillators

• Leonid S. Revin,
• Dmitry A. Pimanov,
• Alexander V. Chiginev,
• Anton V. Blagodatkin,
• Viktor O. Zbrozhek,
• Andrey V. Samartsev,
• Anastasia N. Orlova,
• Dmitry V. Masterov,
• Alexey E. Parafin,
• Victoria Yu. Safonova,
• Anna V. Gordeeva,
• Andrey L. Pankratov,
• Leonid S. Kuzmin,
• Anatolie S. Sidorenko,
• Silvia Masi and
• Paolo de Bernardis

Beilstein J. Nanotechnol. 2024, 15, 26–36, doi:10.3762/bjnano.15.3

• for the 240 GHz channel is 34.8 GHz, and the maximum absorption occurs at a frequency of 239.6 GHz. Fabrication of samples of receiving systems with CEBs The samples and the sample blanks with electronic lithography, ready for electron beam evaporation, were fabricated at the Chalmers University of

• have resulted in jagged edges or a raised edge of the plating after lift-off, which in turn would have prevented thin electron beam resist from being deposited in the next operation. Therefore, LOR3A and S1805 photoresists were used. After the development, a layer of Ti/Au/Pd with thicknesses of 10/100

• /20 nm was deposited with an electron-beam evaporation machine. After lift-off, a double layer of MMA and ARP electron resist was deposited, which is necessary to form an aluminum oxide dielectric layer without breaking the vacuum. Then the electron lithography was made, but the resist was not

TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

• Joshua Williams,
• Michael I. Faley,
• Joseph Vimal Vas,
• Peng-Han Lu and
• Rafal E. Dunin-Borkowski

Beilstein J. Nanotechnol. 2024, 15, 1–12, doi:10.3762/bjnano.15.1

• method to form an undercut structure that guarantees a clean lift-off procedure. The second approach used dry etching with an Ar beam to etch a thin Py film, while an electron-beam-patterned negative resist mask kept the desired structure. In the third process, nanostencils (shadow masks) with

• information down to the nanometer/atomic scale. However, the corresponding samples need to be prepared on electron-beam-transparent membranes, which are very fragile and can easily break during standard lithography procedures. Although a lift-off approach has been demonstrated [20], alternative methods may be

• structure. The resist was patterned using an electron beam, which offers higher resolution than other sources (e.g., UV light) because of the smaller wavelength of electrons. Since the use of an ultrasonic bath will destroy the free-standing membrane, the undercut must be deliberately made larger to ensure

A combined gas-phase dissociative ionization, dissociative electron attachment and deposition study on the potential FEBID precursor [Au(CH₃)₂Cl]₂

• Elif Bilgilisoy,
• Ali Kamali,
• Thomas Xaver Gentner,
• Gerd Ballmann,
• Sjoerd Harder,
• Hans-Peter Steinrück,
• Hubertus Marbach and
• Oddur Ingólfsson

Beilstein J. Nanotechnol. 2023, 14, 1178–1199, doi:10.3762/bjnano.14.98

• Iceland, Dunhagi 3, 107 Reykjavík, Iceland Inorganic and Organometallic Chemistry, Universität Erlangen-Nürnberg, 91058 Erlangen, Germany Carl Zeiss SMT GmbH, 64380 Roßdorf, Germany 10.3762/bjnano.14.98 Abstract Motivated by the potential of focused-electron-beam-induced deposition (FEBID) in the

• yielded deposits with high gold content, ranging from 45 to 61 atom % depending on the beam current and on the cleanliness of the substrates surface. Keywords: dissociative electron attachment; dissociative ionization; focused-electron-beam-induced deposition (FEBID); gold deposit; low-energy electrons

• nanostructures are critical for the enhancement of absorption and controlled scattering of light [10]. Focused-electron-beam-induced deposition (FEBID) is a direct writing method for controlled deposition/fabrication of nanostructures on either flat or nonflat surfaces. It offers excellent shape control and thus

Hierarchically patterned polyurethane microgrooves featuring nanopillars or nanoholes for neurite elongation and alignment

• Lester Uy Vinzons,
• Guo-Chung Dong and
• Shu-Ping Lin

Beilstein J. Nanotechnol. 2023, 14, 1157–1168, doi:10.3762/bjnano.14.96

• fabrication. For instance, traditional techniques, such as electron-beam lithography, laser writing, and cleanroom photolithography, have flexibility in design but require costly equipment [13][14]. Relatively cheaper techniques, such as anodization, electroplating, and electrospinning, are limited by the

A multi-resistance wide-range calibration sample for conductive probe atomic force microscopy measurements

• François Piquemal,
• Khaled Kaja,
• Pascal Chrétien,
• José Morán-Meza,
• Frédéric Houzé,
• Christian Ulysse and
• Abdelmounaim Harouri

Beilstein J. Nanotechnol. 2023, 14, 1141–1148, doi:10.3762/bjnano.14.94

• standard photolithography, using a mask aligner (MA6, Karl Suss, Germany), and conventional deposition techniques. Following a resist (about 1 µm thick) development process, a 2 inch diameter wafer was placed in a vacuum chamber for electron beam deposition of a 200 nm thick titanium/gold layer